HK1131403A1 - Method of preparing hydrophobic silica - Google Patents

Method of preparing hydrophobic silica

Info

Publication number
HK1131403A1
HK1131403A1 HK09111352.0A HK09111352A HK1131403A1 HK 1131403 A1 HK1131403 A1 HK 1131403A1 HK 09111352 A HK09111352 A HK 09111352A HK 1131403 A1 HK1131403 A1 HK 1131403A1
Authority
HK
Hong Kong
Prior art keywords
hydrophobic silica
preparing hydrophobic
preparing
silica
hydrophobic
Prior art date
Application number
HK09111352.0A
Other languages
English (en)
Inventor
Joachim K Floess
William R Williams
Dmitry Fomitchev
Original Assignee
Cabot Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Corp filed Critical Cabot Corp
Publication of HK1131403A1 publication Critical patent/HK1131403A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C09C1/3081—Treatment with organo-silicon compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00—Developers
    • G03G9/08—Developers with toner particles
    • G03G9/097—Plasticisers; Charge controlling agents
    • G03G9/09708—Inorganic compounds
    • G03G9/09716—Inorganic compounds treated with organic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00—Developers
    • G03G9/08—Developers with toner particles
    • G03G9/097—Plasticisers; Charge controlling agents
    • G03G9/09708—Inorganic compounds
    • G03G9/09725—Silicon-oxides; Silicates
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/86—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by NMR- or ESR-data
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/51—Particles with a specific particle size distribution
    • C01P2004/52—Particles with a specific particle size distribution highly monodisperse size distribution
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
    • Y10T428/2995—Silane, siloxane or silicone coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Silicon Polymers (AREA)
HK09111352.0A 2006-09-15 2009-12-03 Method of preparing hydrophobic silica HK1131403A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US84482806P 2006-09-15 2006-09-15
US11/774,133 US8202502B2 (en) 2006-09-15 2007-07-06 Method of preparing hydrophobic silica
PCT/US2007/020007 WO2008033506A2 (en) 2006-09-15 2007-09-14 Method of preparing hydrophobic silica

Publications (1)

Publication Number Publication Date
HK1131403A1 true HK1131403A1 (en) 2010-01-22

Family

ID=39027604

Family Applications (1)

Application Number Title Priority Date Filing Date
HK09111352.0A HK1131403A1 (en) 2006-09-15 2009-12-03 Method of preparing hydrophobic silica

Country Status (6)

Country Link
US (1) US8202502B2 (ja)
EP (1) EP2066754B1 (ja)
JP (2) JP2010503604A (ja)
CN (1) CN101517012B (ja)
HK (1) HK1131403A1 (ja)
WO (1) WO2008033506A2 (ja)

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JP2016073919A (ja) * 2014-10-06 2016-05-12 株式会社アドマテックス 粉粒体の製造方法
JP5865466B2 (ja) * 2014-11-17 2016-02-17 株式会社アドマテックス シリカ粒子材料及びフィラー含有樹脂組成物
JP6442281B2 (ja) * 2014-12-26 2018-12-19 株式会社アドマテックス シリカ被覆有機物粒子およびその製造方法並びに樹脂組成物
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KR101748527B1 (ko) 2015-04-14 2017-06-19 주식회사 엘지화학 실리카 에어로겔 포함 블랑켓의 제조방법 및 이에 따라 제조된 실리카 에어로겔 포함 블랑켓
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