DE69517565T2 - Fotoempfindliche Flachdruckplatte, die kein Feuchtwasser erfordert, und Verfahren zur deren Herstellung - Google Patents
Fotoempfindliche Flachdruckplatte, die kein Feuchtwasser erfordert, und Verfahren zur deren HerstellungInfo
- Publication number
- DE69517565T2 DE69517565T2 DE69517565T DE69517565T DE69517565T2 DE 69517565 T2 DE69517565 T2 DE 69517565T2 DE 69517565 T DE69517565 T DE 69517565T DE 69517565 T DE69517565 T DE 69517565T DE 69517565 T2 DE69517565 T2 DE 69517565T2
- Authority
- DE
- Germany
- Prior art keywords
- group
- layer
- printing plate
- planographic printing
- photopolymerizable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- 150000001412 amines Chemical class 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
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- 239000007822 coupling agent Substances 0.000 description 3
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 3
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- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
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- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- LVTJOONKWUXEFR-FZRMHRINSA-N protoneodioscin Natural products O(C[C@@H](CC[C@]1(O)[C@H](C)[C@@H]2[C@]3(C)[C@H]([C@H]4[C@@H]([C@]5(C)C(=CC4)C[C@@H](O[C@@H]4[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@@H](O)[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@H](CO)O4)CC5)CC3)C[C@@H]2O1)C)[C@H]1[C@H](O)[C@H](O)[C@H](O)[C@@H](CO)O1 LVTJOONKWUXEFR-FZRMHRINSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000010731 rolling oil Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Claims (2)
1. Eine photoempfindliche Flachdruckplatte, die kein Feuchtwasser erfordert,
umfassend einen Träger, auf den eine photopolymerisierbare photoempfindliche Schicht
und eine Siliconkautschukschicht in dieser Reihenfolge aufgebracht sind,
worin die photopolymerisierbare photoempfindliche Schicht mindestens ein durch
die folgende Formel (I) wiedergegebenes photopolymerisierbares Monomer und
einen Photopolymerisationsinitiator enthält:
worin m eine ganze Zahl von 0 bis 30 bedeutet;
Y -COO-, -OCO-, -CONH-, -O-, -NH- oder -S- bedeutet;
L&sub1; eine Alkylengruppe bedeutet;
L&sub2; eine Alkylengruppe, eine Phenylengruppe oder eine Aralkylengruppe bedeutet;
p und q jeweils 0 oder 1 bedeuten; und
R¹, R² und R³ gleich oder verschieden sind und jeweils ein Wasserstoffatom, eine
Alkylgruppe oder eine durch die folgende Formel (II) wiedergegebene Gruppe
bedeuten, mit der Maßgabe, daß mindestens zwei von R¹, R² und R³ ausgewählt
sind aus den Gruppen, die durch die folgende Formel (II) wiedergegeben werden:
worin n eine ganze Zahl von 1 bis 15 bedeutet, mit der Maßgabe, daß die
Gesamtzahl der Ethylenoxidgruppe oder der Propylenoxidgruppe in einem Molekül eines
durch die Formel (I) wiedergegebenen Monomers 30 oder weniger beträgt;
R&sup4; ein Wasserstoffatom oder eine Alkylgruppe mit 1 bis 4 Kohlenstoffatomen
bedeutet;
R&sup5; ein Wasserstoffatom oder eine Methylgruppe bedeutet und die Vielzahl der R&sup5;-
Gruppen gleich oder verschieden sein kann;
X -COO-, -CONH- oder eine Phenylengruppe bedeutet;
L&sub3; und L&sub4; jeweils eine substituierte oder unsubstituierte Alkylengruppe bedeuten;
und
r 0 oder 1 bedeutet.
2. Ein Verfahren zur Herstellung einer Flachdruckplatte, die kein Feuchtwasser
erfordert, das die Stufen umfaßt:
(a) selektives Belichten der photoempfindlichen Flachdruckplatte, die kein
Feuchtwasser erfordert, gemäß Anspruch 1,
(b) Durchtränken der Platte in Wasser oder einem hauptsächlich Wasser enthaltenden
organischen Lösungsmittel und
(c) Entfernen der Siliconkautschukschicht, um ein Bild zu bilden, während die Platte
durchtränkt wird.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21400594A JP3290313B2 (ja) | 1994-09-07 | 1994-09-07 | 湿し水不要感光性平版印刷版及びその製版方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69517565D1 DE69517565D1 (de) | 2000-07-27 |
| DE69517565T2 true DE69517565T2 (de) | 2000-10-19 |
Family
ID=16648692
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69517565T Expired - Lifetime DE69517565T2 (de) | 1994-09-07 | 1995-08-23 | Fotoempfindliche Flachdruckplatte, die kein Feuchtwasser erfordert, und Verfahren zur deren Herstellung |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US5571658A (de) |
| EP (1) | EP0701170B1 (de) |
| JP (1) | JP3290313B2 (de) |
| DE (1) | DE69517565T2 (de) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR970702158A (ko) * | 1994-03-28 | 1997-05-13 | 하시모토 신이치 | 평판인쇄판(lithographic form plate) |
| JP3389820B2 (ja) * | 1996-06-17 | 2003-03-24 | 東レ株式会社 | 水なし平版印刷版原版 |
| JP3654422B2 (ja) * | 2000-01-31 | 2005-06-02 | 三菱製紙株式会社 | 感光性組成物および感光性平版印刷版材料 |
| US6841336B2 (en) | 2000-10-16 | 2005-01-11 | Fuji Photo Film Co., Ltd. | Plate-making method of lithographic printing plate |
| EP1910897A4 (de) | 2005-07-29 | 2010-12-22 | Anocoil Corp | Abbildbare druckplatte für entwicklung auf der druckpresse |
| ES2340605T3 (es) * | 2006-12-20 | 2010-06-07 | Agfa Graphics N.V. | Precursor de forma para impresion flexografica grabable por laser. |
Family Cites Families (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2033769B2 (de) | 1969-07-11 | 1980-02-21 | Ppg Industries, Inc., Pittsburgh, Pa. (V.St.A.) | Bis-<2-acryloxyäthyl)hexahydrophthalat enthaltende Gemische und Herstellungsverfahren |
| JPS4841708B1 (de) | 1970-01-13 | 1973-12-07 | ||
| JPS506034B1 (de) | 1970-08-11 | 1975-03-10 | ||
| JPS5324989B2 (de) | 1971-12-09 | 1978-07-24 | ||
| JPS5230490B2 (de) | 1972-03-21 | 1977-08-09 | ||
| JPS5426923B2 (de) | 1972-03-21 | 1979-09-06 | ||
| JPS5522781B2 (de) | 1972-05-09 | 1980-06-19 | ||
| JPS5623150B2 (de) | 1973-09-04 | 1981-05-29 | ||
| JPS5311314B2 (de) | 1974-09-25 | 1978-04-20 | ||
| JPS5680047A (en) * | 1979-12-06 | 1981-07-01 | Toray Ind Inc | Lithographic plate requiring no dampening water |
| JPS5713448A (en) | 1980-06-30 | 1982-01-23 | Toray Ind Inc | Developing solution for use in lithographic plate requiring no dampening water |
| JPS57154150A (en) * | 1981-03-17 | 1982-09-22 | Teijin Ltd | Tertiary amine compound containing (meth)acrylic acid ester group and its preparation |
| JPS57151639A (en) * | 1981-03-17 | 1982-09-18 | Teijin Ltd | Photo-polymerizable resin composition |
| JPS58215411A (ja) | 1982-06-09 | 1983-12-14 | Daikin Ind Ltd | 感応性材料 |
| JPS59146054A (ja) | 1983-02-09 | 1984-08-21 | Toray Ind Inc | 湿し水不要平版印刷版用現像液 |
| JPS6022903A (ja) | 1983-07-19 | 1985-02-05 | Toray Ind Inc | 流体分離装置 |
| US4540649A (en) | 1984-09-12 | 1985-09-10 | Napp Systems (Usa) Inc. | Water developable photopolymerizable composition and printing plate element containing same |
| JPS6250760A (ja) | 1985-08-29 | 1987-03-05 | Fuji Photo Film Co Ltd | 湿し水不要感光性平版印刷版 |
| JPS63133151A (ja) | 1986-11-26 | 1988-06-04 | Konica Corp | 新規なイエロ−カプラ−を含有するハロゲン化銀写真感光材料 |
| JPS63253949A (ja) * | 1987-04-10 | 1988-10-20 | Fuji Photo Film Co Ltd | 湿し水不要感光性平版印刷原板 |
| DE3811832C2 (de) * | 1987-04-10 | 1998-06-04 | Fuji Photo Film Co Ltd | Trockene, vorsensibilisierte Platte und Verfahren zur Herstellung einer lithographischen Druckplatte |
| JPH07101305B2 (ja) * | 1987-05-12 | 1995-11-01 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷版 |
| JPH01159644A (ja) | 1987-12-16 | 1989-06-22 | Fuji Photo Film Co Ltd | 水なしｐｓ版用現像液 |
| JPH07104599B2 (ja) | 1988-01-04 | 1995-11-13 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷原版 |
| JPH02103047A (ja) | 1988-10-12 | 1990-04-16 | Konica Corp | 湿し水不要の平版印刷版材料 |
| JP2577630B2 (ja) | 1989-03-10 | 1997-02-05 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷版 |
| JP2532291B2 (ja) | 1989-10-30 | 1996-09-11 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷版 |
| JP2532290B2 (ja) | 1990-01-31 | 1996-09-11 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷版 |
| JP2739383B2 (ja) | 1990-03-16 | 1998-04-15 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷版 |
| JP2596850B2 (ja) | 1990-07-09 | 1997-04-02 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷版 |
| JP2532302B2 (ja) | 1990-11-07 | 1996-09-11 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷版 |
| JP2577658B2 (ja) | 1990-12-13 | 1997-02-05 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷版 |
| JP2726962B2 (ja) | 1992-02-12 | 1998-03-11 | 富士写真フイルム株式会社 | 重合性組成物 |
| US5397681A (en) * | 1992-08-20 | 1995-03-14 | Toray Industries, Inc. | Laminate used for the production of a dry planographic printing plate |
| JP3319059B2 (ja) | 1992-08-20 | 2002-08-26 | 東レ株式会社 | 水なし平版印刷版原版および水なし平版印刷版 |
| JP2729880B2 (ja) | 1992-09-07 | 1998-03-18 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷版 |
-
1994
- 1994-09-07 JP JP21400594A patent/JP3290313B2/ja not_active Expired - Fee Related
-
1995
- 1995-08-23 DE DE69517565T patent/DE69517565T2/de not_active Expired - Lifetime
- 1995-08-23 EP EP95113261A patent/EP0701170B1/de not_active Expired - Lifetime
- 1995-08-29 US US08/520,572 patent/US5571658A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE69517565D1 (de) | 2000-07-27 |
| EP0701170A2 (de) | 1996-03-13 |
| EP0701170A3 (de) | 1997-11-05 |
| US5571658A (en) | 1996-11-05 |
| JPH0876367A (ja) | 1996-03-22 |
| EP0701170B1 (de) | 2000-06-21 |
| JP3290313B2 (ja) | 2002-06-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP |