JPS57154150A - Tertiary amine compound containing (meth)acrylic acid ester group and its preparation - Google Patents

Tertiary amine compound containing (meth)acrylic acid ester group and its preparation

Info

Publication number
JPS57154150A
JPS57154150A JP3720081A JP3720081A JPS57154150A JP S57154150 A JPS57154150 A JP S57154150A JP 3720081 A JP3720081 A JP 3720081A JP 3720081 A JP3720081 A JP 3720081A JP S57154150 A JPS57154150 A JP S57154150A
Authority
JP
Japan
Prior art keywords
compound
formula
group
formula iii
meth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3720081A
Other languages
Japanese (ja)
Inventor
Yoichi Saito
Kaoru Iwata
Tsuneo Hagiwara
Akihiro Horiie
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP3720081A priority Critical patent/JPS57154150A/en
Publication of JPS57154150A publication Critical patent/JPS57154150A/en
Pending legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

NEW MATERIAL:The compound of formulaI[R3 and R4 are ≤10C alkyl, group of formula II of formula III, or R3 and R4 together form an alkylene; when n=0, then R4 is group of formula III; R5 is 1W25C bivalent aliphatic or alicyclic hydrocarbon group (when R3 and R4 are hydrocarbon group, R5 may contain hetero atom); R10WR12 and R20WR22 are H or CH3; l10Wl12 are integer 1W50; n is 0 or 1].
EXAMPLE: N-Ethyl diethanolamino diacrylate.
USE: A photosensitive crosslinking agent also acting as a reducing agent of a photosensitive resin in Oster process. It has high crosslinking reactivity, low tendency of dark reaction, excellent compatibility with various general-purpose polymers, and can be prepared economically.
PROCESS: The compound of formulaIis prepared by reacting 1mol of the compound of formula IV (R3 and R4 are above-defined groups except group of formula III) with ≥2mol of the compound of formula V[X is OH, halogen, ≤10C alkoxy, CH2=CHCOO, or CH2=C(CH3)]OO].
COPYRIGHT: (C)1982,JPO&Japio
JP3720081A 1981-03-17 1981-03-17 Tertiary amine compound containing (meth)acrylic acid ester group and its preparation Pending JPS57154150A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3720081A JPS57154150A (en) 1981-03-17 1981-03-17 Tertiary amine compound containing (meth)acrylic acid ester group and its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3720081A JPS57154150A (en) 1981-03-17 1981-03-17 Tertiary amine compound containing (meth)acrylic acid ester group and its preparation

Publications (1)

Publication Number Publication Date
JPS57154150A true JPS57154150A (en) 1982-09-22

Family

ID=12490926

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3720081A Pending JPS57154150A (en) 1981-03-17 1981-03-17 Tertiary amine compound containing (meth)acrylic acid ester group and its preparation

Country Status (1)

Country Link
JP (1) JPS57154150A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0701170A3 (en) * 1994-09-07 1997-11-05 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate requiring no fountain solution and process for producing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0701170A3 (en) * 1994-09-07 1997-11-05 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate requiring no fountain solution and process for producing the same

Similar Documents

Publication Publication Date Title
JPS5736115A (en) Curing agent composition for polyurethane
ES458112A1 (en) Novel inversion process
IE811931L (en) Oxiranes.
EP0226009A3 (en) Photoresist compositions of controlled dissolution rate in alkaline developers
ES2000841A6 (en) Polymers of self- and hydroxyl reactive formaldehyde-free cyclic hemiamidal and hemiamide ketal crosslinking monomers.
ES2001343A6 (en) Self- and hydroxyl reactive formaldehyde-free cyclic hemiamidal and hemiamide ketal crosslinking monomers and their derived polymers.
JPS57154150A (en) Tertiary amine compound containing (meth)acrylic acid ester group and its preparation
ES8801894A1 (en) Phenethanol amine derivatives.
JPS57183738A (en) Aromatic carboxylic acid derivative
EP0205319A3 (en) Polymer composition for photoresist application
JPS57180618A (en) Photocurable resin composition
JPS57179146A (en) Amidine compound
JPS57151639A (en) Photo-polymerizable resin composition
JPS5667376A (en) Composition for cationic electrostatic coating paint
IE860669L (en) Thieno-imidazoles
JPS55147578A (en) Adhesive composition
JPS5727433A (en) Magnetic recording medium
JPS5742662A (en) Benzoic acid amide derivative
JPS55160785A (en) Preparation of organopolysiloxane
JPS56150083A (en) Novel dibenzo b,e oxepin derivative
JPS56161476A (en) Antifouling paint
JPS57126823A (en) Silyl-terminated polymer and its production
JPS57137329A (en) Flame-retardant for synthetic resin
JPS5776003A (en) Preparation of high polymeric organotin compound
ES8406481A1 (en) Bicyclic compounds