DE69718998T2 - Trocken flachdruckplatte - Google Patents
Trocken flachdruckplatteInfo
- Publication number
- DE69718998T2 DE69718998T2 DE69718998T DE69718998T DE69718998T2 DE 69718998 T2 DE69718998 T2 DE 69718998T2 DE 69718998 T DE69718998 T DE 69718998T DE 69718998 T DE69718998 T DE 69718998T DE 69718998 T2 DE69718998 T2 DE 69718998T2
- Authority
- DE
- Germany
- Prior art keywords
- print plate
- flat print
- dry flat
- dry
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15558196 | 1996-06-17 | ||
JP27010696 | 1996-10-11 | ||
JP9403597 | 1997-04-11 | ||
JP14834097A JP3389820B2 (ja) | 1996-06-17 | 1997-06-05 | 水なし平版印刷版原版 |
PCT/JP1997/002085 WO1997049005A1 (fr) | 1996-06-17 | 1997-06-17 | Plaque pour lithographie sans eau |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69718998D1 DE69718998D1 (de) | 2003-03-20 |
DE69718998T2 true DE69718998T2 (de) | 2003-11-06 |
Family
ID=27468181
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69718998T Expired - Fee Related DE69718998T2 (de) | 1996-06-17 | 1997-06-17 | Trocken flachdruckplatte |
Country Status (5)
Country | Link |
---|---|
US (1) | US6106997A (de) |
EP (1) | EP0845708B1 (de) |
JP (1) | JP3389820B2 (de) |
DE (1) | DE69718998T2 (de) |
WO (1) | WO1997049005A1 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000347397A (ja) | 1999-06-04 | 2000-12-15 | Jsr Corp | 感放射線性樹脂組成物およびその層間絶縁膜への使用 |
US7425406B2 (en) | 2004-07-27 | 2008-09-16 | Fujifilm Corporation | Lithographic printing plate precursor and lithographic printing method |
US7736836B2 (en) * | 2004-09-22 | 2010-06-15 | Jonghan Choi | Slip film compositions containing layered silicates |
EP1685957B1 (de) * | 2005-01-26 | 2013-12-11 | FUJIFILM Corporation | Flachdruckverfahrenstapel |
JP4905016B2 (ja) * | 2006-09-20 | 2012-03-28 | トヨタ自動車株式会社 | 車輪速パルス補正システム |
EP2567284B1 (de) | 2010-05-03 | 2016-08-31 | Basf Se | Farbfilter für tieftemperaturanwendungen |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56129212A (en) * | 1980-03-13 | 1981-10-09 | Toray Ind Inc | Photosensitive polyamide resin composition |
JP2532302B2 (ja) * | 1990-11-07 | 1996-09-11 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷版 |
DE4224938A1 (de) * | 1991-07-29 | 1993-02-04 | Fuji Photo Film Co Ltd | Polymerisierbare zusammensetzung und trockene ps-platte |
JPH07140644A (ja) * | 1993-11-19 | 1995-06-02 | Fuji Photo Film Co Ltd | 湿し水不要感光性平版印刷版 |
JPH07281424A (ja) * | 1994-02-17 | 1995-10-27 | Toray Ind Inc | 水なし平版印刷版原版 |
JP3290313B2 (ja) * | 1994-09-07 | 2002-06-10 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷版及びその製版方法 |
-
1997
- 1997-06-05 JP JP14834097A patent/JP3389820B2/ja not_active Expired - Fee Related
- 1997-06-17 DE DE69718998T patent/DE69718998T2/de not_active Expired - Fee Related
- 1997-06-17 WO PCT/JP1997/002085 patent/WO1997049005A1/ja active IP Right Grant
- 1997-06-17 EP EP97926272A patent/EP0845708B1/de not_active Expired - Lifetime
- 1997-06-17 US US09/011,793 patent/US6106997A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP3389820B2 (ja) | 2003-03-24 |
DE69718998D1 (de) | 2003-03-20 |
EP0845708A4 (de) | 1999-12-08 |
US6106997A (en) | 2000-08-22 |
WO1997049005A1 (fr) | 1997-12-24 |
EP0845708A1 (de) | 1998-06-03 |
JPH10339946A (ja) | 1998-12-22 |
EP0845708B1 (de) | 2003-02-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |