DE69804876T2 - Flachdruckplatte - Google Patents

Flachdruckplatte

Info

Publication number
DE69804876T2
DE69804876T2 DE69804876T DE69804876T DE69804876T2 DE 69804876 T2 DE69804876 T2 DE 69804876T2 DE 69804876 T DE69804876 T DE 69804876T DE 69804876 T DE69804876 T DE 69804876T DE 69804876 T2 DE69804876 T2 DE 69804876T2
Authority
DE
Germany
Prior art keywords
printing plate
lithographic printing
lithographic
plate
printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69804876T
Other languages
English (en)
Other versions
DE69804876D1 (de
Inventor
Kazuo Maemoto
Koichi Kawamura
Katsuji Kitatani
Fumikazu Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP01075597A external-priority patent/JP3805051B2/ja
Priority claimed from JP02687797A external-priority patent/JP3751703B2/ja
Priority claimed from JP3666597A external-priority patent/JP3839540B2/ja
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69804876D1 publication Critical patent/DE69804876D1/de
Application granted granted Critical
Publication of DE69804876T2 publication Critical patent/DE69804876T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/08—Developable by water or the fountain solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE69804876T 1997-01-24 1998-01-23 Flachdruckplatte Expired - Lifetime DE69804876T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP01075597A JP3805051B2 (ja) 1997-01-24 1997-01-24 平版印刷版用原版
JP2687897 1997-02-10
JP02687797A JP3751703B2 (ja) 1997-02-10 1997-02-10 平版印刷版用原版
JP3666597A JP3839540B2 (ja) 1997-02-20 1997-02-20 平版印刷版用原版

Publications (2)

Publication Number Publication Date
DE69804876D1 DE69804876D1 (de) 2002-05-23
DE69804876T2 true DE69804876T2 (de) 2002-11-14

Family

ID=27455455

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69804876T Expired - Lifetime DE69804876T2 (de) 1997-01-24 1998-01-23 Flachdruckplatte

Country Status (3)

Country Link
US (1) US6017677A (de)
EP (1) EP0855267B1 (de)
DE (1) DE69804876T2 (de)

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2153986C2 (ru) 1996-04-23 2000-08-10 Хорселл Грэфик Индастриз Лимитед Термочувствительная композиция и способ ее применения для изготовления литографической печатной формы
DE69819584T2 (de) * 1997-04-08 2004-09-16 Fuji Photo Film Co., Ltd., Minami-Ashigara Positiv arbeitende lithographische Druckplatte
DE19729067A1 (de) * 1997-07-08 1999-01-14 Agfa Gevaert Ag Infrarot-bebilderbares Aufzeichnungsmaterial und daraus hergestellte Offsetdruckplatte
EP0901902A3 (de) * 1997-09-12 1999-03-24 Fuji Photo Film Co., Ltd. Positiv arbeitende lichtempfindliche Zusammensetzung für Infrarot Bebilderung
DE69838703T2 (de) 1997-09-12 2008-09-25 Fujifilm Corp. Strahlungsempfindlicher Flachdruckplattenvorläufer und Flachdruckplatte
US6153352A (en) 1997-12-10 2000-11-28 Fuji Photo Film Co., Ltd. Planographic printing plate precursor and a method for producing a planographic printing plate
JP3853967B2 (ja) * 1998-04-13 2006-12-06 富士写真フイルム株式会社 熱硬化性組成物およびこれを用いた平版印刷版用原版ならびにスルホン酸エステル化合物
US6250225B1 (en) * 1998-07-16 2001-06-26 Agfa-Gevaert Thermal lithographic printing plate precursor with excellent shelf life
US6413694B1 (en) * 1998-09-18 2002-07-02 Kodak Polychrome Graphics Llc Processless imaging member containing heat sensitive sulfonate polymer and methods of use
JP3392404B2 (ja) * 1998-09-21 2003-03-31 プレステク，インコーポレイテッド レーザイメージング装置に用いるリソグラフ印刷プレート
US6489079B1 (en) * 1998-10-26 2002-12-03 Agfa-Gevaert Heat mode sensitive imaging element for making positive working printing plates
US6420082B1 (en) * 1998-11-13 2002-07-16 Fuji Photo Film Co., Ltd. Positive resist fluid and positive resist composition
KR100610165B1 (ko) * 1998-12-07 2006-08-09 후지 샤신 필름 가부시기가이샤 포지티브 포토레지스트 조성물
US6455132B1 (en) * 1999-02-04 2002-09-24 Kodak Polychrome Graphics Llc Lithographic printing printable media and process for the production thereof
JP3775634B2 (ja) 1999-02-22 2006-05-17 富士写真フイルム株式会社 平版印刷版用原版
ATE288359T1 (de) 1999-02-22 2005-02-15 Fuji Photo Film Co Ltd Wärmeempfindliche lithographische druckplatte
KR100647527B1 (ko) * 1999-04-01 2006-11-17 후지 샤신 필름 가부시기가이샤 원자외선 노광용 포지티브 포토레지스트 조성물
JP2000318331A (ja) * 1999-05-13 2000-11-21 Fuji Photo Film Co Ltd 感熱性平版印刷版
US6319655B1 (en) * 1999-06-11 2001-11-20 Electron Vision Corporation Modification of 193 nm sensitive photoresist materials by electron beam exposure
JP4090154B2 (ja) * 1999-07-23 2008-05-28 富士フイルム株式会社 平版印刷版の製造方法
US6186067B1 (en) * 1999-09-30 2001-02-13 Presstek, Inc. Infrared laser-imageable lithographic printing members and methods of preparing and imaging such printing members
US6844137B2 (en) * 2000-03-01 2005-01-18 Fuji Photo Film Co., Ltd. Image recording material
JP4119597B2 (ja) * 2000-05-17 2008-07-16 富士フイルム株式会社 平版印刷版原版
CN1324403C (zh) * 2000-11-10 2007-07-04 富士胶片株式会社 热敏性平版印刷版
JP2002240450A (ja) * 2001-02-15 2002-08-28 Fuji Photo Film Co Ltd 平版印刷版原版
EP1295717B1 (de) * 2001-09-24 2007-07-25 Agfa Graphics N.V. Wärmeempfindlicher positiv arbeitender Flachdruckplattenvorläufer
US7294447B2 (en) 2001-09-24 2007-11-13 Agfa Graphics Nv Positive-working lithographic printing plate precursor
US7776505B2 (en) * 2001-11-05 2010-08-17 The University Of North Carolina At Charlotte High resolution resists for next generation lithographies
JP3901565B2 (ja) * 2002-04-15 2007-04-04 富士フイルム株式会社 感熱性平版印刷版用原板
KR100478982B1 (ko) * 2002-05-02 2005-03-25 금호석유화학 주식회사 신규 산발생제 및 이를 함유한 박막 조성물
DE10245128A1 (de) * 2002-09-27 2004-04-08 Infineon Technologies Ag Fotoempfindlicher Lack zum Beschichten eines Substrates und Verfahren zum Belichten des mit dem Lack beschichteten Substrates
AU2003277502A1 (en) * 2002-10-16 2004-05-04 Mitsui Chemicals, Inc. Photosensitive resin composition for lithographic printing forme and original forme for lithographic printing
JP2004206058A (ja) * 2002-10-31 2004-07-22 Sumitomo Chem Co Ltd ポジ型感光性組成物
US6838226B2 (en) 2003-05-20 2005-01-04 Eastman Kodak Company Imaging member with microgel protective layer
US6899996B2 (en) 2003-05-20 2005-05-31 Eastman Kodak Company Method of preparing imaging member with microgel protective layer
US6939663B2 (en) 2003-07-08 2005-09-06 Kodak Polychrome Graphics Llc Sulfated phenolic resins and printing plate precursors comprising sulfated phenolic resins
ATE378174T1 (de) 2004-01-23 2007-11-15 Fujifilm Corp Lithographiedruckplattenvorläufer und lithographisches druckverfahren
EP1584485B1 (de) 2004-04-09 2007-12-05 FUJIFILM Corporation Flachdruckplattenvorläufer und Flachdruckverfahren.
JP2006062188A (ja) 2004-08-26 2006-03-09 Fuji Photo Film Co Ltd 色画像形成材料及び平版印刷版原版
US20060150847A1 (en) * 2004-10-12 2006-07-13 Presstek, Inc. Inkjet-imageable lithographic printing members and methods of preparing and imaging them
US20060115768A1 (en) 2004-11-30 2006-06-01 Fuji Photo Film Co. Ltd Lithographic printing plate precursor, plate-making method, and lithographic printing method
US7856985B2 (en) 2005-04-22 2010-12-28 Cynosure, Inc. Method of treatment body tissue using a non-uniform laser beam
DE102005060061A1 (de) * 2005-06-02 2006-12-07 Hynix Semiconductor Inc., Ichon Polymer für die Immersionslithographie, Photoresistzusammensetzung, die selbiges enthält, Verfahren zur Herstellung einer Halbleitervorrichtung und Halbleitervorrichtung
US7586957B2 (en) 2006-08-02 2009-09-08 Cynosure, Inc Picosecond laser apparatus and methods for its operation and use
WO2009152276A2 (en) * 2008-06-10 2009-12-17 University Of North Carolina At Charlotte Photoacid generators and lithographic resists comprising the same
KR102183581B1 (ko) 2012-04-18 2020-11-27 싸이노슈어, 엘엘씨 피코초 레이저 장치 및 그를 사용한 표적 조직의 치료 방법
EP2937733A4 (de) 2012-12-19 2016-09-14 Ibf Indústria Brasileira De Filmes S A Zusammensetzung mit empfindlichkeit gegenüber strahlung in elektromagnetischen spektren für druckzwecke, druckplatte mit dieser zusammensetzung und verwendung dieser zusammensetzung sowie bildentwicklungsverfahren
WO2014145707A2 (en) 2013-03-15 2014-09-18 Cynosure, Inc. Picosecond optical radiation systems and methods of use
WO2019165426A1 (en) 2018-02-26 2019-08-29 Cynosure, Inc. Q-switched cavity dumped sub-nanosecond laser

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0671787B2 (ja) * 1983-12-21 1994-09-14 旭化成工業株式会社 平板印刷用刷版の製造方法
JPS63257750A (ja) * 1987-04-16 1988-10-25 Oji Paper Co Ltd ポジ型感光性樹脂
DE3854364T2 (de) * 1987-05-28 1996-04-25 Nippon Paint Co Ltd Positiv arbeitende lichtempfindliche Harzzusammensetzung.
JP2717602B2 (ja) * 1990-01-16 1998-02-18 富士写真フイルム株式会社 感光性組成物
GB9322705D0 (en) * 1993-11-04 1993-12-22 Minnesota Mining & Mfg Lithographic printing plates
JP3589365B2 (ja) * 1996-02-02 2004-11-17 富士写真フイルム株式会社 ポジ画像形成組成物
EP0795789B1 (de) * 1996-03-11 2000-02-09 Fuji Photo Film Co., Ltd. Negativarbeitendes Bildaufzeichnungsmaterial

Also Published As

Publication number Publication date
EP0855267B1 (de) 2002-04-17
EP0855267A3 (de) 1999-02-17
US6017677A (en) 2000-01-25
EP0855267A2 (de) 1998-07-29
DE69804876D1 (de) 2002-05-23

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP