DE3854364T2 - Positiv arbeitende lichtempfindliche Harzzusammensetzung. - Google Patents

Positiv arbeitende lichtempfindliche Harzzusammensetzung.

Info

Publication number
DE3854364T2
DE3854364T2 DE3854364T DE3854364T DE3854364T2 DE 3854364 T2 DE3854364 T2 DE 3854364T2 DE 3854364 T DE3854364 T DE 3854364T DE 3854364 T DE3854364 T DE 3854364T DE 3854364 T2 DE3854364 T2 DE 3854364T2
Authority
DE
Germany
Prior art keywords
resin composition
photosensitive resin
positive working
working photosensitive
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3854364T
Other languages
English (en)
Other versions
DE3854364D1 (de
Inventor
Masamitsu Shirai
Masahiro Tsunooka
Makoto Tanaka
Kanji Nishijima
Katsukiyo Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Application granted granted Critical
Publication of DE3854364D1 publication Critical patent/DE3854364D1/de
Publication of DE3854364T2 publication Critical patent/DE3854364T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
DE3854364T 1987-05-28 1988-05-27 Positiv arbeitende lichtempfindliche Harzzusammensetzung. Expired - Fee Related DE3854364T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13275687 1987-05-28

Publications (2)

Publication Number Publication Date
DE3854364D1 DE3854364D1 (de) 1995-10-05
DE3854364T2 true DE3854364T2 (de) 1996-04-25

Family

ID=15088820

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3854364T Expired - Fee Related DE3854364T2 (de) 1987-05-28 1988-05-27 Positiv arbeitende lichtempfindliche Harzzusammensetzung.

Country Status (4)

Country Link
US (1) US4869995A (de)
EP (1) EP0293058B1 (de)
CA (1) CA1316622C (de)
DE (1) DE3854364T2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2632066B2 (ja) * 1990-04-06 1997-07-16 富士写真フイルム株式会社 ポジ画像の形成方法
JP2645384B2 (ja) * 1990-05-21 1997-08-25 日本ペイント株式会社 ポジ型感光性樹脂組成物
JPH05150459A (ja) * 1991-05-24 1993-06-18 Nippon Paint Co Ltd レジストパターンの形成方法
JP3382081B2 (ja) * 1995-06-01 2003-03-04 株式会社東芝 レジストおよびこれを用いたパターン形成方法
US5928840A (en) * 1995-11-10 1999-07-27 Matsushita Electric Industrial Co., Ltd. Patterning material and patterning method
JP3589365B2 (ja) * 1996-02-02 2004-11-17 富士写真フイルム株式会社 ポジ画像形成組成物
DE69707325T2 (de) 1996-02-26 2002-05-02 Matsushita Electric Ind Co Ltd Bilderzeugungsmaterial und Verfahren
DE69804876T2 (de) * 1997-01-24 2002-11-14 Fuji Photo Film Co Ltd Flachdruckplatte
US6413694B1 (en) * 1998-09-18 2002-07-02 Kodak Polychrome Graphics Llc Processless imaging member containing heat sensitive sulfonate polymer and methods of use
US5985514A (en) * 1998-09-18 1999-11-16 Eastman Kodak Company Imaging member containing heat sensitive thiosulfate polymer and methods of use
US6399268B1 (en) 1999-04-16 2002-06-04 Kodak Polychrome Graphics Llc Processless direct write imaging member containing polymer grafted carbon and methods of imaging and printing
US6465152B1 (en) 2000-06-26 2002-10-15 Kodak Polychrome Graphics Llc Imaging member containing heat sensitive thiosulfate polymer on improved substrate and methods of use
US7105272B2 (en) 2002-02-15 2006-09-12 Nippon Soda Co., Ltd. Acid-degradable resin compositions containing ketene-aldehyde copolymer
US7029072B1 (en) 2002-03-11 2006-04-18 Wirtgen America, Inc. Modified rumble strip cutter
KR101357606B1 (ko) * 2006-01-12 2014-02-03 주식회사 동진쎄미켐 감광성 고분자 및 이를 포함하는 포토레지스트 조성물
CN101473268A (zh) * 2006-06-20 2009-07-01 西巴控股有限公司 肟磺酸酯和其作为潜伏酸的用途
US7635552B2 (en) * 2006-07-25 2009-12-22 Endicott Interconnect Technologies, Inc. Photoresist composition with antibacterial agent

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL92883C (de) * 1953-07-01
US4160666A (en) * 1977-05-25 1979-07-10 Eastman Kodak Company Polymeric chemical sensitizers for organic photoconductive compositions
US4539250A (en) * 1981-12-19 1985-09-03 Daikin Kogyo Co. Ltd. Resist material and process for forming fine resist pattern
JPS58203433A (ja) * 1982-05-21 1983-11-26 Fuji Photo Film Co Ltd 感光性組成物
US4666820A (en) * 1983-04-29 1987-05-19 American Telephone And Telegraph Company, At&T Laboratories Photosensitive element comprising a substrate and an alkaline soluble mixture
GB8413395D0 (en) * 1984-05-25 1984-07-04 Ciba Geigy Ag Production of images
DE3660255D1 (en) * 1985-04-12 1988-07-07 Ciba Geigy Ag Oxime sulphonates containing reactive groups
GB8608528D0 (en) * 1986-04-08 1986-05-14 Ciba Geigy Ag Production of positive images
US4684599A (en) * 1986-07-14 1987-08-04 Eastman Kodak Company Photoresist compositions containing quinone sensitizer

Also Published As

Publication number Publication date
DE3854364D1 (de) 1995-10-05
US4869995A (en) 1989-09-26
EP0293058A3 (en) 1989-10-25
CA1316622C (en) 1993-04-20
EP0293058B1 (de) 1995-08-30
EP0293058A2 (de) 1988-11-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee