DE3881976D1 - Positive photoempfindliche harzzubereitung. - Google Patents

Positive photoempfindliche harzzubereitung.

Info

Publication number
DE3881976D1
DE3881976D1 DE8888901323T DE3881976T DE3881976D1 DE 3881976 D1 DE3881976 D1 DE 3881976D1 DE 8888901323 T DE8888901323 T DE 8888901323T DE 3881976 T DE3881976 T DE 3881976T DE 3881976 D1 DE3881976 D1 DE 3881976D1
Authority
DE
Germany
Prior art keywords
sensitive resin
resin preparation
positive photo
photo
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8888901323T
Other languages
English (en)
Other versions
DE3881976T2 (de
Inventor
Mamoru Nippon Paint Co Seio
Kanji Nishijima
Katsukiyo Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Publication of DE3881976D1 publication Critical patent/DE3881976D1/de
Application granted granted Critical
Publication of DE3881976T2 publication Critical patent/DE3881976T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
DE88901323T 1987-02-02 1988-02-02 Positive photoempfindliche harzzubereitung. Expired - Fee Related DE3881976T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP62023114A JP2593305B2 (ja) 1987-02-02 1987-02-02 ポジ型感光性樹脂組成物
CA000576099A CA1330404C (en) 1987-02-02 1988-08-30 Positive type photo-sensitive resinous composition

Publications (2)

Publication Number Publication Date
DE3881976D1 true DE3881976D1 (de) 1993-07-29
DE3881976T2 DE3881976T2 (de) 1993-09-30

Family

ID=25672092

Family Applications (1)

Application Number Title Priority Date Filing Date
DE88901323T Expired - Fee Related DE3881976T2 (de) 1987-02-02 1988-02-02 Positive photoempfindliche harzzubereitung.

Country Status (6)

Country Link
US (1) US4946757A (de)
EP (1) EP0301101B1 (de)
JP (1) JP2593305B2 (de)
CA (1) CA1330404C (de)
DE (1) DE3881976T2 (de)
WO (1) WO1988005927A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2585070B2 (ja) * 1988-08-02 1997-02-26 日本ペイント株式会社 画像形成方法
CA1334897C (en) * 1988-08-02 1995-03-28 Mamoru Seio Electrodeposition coating composition and image-forming method using the same
JP2584672B2 (ja) * 1989-04-28 1997-02-26 富士写真フイルム株式会社 感光性組成物
JPH0389353A (ja) * 1989-09-01 1991-04-15 Nippon Paint Co Ltd ポジ型感光性樹脂組成物
JP2826180B2 (ja) * 1990-07-31 1998-11-18 アスモ株式会社 車両用ワイパ
JPH04258957A (ja) * 1991-02-14 1992-09-14 Nippon Paint Co Ltd ポジ型感光性電着樹脂組成物
US5362597A (en) * 1991-05-30 1994-11-08 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition comprising an epoxy-containing alkali-soluble resin and a naphthoquinone diazide sulfonic acid ester
EP0653681B1 (de) * 1993-11-17 2000-09-13 AT&T Corp. Verfahren zur Herstellung einer Vorrichtung unter Benutzung einer lichtempfindlichen Zusammensetzung
JP2000347397A (ja) 1999-06-04 2000-12-15 Jsr Corp 感放射線性樹脂組成物およびその層間絶縁膜への使用
KR100538655B1 (ko) * 2001-07-19 2005-12-23 주식회사 동진쎄미켐 감광성 수지 조성물
JP2008202006A (ja) * 2007-02-22 2008-09-04 Fujifilm Corp 含フッ素化合物、樹脂組成物、感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
CN114270479B (zh) 2019-06-27 2022-10-11 朗姆研究公司 交替蚀刻与钝化工艺

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3551154A (en) * 1966-12-28 1970-12-29 Ferrania Spa Light sensitive article comprising a quinone diazide and polymeric binder
US3802885A (en) * 1967-08-15 1974-04-09 Algraphy Ltd Photosensitive lithographic naphthoquinone diazide printing plate with aluminum base
US3637384A (en) * 1969-02-17 1972-01-25 Gaf Corp Positive-working diazo-oxide terpolymer photoresists
US3890153A (en) * 1971-03-13 1975-06-17 Philips Corp Positive-acting napthoquinone diazide photosensitive composition
US3900325A (en) * 1972-06-12 1975-08-19 Shipley Co Light sensitive quinone diazide composition with n-3-oxohydrocarbon substituted acrylamide
JPS5114042B2 (de) * 1972-06-12 1976-05-06
JPS56122031A (en) * 1980-03-01 1981-09-25 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPS61206293A (ja) * 1985-03-08 1986-09-12 日本ペイント株式会社 回路板の製造方法
JPH0678461B2 (ja) * 1986-01-08 1994-10-05 日本ペイント株式会社 塗料用アクリル樹脂組成物

Also Published As

Publication number Publication date
EP0301101A4 (de) 1990-02-22
EP0301101B1 (de) 1993-06-23
JP2593305B2 (ja) 1997-03-26
CA1330404C (en) 1994-06-28
DE3881976T2 (de) 1993-09-30
WO1988005927A1 (en) 1988-08-11
US4946757A (en) 1990-08-07
EP0301101A1 (de) 1989-02-01
JPS63189857A (ja) 1988-08-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee