DE3751743D1 - Positiv arbeitende photoempfindliche Kunststoffzusammensetzung - Google Patents

Positiv arbeitende photoempfindliche Kunststoffzusammensetzung

Info

Publication number
DE3751743D1
DE3751743D1 DE3751743T DE3751743T DE3751743D1 DE 3751743 D1 DE3751743 D1 DE 3751743D1 DE 3751743 T DE3751743 T DE 3751743T DE 3751743 T DE3751743 T DE 3751743T DE 3751743 D1 DE3751743 D1 DE 3751743D1
Authority
DE
Germany
Prior art keywords
plastic composition
positive working
working photosensitive
photosensitive plastic
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3751743T
Other languages
English (en)
Other versions
DE3751743T2 (de
Inventor
Hiroshi Oka
Chozo Okuda
Yoshinori Yoshida
Toshihiko Takahashi
Yoichi Kamoshida
Takao Miura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26411695&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE3751743(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from JP61070552A external-priority patent/JPH0654386B2/ja
Priority claimed from JP61146459A external-priority patent/JPH0654389B2/ja
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Application granted granted Critical
Publication of DE3751743D1 publication Critical patent/DE3751743D1/de
Publication of DE3751743T2 publication Critical patent/DE3751743T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
DE3751743T 1986-03-28 1987-03-30 Positiv arbeitende photoempfindliche Kunststoffzusammensetzung Expired - Lifetime DE3751743T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP61070552A JPH0654386B2 (ja) 1986-03-28 1986-03-28 ポジ型感放射線性樹脂組成物
JP61146459A JPH0654389B2 (ja) 1986-06-23 1986-06-23 ポジ型感放射線性樹脂組成物

Publications (2)

Publication Number Publication Date
DE3751743D1 true DE3751743D1 (de) 1996-04-25
DE3751743T2 DE3751743T2 (de) 1996-11-14

Family

ID=26411695

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3751743T Expired - Lifetime DE3751743T2 (de) 1986-03-28 1987-03-30 Positiv arbeitende photoempfindliche Kunststoffzusammensetzung

Country Status (3)

Country Link
US (1) US5019479A (de)
EP (1) EP0239423B1 (de)
DE (1) DE3751743T2 (de)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2590342B2 (ja) * 1986-11-08 1997-03-12 住友化学工業株式会社 ポジ型フォトレジスト用ノボラック樹脂及びそれを含有するポジ型フォトレジスト組成物
US5266440A (en) * 1986-12-23 1993-11-30 Shipley Company Inc. Photoresist composition with aromatic novolak binder having a weight-average molecular weight in excess of 1500 Daltons
EP0718693B1 (de) † 1986-12-23 2003-07-02 Shipley Company Inc. Fotoresistzusammensetzungen und ihre Bestandteile
DE3810632A1 (de) * 1988-03-29 1989-10-12 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3810631A1 (de) * 1988-03-29 1989-10-12 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial mit hohem waermestand
US5456995A (en) * 1988-07-07 1995-10-10 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition
JP2692403B2 (ja) * 1988-07-07 1997-12-17 住友化学工業株式会社 ポジ型感放射線性レジスト組成物
US5861229A (en) * 1988-07-07 1999-01-19 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound
EP0358871B1 (de) * 1988-07-07 1998-09-30 Sumitomo Chemical Company, Limited Strahlungsempfindliche, positiv arbeitende Resistzusammensetzung
US5753406A (en) * 1988-10-18 1998-05-19 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition
JP2623778B2 (ja) * 1988-10-18 1997-06-25 日本合成ゴム株式会社 感放射線性樹脂組成物
CA2023791A1 (en) * 1989-08-24 1991-02-25 Ayako Ida Radiation-sensitive positive resist composition
US5288587A (en) * 1989-09-05 1994-02-22 Sumitomo Chemical Co., Ltd. Radiation-sensitive positive resist composition comprising an o-quinone diazide, an alkali-soluble resin and a polyphenol compound
US5322757A (en) * 1989-09-08 1994-06-21 Ocg Microelectronic Materials, Inc. Positive photoresists comprising a novolak resin made from 2,3-dimethyl phenol,2,3,5-trimethylphenol and aldehyde with no meta-cresol present
US5324620A (en) * 1989-09-08 1994-06-28 Ocg Microeletronic Materials, Inc. Radiation-sensitive compositions containing novolak polymers made from four phenolic derivatives and an aldehyde
AU6339390A (en) * 1989-09-08 1991-04-08 Olin Hunt Specialty Products Inc. Radiation-sensitive compositions containing fully substituted novolak polymers
CA2029464A1 (en) * 1989-12-20 1991-06-21 Sangya Jain Positive photoresist composition
JP3063148B2 (ja) * 1989-12-27 2000-07-12 住友化学工業株式会社 ポジ型レジスト組成物
US5208138A (en) * 1990-02-05 1993-05-04 Morton International, Inc. High contrast high thermal stability positive photoresists having novolak resins of lowered hydroxyl content
TW202504B (de) * 1990-02-23 1993-03-21 Sumitomo Chemical Co
US5225318A (en) * 1990-07-02 1993-07-06 Ocg Microelectronic Materials, Inc. Selected photoactive methylolated cyclohexanol compounds and their use in forming positive resist image patterns
US5151340A (en) * 1990-07-02 1992-09-29 Ocg Microelectronic Materials, Inc. Selected photoactive methylolated cyclohexanol compounds and their use in radiation-sensitive mixtures
JP2711590B2 (ja) † 1990-09-13 1998-02-10 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5413896A (en) * 1991-01-24 1995-05-09 Japan Synthetic Rubber Co., Ltd. I-ray sensitive positive resist composition
JPH05204144A (ja) * 1991-08-21 1993-08-13 Sumitomo Chem Co Ltd ポジ型レジスト組成物
JPH05239166A (ja) * 1991-08-22 1993-09-17 Hoechst Celanese Corp 高いガラス転位点と高い光感度を有するフォトレジスト用ノボラック樹脂組成物
US5372909A (en) * 1991-09-24 1994-12-13 Mitsubishi Kasei Corporation Photosensitive resin composition comprising an alkali-soluble resin made from a phenolic compound and at least 2 different aldehydes
US5346799A (en) * 1991-12-23 1994-09-13 Ocg Microelectronic Materials, Inc. Novolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehyde
JP3095847B2 (ja) * 1991-12-27 2000-10-10 コニカ株式会社 カラー写真用処理液及び該処理液を用いたハロゲン化銀カラー写真感光材料の処理方法
JPH05249666A (ja) * 1992-03-05 1993-09-28 Sumitomo Chem Co Ltd ポジ型レジスト組成物
US5206348A (en) * 1992-07-23 1993-04-27 Morton International, Inc. Hexahydroxybenzophenone sulfonate esters of diazonaphthoquinone sensitizers and positive photoresists employing same
US5308744A (en) * 1993-03-05 1994-05-03 Morton International, Inc. Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives
JP3192548B2 (ja) * 1994-04-22 2001-07-30 東京応化工業株式会社 ポジ型ホトレジスト組成物
US5652081A (en) * 1995-09-20 1997-07-29 Fuji Photo Film Co., Ltd. Positive working photoresist composition
JPH0990622A (ja) * 1995-09-22 1997-04-04 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
US6023318A (en) * 1996-04-15 2000-02-08 Canon Kabushiki Kaisha Electrode plate, process for producing the plate, liquid crystal device including the plate and process for producing the device
JP3666839B2 (ja) * 1998-01-23 2005-06-29 東京応化工業株式会社 ポジ型ホトレジスト組成物およびその製造方法
US6200891B1 (en) * 1998-08-13 2001-03-13 International Business Machines Corporation Removal of dielectric oxides
DE69930019T2 (de) * 1998-08-24 2006-10-12 Fuji Photo Film Co., Ltd., Minami-Ashigara Lichtempfindliche Harzzusammensetzung und Flachdruckplatte
JP4068260B2 (ja) * 1999-04-02 2008-03-26 Ａｚエレクトロニックマテリアルズ株式会社 感放射線性樹脂組成物
US8822123B2 (en) 2012-07-13 2014-09-02 Momentive Specialty Chemicals Inc. Polymeric materials and methods for making the polymeric materials
KR102564083B1 (ko) * 2016-12-05 2023-08-08 알케마 인코포레이티드 개시제 블렌드 및 그러한 개시제 블렌드를 함유하는 3차원 인쇄에 유용한 광경화성 조성물
CN111176073B (zh) * 2020-01-06 2023-11-07 苏州瑞红电子化学品有限公司 一种含高耐热性羧基酚醛树脂的厚膜光刻胶组合物

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3666473A (en) * 1970-10-06 1972-05-30 Ibm Positive photoresists for projection exposure
US4173470A (en) * 1977-11-09 1979-11-06 Bell Telephone Laboratories, Incorporated Novolak photoresist composition and preparation thereof
DE3174017D1 (en) * 1980-12-17 1986-04-10 Konishiroku Photo Ind Photosensitive compositions
DE3274354D1 (en) * 1981-06-22 1987-01-08 Hunt Chem Corp Philip A Novolak resin and a positive photoresist composition containing the same
US4492740A (en) * 1982-06-18 1985-01-08 Konishiroku Photo Industry Co., Ltd. Support for lithographic printing plate
CA1255952A (en) * 1983-03-04 1989-06-20 Akihiro Furuta Positive type photoresist composition
JPH0658529B2 (ja) * 1983-08-17 1994-08-03 三菱化成株式会社 ポジ型クレゾ−ルノボラツクフオトレジスト組成物
JPS6045238A (ja) * 1983-08-23 1985-03-11 Fujitsu Ltd ポジ型レジスト材料とその製造方法
EP0136110A3 (de) * 1983-08-30 1986-05-28 Mitsubishi Kasei Corporation Positive lichtempfindliche Zusammensetzung und Verwendung für Photolacke
DE3344202A1 (de) * 1983-12-07 1985-06-20 Merck Patent Gmbh, 6100 Darmstadt Positiv-fotoresistzusammensetzungen
JPS61185741A (ja) * 1985-02-13 1986-08-19 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物

Also Published As

Publication number Publication date
US5019479A (en) 1991-05-28
DE3751743T2 (de) 1996-11-14
EP0239423B1 (de) 1996-03-20
EP0239423A2 (de) 1987-09-30
EP0239423A3 (en) 1989-10-18

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8365 Fully valid after opposition proceedings
8327 Change in the person/name/address of the patent owner

Owner name: JSR CORP., TOKIO/TOKYO, JP