DE60227135D1 - Bilderzeugungsapparat - Google Patents

Bilderzeugungsapparat

Info

Publication number
DE60227135D1
DE60227135D1 DE60227135T DE60227135T DE60227135D1 DE 60227135 D1 DE60227135 D1 DE 60227135D1 DE 60227135 T DE60227135 T DE 60227135T DE 60227135 T DE60227135 T DE 60227135T DE 60227135 D1 DE60227135 D1 DE 60227135D1
Authority
DE
Germany
Prior art keywords
image forming
forming apparatus
image
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60227135T
Other languages
English (en)
Inventor
Arno Jan Bleeker
Jager Pieter Willem Herman De
Jason Douglas Hintersteiner
Borgert Kruizinga
Matthew Eugene Mccarthy
Mark Oskotsky
Lev Ryzhikov
Lev Sakin
Stanislav Smirnov
Bart Snijders
Der Mast Karel Diederick Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE60227135D1 publication Critical patent/DE60227135D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60227135T 2001-07-24 2002-07-24 Bilderzeugungsapparat Expired - Lifetime DE60227135D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP01202825 2001-07-24

Publications (1)

Publication Number Publication Date
DE60227135D1 true DE60227135D1 (de) 2008-07-31

Family

ID=8180693

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60227135T Expired - Lifetime DE60227135D1 (de) 2001-07-24 2002-07-24 Bilderzeugungsapparat

Country Status (5)

Country Link
US (2) US6778257B2 (de)
JP (1) JP4316209B2 (de)
KR (1) KR100589231B1 (de)
DE (1) DE60227135D1 (de)
TW (2) TW529172B (de)

Families Citing this family (373)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
JP2003149740A (ja) * 2001-11-16 2003-05-21 National Institute Of Advanced Industrial & Technology 光投影装置
US7145708B2 (en) * 2002-04-09 2006-12-05 Dicon A/S Light modulating engine
US7048384B2 (en) * 2003-01-24 2006-05-23 Honeywell International Inc. Multiple scene projection system
SE0300516D0 (sv) * 2003-02-28 2003-02-28 Micronic Laser Systems Ab SLM direct writer
SG2014015176A (en) 2003-04-10 2015-06-29 Nippon Kogaku Kk Environmental system including vacuum scavange for an immersion lithography apparatus
KR101745223B1 (ko) 2003-04-10 2017-06-08 가부시키가이샤 니콘 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
CN101825847B (zh) 2003-04-11 2013-10-16 株式会社尼康 用于沉浸式光刻光学系统的清洗方法
SG2012031738A (en) 2003-04-11 2015-07-30 Nippon Kogaku Kk Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
TWI612556B (zh) 2003-05-23 2018-01-21 Nikon Corp 曝光裝置、曝光方法及元件製造方法
US7061591B2 (en) * 2003-05-30 2006-06-13 Asml Holding N.V. Maskless lithography systems and methods utilizing spatial light modulator arrays
EP1482373A1 (de) * 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
KR101931923B1 (ko) 2003-06-19 2018-12-21 가부시키가이샤 니콘 노광 장치 및 디바이스 제조방법
US7110082B2 (en) * 2003-06-24 2006-09-19 Asml Holding N.V. Optical system for maskless lithography
KR101935709B1 (ko) * 2003-07-28 2019-01-04 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법, 그리고 노광 장치의 제어 방법
US6876440B1 (en) * 2003-09-30 2005-04-05 Asml Holding N.V. Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
US7023526B2 (en) * 2003-09-30 2006-04-04 Asml Holding N.V. Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation
US7410736B2 (en) * 2003-09-30 2008-08-12 Asml Holding N.V. Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
US20070103658A1 (en) * 2003-12-22 2007-05-10 Koninklijke Philips Electronic, N.V. Lithographic projection device, method an substrate for manufacturing electronic devices, and obtained electronic device
US7361457B2 (en) * 2004-01-13 2008-04-22 International Business Machines Corporation Real-time configurable masking
WO2005071491A2 (en) * 2004-01-20 2005-08-04 Carl Zeiss Smt Ag Exposure apparatus and measuring device for a projection lens
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
KR101945638B1 (ko) * 2004-02-04 2019-02-07 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
US20070030467A1 (en) * 2004-02-19 2007-02-08 Nikon Corporation Exposure apparatus, exposure method, and device fabricating method
WO2005081291A1 (ja) * 2004-02-19 2005-09-01 Nikon Corporation 露光装置及びデバイスの製造方法
US6977718B1 (en) * 2004-03-02 2005-12-20 Advanced Micro Devices, Inc. Lithography method and system with adjustable reflector
US7094506B2 (en) * 2004-03-09 2006-08-22 Asml Netherlands B.V Lithographic apparatus and device manufacturing method
DE102004013886A1 (de) 2004-03-16 2005-10-06 Carl Zeiss Smt Ag Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem
KR20180042456A (ko) 2004-03-25 2018-04-25 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US7034917B2 (en) * 2004-04-01 2006-04-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
JP4677986B2 (ja) 2004-04-19 2011-04-27 株式会社ニコン ノズル部材、露光方法、露光装置及びデバイス製造方法
US20050254035A1 (en) * 2004-05-11 2005-11-17 Chromaplex, Inc. Multi-photon lithography
US7486381B2 (en) * 2004-05-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN1954408B (zh) * 2004-06-04 2012-07-04 尼康股份有限公司 曝光装置、曝光方法及元件制造方法
US20080192226A1 (en) 2004-06-07 2008-08-14 Nikon Corporation Stage Unit, Exposure Apparatus, and Exposure Method
KR101421870B1 (ko) 2004-06-09 2014-07-22 가부시키가이샤 니콘 기판 유지 장치 및 그것을 구비하는 노광 장치, 노광 방법, 디바이스 제조 방법, 그리고 발액 플레이트
KR101162128B1 (ko) 2004-06-09 2012-07-03 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
CN102736446B (zh) 2004-06-10 2014-09-17 尼康股份有限公司 曝光装置及元件制造方法
US20080068567A1 (en) 2004-06-10 2008-03-20 Hiroyuki Nagasaka Exposure Apparatus, Exposure Method, and Method for Producing Device
US8717533B2 (en) * 2004-06-10 2014-05-06 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8508713B2 (en) * 2004-06-10 2013-08-13 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8373843B2 (en) * 2004-06-10 2013-02-12 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
KR101245070B1 (ko) 2004-06-21 2013-03-18 가부시키가이샤 니콘 노광 장치 및 그 부재의 세정 방법, 노광 장치의 메인터넌스 방법, 메인터넌스 기기, 그리고 디바이스 제조 방법
US8698998B2 (en) * 2004-06-21 2014-04-15 Nikon Corporation Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
KR20070027704A (ko) * 2004-06-25 2007-03-09 가부시키가이샤 니콘 위치 결정 장치, 위치 결정 방법, 노광 장치, 노광 방법 및디바이스의 제조 방법
US7116403B2 (en) * 2004-06-28 2006-10-03 Asml Netherlands B.V Lithographic apparatus and device manufacturing method
WO2006006565A1 (ja) 2004-07-12 2006-01-19 Nikon Corporation 露光装置及びデバイス製造方法
WO2006006730A1 (ja) * 2004-07-15 2006-01-19 Nikon Corporation 平面モータ装置、ステージ装置、露光装置及びデバイスの製造方法
US7914972B2 (en) * 2004-07-21 2011-03-29 Nikon Corporation Exposure method and device manufacturing method
KR20070039926A (ko) * 2004-07-23 2007-04-13 가부시키가이샤 니콘 지지 장치, 스테이지 장치, 노광 장치, 및 디바이스의 제조방법
US7227613B2 (en) * 2004-07-26 2007-06-05 Asml Holding N.V. Lithographic apparatus having double telecentric illumination
US8169591B2 (en) 2004-08-03 2012-05-01 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
JPWO2006030910A1 (ja) * 2004-09-17 2008-05-15 株式会社ニコン 露光用基板、露光方法及びデバイス製造方法
EP1796146B1 (de) * 2004-09-17 2013-01-16 Nikon Corporation Belichtungsvorrichtung, belichtungsverfahren und verfahren zur bauelementeherstellung
SG156635A1 (en) * 2004-10-15 2009-11-26 Nikon Corp Exposure apparatus and device manufacturing method
JP4625673B2 (ja) 2004-10-15 2011-02-02 株式会社東芝 露光方法及び露光装置
KR20070085214A (ko) 2004-11-11 2007-08-27 가부시키가이샤 니콘 노광 방법, 디바이스 제조 방법, 및 기판
TWI553703B (zh) 2004-11-18 2016-10-11 尼康股份有限公司 A position measuring method, a position control method, a measuring method, a loading method, an exposure method and an exposure apparatus, and a device manufacturing method
WO2006054719A1 (ja) * 2004-11-19 2006-05-26 Nikon Corporation メンテナンス方法、露光方法、露光装置及びデバイス製造方法
JP4555903B2 (ja) * 2004-12-02 2010-10-06 株式会社ニコン 露光装置及びデバイス製造方法
US7277158B2 (en) * 2004-12-02 2007-10-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4752473B2 (ja) 2004-12-09 2011-08-17 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
EP1837896B1 (de) 2004-12-15 2015-09-09 Nikon Corporation Substrat haltevorrichtung, belichtungsvorrichtung und bauelemente-herstellungsverfahren
US7567368B2 (en) * 2005-01-06 2009-07-28 Asml Holding N.V. Systems and methods for minimizing scattered light in multi-SLM maskless lithography
US7557529B2 (en) * 2005-01-11 2009-07-07 Nikon Corporation Stage unit and exposure apparatus
US7450217B2 (en) * 2005-01-12 2008-11-11 Asml Netherlands B.V. Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
US20080165330A1 (en) * 2005-01-18 2008-07-10 Nikon Corporation Liquid Removing Apparatus, Exposure Apparatus and Device Fabricating Method
US8692973B2 (en) * 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
JPWO2006080513A1 (ja) * 2005-01-31 2008-06-19 株式会社ニコン レーザ光源の制御方法、レーザ光源装置、及び露光装置
KR20160135859A (ko) 2005-01-31 2016-11-28 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US20070258068A1 (en) * 2005-02-17 2007-11-08 Hiroto Horikawa Exposure Apparatus, Exposure Method, and Device Fabricating Method
JP4844186B2 (ja) 2005-03-18 2011-12-28 株式会社ニコン プレート部材、基板保持装置、露光装置及び露光方法、並びにデバイス製造方法
US8638422B2 (en) * 2005-03-18 2014-01-28 Nikon Corporation Exposure method, exposure apparatus, method for producing device, and method for evaluating exposure apparatus
KR101197071B1 (ko) * 2005-03-30 2012-11-06 가부시키가이샤 니콘 노광 조건의 결정 방법, 노광 방법 및 노광 장치, 그리고디바이스 제조 방법
KR20070115860A (ko) * 2005-03-30 2007-12-06 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
US20090047607A1 (en) * 2005-03-31 2009-02-19 Hiroyuki Nagasaka Exposure method, exposure apparatus and device fabricating methods
TW200644079A (en) * 2005-03-31 2006-12-16 Nikon Corp Exposure apparatus, exposure method, and device production method
US20070132976A1 (en) * 2005-03-31 2007-06-14 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8089608B2 (en) 2005-04-18 2012-01-03 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
EP1876635A4 (de) 2005-04-25 2010-06-30 Nikon Corp Belichtungsverfahren, belichtungsvorrichtung sowie herstellungsverfahren für die vorrichtung
EP1879219A4 (de) * 2005-04-27 2012-08-08 Nikon Corp Belichtungsverfahren, belichtungsvorrichtung, verfahren zur bauelementeherstellung und filmevaluierungsverfahren
US20090135382A1 (en) * 2005-04-28 2009-05-28 Nikon Corporation Exposure method, exposure apparatus, and method for producing device
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WO2006126522A1 (ja) * 2005-05-24 2006-11-30 Nikon Corporation 露光方法及び露光装置、並びにデバイス製造方法
US7838858B2 (en) * 2005-05-31 2010-11-23 Nikon Corporation Evaluation system and method of a search operation that detects a detection subject on an object
US20070085989A1 (en) * 2005-06-21 2007-04-19 Nikon Corporation Exposure apparatus and exposure method, maintenance method, and device manufacturing method
KR20080018158A (ko) 2005-06-21 2008-02-27 가부시키가이샤 니콘 노광 장치 및 노광 방법, 메인터넌스 방법과 디바이스 제조방법
US7924416B2 (en) * 2005-06-22 2011-04-12 Nikon Corporation Measurement apparatus, exposure apparatus, and device manufacturing method
JPWO2007000995A1 (ja) * 2005-06-28 2009-01-22 株式会社ニコン 露光装置及び方法、並びにデバイス製造方法
US8693006B2 (en) * 2005-06-28 2014-04-08 Nikon Corporation Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
KR20080015778A (ko) * 2005-06-29 2008-02-20 가부시키가이샤 니콘 노광 장치, 기판 처리 방법, 및 디바이스 제조 방법
JP2007012375A (ja) * 2005-06-29 2007-01-18 Toyota Motor Corp 燃料電池、燃料電池用電極触媒層の製造方法、及び燃料電池の運転方法
JP5194792B2 (ja) * 2005-06-30 2013-05-08 株式会社ニコン 露光装置及び方法、露光装置のメンテナンス方法、並びにデバイス製造方法
WO2007004567A1 (ja) 2005-07-01 2007-01-11 Nikon Corporation 露光装置、露光方法及びデバイス製造方法、並びにシステム
KR20080031376A (ko) * 2005-07-11 2008-04-08 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR100729263B1 (ko) * 2005-07-14 2007-06-15 삼성전자주식회사 기판 노광 장치
EP1918983A4 (de) * 2005-08-05 2010-03-31 Nikon Corp Bühnenvorrichtung und belichtungsvorrichtung
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WO2007029829A1 (ja) * 2005-09-09 2007-03-15 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
US8111374B2 (en) * 2005-09-09 2012-02-07 Nikon Corporation Analysis method, exposure method, and device manufacturing method
US8373923B2 (en) * 2005-09-16 2013-02-12 Koninklijke Philips Electronics N.V. Illuminator having a spatial light modulator
EP1936665A4 (de) 2005-09-21 2010-03-31 Nikon Corp Belichtungseinrichtung, belichtungsverfahren und bauelement-herstellungsverfahren
US20070070323A1 (en) * 2005-09-21 2007-03-29 Nikon Corporation Exposure apparatus, exposure method, and device fabricating method
EP1950794A4 (de) * 2005-10-07 2010-03-31 Nikon Corp Verfahren zur messung einer optischen kenngrösse, belichtungsverfahren, bauelemente-herstellungsverfahren, untersuchungsvorrichtung und messverfahren
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US8681314B2 (en) * 2005-10-24 2014-03-25 Nikon Corporation Stage device and coordinate correction method for the same, exposure apparatus, and device manufacturing method
US20070095739A1 (en) * 2005-10-24 2007-05-03 Nikon Corporation Utility transfer apparatus, stage apparatus, exposure apparatus, and device manufacturing method
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US20070127135A1 (en) * 2005-11-01 2007-06-07 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
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US20070127002A1 (en) * 2005-11-09 2007-06-07 Nikon Corporation Exposure apparatus and method, and device manufacturing method
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US7803516B2 (en) * 2005-11-21 2010-09-28 Nikon Corporation Exposure method, device manufacturing method using the same, exposure apparatus, and substrate processing method and apparatus
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US8125610B2 (en) * 2005-12-02 2012-02-28 ASML Metherlands B.V. Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
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WO2008146819A1 (ja) * 2007-05-28 2008-12-04 Nikon Corporation 露光装置、デバイス製造方法、洗浄装置、及びクリーニング方法並びに露光方法
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US8218129B2 (en) * 2007-08-24 2012-07-10 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
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WO2009026947A1 (en) 2007-08-30 2009-03-05 Carl Zeiss Smt Ag Illumination system for illuminating a mask in a microlithographic projection exposure apparatus
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JP4880561B2 (ja) * 2007-10-03 2012-02-22 新光電気工業株式会社 フリップチップ実装装置
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WO2009075103A1 (ja) * 2007-12-11 2009-06-18 Nikon Corporation 移動体装置、露光装置及びパターン形成装置、並びにデバイス製造方法
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US20090174873A1 (en) * 2007-12-17 2009-07-09 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
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TWI643027B (zh) 2009-11-09 2018-12-01 尼康股份有限公司 曝光裝置、曝光方法、曝光裝置之維修方法、曝光裝置之調整方法、以及元件製造方法
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US8488106B2 (en) 2009-12-28 2013-07-16 Nikon Corporation Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method
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KR102082846B1 (ko) 2011-01-28 2020-02-28 고쿠리츠다이가쿠호우진 도쿄다이가쿠 구동 시스템과 구동 방법, 노광 장치와 노광 방법, 및 구동 시스템 설계 방법
JPWO2012115002A1 (ja) 2011-02-22 2014-07-07 株式会社ニコン 保持装置、露光装置、及びデバイスの製造方法
DE102011001785B4 (de) * 2011-04-04 2015-03-05 Jenoptik Optical Systems Gmbh Belichtungseinrichtung zur strukturierten Belichtung einer Fläche
US20130016329A1 (en) 2011-07-12 2013-01-17 Nikon Corporation Exposure apparatus, exposure method, measurement method, and device manufacturing method
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WO2013161428A1 (ja) 2012-04-26 2013-10-31 株式会社ニコン 計測方法及びエンコーダ装置、並びに露光方法及び装置
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JP6075657B2 (ja) 2012-10-02 2017-02-08 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
CN108983554A (zh) 2012-10-02 2018-12-11 株式会社尼康 曝光装置以及器件制造方法
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9772564B2 (en) 2012-11-12 2017-09-26 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method
EP2947679A4 (de) 2012-11-20 2017-02-08 Nikon Corporation Belichtungsvorrichtung, mobile vorrichtung und vorrichtungsherstellungsverfahren
JP6119242B2 (ja) 2012-12-27 2017-04-26 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9352073B2 (en) 2013-01-22 2016-05-31 Niko Corporation Functional film
US9057955B2 (en) 2013-01-22 2015-06-16 Nikon Corporation Functional film, liquid immersion member, method of manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
JP5979302B2 (ja) 2013-02-28 2016-08-24 株式会社ニコン 摺動膜、摺動膜が形成された部材、及びその製造方法
CN105493237B (zh) 2013-06-28 2021-07-09 株式会社尼康 移动体装置和曝光装置以及器件制造方法
JPWO2015034005A1 (ja) 2013-09-04 2017-03-02 Ckd株式会社 電磁アクチュエータ用電機子コイル、電磁アクチュエータ、露光装置、及びデバイス製造方法
JP6571092B2 (ja) * 2013-09-25 2019-09-04 エーエスエムエル ネザーランズ ビー．ブイ． ビームデリバリ装置及び方法
CN105229774B (zh) 2013-10-08 2019-01-11 株式会社尼康 液浸部件、曝光装置及曝光方法、以及器件制造方法
CN107407894B (zh) 2014-12-24 2020-01-24 株式会社尼康 测量装置及测量方法、曝光装置及曝光方法、以及器件制造方法
CN107615473B (zh) 2014-12-24 2021-04-20 株式会社尼康 移动体的控制方法、曝光方法、器件制造方法、移动体装置及曝光装置
CN107430356B (zh) 2015-03-25 2021-02-26 株式会社尼康 布局方法、标记检测方法、曝光方法、测量装置、曝光装置、以及组件制造方法
DE102015224522B4 (de) * 2015-12-08 2018-06-21 Carl Zeiss Smt Gmbh Beleuchtungssystem einer mikrolithographischen Projektionsanlage und Verfahren zum Betreiben eines solchen Systems
JP6193963B2 (ja) * 2015-12-18 2017-09-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置においてマスクを照明するための照明システム
US9909862B2 (en) 2016-06-13 2018-03-06 Google Llc Curved array of light-emitting elements for sweeping out an angular range
US10212785B2 (en) 2016-06-13 2019-02-19 Google Llc Staggered array of individually addressable light-emitting elements for sweeping out an angular range
US10069996B2 (en) * 2016-09-15 2018-09-04 Xerox Corporation System and method for utilizing digital micromirror devices to split and recombine a signal image to enable heat dissipation
CN109791368B (zh) 2016-09-27 2021-11-26 株式会社尼康 决定方法及装置、程序、信息记录媒体、曝光装置、布局信息提供方法、布局方法、标记检测方法、曝光方法、以及器件制造方法
JP6827785B2 (ja) 2016-11-30 2021-02-10 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
TWI759628B (zh) * 2018-09-18 2022-04-01 荷蘭商Ａｓｍｌ荷蘭公司 用於偵測快速充電裝置中時間相依缺陷的設備及方法
WO2022162896A1 (ja) 2021-01-29 2022-08-04 株式会社ニコン 露光装置

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS597359A (ja) 1982-07-02 1984-01-14 Canon Inc 照明装置
US5523193A (en) * 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
DE3831743A1 (de) * 1988-09-17 1990-03-29 Philips Patentverwaltung Vorrichtung zur bearbeitung eines werkstueckes mit laserlicht und verwendung dieser vorrichtung
JP2732498B2 (ja) 1988-11-24 1998-03-30 株式会社日立製作所 縮小投影式露光方法及びその装置
US5153773A (en) 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
ATE123885T1 (de) * 1990-05-02 1995-06-15 Fraunhofer Ges Forschung Belichtungsvorrichtung.
KR0165548B1 (ko) * 1991-07-20 1999-01-15 도바 다다스 아미노산, 핵산 또는 이들의 유도체의 정제 방법
US5229872A (en) * 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
US5475416A (en) 1992-06-03 1995-12-12 Eastman Kodak Company Printing system for printing an image with lasers emitting diverging laser beams
KR0165701B1 (ko) 1993-06-29 1999-02-01 미타라이 하지메 조명장치 및 동장치를 사용하는 노광장치
US5674414A (en) 1994-11-11 1997-10-07 Carl-Zeiss Stiftung Method and apparatus of irradiating a surface of a workpiece with a plurality of beams
WO1997033205A1 (en) * 1996-03-06 1997-09-12 Philips Electronics N.V. Differential interferometer system and lithographic step-and-scan apparatus provided with such a system
DE19707834A1 (de) * 1996-04-09 1997-10-16 Zeiss Carl Fa Materialbestrahlungsgerät und Verfahren zum Betrieb von Materialbestrahlungsgeräten
US5691541A (en) 1996-05-14 1997-11-25 The Regents Of The University Of California Maskless, reticle-free, lithography
JP3689490B2 (ja) * 1996-06-07 2005-08-31 キヤノン株式会社 ノズル部材の製造方法及びそれを用いた加工装置
WO1998028665A1 (en) * 1996-12-24 1998-07-02 Koninklijke Philips Electronics N.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
EP0956516B1 (de) 1997-01-29 2002-04-10 Micronic Laser Systems Ab Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
US6262796B1 (en) 1997-03-10 2001-07-17 Asm Lithography B.V. Positioning device having two object holders
US6233039B1 (en) 1997-06-05 2001-05-15 Texas Instruments Incorporated Optical illumination system and associated exposure apparatus
JP4238390B2 (ja) 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
EP1111473A3 (de) * 1999-12-23 2004-04-21 ASML Netherlands B.V. Lithographischer Apparat mit Vakuumkammer und interferometrischem Ausrichtungssystem
US6509955B2 (en) * 2000-05-25 2003-01-21 Ball Semiconductor, Inc. Lens system for maskless photolithography
GB0030444D0 (en) 2000-12-14 2001-01-24 Secr Defence Printing by active tiling
KR100992262B1 (ko) 2001-06-13 2010-11-05 오르보테크 엘티디. 기판 미세가공 시스템
JP4728536B2 (ja) * 2001-07-05 2011-07-20 株式会社オーク製作所 多重露光描画方法及び多重露光描画装置
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
US6567217B1 (en) * 2001-11-06 2003-05-20 Eastman Kodak Company Image-forming system with enhanced gray levels

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