DE60227135D1 - Bilderzeugungsapparat - Google Patents

Bilderzeugungsapparat

Info

Publication number
DE60227135D1
DE60227135D1 DE60227135T DE60227135T DE60227135D1 DE 60227135 D1 DE60227135 D1 DE 60227135D1 DE 60227135 T DE60227135 T DE 60227135T DE 60227135 T DE60227135 T DE 60227135T DE 60227135 D1 DE60227135 D1 DE 60227135D1
Authority
DE
Germany
Prior art keywords
image forming
forming apparatus
image
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60227135T
Other languages
English (en)
Inventor
Arno Jan Bleeker
Jager Pieter Willem Herman De
Jason Douglas Hintersteiner
Borgert Kruizinga
Matthew Eugene Mccarthy
Mark Oskotsky
Lev Ryzhikov
Lev Sakin
Stanislav Smirnov
Bart Snijders
Der Mast Karel Diederick Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE60227135D1 publication Critical patent/DE60227135D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60227135T 2001-07-24 2002-07-24 Bilderzeugungsapparat Expired - Lifetime DE60227135D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP01202825 2001-07-24

Publications (1)

Publication Number Publication Date
DE60227135D1 true DE60227135D1 (de) 2008-07-31

Family

ID=8180693

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60227135T Expired - Lifetime DE60227135D1 (de) 2001-07-24 2002-07-24 Bilderzeugungsapparat

Country Status (5)

Country Link
US (2) US6778257B2 (de)
JP (1) JP4316209B2 (de)
KR (1) KR100589231B1 (de)
DE (1) DE60227135D1 (de)
TW (2) TW529172B (de)

Families Citing this family (373)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
JP2003149740A (ja) * 2001-11-16 2003-05-21 National Institute Of Advanced Industrial & Technology 光投影装置
JP2005522733A (ja) * 2002-04-09 2005-07-28 ディーコン エーエス 光変調エンジン
US7048384B2 (en) * 2003-01-24 2006-05-23 Honeywell International Inc. Multiple scene projection system
SE0300516D0 (sv) * 2003-02-28 2003-02-28 Micronic Laser Systems Ab SLM direct writer
EP2667253B1 (de) 2003-04-10 2015-06-10 Nikon Corporation System zur Umgebungskontrolle mittels Vakuum-Rückförderung für eine Immersionslithografievorrichtung
KR101745223B1 (ko) 2003-04-10 2017-06-08 가부시키가이샤 니콘 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
SG189557A1 (en) 2003-04-11 2013-05-31 Nikon Corp Cleanup method for optics in immersion lithography
SG10201603067VA (en) 2003-04-11 2016-05-30 Nikon Corp Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
TWI503865B (zh) 2003-05-23 2015-10-11 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
US7061591B2 (en) * 2003-05-30 2006-06-13 Asml Holding N.V. Maskless lithography systems and methods utilizing spatial light modulator arrays
EP1482373A1 (de) 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
TWI433212B (zh) 2003-06-19 2014-04-01 尼康股份有限公司 An exposure apparatus, an exposure method, and an element manufacturing method
US7110082B2 (en) * 2003-06-24 2006-09-19 Asml Holding N.V. Optical system for maskless lithography
KR101641011B1 (ko) 2003-07-28 2016-07-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법, 그리고 노광 장치의 제어 방법
US6876440B1 (en) * 2003-09-30 2005-04-05 Asml Holding N.V. Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
US7023526B2 (en) * 2003-09-30 2006-04-04 Asml Holding N.V. Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation
US7410736B2 (en) * 2003-09-30 2008-08-12 Asml Holding N.V. Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
KR20060128893A (ko) * 2003-12-22 2006-12-14 코닌클리즈케 필립스 일렉트로닉스 엔.브이. 리소그래픽 프로젝션 장치와, 촬상 가능 기판 및 전자 장치제조 방법
US7361457B2 (en) * 2004-01-13 2008-04-22 International Business Machines Corporation Real-time configurable masking
WO2005071491A2 (en) * 2004-01-20 2005-08-04 Carl Zeiss Smt Ag Exposure apparatus and measuring device for a projection lens
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
KR101309428B1 (ko) * 2004-02-04 2013-09-23 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
US20070030467A1 (en) * 2004-02-19 2007-02-08 Nikon Corporation Exposure apparatus, exposure method, and device fabricating method
JP4572896B2 (ja) * 2004-02-19 2010-11-04 株式会社ニコン 露光装置及びデバイスの製造方法
US6977718B1 (en) * 2004-03-02 2005-12-20 Advanced Micro Devices, Inc. Lithography method and system with adjustable reflector
US7094506B2 (en) * 2004-03-09 2006-08-22 Asml Netherlands B.V Lithographic apparatus and device manufacturing method
DE102004013886A1 (de) 2004-03-16 2005-10-06 Carl Zeiss Smt Ag Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem
TWI402893B (zh) 2004-03-25 2013-07-21 尼康股份有限公司 曝光方法
US7034917B2 (en) * 2004-04-01 2006-04-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
KR101162938B1 (ko) * 2004-04-19 2012-07-05 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US20050254035A1 (en) * 2004-05-11 2005-11-17 Chromaplex, Inc. Multi-photon lithography
US7486381B2 (en) * 2004-05-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1768169B9 (de) * 2004-06-04 2013-03-06 Nikon Corporation Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung eines bauelementes
US20080192226A1 (en) 2004-06-07 2008-08-14 Nikon Corporation Stage Unit, Exposure Apparatus, and Exposure Method
KR101433496B1 (ko) 2004-06-09 2014-08-22 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US8705008B2 (en) 2004-06-09 2014-04-22 Nikon Corporation Substrate holding unit, exposure apparatus having same, exposure method, method for producing device, and liquid repellant plate
US8508713B2 (en) * 2004-06-10 2013-08-13 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
KR20180072867A (ko) 2004-06-10 2018-06-29 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
US8717533B2 (en) * 2004-06-10 2014-05-06 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
KR101639928B1 (ko) 2004-06-10 2016-07-14 가부시키가이샤 니콘 노광 장치, 노광 방법, 및 디바이스 제조 방법
US8373843B2 (en) * 2004-06-10 2013-02-12 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
WO2005124833A1 (ja) 2004-06-21 2005-12-29 Nikon Corporation 露光装置及びその部材の洗浄方法、露光装置のメンテナンス方法、メンテナンス機器、並びにデバイス製造方法
US8698998B2 (en) * 2004-06-21 2014-04-15 Nikon Corporation Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
EP1780771A1 (de) * 2004-06-25 2007-05-02 Nikon Corporation Ausrichtungsvorrichtung, ausrichtungsverafhren, belichtungsvorrichtung, belichtungsverfahren und bauelementeherstellungsverfahren
US7116403B2 (en) * 2004-06-28 2006-10-03 Asml Netherlands B.V Lithographic apparatus and device manufacturing method
KR101433491B1 (ko) 2004-07-12 2014-08-22 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
EP1788694A4 (de) * 2004-07-15 2014-07-02 Nikon Corp Planarmotorgerät, bühnengerät, belichtungsgerät und bauelementeherstellungsverfahren
US7914972B2 (en) * 2004-07-21 2011-03-29 Nikon Corporation Exposure method and device manufacturing method
US20080013060A1 (en) * 2004-07-23 2008-01-17 Nikon Corporation Support Apparatus, Stage Apparatus, Exposure Apparatus, And Device Manufacturing Method
US7227613B2 (en) * 2004-07-26 2007-06-05 Asml Holding N.V. Lithographic apparatus having double telecentric illumination
EP3267257B1 (de) 2004-08-03 2019-02-13 Nikon Corporation Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung einer vorrichtung
KR101285963B1 (ko) * 2004-09-17 2013-07-12 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
KR20070054635A (ko) * 2004-09-17 2007-05-29 가부시키가이샤 니콘 노광용 기판, 노광 방법 및 디바이스 제조 방법
EP3306647A1 (de) 2004-10-15 2018-04-11 Nikon Corporation Belichtungsvorrichtung und vorrichtungsherstellungsverfahren
JP4625673B2 (ja) 2004-10-15 2011-02-02 株式会社東芝 露光方法及び露光装置
WO2006051909A1 (ja) 2004-11-11 2006-05-18 Nikon Corporation 露光方法、デバイス製造方法、及び基板
TWI393170B (zh) 2004-11-18 2013-04-11 尼康股份有限公司 A position measuring method, a position control method, a measuring method, a loading method, an exposure method, an exposure apparatus, and a device manufacturing method
WO2006054719A1 (ja) * 2004-11-19 2006-05-26 Nikon Corporation メンテナンス方法、露光方法、露光装置及びデバイス製造方法
US7277158B2 (en) * 2004-12-02 2007-10-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2006059636A1 (ja) * 2004-12-02 2006-06-08 Nikon Corporation 露光装置及びデバイス製造方法
JP4752473B2 (ja) * 2004-12-09 2011-08-17 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
EP3285282A1 (de) 2004-12-15 2018-02-21 Nikon Corporation Belichtungsapparat und verfahren zur herstellung einer vorrichtung
US7567368B2 (en) * 2005-01-06 2009-07-28 Asml Holding N.V. Systems and methods for minimizing scattered light in multi-SLM maskless lithography
US7557529B2 (en) * 2005-01-11 2009-07-07 Nikon Corporation Stage unit and exposure apparatus
US7450217B2 (en) 2005-01-12 2008-11-11 Asml Netherlands B.V. Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
EP1843386A1 (de) * 2005-01-18 2007-10-10 Nikon Corporation Flüssigkeits-entfernungsvorrichtung, belichtungsvorrichtung und bauelemente-herstellungsverfahren
KR20180125636A (ko) * 2005-01-31 2018-11-23 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR20070100870A (ko) * 2005-01-31 2007-10-12 가부시키가이샤 니콘 레이저 광원의 제어 방법, 레이저 광원 장치 및 노광 장치
US8692973B2 (en) * 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
US20070258068A1 (en) * 2005-02-17 2007-11-08 Hiroto Horikawa Exposure Apparatus, Exposure Method, and Device Fabricating Method
TWI424260B (zh) 2005-03-18 2014-01-21 尼康股份有限公司 A board member, a substrate holding device, an exposure apparatus and an exposure method, and a device manufacturing method
JP4946109B2 (ja) * 2005-03-18 2012-06-06 株式会社ニコン 露光方法、露光装置、及びデバイス製造方法
US20090226846A1 (en) * 2005-03-30 2009-09-10 Nikon Corporation Exposure Apparatus, Exposure Method, and Device Manufacturing Method
JP4605219B2 (ja) * 2005-03-30 2011-01-05 株式会社ニコン 露光条件の決定方法、露光方法及び露光装置、並びにデバイス製造方法
US20070132976A1 (en) * 2005-03-31 2007-06-14 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
TW200644079A (en) * 2005-03-31 2006-12-16 Nikon Corp Exposure apparatus, exposure method, and device production method
US20090047607A1 (en) * 2005-03-31 2009-02-19 Hiroyuki Nagasaka Exposure method, exposure apparatus and device fabricating methods
US8089608B2 (en) * 2005-04-18 2012-01-03 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
KR101344142B1 (ko) * 2005-04-25 2013-12-23 가부시키가이샤 니콘 노광 방법, 노광 장치, 및 디바이스 제조 방법
WO2006118108A1 (ja) * 2005-04-27 2006-11-09 Nikon Corporation 露光方法、露光装置、デバイス製造方法、及び膜の評価方法
WO2006118258A1 (ja) 2005-04-28 2006-11-09 Nikon Corporation 露光方法及び露光装置、並びにデバイス製造方法
EP1876636A1 (de) * 2005-04-28 2008-01-09 Nikon Corporation Belichtungsverfahren, belichtungsvorrichtung und verfahren zur herstellung von bauelementen
JP4596191B2 (ja) * 2005-05-24 2010-12-08 株式会社ニコン 露光方法及び露光装置、並びにデバイス製造方法
US7838858B2 (en) * 2005-05-31 2010-11-23 Nikon Corporation Evaluation system and method of a search operation that detects a detection subject on an object
US20070085989A1 (en) * 2005-06-21 2007-04-19 Nikon Corporation Exposure apparatus and exposure method, maintenance method, and device manufacturing method
EP1895571A4 (de) 2005-06-21 2011-04-27 Nikon Corp Belichtungsvorrichtung, belichtungsverfahren, wartungsverfahren und bauelemente-herstellungsverfahren
US7924416B2 (en) * 2005-06-22 2011-04-12 Nikon Corporation Measurement apparatus, exposure apparatus, and device manufacturing method
US20090033896A1 (en) * 2005-06-28 2009-02-05 Hiroyuki Nagasaka Exposure apparatus and method, and device manufacturing method
US8693006B2 (en) * 2005-06-28 2014-04-08 Nikon Corporation Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
JP2007012375A (ja) * 2005-06-29 2007-01-18 Toyota Motor Corp 燃料電池、燃料電池用電極触媒層の製造方法、及び燃料電池の運転方法
WO2007001045A1 (ja) * 2005-06-29 2007-01-04 Nikon Corporation 露光装置、基板処理方法、及びデバイス製造方法
JP5194792B2 (ja) * 2005-06-30 2013-05-08 株式会社ニコン 露光装置及び方法、露光装置のメンテナンス方法、並びにデバイス製造方法
WO2007004567A1 (ja) 2005-07-01 2007-01-11 Nikon Corporation 露光装置、露光方法及びデバイス製造方法、並びにシステム
EP1909310A4 (de) * 2005-07-11 2010-10-06 Nikon Corp Belichtungsvorrichtung und verfahren zur bauelementeherstellung
KR100729263B1 (ko) * 2005-07-14 2007-06-15 삼성전자주식회사 기판 노광 장치
WO2007018127A1 (ja) * 2005-08-05 2007-02-15 Nikon Corporation ステージ装置及び露光装置
JP5040653B2 (ja) 2005-08-23 2012-10-03 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
TWI450044B (zh) 2005-08-31 2014-08-21 尼康股份有限公司 An optical element, an exposure apparatus using the same, an exposure method, and a manufacturing method of the micro-element
KR101388345B1 (ko) * 2005-09-09 2014-04-22 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
US8111374B2 (en) * 2005-09-09 2012-02-07 Nikon Corporation Analysis method, exposure method, and device manufacturing method
KR101333028B1 (ko) * 2005-09-16 2013-11-26 코닌클리케 필립스 엔.브이. 조명기기
US20070070323A1 (en) * 2005-09-21 2007-03-29 Nikon Corporation Exposure apparatus, exposure method, and device fabricating method
KR20080053497A (ko) 2005-09-21 2008-06-13 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
KR20080059572A (ko) * 2005-10-07 2008-06-30 가부시키가이샤 니콘 광학 특성 계측 방법, 노광 방법 및 디바이스 제조 방법,그리고 검사 장치 및 계측 방법
JP4978471B2 (ja) 2005-10-19 2012-07-18 株式会社ニコン 物体の搬出入方法及び搬出入装置、露光方法及び露光装置、並びにデバイス製造方法
US20070095739A1 (en) * 2005-10-24 2007-05-03 Nikon Corporation Utility transfer apparatus, stage apparatus, exposure apparatus, and device manufacturing method
US8681314B2 (en) * 2005-10-24 2014-03-25 Nikon Corporation Stage device and coordinate correction method for the same, exposure apparatus, and device manufacturing method
WO2007052659A1 (ja) 2005-11-01 2007-05-10 Nikon Corporation 露光装置、露光方法、及びデバイス製造方法
US20070127135A1 (en) * 2005-11-01 2007-06-07 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US20070127002A1 (en) * 2005-11-09 2007-06-07 Nikon Corporation Exposure apparatus and method, and device manufacturing method
KR20080066836A (ko) 2005-11-09 2008-07-16 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
JPWO2007055199A1 (ja) 2005-11-09 2009-04-30 株式会社ニコン 露光装置及び方法、並びにデバイス製造方法
EP1962328B1 (de) 2005-11-14 2013-01-16 Nikon Corporation Belichtungsapparat, belichtungsverfahren und verfahren zur herstellung einer vorrichtung
EP1953806A1 (de) 2005-11-16 2008-08-06 Nikon Corporation Substratverarbeitungsverfahren, fotomasken-herstellungsverfahren, fotomaske und bauelemente-herstellungsverfahren
JP2007165869A (ja) 2005-11-21 2007-06-28 Nikon Corp 露光方法及びそれを用いたデバイス製造方法、露光装置、並びに基板処理方法及び装置
US7803516B2 (en) * 2005-11-21 2010-09-28 Nikon Corporation Exposure method, device manufacturing method using the same, exposure apparatus, and substrate processing method and apparatus
US8125610B2 (en) * 2005-12-02 2012-02-28 ASML Metherlands B.V. Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
US7782442B2 (en) * 2005-12-06 2010-08-24 Nikon Corporation Exposure apparatus, exposure method, projection optical system and device producing method
JP5194799B2 (ja) 2005-12-06 2013-05-08 株式会社ニコン 露光方法、露光装置、及びデバイス製造方法
KR20080071555A (ko) 2005-12-06 2008-08-04 가부시키가이샤 니콘 노광 장치, 노광 방법, 투영 광학계 및 디바이스 제조방법
KR101539517B1 (ko) 2005-12-08 2015-07-24 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
WO2007077925A1 (ja) 2005-12-28 2007-07-12 Nikon Corporation パターン形成方法及びパターン形成装置、並びにデバイス製造方法
US8411271B2 (en) * 2005-12-28 2013-04-02 Nikon Corporation Pattern forming method, pattern forming apparatus, and device manufacturing method
KR20080088579A (ko) 2005-12-28 2008-10-02 가부시키가이샤 니콘 노광 장치 및 노광 방법, 디바이스 제조 방법
US8953148B2 (en) * 2005-12-28 2015-02-10 Nikon Corporation Exposure apparatus and making method thereof
CN102636966B (zh) * 2005-12-28 2014-12-03 株式会社尼康 曝光方法及曝光装置、以及元件制造方法
EP2857902B1 (de) * 2006-01-19 2016-04-20 Nikon Corporation Immersionsbelichtungsvorrichtung, Immersionsbelichtungsverfahren, und Verfahren zur Herstellung einer Vorrichtung
KR20080102192A (ko) 2006-02-16 2008-11-24 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
JPWO2007094470A1 (ja) * 2006-02-16 2009-07-09 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
WO2007094431A1 (ja) 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
WO2007094407A1 (ja) 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
US8134681B2 (en) * 2006-02-17 2012-03-13 Nikon Corporation Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
SG170012A1 (en) * 2006-02-21 2011-04-29 Nikon Corp Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method
CN101385120B (zh) * 2006-02-21 2012-09-05 株式会社尼康 测定装置及方法、处理装置及方法、图案形成装置及方法、曝光装置及方法、以及元件制造方法
KR20130057496A (ko) 2006-02-21 2013-05-31 가부시키가이샤 니콘 패턴 형성 장치, 마크 검출 장치, 노광 장치, 패턴 형성 방법, 노광 방법 및 디바이스 제조 방법
EP1993121A4 (de) 2006-03-03 2011-12-07 Nikon Corp Belichtungsvorrichtung und bauelementeherstellungsverfahren
JP5077770B2 (ja) * 2006-03-07 2012-11-21 株式会社ニコン デバイス製造方法、デバイス製造システム及び測定検査装置
KR20080114691A (ko) * 2006-03-13 2008-12-31 가부시키가이샤 니콘 노광 장치, 메인터넌스 방법, 노광 방법 및 디바이스 제조 방법
US20070242254A1 (en) 2006-03-17 2007-10-18 Nikon Corporation Exposure apparatus and device manufacturing method
US8982322B2 (en) 2006-03-17 2015-03-17 Nikon Corporation Exposure apparatus and device manufacturing method
US20080013062A1 (en) 2006-03-23 2008-01-17 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
WO2007116711A1 (ja) * 2006-03-29 2007-10-18 Nikon Corporation 計測方法、計測装置及び処理装置、並びにパターン形成方法及びデバイス製造方法
TWI454859B (zh) * 2006-03-30 2014-10-01 尼康股份有限公司 移動體裝置、曝光裝置與曝光方法以及元件製造方法
KR20090006064A (ko) 2006-04-05 2009-01-14 가부시키가이샤 니콘 스테이지 장치, 노광 장치, 스테이지 제어 방법, 노광 방법및 디바이스 제조 방법
JPWO2007119821A1 (ja) * 2006-04-14 2009-08-27 株式会社ニコン 露光方法及び露光装置、並びにデバイス製造方法
EP2009678A4 (de) * 2006-04-17 2011-04-06 Nikon Corp Optische beleuchtungsvorrichtung, belichtungsvorrichtung und bauelementeherstelllungsverfahren
US8125613B2 (en) * 2006-04-21 2012-02-28 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
DE102006021797A1 (de) * 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
TWI439813B (zh) * 2006-05-10 2014-06-01 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
WO2007135990A1 (ja) 2006-05-18 2007-11-29 Nikon Corporation 露光方法及び装置、メンテナンス方法、並びにデバイス製造方法
JP2008004928A (ja) * 2006-05-22 2008-01-10 Nikon Corp 露光方法及び装置、メンテナンス方法、並びにデバイス製造方法
JP5019170B2 (ja) 2006-05-23 2012-09-05 株式会社ニコン メンテナンス方法、露光方法及び装置、並びにデバイス製造方法
JPWO2007135998A1 (ja) 2006-05-24 2009-10-01 株式会社ニコン 保持装置及び露光装置
WO2007139017A1 (ja) * 2006-05-29 2007-12-06 Nikon Corporation 液体回収部材、基板保持部材、露光装置、及びデバイス製造方法
EP2023379A4 (de) 2006-05-31 2009-07-08 Nikon Corp Belichtungsvorrichtung und belichtungsverfahren
SG172681A1 (en) 2006-06-09 2011-07-28 Nikon Corp Movable-body apparatus, exposure apparatus, exposure method, and device manufacturing method
EP2031640A4 (de) * 2006-06-16 2009-06-10 Nikon Corp Vorrichtung mit variablem schlitz, beleuchtungsvorrichtung, belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung der vorrichtung
KR20090033170A (ko) 2006-06-30 2009-04-01 가부시키가이샤 니콘 메인터넌스 방법, 노광 방법 및 장치 및 디바이스 제조 방법
JPWO2008007633A1 (ja) * 2006-07-12 2009-12-10 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
JP5308638B2 (ja) * 2006-07-14 2013-10-09 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置用の照明光学系
DE102006032810A1 (de) 2006-07-14 2008-01-17 Carl Zeiss Smt Ag Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, mikrolithografie-Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, mikrolithografisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
WO2008007660A1 (en) * 2006-07-14 2008-01-17 Nikon Corporation Stage apparatus and exposure apparatus
US8570484B2 (en) * 2006-08-30 2013-10-29 Nikon Corporation Immersion exposure apparatus, device manufacturing method, cleaning method, and cleaning member to remove foreign substance using liquid
SG10201407395SA (en) 2006-08-31 2014-12-30 Nikon Corp Movable Body Drive Method And Movable Body Drive System, Pattern Formation Method And Apparatus, Exposure Method And Apparatus, And Device Manufacturing Method
EP2071611B1 (de) 2006-08-31 2019-05-01 Nikon Corporation Mobilkörperantriebssystem und mobilkörperantriebsverfahren, strukturerzeugungsvorrichtung und verfahren, belichtungsvorrichtung und verfahren, bauelementeherstellungsverfahren und entscheidungsverfahren
TWI597585B (zh) 2006-08-31 2017-09-01 Nippon Kogaku Kk Exposure method and exposure apparatus, and device manufacturing method
KR101770082B1 (ko) 2006-09-01 2017-08-21 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 디바이스 제조 방법, 그리고 캘리브레이션 방법
WO2008026709A1 (en) * 2006-09-01 2008-03-06 Nikon Corporation Discharge lamp, light source apparatus, exposure apparatus and exposure apparatus manufacturing method
SG10201407218XA (en) 2006-09-01 2015-01-29 Nippon Kogaku Kk Movable Body Drive Method And Movable Body Drive System, Pattern Formation Method And Apparatus, Exposure Method And Apparatus, And Device Manufacturing Method
WO2008029884A1 (en) * 2006-09-08 2008-03-13 Nikon Corporation Cleaning member, cleaning method and device manufacturing method
US7872730B2 (en) * 2006-09-15 2011-01-18 Nikon Corporation Immersion exposure apparatus and immersion exposure method, and device manufacturing method
TW200821772A (en) * 2006-09-28 2008-05-16 Nikon Corp Line width measuring method, image forming status detecting method, adjusting method, exposure method and device manufacturing method
JP5120377B2 (ja) * 2006-09-29 2013-01-16 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
KR101360507B1 (ko) * 2006-09-29 2014-02-07 가부시키가이샤 니콘 이동체 시스템, 패턴 형성 장치, 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
KR100816494B1 (ko) * 2006-10-09 2008-03-24 엘지전자 주식회사 마스크리스 노광기 및 이를 이용한 표시장치용 기판의 제조방법
US20080100909A1 (en) * 2006-10-30 2008-05-01 Nikon Corporation Optical element, liquid immersion exposure apparatus, liquid immersion exposure method, and method for producing microdevice
WO2008053918A1 (en) * 2006-10-31 2008-05-08 Nikon Corporation Liquid holding apparatus, liquid holding method, exposure apparatus, exposure method and device manufacturing method
WO2008056735A1 (en) * 2006-11-09 2008-05-15 Nikon Corporation Holding unit, position detecting system and exposure system, moving method, position detecting method, exposure method, adjusting method of detection system, and device producing method
JP5055971B2 (ja) 2006-11-16 2012-10-24 株式会社ニコン 表面処理方法及び表面処理装置、露光方法及び露光装置、並びにデバイス製造方法
US20080156356A1 (en) * 2006-12-05 2008-07-03 Nikon Corporation Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method
JP5146323B2 (ja) * 2006-12-27 2013-02-20 株式会社ニコン ステージ装置、露光装置、及びデバイスの製造方法
US20080212047A1 (en) * 2006-12-28 2008-09-04 Nikon Corporation Exposure apparatus, exposing method, and device fabricating method
US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
JPWO2008090975A1 (ja) * 2007-01-26 2010-05-20 株式会社ニコン 支持構造体及び露光装置
JP2010519722A (ja) * 2007-02-23 2010-06-03 株式会社ニコン 露光方法、露光装置、デバイス製造方法、及び液浸露光用基板
US8323855B2 (en) * 2007-03-01 2012-12-04 Nikon Corporation Pellicle frame apparatus, mask, exposing method, exposure apparatus, and device fabricating method
JP5448070B2 (ja) * 2007-03-05 2014-03-19 株式会社ニコン 移動体装置、パターン形成装置及びパターン形成方法、デバイス製造方法、並びに移動体駆動方法
US20080225261A1 (en) * 2007-03-13 2008-09-18 Noriyuki Hirayanagi Exposure apparatus and device manufacturing method
US8134685B2 (en) * 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
JP4880511B2 (ja) * 2007-03-28 2012-02-22 株式会社オーク製作所 露光描画装置
TWI401538B (zh) * 2007-03-28 2013-07-11 Orc Mfg Co Ltd Exposure drawing device
JP4885029B2 (ja) * 2007-03-28 2012-02-29 株式会社オーク製作所 露光描画装置
US9165738B2 (en) 2007-04-12 2015-10-20 Nikon Corporation Discharge lamp, connecting cable, light source apparatus, and exposure apparatus
WO2008132799A1 (ja) * 2007-04-12 2008-11-06 Nikon Corporation 計測方法、露光方法及びデバイス製造方法
KR102016673B1 (ko) 2007-04-12 2019-08-30 가부시키가이샤 니콘 방전램프
US8300207B2 (en) * 2007-05-17 2012-10-30 Nikon Corporation Exposure apparatus, immersion system, exposing method, and device fabricating method
US20090122282A1 (en) * 2007-05-21 2009-05-14 Nikon Corporation Exposure apparatus, liquid immersion system, exposing method, and device fabricating method
WO2008146819A1 (ja) * 2007-05-28 2008-12-04 Nikon Corporation 露光装置、デバイス製造方法、洗浄装置、及びクリーニング方法並びに露光方法
US8164736B2 (en) * 2007-05-29 2012-04-24 Nikon Corporation Exposure method, exposure apparatus, and method for producing device
US8098362B2 (en) * 2007-05-30 2012-01-17 Nikon Corporation Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
US8547527B2 (en) * 2007-07-24 2013-10-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
EP2184768B1 (de) 2007-07-24 2015-09-09 Nikon Corporation Mobilobjekt-ansteuerverfahren, mobilobjekt-ansteuersystem, strukturerzeugungsverfahren und vorrichtung, belichtungsverfahren und vorrichtung und bauelementeherstellungsverfahren
US8194232B2 (en) * 2007-07-24 2012-06-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
WO2009013905A1 (ja) 2007-07-24 2009-01-29 Nikon Corporation 位置計測システム、露光装置、位置計測方法、露光方法及びデバイス製造方法、並びに工具及び計測方法
JP4863948B2 (ja) * 2007-07-30 2012-01-25 株式会社日立ハイテクノロジーズ 露光装置、露光方法、及び表示用パネル基板の製造方法
US9025126B2 (en) * 2007-07-31 2015-05-05 Nikon Corporation Exposure apparatus adjusting method, exposure apparatus, and device fabricating method
US8023106B2 (en) * 2007-08-24 2011-09-20 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US8867022B2 (en) 2007-08-24 2014-10-21 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
US20090051895A1 (en) * 2007-08-24 2009-02-26 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, device manufacturing method, and processing system
US9304412B2 (en) * 2007-08-24 2016-04-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method
US8218129B2 (en) * 2007-08-24 2012-07-10 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
US8237919B2 (en) * 2007-08-24 2012-08-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
KR20090021755A (ko) * 2007-08-28 2009-03-04 삼성전자주식회사 노광 장치 및 반도체 기판의 노광 방법
WO2009026947A1 (en) 2007-08-30 2009-03-05 Carl Zeiss Smt Ag Illumination system for illuminating a mask in a microlithographic projection exposure apparatus
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US8421994B2 (en) * 2007-09-27 2013-04-16 Nikon Corporation Exposure apparatus
JP4880561B2 (ja) * 2007-10-03 2012-02-22 新光電気工業株式会社 フリップチップ実装装置
US8279399B2 (en) 2007-10-22 2012-10-02 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9013681B2 (en) * 2007-11-06 2015-04-21 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
KR101470671B1 (ko) * 2007-11-07 2014-12-08 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
US9256140B2 (en) * 2007-11-07 2016-02-09 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method with measurement device to measure movable body in Z direction
US8665455B2 (en) * 2007-11-08 2014-03-04 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US8422015B2 (en) 2007-11-09 2013-04-16 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
SG185261A1 (en) * 2007-12-11 2012-11-29 Nikon Corp Movable body apparatus, exposure apparatus and pattern formation apparatus, and device manufacturing method
US8711327B2 (en) * 2007-12-14 2014-04-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8115906B2 (en) * 2007-12-14 2012-02-14 Nikon Corporation Movable body system, pattern formation apparatus, exposure apparatus and measurement device, and device manufacturing method
US20090174873A1 (en) * 2007-12-17 2009-07-09 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
SG183058A1 (en) * 2007-12-17 2012-08-30 Nikon Corp Exposure apparatus, exposure method and device manufacturing method
US8964166B2 (en) * 2007-12-17 2015-02-24 Nikon Corporation Stage device, exposure apparatus and method of producing device
US8451425B2 (en) * 2007-12-28 2013-05-28 Nikon Corporation Exposure apparatus, exposure method, cleaning apparatus, and device manufacturing method
US8792079B2 (en) * 2007-12-28 2014-07-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method having encoders to measure displacement between optical member and measurement mount and between measurement mount and movable body
US8269945B2 (en) * 2007-12-28 2012-09-18 Nikon Corporation Movable body drive method and apparatus, exposure method and apparatus, pattern formation method and apparatus, and device manufacturing method
US8237916B2 (en) * 2007-12-28 2012-08-07 Nikon Corporation Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
CN101681809B (zh) * 2007-12-28 2012-04-25 株式会社尼康 曝光装置、曝光方法以及器件制造方法
JP5369443B2 (ja) 2008-02-05 2013-12-18 株式会社ニコン ステージ装置、露光装置、露光方法、及びデバイス製造方法
KR20100124245A (ko) * 2008-02-08 2010-11-26 가부시키가이샤 니콘 위치 계측 시스템 및 위치 계측 방법, 이동체 장치, 이동체 구동 방법, 노광 장치 및 노광 방법, 패턴 형성 장치, 그리고 디바이스 제조 방법
US20090218743A1 (en) * 2008-02-29 2009-09-03 Nikon Corporation Substrate holding apparatus, exposure apparatus, exposing method, device fabricating method, plate member, and wall
US20100039628A1 (en) * 2008-03-19 2010-02-18 Nikon Corporation Cleaning tool, cleaning method, and device fabricating method
US8233139B2 (en) * 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
KR20100128352A (ko) * 2008-04-11 2010-12-07 가부시키가이샤 니콘 스테이지장치, 노광장치 및 디바이스 제조방법
US8654306B2 (en) * 2008-04-14 2014-02-18 Nikon Corporation Exposure apparatus, cleaning method, and device fabricating method
KR20100135215A (ko) * 2008-04-30 2010-12-24 가부시키가이샤 니콘 노광 장치 및 노광 방법과, 디바이스 제조 방법
US8274639B2 (en) 2008-04-30 2012-09-25 Nikon Corporation Stage device, pattern formation apparatus, exposure apparatus, stage drive method, exposure method, and device manufacturing method
US8817236B2 (en) * 2008-05-13 2014-08-26 Nikon Corporation Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method
US8786829B2 (en) * 2008-05-13 2014-07-22 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8228482B2 (en) * 2008-05-13 2012-07-24 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20090303454A1 (en) * 2008-06-10 2009-12-10 Nikon Corporation Exposure apparatus with a scanning illumination beam
TW201003053A (en) * 2008-07-10 2010-01-16 Nikon Corp Deformation measuring apparatus, exposure apparatus, jig for deformation measuring apparatus, position measuring method and device manufacturing method
US20100045949A1 (en) * 2008-08-11 2010-02-25 Nikon Corporation Exposure apparatus, maintaining method and device fabricating method
US8736813B2 (en) * 2008-08-26 2014-05-27 Nikon Corporation Exposure apparatus with an illumination system generating multiple illumination beams
US8705170B2 (en) * 2008-08-29 2014-04-22 Nikon Corporation High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations
KR101560617B1 (ko) * 2008-09-10 2015-10-16 삼성전자주식회사 광 발생 장치 및 그 제어 방법
NL2003363A (en) * 2008-09-10 2010-03-15 Asml Netherlands Bv Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method.
US8435723B2 (en) * 2008-09-11 2013-05-07 Nikon Corporation Pattern forming method and device production method
US8994923B2 (en) * 2008-09-22 2015-03-31 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8325325B2 (en) 2008-09-22 2012-12-04 Nikon Corporation Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
US8508735B2 (en) 2008-09-22 2013-08-13 Nikon Corporation Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
US20100091257A1 (en) * 2008-10-10 2010-04-15 Nikon Corporation Optical Imaging System and Method for Imaging Up to Four Reticles to a Single Imaging Location
US8902402B2 (en) 2008-12-19 2014-12-02 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8599359B2 (en) 2008-12-19 2013-12-03 Nikon Corporation Exposure apparatus, exposure method, device manufacturing method, and carrier method
US8773635B2 (en) * 2008-12-19 2014-07-08 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8760629B2 (en) 2008-12-19 2014-06-24 Nikon Corporation Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
US8896806B2 (en) 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20100196832A1 (en) 2009-01-30 2010-08-05 Nikon Corporation Exposure apparatus, exposing method, liquid immersion member and device fabricating method
US8659746B2 (en) 2009-03-04 2014-02-25 Nikon Corporation Movable body apparatus, exposure apparatus and device manufacturing method
JP5482784B2 (ja) 2009-03-10 2014-05-07 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
TW201100975A (en) * 2009-04-21 2011-01-01 Nikon Corp Moving-object apparatus, exposure apparatus, exposure method, and device manufacturing method
US8953143B2 (en) * 2009-04-24 2015-02-10 Nikon Corporation Liquid immersion member
US8202671B2 (en) 2009-04-28 2012-06-19 Nikon Corporation Protective apparatus, mask, mask forming apparatus, mask forming method, exposure apparatus, device fabricating method, and foreign matter detecting apparatus
US20110085152A1 (en) * 2009-05-07 2011-04-14 Hideaki Nishino Vibration control apparatus, vibration control method, exposure apparatus, and device manufacturing method
US20100323303A1 (en) * 2009-05-15 2010-12-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, and device fabricating method
US8395758B2 (en) * 2009-05-15 2013-03-12 Nikon Corporation Exposure apparatus and device manufacturing method
US8970820B2 (en) * 2009-05-20 2015-03-03 Nikon Corporation Object exchange method, exposure method, carrier system, exposure apparatus, and device manufacturing method
US8792084B2 (en) * 2009-05-20 2014-07-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8553204B2 (en) * 2009-05-20 2013-10-08 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8472008B2 (en) 2009-06-19 2013-06-25 Nikon Corporation Movable body apparatus, exposure apparatus and device manufacturing method
US20110008734A1 (en) * 2009-06-19 2011-01-13 Nikon Corporation Exposure apparatus and device manufacturing method
US8294878B2 (en) 2009-06-19 2012-10-23 Nikon Corporation Exposure apparatus and device manufacturing method
US8355116B2 (en) 2009-06-19 2013-01-15 Nikon Corporation Exposure apparatus and device manufacturing method
US8446569B2 (en) * 2009-06-19 2013-05-21 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US8355114B2 (en) 2009-06-19 2013-01-15 Nikon Corporation Exposure apparatus and device manufacturing method
US8379186B2 (en) * 2009-07-17 2013-02-19 Nikon Corporation Pattern formation apparatus, pattern formation method, and device manufacturing method
US8235695B2 (en) 2009-07-17 2012-08-07 Nikon Corporation Pattern forming device, pattern forming method, and device manufacturing method
KR101862234B1 (ko) * 2009-08-20 2018-05-29 가부시키가이샤 니콘 물체 처리 장치, 노광 장치와 노광 방법, 및 디바이스 제조 방법
US8699001B2 (en) * 2009-08-20 2014-04-15 Nikon Corporation Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method
US20110042874A1 (en) * 2009-08-20 2011-02-24 Nikon Corporation Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method
US8488109B2 (en) 2009-08-25 2013-07-16 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US8493547B2 (en) 2009-08-25 2013-07-23 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8514395B2 (en) 2009-08-25 2013-08-20 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US20110096312A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110102761A1 (en) 2009-09-28 2011-05-05 Nikon Corporation Stage apparatus, exposure apparatus, and device fabricating method
US20110096318A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110096306A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
US20110075120A1 (en) 2009-09-30 2011-03-31 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110085150A1 (en) 2009-09-30 2011-04-14 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110086315A1 (en) 2009-09-30 2011-04-14 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110199591A1 (en) * 2009-10-14 2011-08-18 Nikon Corporation Exposure apparatus, exposing method, maintenance method and device fabricating method
WO2011052703A1 (en) 2009-10-30 2011-05-05 Nikon Corporation Exposure apparatus and device manufacturing method
KR20170113709A (ko) 2009-11-09 2017-10-12 가부시키가이샤 니콘 노광 장치, 노광 방법, 노광 장치의 메인터넌스 방법, 노광 장치의 조정 방법, 및 디바이스 제조 방법
US20110242520A1 (en) 2009-11-17 2011-10-06 Nikon Corporation Optical properties measurement method, exposure method and device manufacturing method
US20110123913A1 (en) 2009-11-19 2011-05-26 Nikon Corporation Exposure apparatus, exposing method, and device fabricating method
US20110128523A1 (en) 2009-11-19 2011-06-02 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
US20110164238A1 (en) 2009-12-02 2011-07-07 Nikon Corporation Exposure apparatus and device fabricating method
US20110134400A1 (en) 2009-12-04 2011-06-09 Nikon Corporation Exposure apparatus, liquid immersion member, and device manufacturing method
US8488106B2 (en) 2009-12-28 2013-07-16 Nikon Corporation Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method
CN103135365A (zh) 2009-12-28 2013-06-05 株式会社尼康 液浸构件、液浸构件的制造方法、曝光装置、及元件制造方法
CN102714141B (zh) 2010-01-08 2016-03-23 株式会社尼康 液浸构件、曝光装置、曝光方法及元件制造方法
JP5842615B2 (ja) 2010-02-03 2016-01-13 株式会社ニコン 照明光学装置、照明方法、並びに露光方法及び装置
US8841065B2 (en) * 2010-02-12 2014-09-23 Nikon Corporation Manufacturing method of exposure apparatus and device manufacturing method
EP2360481B1 (de) * 2010-02-23 2018-09-12 Neaspec GmbH Optisches Nahfeldmikroskop mit optischem Bildgebungssystem
US20110222031A1 (en) * 2010-03-12 2011-09-15 Nikon Corporation Liquid immersion member, exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US20110244396A1 (en) 2010-04-01 2011-10-06 Nikon Corporation Exposure apparatus, exchange method of object, exposure method, and device manufacturing method
US8937703B2 (en) 2010-07-14 2015-01-20 Nikon Corporation Liquid immersion member, immersion exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US20120013864A1 (en) 2010-07-14 2012-01-19 Nikon Corporation Liquid immersion member, immersion exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US20120013863A1 (en) 2010-07-14 2012-01-19 Nikon Corporation Liquid immersion member, immersion exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US20120012191A1 (en) 2010-07-16 2012-01-19 Nikon Corporation Liquid recovery apparatus, exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US20120019803A1 (en) 2010-07-23 2012-01-26 Nikon Corporation Cleaning method, liquid immersion member, immersion exposure apparatus, device fabricating method, program, and storage medium
US20120019802A1 (en) 2010-07-23 2012-01-26 Nikon Corporation Cleaning method, immersion exposure apparatus, device fabricating method, program, and storage medium
US20120019804A1 (en) 2010-07-23 2012-01-26 Nikon Corporation Cleaning method, cleaning apparatus, device fabricating method, program, and storage medium
US8598538B2 (en) 2010-09-07 2013-12-03 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
US8988655B2 (en) 2010-09-07 2015-03-24 Nikon Corporation Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
US20120064460A1 (en) 2010-09-07 2012-03-15 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
US20120064461A1 (en) 2010-09-13 2012-03-15 Nikon Corporation Movable body apparatus, exposure apparatus, device manufacturing method, flat-panel display manufacturing method, and object exchange method
US9291814B2 (en) * 2010-09-22 2016-03-22 Nikon Corporation Spatial light modulator, exposure apparatus, and method for manufacturing device
US20120162619A1 (en) 2010-12-27 2012-06-28 Nikon Corporation Liquid immersion member, immersion exposure apparatus, exposing method, device fabricating method, program, and storage medium
US20120188521A1 (en) 2010-12-27 2012-07-26 Nikon Corporation Cleaning method, liquid immersion member, immersion exposure apparatus, device fabricating method, program and storage medium
KR102082846B1 (ko) 2011-01-28 2020-02-28 고쿠리츠다이가쿠호우진 도쿄다이가쿠 구동 시스템과 구동 방법, 노광 장치와 노광 방법, 및 구동 시스템 설계 방법
JPWO2012115002A1 (ja) 2011-02-22 2014-07-07 株式会社ニコン 保持装置、露光装置、及びデバイスの製造方法
DE102011001785B4 (de) * 2011-04-04 2015-03-05 Jenoptik Optical Systems Gmbh Belichtungseinrichtung zur strukturierten Belichtung einer Fläche
US20130016329A1 (en) 2011-07-12 2013-01-17 Nikon Corporation Exposure apparatus, exposure method, measurement method, and device manufacturing method
US9329496B2 (en) 2011-07-21 2016-05-03 Nikon Corporation Exposure apparatus, exposure method, method of manufacturing device, program, and storage medium
US9256137B2 (en) 2011-08-25 2016-02-09 Nikon Corporation Exposure apparatus, liquid holding method, and device manufacturing method
US20130050666A1 (en) 2011-08-26 2013-02-28 Nikon Corporation Exposure apparatus, liquid holding method, and device manufacturing method
US20130135594A1 (en) 2011-11-25 2013-05-30 Nikon Corporation Liquid immersion member, immersion exposure apparatus, exposure method, device manufacturing method, program, and recording medium
US20130169944A1 (en) 2011-12-28 2013-07-04 Nikon Corporation Exposure apparatus, exposure method, device manufacturing method, program, and recording medium
US9360772B2 (en) 2011-12-29 2016-06-07 Nikon Corporation Carrier method, exposure method, carrier system and exposure apparatus, and device manufacturing method
US9207549B2 (en) 2011-12-29 2015-12-08 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
WO2013161428A1 (ja) 2012-04-26 2013-10-31 株式会社ニコン 計測方法及びエンコーダ装置、並びに露光方法及び装置
US8993974B2 (en) 2012-06-12 2015-03-31 Nikon Corporation Color time domain integration camera having a single charge coupled device and fringe projection auto-focus system
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9243896B2 (en) 2012-08-15 2016-01-26 Nikon Corporation Two axis encoder head assembly
CN108613638B (zh) 2012-10-02 2020-09-18 株式会社尼康 曝光装置及曝光方法、以及器件制造方法
KR102126664B1 (ko) 2012-10-02 2020-06-25 가부시키가이샤 니콘 이동체 장치, 노광 장치, 및 디바이스 제조 방법
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9772564B2 (en) 2012-11-12 2017-09-26 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method
HK1215330A1 (en) 2012-11-20 2016-08-19 Nikon Corporation Exposure device, mobile device, and device manufacturing method
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
JP6119242B2 (ja) 2012-12-27 2017-04-26 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9352073B2 (en) 2013-01-22 2016-05-31 Niko Corporation Functional film
US9057955B2 (en) 2013-01-22 2015-06-16 Nikon Corporation Functional film, liquid immersion member, method of manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
WO2014132923A1 (ja) 2013-02-28 2014-09-04 株式会社ニコン 摺動膜、摺動膜が形成された部材、及びその製造方法
KR102342910B1 (ko) 2013-06-28 2021-12-23 가부시키가이샤 니콘 이동체 장치 및 노광 장치, 그리고 디바이스 제조 방법
WO2015034005A1 (ja) 2013-09-04 2015-03-12 Ckd株式会社 電磁アクチュエータ用電機子コイル、電磁アクチュエータ、露光装置、及びデバイス製造方法
SG11201601454WA (en) * 2013-09-25 2016-03-30 Asml Netherlands Bv Beam delivery apparatus and method
JP6369472B2 (ja) 2013-10-08 2018-08-08 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法
WO2016104513A1 (ja) 2014-12-24 2016-06-30 株式会社ニコン 移動体の制御方法、露光方法、デバイス製造方法、移動体装置、及び露光装置
WO2016104511A1 (ja) 2014-12-24 2016-06-30 株式会社ニコン 計測装置及び計測方法、露光装置及び露光方法、並びにデバイス製造方法
CN107430356B (zh) 2015-03-25 2021-02-26 株式会社尼康 布局方法、标记检测方法、曝光方法、测量装置、曝光装置、以及组件制造方法
DE102015224522B4 (de) * 2015-12-08 2018-06-21 Carl Zeiss Smt Gmbh Beleuchtungssystem einer mikrolithographischen Projektionsanlage und Verfahren zum Betreiben eines solchen Systems
JP6193963B2 (ja) * 2015-12-18 2017-09-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置においてマスクを照明するための照明システム
US10212785B2 (en) 2016-06-13 2019-02-19 Google Llc Staggered array of individually addressable light-emitting elements for sweeping out an angular range
US9909862B2 (en) 2016-06-13 2018-03-06 Google Llc Curved array of light-emitting elements for sweeping out an angular range
US10069996B2 (en) * 2016-09-15 2018-09-04 Xerox Corporation System and method for utilizing digital micromirror devices to split and recombine a signal image to enable heat dissipation
JP7081490B2 (ja) 2016-09-27 2022-06-07 株式会社ニコン レイアウト情報提供方法、レイアウト情報、決定方法、プログラム、並びに情報記録媒体
JP6827785B2 (ja) 2016-11-30 2021-02-10 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
TWI854195B (zh) * 2018-09-18 2024-09-01 荷蘭商Ａｓｍｌ荷蘭公司 用於偵測快速充電裝置中時間相依缺陷的設備及方法
JP7563497B2 (ja) 2021-01-29 2024-10-08 株式会社ニコン 露光装置

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS597359A (ja) * 1982-07-02 1984-01-14 Canon Inc 照明装置
US5523193A (en) * 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
DE3831743A1 (de) * 1988-09-17 1990-03-29 Philips Patentverwaltung Vorrichtung zur bearbeitung eines werkstueckes mit laserlicht und verwendung dieser vorrichtung
JP2732498B2 (ja) * 1988-11-24 1998-03-30 株式会社日立製作所 縮小投影式露光方法及びその装置
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
WO1991017483A1 (de) * 1990-05-02 1991-11-14 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Belichtungsvorrichtung
KR0165548B1 (ko) * 1991-07-20 1999-01-15 도바 다다스 아미노산, 핵산 또는 이들의 유도체의 정제 방법
US5229872A (en) * 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
US5475416A (en) 1992-06-03 1995-12-12 Eastman Kodak Company Printing system for printing an image with lasers emitting diverging laser beams
KR0165701B1 (ko) * 1993-06-29 1999-02-01 미타라이 하지메 조명장치 및 동장치를 사용하는 노광장치
US5674414A (en) * 1994-11-11 1997-10-07 Carl-Zeiss Stiftung Method and apparatus of irradiating a surface of a workpiece with a plurality of beams
EP0824722B1 (de) * 1996-03-06 2001-07-25 Asm Lithography B.V. Differential-interferometer-system und lithographischer "step and scan" apparat ausgestattet mit diesem system
DE19707834A1 (de) * 1996-04-09 1997-10-16 Zeiss Carl Fa Materialbestrahlungsgerät und Verfahren zum Betrieb von Materialbestrahlungsgeräten
US5691541A (en) * 1996-05-14 1997-11-25 The Regents Of The University Of California Maskless, reticle-free, lithography
JP3689490B2 (ja) * 1996-06-07 2005-08-31 キヤノン株式会社 ノズル部材の製造方法及びそれを用いた加工装置
EP1197801B1 (de) * 1996-12-24 2005-12-28 ASML Netherlands B.V. Lithographisches Gerät mit zwei Objekthaltern
KR100459813B1 (ko) 1997-01-29 2004-12-04 마이크로닉 레이저 시스템즈 에이비 집속된 레이저 광선에 의해 감광 물질로 코팅된 기판상에 구조체를 형성시키는 방법 및 장치
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
USRE40043E1 (en) 1997-03-10 2008-02-05 Asml Netherlands B.V. Positioning device having two object holders
US6233039B1 (en) * 1997-06-05 2001-05-15 Texas Instruments Incorporated Optical illumination system and associated exposure apparatus
JP4238390B2 (ja) 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
EP1111473A3 (de) * 1999-12-23 2004-04-21 ASML Netherlands B.V. Lithographischer Apparat mit Vakuumkammer und interferometrischem Ausrichtungssystem
US6509955B2 (en) * 2000-05-25 2003-01-21 Ball Semiconductor, Inc. Lens system for maskless photolithography
GB0030444D0 (en) 2000-12-14 2001-01-24 Secr Defence Printing by active tiling
KR100938325B1 (ko) 2001-06-13 2010-01-22 오르보테크 엘티디. 에너지 전달 시스템
JP4728536B2 (ja) * 2001-07-05 2011-07-20 株式会社オーク製作所 多重露光描画方法及び多重露光描画装置
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
US6567217B1 (en) * 2001-11-06 2003-05-20 Eastman Kodak Company Image-forming system with enhanced gray levels

Also Published As

Publication number Publication date
US7023525B2 (en) 2006-04-04
TW529172B (en) 2003-04-21
US20040239909A1 (en) 2004-12-02
KR20030035817A (ko) 2003-05-09
US20030030781A1 (en) 2003-02-13
KR100589231B1 (ko) 2006-06-14
JP2003100626A (ja) 2003-04-04
US6778257B2 (en) 2004-08-17
TWI267694B (en) 2006-12-01
JP4316209B2 (ja) 2009-08-19

Similar Documents

Publication Publication Date Title
DE60227135D1 (de) Bilderzeugungsapparat
DE60216014D1 (de) Bilderzeugungsgerät
DE60317829D1 (de) Bilderzeugungsgerät
DE60222489D1 (de) Elektrophotographisches Bilderzeugungsgerät
DE60321062D1 (de) Bilderzeugungsgerät
DE60100212D1 (de) Bilderzeugungsgerät
DE60026950D1 (de) Bilderzeugungsgerät
DE602004028194D1 (de) Bilderzeugungsgerät
DE60232568D1 (de) Belichtungsapparat
DE60114985D1 (de) Bildprojektionsgerät
DE60228664D1 (de) Bilderzeugungsgerät
DE60034208D1 (de) Bilderzeugungsgerät
DE60015425D1 (de) Bilderzeugungsgerät
DE60203861D1 (de) Farbbilderzeugungsgerät
DE60141801D1 (de) Bilderzeugungsgerät
DE60301217D1 (de) Bilderzeugungsgerät
DE602004026661D1 (de) Bilderzeugungsgerät
DE60306009D1 (de) Bilderzeugungsgerät
DE60025449D1 (de) Bilderzeugungsgerät
DE60041947D1 (de) Bilderzeugungsgerät
DE60237338D1 (de) Bilderzeugungsgerät
DE60228783D1 (de) Bilderzeugungsgerät
DE60039846D1 (de) Bilderzeugungsgerät
DE60033594D1 (de) Bilderzeugungsgerät
DE60017473D1 (de) Bilderzeugungsgerät

Legal Events

Date Code Title Description
8364 No opposition during term of opposition