DE60227135D1 - Bilderzeugungsapparat - Google Patents

Bilderzeugungsapparat

Info

Publication number
DE60227135D1
DE60227135D1 DE60227135T DE60227135T DE60227135D1 DE 60227135 D1 DE60227135 D1 DE 60227135D1 DE 60227135 T DE60227135 T DE 60227135T DE 60227135 T DE60227135 T DE 60227135T DE 60227135 D1 DE60227135 D1 DE 60227135D1
Authority
DE
Germany
Prior art keywords
image forming
forming apparatus
image
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60227135T
Other languages
English (en)
Inventor
Arno Jan Bleeker
Jager Pieter Willem Herman De
Jason Douglas Hintersteiner
Borgert Kruizinga
Matthew Eugene Mccarthy
Mark Oskotsky
Lev Ryzhikov
Lev Sakin
Stanislav Smirnov
Bart Snijders
Der Mast Karel Diederick Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE60227135D1 publication Critical patent/DE60227135D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60227135T 2001-07-24 2002-07-24 Bilderzeugungsapparat Expired - Lifetime DE60227135D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP01202825 2001-07-24

Publications (1)

Publication Number Publication Date
DE60227135D1 true DE60227135D1 (de) 2008-07-31

Family

ID=8180693

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60227135T Expired - Lifetime DE60227135D1 (de) 2001-07-24 2002-07-24 Bilderzeugungsapparat

Country Status (5)

Country Link
US (2) US6778257B2 (de)
JP (1) JP4316209B2 (de)
KR (1) KR100589231B1 (de)
DE (1) DE60227135D1 (de)
TW (2) TW529172B (de)

Families Citing this family (373)

* Cited by examiner, † Cited by third party
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