DE60227135D1 - Bilderzeugungsapparat - Google Patents

Bilderzeugungsapparat

Info

Publication number
DE60227135D1
DE60227135D1 DE60227135T DE60227135T DE60227135D1 DE 60227135 D1 DE60227135 D1 DE 60227135D1 DE 60227135 T DE60227135 T DE 60227135T DE 60227135 T DE60227135 T DE 60227135T DE 60227135 D1 DE60227135 D1 DE 60227135D1
Authority
DE
Germany
Prior art keywords
image forming
forming apparatus
image
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60227135T
Other languages
English (en)
Inventor
Arno Jan Bleeker
Jager Pieter Willem Herman De
Jason Douglas Hintersteiner
Borgert Kruizinga
Matthew Eugene Mccarthy
Mark Oskotsky
Lev Ryzhikov
Lev Sakin
Stanislav Smirnov
Bart Snijders
Der Mast Karel Diederick Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE60227135D1 publication Critical patent/DE60227135D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60227135T 2001-07-24 2002-07-24 Bilderzeugungsapparat Expired - Lifetime DE60227135D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP01202825 2001-07-24

Publications (1)

Publication Number Publication Date
DE60227135D1 true DE60227135D1 (de) 2008-07-31

Family

ID=8180693

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60227135T Expired - Lifetime DE60227135D1 (de) 2001-07-24 2002-07-24 Bilderzeugungsapparat

Country Status (5)

Country Link
US (2) US6778257B2 (de)
JP (1) JP4316209B2 (de)
KR (1) KR100589231B1 (de)
DE (1) DE60227135D1 (de)
TW (2) TW529172B (de)

Families Citing this family (373)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
JP2003149740A (ja) * 2001-11-16 2003-05-21 National Institute Of Advanced Industrial & Technology 光投影装置
US7145708B2 (en) * 2002-04-09 2006-12-05 Dicon A/S Light modulating engine
US7048384B2 (en) * 2003-01-24 2006-05-23 Honeywell International Inc. Multiple scene projection system
SE0300516D0 (sv) 2003-02-28 2003-02-28 Micronic Laser Systems Ab SLM direct writer
KR101409565B1 (ko) 2003-04-10 2014-06-19 가부시키가이샤 니콘 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
KR20180089562A (ko) 2003-04-10 2018-08-08 가부시키가이샤 니콘 액침 리소그래피 장치용 진공 배출을 포함하는 환경 시스템
SG139733A1 (en) 2003-04-11 2008-02-29 Nikon Corp Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
SG10201803122UA (en) 2003-04-11 2018-06-28 Nikon Corp Immersion lithography apparatus and device manufacturing method
TWI424470B (zh) 2003-05-23 2014-01-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
US7061591B2 (en) * 2003-05-30 2006-06-13 Asml Holding N.V. Maskless lithography systems and methods utilizing spatial light modulator arrays
EP1482373A1 (de) * 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
KR101148810B1 (ko) 2003-06-19 2012-05-24 가부시키가이샤 니콘 노광 장치 및 디바이스 제조방법
US7110082B2 (en) * 2003-06-24 2006-09-19 Asml Holding N.V. Optical system for maskless lithography
KR101343720B1 (ko) 2003-07-28 2013-12-20 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법, 그리고 노광 장치의제어 방법
US7410736B2 (en) * 2003-09-30 2008-08-12 Asml Holding N.V. Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
US6876440B1 (en) * 2003-09-30 2005-04-05 Asml Holding N.V. Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
US7023526B2 (en) * 2003-09-30 2006-04-04 Asml Holding N.V. Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation
WO2005064407A2 (en) * 2003-12-22 2005-07-14 Koninklijke Philips Electronics N.V. Lithographic projection apparatus and device manufacturing method
US7361457B2 (en) * 2004-01-13 2008-04-22 International Business Machines Corporation Real-time configurable masking
DE602005019689D1 (de) * 2004-01-20 2010-04-15 Zeiss Carl Smt Ag Belichtungsvorrichtung und messeinrichtung für eine projektionslinse
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
KR101945638B1 (ko) 2004-02-04 2019-02-07 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
US20070030467A1 (en) * 2004-02-19 2007-02-08 Nikon Corporation Exposure apparatus, exposure method, and device fabricating method
JP4572896B2 (ja) * 2004-02-19 2010-11-04 株式会社ニコン 露光装置及びデバイスの製造方法
US6977718B1 (en) * 2004-03-02 2005-12-20 Advanced Micro Devices, Inc. Lithography method and system with adjustable reflector
US7094506B2 (en) * 2004-03-09 2006-08-22 Asml Netherlands B.V Lithographic apparatus and device manufacturing method
DE102004013886A1 (de) 2004-03-16 2005-10-06 Carl Zeiss Smt Ag Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem
WO2005093791A1 (ja) 2004-03-25 2005-10-06 Nikon Corporation 露光装置及びデバイス製造方法
US7034917B2 (en) * 2004-04-01 2006-04-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
US8488099B2 (en) 2004-04-19 2013-07-16 Nikon Corporation Exposure apparatus and device manufacturing method
US20050254035A1 (en) * 2004-05-11 2005-11-17 Chromaplex, Inc. Multi-photon lithography
US7486381B2 (en) * 2004-05-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN1954408B (zh) * 2004-06-04 2012-07-04 尼康股份有限公司 曝光装置、曝光方法及元件制造方法
JP4655039B2 (ja) 2004-06-07 2011-03-23 株式会社ニコン ステージ装置、露光装置及び露光方法
KR101162128B1 (ko) 2004-06-09 2012-07-03 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR20190006080A (ko) 2004-06-09 2019-01-16 가부시키가이샤 니콘 기판 유지 장치 및 그것을 구비하는 노광 장치, 노광 방법, 디바이스 제조 방법, 그리고 발액 플레이트
US8373843B2 (en) * 2004-06-10 2013-02-12 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8508713B2 (en) * 2004-06-10 2013-08-13 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8717533B2 (en) * 2004-06-10 2014-05-06 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
SG153820A1 (en) * 2004-06-10 2009-07-29 Nikon Corp Exposure apparatus, exposure method, and device producing method
KR101556454B1 (ko) 2004-06-10 2015-10-13 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
KR101245070B1 (ko) 2004-06-21 2013-03-18 가부시키가이샤 니콘 노광 장치 및 그 부재의 세정 방법, 노광 장치의 메인터넌스 방법, 메인터넌스 기기, 그리고 디바이스 제조 방법
US8698998B2 (en) * 2004-06-21 2014-04-15 Nikon Corporation Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
JPWO2006001282A1 (ja) * 2004-06-25 2008-04-17 株式会社ニコン 位置決め装置、位置決め方法、露光装置、露光方法、及びデバイスの製造方法
US7116403B2 (en) * 2004-06-28 2006-10-03 Asml Netherlands B.V Lithographic apparatus and device manufacturing method
US8384874B2 (en) 2004-07-12 2013-02-26 Nikon Corporation Immersion exposure apparatus and device manufacturing method to detect if liquid on base member
WO2006006730A1 (ja) * 2004-07-15 2006-01-19 Nikon Corporation 平面モータ装置、ステージ装置、露光装置及びデバイスの製造方法
JP4677987B2 (ja) * 2004-07-21 2011-04-27 株式会社ニコン 露光方法及びデバイス製造方法
WO2006009254A1 (ja) * 2004-07-23 2006-01-26 Nikon Corporation 支持装置、ステージ装置、露光装置、及びデバイスの製造方法
US7227613B2 (en) * 2004-07-26 2007-06-05 Asml Holding N.V. Lithographic apparatus having double telecentric illumination
EP1791164B2 (de) 2004-08-03 2014-08-20 Nikon Corporation Belichtungsgeräte, belichtungsverfahren und bauelemente-herstellungsverfahren
TWI610340B (zh) * 2004-09-17 2018-01-01 尼康股份有限公司 曝光裝置、曝光方法及元件製造方法
CN101015039B (zh) * 2004-09-17 2010-09-01 尼康股份有限公司 曝光用基板、曝光方法及元件制造方法
JP4625673B2 (ja) 2004-10-15 2011-02-02 株式会社東芝 露光方法及び露光装置
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EP1814146A4 (de) * 2004-11-19 2009-02-11 Nikon Corp Aufrechterhaltungsverfahren, belichtungsverfahren, belichtungsvorrichtung und bauelemente-herstellungsverfahren
WO2006059636A1 (ja) * 2004-12-02 2006-06-08 Nikon Corporation 露光装置及びデバイス製造方法
US7277158B2 (en) * 2004-12-02 2007-10-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4752473B2 (ja) * 2004-12-09 2011-08-17 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
KR101411123B1 (ko) 2004-12-15 2014-06-25 가부시키가이샤 니콘 기판 유지 장치, 노광 장치 및 디바이스 제조방법
US7567368B2 (en) * 2005-01-06 2009-07-28 Asml Holding N.V. Systems and methods for minimizing scattered light in multi-SLM maskless lithography
US7557529B2 (en) * 2005-01-11 2009-07-07 Nikon Corporation Stage unit and exposure apparatus
US7450217B2 (en) * 2005-01-12 2008-11-11 Asml Netherlands B.V. Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
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US8692973B2 (en) * 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
US20070258068A1 (en) * 2005-02-17 2007-11-08 Hiroto Horikawa Exposure Apparatus, Exposure Method, and Device Fabricating Method
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US8638422B2 (en) * 2005-03-18 2014-01-28 Nikon Corporation Exposure method, exposure apparatus, method for producing device, and method for evaluating exposure apparatus
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US20070132976A1 (en) * 2005-03-31 2007-06-14 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US20090047607A1 (en) * 2005-03-31 2009-02-19 Hiroyuki Nagasaka Exposure method, exposure apparatus and device fabricating methods
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WO2007145139A1 (ja) 2006-06-16 2007-12-21 Nikon Corporation 可変スリット装置、照明装置、露光装置、露光方法及びデバイス製造方法
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WO2008108253A2 (en) * 2007-02-23 2008-09-12 Nikon Corporation Exposing method, exposure apparatus, device fabricating method, and substrate for immersion exposure
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WO2009060585A1 (ja) * 2007-11-07 2009-05-14 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
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WO2009075103A1 (ja) * 2007-12-11 2009-06-18 Nikon Corporation 移動体装置、露光装置及びパターン形成装置、並びにデバイス製造方法
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KR101560617B1 (ko) * 2008-09-10 2015-10-16 삼성전자주식회사 광 발생 장치 및 그 제어 방법
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US20110242520A1 (en) 2009-11-17 2011-10-06 Nikon Corporation Optical properties measurement method, exposure method and device manufacturing method
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US20110134400A1 (en) * 2009-12-04 2011-06-09 Nikon Corporation Exposure apparatus, liquid immersion member, and device manufacturing method
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WO2011081062A1 (ja) 2009-12-28 2011-07-07 株式会社ニコン 液浸部材、液浸部材の製造方法、露光装置、及びデバイス製造方法
EP2523210A1 (de) 2010-01-08 2012-11-14 Nikon Corporation Flüssigkeitsimmersionselement, belichtungsverfahren und vorrichtungsherstellungsverfahren
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EP2360481B1 (de) * 2010-02-23 2018-09-12 Neaspec GmbH Optisches Nahfeldmikroskop mit optischem Bildgebungssystem
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KR102082846B1 (ko) 2011-01-28 2020-02-28 고쿠리츠다이가쿠호우진 도쿄다이가쿠 구동 시스템과 구동 방법, 노광 장치와 노광 방법, 및 구동 시스템 설계 방법
JPWO2012115002A1 (ja) 2011-02-22 2014-07-07 株式会社ニコン 保持装置、露光装置、及びデバイスの製造方法
DE102011001785B4 (de) * 2011-04-04 2015-03-05 Jenoptik Optical Systems Gmbh Belichtungseinrichtung zur strukturierten Belichtung einer Fläche
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US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
WO2013161428A1 (ja) 2012-04-26 2013-10-31 株式会社ニコン 計測方法及びエンコーダ装置、並びに露光方法及び装置
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CN108983554A (zh) 2012-10-02 2018-12-11 株式会社尼康 曝光装置以及器件制造方法
WO2014054690A1 (ja) 2012-10-02 2014-04-10 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9772564B2 (en) 2012-11-12 2017-09-26 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method
CN104937696B (zh) 2012-11-20 2019-03-15 株式会社尼康 曝光装置、移动体装置以及器件制造方法
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
JP6119242B2 (ja) 2012-12-27 2017-04-26 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9352073B2 (en) 2013-01-22 2016-05-31 Niko Corporation Functional film
US9057955B2 (en) 2013-01-22 2015-06-16 Nikon Corporation Functional film, liquid immersion member, method of manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
JP5979302B2 (ja) 2013-02-28 2016-08-24 株式会社ニコン 摺動膜、摺動膜が形成された部材、及びその製造方法
EP4194953A1 (de) 2013-06-28 2023-06-14 Nikon Corporation Mobilkörpervorrichtung, belichtungsvorrichtung und vorrichtungsherstellungsverfahren
WO2015034005A1 (ja) 2013-09-04 2015-03-12 Ckd株式会社 電磁アクチュエータ用電機子コイル、電磁アクチュエータ、露光装置、及びデバイス製造方法
WO2015044182A2 (en) * 2013-09-25 2015-04-02 Asml Netherlands B.V. Beam delivery apparatus and method
CN105229774B (zh) 2013-10-08 2019-01-11 株式会社尼康 液浸部件、曝光装置及曝光方法、以及器件制造方法
KR102022785B1 (ko) 2014-12-24 2019-09-18 가부시키가이샤 니콘 계측 장치 및 계측 방법, 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
CN113093484B (zh) 2014-12-24 2023-12-19 株式会社尼康 测量系统、测量方法及曝光装置
HK1250263A1 (en) 2015-03-25 2018-12-07 Nikon Corporation Layout method, mark detection method, light exposure method, measurement apparatus, light exposure apparatus, and method for manufacturing device
DE102015224522B4 (de) * 2015-12-08 2018-06-21 Carl Zeiss Smt Gmbh Beleuchtungssystem einer mikrolithographischen Projektionsanlage und Verfahren zum Betreiben eines solchen Systems
JP6193963B2 (ja) * 2015-12-18 2017-09-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置においてマスクを照明するための照明システム
US10212785B2 (en) 2016-06-13 2019-02-19 Google Llc Staggered array of individually addressable light-emitting elements for sweeping out an angular range
US9909862B2 (en) 2016-06-13 2018-03-06 Google Llc Curved array of light-emitting elements for sweeping out an angular range
US10069996B2 (en) * 2016-09-15 2018-09-04 Xerox Corporation System and method for utilizing digital micromirror devices to split and recombine a signal image to enable heat dissipation
JP7081490B2 (ja) 2016-09-27 2022-06-07 株式会社ニコン レイアウト情報提供方法、レイアウト情報、決定方法、プログラム、並びに情報記録媒体
JP6827785B2 (ja) 2016-11-30 2021-02-10 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
TWI854195B (zh) * 2018-09-18 2024-09-01 荷蘭商Ａｓｍｌ荷蘭公司 用於偵測快速充電裝置中時間相依缺陷的設備及方法
JP7563497B2 (ja) 2021-01-29 2024-10-08 株式会社ニコン 露光装置

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS597359A (ja) * 1982-07-02 1984-01-14 Canon Inc 照明装置
US5523193A (en) * 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
DE3831743A1 (de) * 1988-09-17 1990-03-29 Philips Patentverwaltung Vorrichtung zur bearbeitung eines werkstueckes mit laserlicht und verwendung dieser vorrichtung
JP2732498B2 (ja) * 1988-11-24 1998-03-30 株式会社日立製作所 縮小投影式露光方法及びその装置
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
ATE123885T1 (de) * 1990-05-02 1995-06-15 Fraunhofer Ges Forschung Belichtungsvorrichtung.
KR0165548B1 (ko) * 1991-07-20 1999-01-15 도바 다다스 아미노산, 핵산 또는 이들의 유도체의 정제 방법
US5229872A (en) * 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
US5475416A (en) 1992-06-03 1995-12-12 Eastman Kodak Company Printing system for printing an image with lasers emitting diverging laser beams
KR0165701B1 (ko) * 1993-06-29 1999-02-01 미타라이 하지메 조명장치 및 동장치를 사용하는 노광장치
US5674414A (en) 1994-11-11 1997-10-07 Carl-Zeiss Stiftung Method and apparatus of irradiating a surface of a workpiece with a plurality of beams
JP4075966B2 (ja) * 1996-03-06 2008-04-16 エーエスエムエル ネザーランズ ビー．ブイ． 差分干渉計システム及びこのシステムを具えたリソグラフステップアンドスキャン装置
DE19707834A1 (de) * 1996-04-09 1997-10-16 Zeiss Carl Fa Materialbestrahlungsgerät und Verfahren zum Betrieb von Materialbestrahlungsgeräten
US5691541A (en) * 1996-05-14 1997-11-25 The Regents Of The University Of California Maskless, reticle-free, lithography
JP3689490B2 (ja) * 1996-06-07 2005-08-31 キヤノン株式会社 ノズル部材の製造方法及びそれを用いた加工装置
KR100512450B1 (ko) * 1996-12-24 2006-01-27 에이에스엠엘 네델란즈 비.브이. 두개의물체홀더를가진이차원적으로안정화된위치설정장치와이런위치설정장치를구비한리소그래픽장치
ATE216091T1 (de) 1997-01-29 2002-04-15 Micronic Laser Systems Ab Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
JP3626504B2 (ja) 1997-03-10 2005-03-09 アーエスエム リソグラフィ ベスローテン フェンノートシャップ ２個の物品ホルダを有する位置決め装置
US6233039B1 (en) * 1997-06-05 2001-05-15 Texas Instruments Incorporated Optical illumination system and associated exposure apparatus
JP4238390B2 (ja) 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
EP1111473A3 (de) * 1999-12-23 2004-04-21 ASML Netherlands B.V. Lithographischer Apparat mit Vakuumkammer und interferometrischem Ausrichtungssystem
US6509955B2 (en) * 2000-05-25 2003-01-21 Ball Semiconductor, Inc. Lens system for maskless photolithography
GB0030444D0 (en) 2000-12-14 2001-01-24 Secr Defence Printing by active tiling
JP4113495B2 (ja) 2001-06-13 2008-07-09 オーボテック リミテッド マルチビーム微細機械加工システム及び方法
JP4728536B2 (ja) * 2001-07-05 2011-07-20 株式会社オーク製作所 多重露光描画方法及び多重露光描画装置
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
US6567217B1 (en) * 2001-11-06 2003-05-20 Eastman Kodak Company Image-forming system with enhanced gray levels

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