DE3787296T2 - Negativ arbeitende Photolack-Zusammensetzung und Verfahren zur Herstellung von thermisch stabilen negativen Bildern damit. - Google Patents

Negativ arbeitende Photolack-Zusammensetzung und Verfahren zur Herstellung von thermisch stabilen negativen Bildern damit.

Info

Publication number
DE3787296T2
DE3787296T2 DE87300219T DE3787296T DE3787296T2 DE 3787296 T2 DE3787296 T2 DE 3787296T2 DE 87300219 T DE87300219 T DE 87300219T DE 3787296 T DE3787296 T DE 3787296T DE 3787296 T2 DE3787296 T2 DE 3787296T2
Authority
DE
Germany
Prior art keywords
bis
chlorophenyl
coating
wavelength
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE87300219T
Other languages
German (de)
English (en)
Other versions
DE3787296D1 (de
Inventor
Wayne Edmund Feely
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Co
Original Assignee
Rohm and Haas Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm and Haas Co filed Critical Rohm and Haas Co
Application granted granted Critical
Publication of DE3787296D1 publication Critical patent/DE3787296D1/de
Publication of DE3787296T2 publication Critical patent/DE3787296T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Secondary Cells (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
DE87300219T 1986-01-13 1987-01-12 Negativ arbeitende Photolack-Zusammensetzung und Verfahren zur Herstellung von thermisch stabilen negativen Bildern damit. Expired - Lifetime DE3787296T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US81843086A 1986-01-13 1986-01-13

Publications (2)

Publication Number Publication Date
DE3787296D1 DE3787296D1 (de) 1993-10-14
DE3787296T2 true DE3787296T2 (de) 1994-03-31

Family

ID=25225519

Family Applications (1)

Application Number Title Priority Date Filing Date
DE87300219T Expired - Lifetime DE3787296T2 (de) 1986-01-13 1987-01-12 Negativ arbeitende Photolack-Zusammensetzung und Verfahren zur Herstellung von thermisch stabilen negativen Bildern damit.

Country Status (19)

Country Link
EP (1) EP0232972B1 (OSRAM)
JP (2) JPH083635B2 (OSRAM)
KR (1) KR950000484B1 (OSRAM)
CN (1) CN1036489C (OSRAM)
AT (1) ATE94295T1 (OSRAM)
AU (1) AU593880B2 (OSRAM)
BR (1) BR8700092A (OSRAM)
CA (1) CA1307695C (OSRAM)
DE (1) DE3787296T2 (OSRAM)
DK (1) DK14087A (OSRAM)
FI (1) FI870104L (OSRAM)
HK (1) HK143493A (OSRAM)
IL (1) IL81229A (OSRAM)
IN (1) IN167612B (OSRAM)
MX (1) MX167803B (OSRAM)
MY (1) MY103315A (OSRAM)
NO (1) NO870119L (OSRAM)
PH (1) PH27327A (OSRAM)
ZA (1) ZA87199B (OSRAM)

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JP2538118B2 (ja) * 1990-09-28 1996-09-25 東京応化工業株式会社 ネガ型放射線感応性レジスト組成物
JP3006873B2 (ja) * 1990-11-14 2000-02-07 大日本印刷株式会社 Ｐｓ版用またはホログラム記録材料用光硬化性組成物
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DE4112974A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4112965A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4112972A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
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JP6764636B2 (ja) 2014-10-08 2020-10-07 東京応化工業株式会社 感放射線性樹脂組成物、パターン製造方法、透明絶縁膜、及び表示装置

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NO870119D0 (no) 1987-01-13
JPH083635B2 (ja) 1996-01-17
ATE94295T1 (de) 1993-09-15
EP0232972A2 (en) 1987-08-19
KR870007449A (ko) 1987-08-19
MX167803B (es) 1993-04-12
AU593880B2 (en) 1990-02-22
FI870104A7 (fi) 1987-07-14
JP2000131842A (ja) 2000-05-12
AU6752887A (en) 1987-07-16
EP0232972A3 (en) 1988-12-21
CN1036489C (zh) 1997-11-19
BR8700092A (pt) 1987-12-01
FI870104A0 (fi) 1987-01-12
IL81229A0 (en) 1987-08-31
IN167612B (OSRAM) 1990-11-24
DK14087A (da) 1987-07-14
MY103315A (en) 1993-05-29
DE3787296D1 (de) 1993-10-14
IL81229A (en) 1991-03-10
CA1307695C (en) 1992-09-22
PH27327A (en) 1993-06-08
JP3320676B2 (ja) 2002-09-03
FI870104L (fi) 1987-07-14
JPS62164045A (ja) 1987-07-20
HK143493A (en) 1994-01-07
EP0232972B1 (en) 1993-09-08
DK14087D0 (da) 1987-01-12
CN87100185A (zh) 1987-09-23
KR950000484B1 (ko) 1995-01-20
ZA87199B (en) 1988-09-28
NO870119L (no) 1987-07-14

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