AU593880B2 - Negative photoresist compositions and processes for preparing thermally stable, negative images using them - Google Patents

Negative photoresist compositions and processes for preparing thermally stable, negative images using them Download PDF

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Publication number
AU593880B2
AU593880B2 AU67528/87A AU6752887A AU593880B2 AU 593880 B2 AU593880 B2 AU 593880B2 AU 67528/87 A AU67528/87 A AU 67528/87A AU 6752887 A AU6752887 A AU 6752887A AU 593880 B2 AU593880 B2 AU 593880B2
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AU
Australia
Prior art keywords
nov
acid
bis
negative
hardening resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU67528/87A
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English (en)
Other versions
AU6752887A (en
Inventor
Wayne Edmund Feely
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Co
Original Assignee
Rohm and Haas Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm and Haas Co filed Critical Rohm and Haas Co
Publication of AU6752887A publication Critical patent/AU6752887A/en
Application granted granted Critical
Publication of AU593880B2 publication Critical patent/AU593880B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Secondary Cells (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polymerisation Methods In General (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
AU67528/87A 1986-01-13 1987-01-13 Negative photoresist compositions and processes for preparing thermally stable, negative images using them Ceased AU593880B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US81843086A 1986-01-13 1986-01-13
US818430 1986-01-13

Publications (2)

Publication Number Publication Date
AU6752887A AU6752887A (en) 1987-07-16
AU593880B2 true AU593880B2 (en) 1990-02-22

Family

ID=25225519

Family Applications (1)

Application Number Title Priority Date Filing Date
AU67528/87A Ceased AU593880B2 (en) 1986-01-13 1987-01-13 Negative photoresist compositions and processes for preparing thermally stable, negative images using them

Country Status (19)

Country Link
EP (1) EP0232972B1 (OSRAM)
JP (2) JPH083635B2 (OSRAM)
KR (1) KR950000484B1 (OSRAM)
CN (1) CN1036489C (OSRAM)
AT (1) ATE94295T1 (OSRAM)
AU (1) AU593880B2 (OSRAM)
BR (1) BR8700092A (OSRAM)
CA (1) CA1307695C (OSRAM)
DE (1) DE3787296T2 (OSRAM)
DK (1) DK14087A (OSRAM)
FI (1) FI870104L (OSRAM)
HK (1) HK143493A (OSRAM)
IL (1) IL81229A (OSRAM)
IN (1) IN167612B (OSRAM)
MX (1) MX167803B (OSRAM)
MY (1) MY103315A (OSRAM)
NO (1) NO870119L (OSRAM)
PH (1) PH27327A (OSRAM)
ZA (1) ZA87199B (OSRAM)

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JP3006873B2 (ja) * 1990-11-14 2000-02-07 大日本印刷株式会社 Ｐｓ版用またはホログラム記録材料用光硬化性組成物
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DE4112965A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4112968A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Saeurespaltbare verbindungen, diese enthaltendes positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
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KR950000484B1 (ko) 1995-01-20
JP3320676B2 (ja) 2002-09-03
DE3787296T2 (de) 1994-03-31
NO870119L (no) 1987-07-14
KR870007449A (ko) 1987-08-19
BR8700092A (pt) 1987-12-01
IL81229A0 (en) 1987-08-31
PH27327A (en) 1993-06-08
ATE94295T1 (de) 1993-09-15
DK14087A (da) 1987-07-14
EP0232972B1 (en) 1993-09-08
IL81229A (en) 1991-03-10
JPH083635B2 (ja) 1996-01-17
FI870104A0 (fi) 1987-01-12
DE3787296D1 (de) 1993-10-14
ZA87199B (en) 1988-09-28
EP0232972A2 (en) 1987-08-19
FI870104A7 (fi) 1987-07-14
CN87100185A (zh) 1987-09-23
IN167612B (OSRAM) 1990-11-24
EP0232972A3 (en) 1988-12-21
MX167803B (es) 1993-04-12
NO870119D0 (no) 1987-01-13
DK14087D0 (da) 1987-01-12
CN1036489C (zh) 1997-11-19
JP2000131842A (ja) 2000-05-12
CA1307695C (en) 1992-09-22
JPS62164045A (ja) 1987-07-20
FI870104L (fi) 1987-07-14
HK143493A (en) 1994-01-07
AU6752887A (en) 1987-07-16
MY103315A (en) 1993-05-29

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