FI870104L - Negativa, fotoelektriskt resistenta kompositioner och foerfaranden foer framstaellning av vaermestabila negativbilder genom att anvaenda dem. - Google Patents

Negativa, fotoelektriskt resistenta kompositioner och foerfaranden foer framstaellning av vaermestabila negativbilder genom att anvaenda dem. Download PDF

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Publication number
FI870104L
FI870104L FI870104A FI870104A FI870104L FI 870104 L FI870104 L FI 870104L FI 870104 A FI870104 A FI 870104A FI 870104 A FI870104 A FI 870104A FI 870104 L FI870104 L FI 870104L
Authority
FI
Finland
Prior art keywords
vaermestabila
resistenta
negativbilder
fotoelektriskt
negativa
Prior art date
Application number
FI870104A
Other languages
English (en)
Finnish (fi)
Other versions
FI870104A0 (fi
FI870104A7 (fi
Inventor
Wayne E Feely
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of FI870104A0 publication Critical patent/FI870104A0/fi
Publication of FI870104A7 publication Critical patent/FI870104A7/fi
Publication of FI870104L publication Critical patent/FI870104L/fi

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Secondary Cells (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polymerisation Methods In General (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
FI870104A 1986-01-13 1987-01-12 Negativa, fotoelektriskt resistenta kompositioner och foerfaranden foer framstaellning av vaermestabila negativbilder genom att anvaenda dem. FI870104L (fi)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US81843086A 1986-01-13 1986-01-13

Publications (3)

Publication Number Publication Date
FI870104A0 FI870104A0 (fi) 1987-01-12
FI870104A7 FI870104A7 (fi) 1987-07-14
FI870104L true FI870104L (fi) 1987-07-14

Family

ID=25225519

Family Applications (1)

Application Number Title Priority Date Filing Date
FI870104A FI870104L (fi) 1986-01-13 1987-01-12 Negativa, fotoelektriskt resistenta kompositioner och foerfaranden foer framstaellning av vaermestabila negativbilder genom att anvaenda dem.

Country Status (19)

Country Link
EP (1) EP0232972B1 (OSRAM)
JP (2) JPH083635B2 (OSRAM)
KR (1) KR950000484B1 (OSRAM)
CN (1) CN1036489C (OSRAM)
AT (1) ATE94295T1 (OSRAM)
AU (1) AU593880B2 (OSRAM)
BR (1) BR8700092A (OSRAM)
CA (1) CA1307695C (OSRAM)
DE (1) DE3787296T2 (OSRAM)
DK (1) DK14087A (OSRAM)
FI (1) FI870104L (OSRAM)
HK (1) HK143493A (OSRAM)
IL (1) IL81229A (OSRAM)
IN (1) IN167612B (OSRAM)
MX (1) MX167803B (OSRAM)
MY (1) MY103315A (OSRAM)
NO (1) NO870119L (OSRAM)
PH (1) PH27327A (OSRAM)
ZA (1) ZA87199B (OSRAM)

Families Citing this family (108)

* Cited by examiner, † Cited by third party
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JP3006873B2 (ja) * 1990-11-14 2000-02-07 大日本印刷株式会社 Ｐｓ版用またはホログラム記録材料用光硬化性組成物
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DE4112968A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Saeurespaltbare verbindungen, diese enthaltendes positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
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US9410016B2 (en) 2013-07-16 2016-08-09 Dow Global Technologies Llc Aromatic polyacetals and articles comprising them
US9182669B2 (en) 2013-12-19 2015-11-10 Rohm And Haas Electronic Materials Llc Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device
JP6764636B2 (ja) 2014-10-08 2020-10-07 東京応化工業株式会社 感放射線性樹脂組成物、パターン製造方法、透明絶縁膜、及び表示装置

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AU593880B2 (en) 1990-02-22
KR950000484B1 (ko) 1995-01-20
JP3320676B2 (ja) 2002-09-03
DE3787296T2 (de) 1994-03-31
NO870119L (no) 1987-07-14
KR870007449A (ko) 1987-08-19
BR8700092A (pt) 1987-12-01
IL81229A0 (en) 1987-08-31
PH27327A (en) 1993-06-08
ATE94295T1 (de) 1993-09-15
DK14087A (da) 1987-07-14
EP0232972B1 (en) 1993-09-08
IL81229A (en) 1991-03-10
JPH083635B2 (ja) 1996-01-17
FI870104A0 (fi) 1987-01-12
DE3787296D1 (de) 1993-10-14
ZA87199B (en) 1988-09-28
EP0232972A2 (en) 1987-08-19
FI870104A7 (fi) 1987-07-14
CN87100185A (zh) 1987-09-23
IN167612B (OSRAM) 1990-11-24
EP0232972A3 (en) 1988-12-21
MX167803B (es) 1993-04-12
NO870119D0 (no) 1987-01-13
DK14087D0 (da) 1987-01-12
CN1036489C (zh) 1997-11-19
JP2000131842A (ja) 2000-05-12
CA1307695C (en) 1992-09-22
JPS62164045A (ja) 1987-07-20
HK143493A (en) 1994-01-07
AU6752887A (en) 1987-07-16
MY103315A (en) 1993-05-29

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