DK14087D0 - Negativ fotoresistsammens tning og fremgangsmaade til fremstilling af termisk stabile, negative billeder under anvendelse af sammens tningen - Google Patents

Negativ fotoresistsammens tning og fremgangsmaade til fremstilling af termisk stabile, negative billeder under anvendelse af sammens tningen

Info

Publication number
DK14087D0
DK14087D0 DK014087A DK14087A DK14087D0 DK 14087 D0 DK14087 D0 DK 14087D0 DK 014087 A DK014087 A DK 014087A DK 14087 A DK14087 A DK 14087A DK 14087 D0 DK14087 D0 DK 14087D0
Authority
DK
Denmark
Prior art keywords
thermally stable
negative
images
same thing
negative photoresist
Prior art date
Application number
DK014087A
Other languages
English (en)
Other versions
DK14087A (da
Inventor
Wayne E Feely
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of DK14087D0 publication Critical patent/DK14087D0/da
Publication of DK14087A publication Critical patent/DK14087A/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Secondary Cells (AREA)
  • Polymerisation Methods In General (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
DK014087A 1986-01-13 1987-01-12 Negativ fotoresistsammensaetning og fremgangsmaade til fremstilling af termisk stabile, negative billeder under anvendelse af sammensaetningen DK14087A (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US81843086A 1986-01-13 1986-01-13

Publications (2)

Publication Number Publication Date
DK14087D0 true DK14087D0 (da) 1987-01-12
DK14087A DK14087A (da) 1987-07-14

Family

ID=25225519

Family Applications (1)

Application Number Title Priority Date Filing Date
DK014087A DK14087A (da) 1986-01-13 1987-01-12 Negativ fotoresistsammensaetning og fremgangsmaade til fremstilling af termisk stabile, negative billeder under anvendelse af sammensaetningen

Country Status (19)

Country Link
EP (1) EP0232972B1 (da)
JP (2) JPH083635B2 (da)
KR (1) KR950000484B1 (da)
CN (1) CN1036489C (da)
AT (1) ATE94295T1 (da)
AU (1) AU593880B2 (da)
BR (1) BR8700092A (da)
CA (1) CA1307695C (da)
DE (1) DE3787296T2 (da)
DK (1) DK14087A (da)
FI (1) FI870104A (da)
HK (1) HK143493A (da)
IL (1) IL81229A (da)
IN (1) IN167612B (da)
MX (1) MX167803B (da)
MY (1) MY103315A (da)
NO (1) NO870119L (da)
PH (1) PH27327A (da)
ZA (1) ZA87199B (da)

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JP3006873B2 (ja) * 1990-11-14 2000-02-07 大日本印刷株式会社 Ｐｓ版用またはホログラム記録材料用光硬化性組成物
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DE4112968A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Saeurespaltbare verbindungen, diese enthaltendes positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4112972A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
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JP6764636B2 (ja) 2014-10-08 2020-10-07 東京応化工業株式会社 感放射線性樹脂組成物、パターン製造方法、透明絶縁膜、及び表示装置

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DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
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Also Published As

Publication number Publication date
ZA87199B (en) 1988-09-28
FI870104A (fi) 1987-07-14
FI870104A0 (fi) 1987-01-12
IL81229A (en) 1991-03-10
AU593880B2 (en) 1990-02-22
ATE94295T1 (de) 1993-09-15
HK143493A (en) 1994-01-07
EP0232972A2 (en) 1987-08-19
JPS62164045A (ja) 1987-07-20
MY103315A (en) 1993-05-29
IN167612B (da) 1990-11-24
DE3787296D1 (de) 1993-10-14
NO870119L (no) 1987-07-14
JPH083635B2 (ja) 1996-01-17
MX167803B (es) 1993-04-12
KR950000484B1 (ko) 1995-01-20
KR870007449A (ko) 1987-08-19
CN87100185A (zh) 1987-09-23
PH27327A (en) 1993-06-08
DK14087A (da) 1987-07-14
NO870119D0 (no) 1987-01-13
EP0232972B1 (en) 1993-09-08
DE3787296T2 (de) 1994-03-31
CA1307695C (en) 1992-09-22
JP3320676B2 (ja) 2002-09-03
IL81229A0 (en) 1987-08-31
CN1036489C (zh) 1997-11-19
AU6752887A (en) 1987-07-16
BR8700092A (pt) 1987-12-01
JP2000131842A (ja) 2000-05-12
EP0232972A3 (en) 1988-12-21

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