DE69504210T2 - Isolierung von novolakharzen durch wasserdampfdestillation bei niedrigen temperaturen mit zwangzufuhr unterhalb der oberfläche - Google Patents
Isolierung von novolakharzen durch wasserdampfdestillation bei niedrigen temperaturen mit zwangzufuhr unterhalb der oberflächeInfo
- Publication number
- DE69504210T2 DE69504210T2 DE69504210T DE69504210T DE69504210T2 DE 69504210 T2 DE69504210 T2 DE 69504210T2 DE 69504210 T DE69504210 T DE 69504210T DE 69504210 T DE69504210 T DE 69504210T DE 69504210 T2 DE69504210 T2 DE 69504210T2
- Authority
- DE
- Germany
- Prior art keywords
- isolation
- low temperatures
- novolac resin
- steam distillation
- forced under
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- C08G8/12—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with monohydric phenols having only one hydrocarbon substituent ortho on para to the OH group, e.g. p-tert.-butyl phenol
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- C08G8/24—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with mixtures of two or more phenols which are not covered by only one of the groups C08G8/10 - C08G8/20
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
- C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
- C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/366,634 US5750632A (en) | 1994-12-30 | 1994-12-30 | Isolation of novolak resin by low temperature sub surface forced steam distillation |
PCT/US1995/016786 WO1996021211A1 (en) | 1994-12-30 | 1995-12-21 | Isolation of novolak resin by low temperature sub-surface forced steam distillation |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69504210D1 DE69504210D1 (de) | 1998-09-24 |
DE69504210T2 true DE69504210T2 (de) | 1999-04-22 |
Family
ID=23443859
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69504210T Expired - Fee Related DE69504210T2 (de) | 1994-12-30 | 1995-12-21 | Isolierung von novolakharzen durch wasserdampfdestillation bei niedrigen temperaturen mit zwangzufuhr unterhalb der oberfläche |
Country Status (7)
Country | Link |
---|---|
US (2) | US5750632A (de) |
EP (1) | EP0800542B1 (de) |
JP (1) | JPH10512905A (de) |
KR (1) | KR100381288B1 (de) |
CN (2) | CN1085681C (de) |
DE (1) | DE69504210T2 (de) |
WO (1) | WO1996021211A1 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW442710B (en) * | 1995-12-07 | 2001-06-23 | Clariant Finance Bvi Ltd | Isolation of novolak resin without high temperature distillation and photoresist composition therefrom |
US5665517A (en) * | 1996-01-11 | 1997-09-09 | Hoechst Celanese Corporation | Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom |
US5910559A (en) * | 1996-12-18 | 1999-06-08 | Clariant Finance (Bvi) Limited | Fractionated novolak resin from cresol-formaldehyde reaction mixture and photoresist composition therefrom |
TW475099B (en) * | 1996-12-18 | 2002-02-01 | Hoechst Celanese Corp | Isolation of novolak resin without high temperature distillation and photoresist composition therefrom |
US5853954A (en) * | 1996-12-18 | 1998-12-29 | Clariant Finance (Bvi) Limited | Fractionated novolak resin and photoresist composition therefrom |
US5928836A (en) * | 1997-09-29 | 1999-07-27 | Clariant Finance (Bvi) Limited | Fractionated novolak resin copolymer and photoresist composition therefrom |
US6045966A (en) * | 1997-12-15 | 2000-04-04 | Clariant Finance (Bvi) Limited | Fractionated novolak resin and photoresist composition therefrom |
US6121412A (en) * | 1998-11-12 | 2000-09-19 | Clariant Finance (Bvi) Limited | Preparation of fractionated novolak resins by a novel extraction technique |
US6297352B1 (en) * | 1998-11-12 | 2001-10-02 | Clariant Finance (Bvi) Limited | Method of reducing metal ion content of film-forming resins using a liquid/liquid centrifuge |
KR100594815B1 (ko) * | 1999-12-24 | 2006-07-03 | 삼성전자주식회사 | 포토레지스트 린스용 씬너 및 이를 이용한 포토레지스트막의 처리 방법 |
KR100571721B1 (ko) * | 2004-02-10 | 2006-04-17 | 삼성전자주식회사 | 신너 조성물 및 이를 이용한 포토레지스트의 제거 방법 |
KR101097908B1 (ko) * | 2004-12-09 | 2011-12-23 | 주식회사 이엔에프테크놀로지 | 세정액 조성물 및 이의 제조방법 |
JP2016190968A (ja) * | 2015-03-31 | 2016-11-10 | 住友ベークライト株式会社 | 摩擦材用レゾール型フェノール樹脂、その製造方法、摩擦材用接着剤及び湿式摩擦板 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5884814A (ja) * | 1981-11-17 | 1983-05-21 | Dainippon Ink & Chem Inc | ノボラツク型フエノ−ル系樹脂の製造法 |
EP0385408B1 (de) * | 1989-02-27 | 1997-02-05 | Fuji Photo Film Co., Ltd. | Lichtempfindliches photographisches Farbdiffusionsübertragungsmaterial |
JP3063148B2 (ja) * | 1989-12-27 | 2000-07-12 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
TW202504B (de) * | 1990-02-23 | 1993-03-21 | Sumitomo Chemical Co | |
JPH05239166A (ja) * | 1991-08-22 | 1993-09-17 | Hoechst Celanese Corp | 高いガラス転位点と高い光感度を有するフォトレジスト用ノボラック樹脂組成物 |
US5374693A (en) * | 1992-12-29 | 1994-12-20 | Hoechst Celanese Corporation | Novolak resin blends for photoresist applications |
-
1994
- 1994-12-30 US US08/366,634 patent/US5750632A/en not_active Expired - Fee Related
-
1995
- 1995-12-21 WO PCT/US1995/016786 patent/WO1996021211A1/en active IP Right Grant
- 1995-12-21 DE DE69504210T patent/DE69504210T2/de not_active Expired - Fee Related
- 1995-12-21 KR KR1019970704384A patent/KR100381288B1/ko not_active IP Right Cessation
- 1995-12-21 CN CN95197186A patent/CN1085681C/zh not_active Expired - Fee Related
- 1995-12-21 JP JP8521105A patent/JPH10512905A/ja active Pending
- 1995-12-21 EP EP95944652A patent/EP0800542B1/de not_active Expired - Lifetime
- 1995-12-21 CN CNB011163429A patent/CN1166710C/zh not_active Expired - Fee Related
-
1998
- 1998-04-02 US US09/053,885 patent/US6165675A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN1166710C (zh) | 2004-09-15 |
KR100381288B1 (ko) | 2003-08-19 |
WO1996021211A1 (en) | 1996-07-11 |
JPH10512905A (ja) | 1998-12-08 |
DE69504210D1 (de) | 1998-09-24 |
EP0800542A1 (de) | 1997-10-15 |
CN1085681C (zh) | 2002-05-29 |
US5750632A (en) | 1998-05-12 |
CN1171800A (zh) | 1998-01-28 |
EP0800542B1 (de) | 1998-08-19 |
CN1316444A (zh) | 2001-10-10 |
US6165675A (en) | 2000-12-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69504210T2 (de) | Isolierung von novolakharzen durch wasserdampfdestillation bei niedrigen temperaturen mit zwangzufuhr unterhalb der oberfläche | |
DE69006514D1 (de) | Muskelkontraktionsregelung durch überwachung des intramuskulären druckes. | |
EP0596622A3 (de) | Gegen hohe Temperaturen beständige Epoxidharzstrukturklebstoffzusammensetzung. | |
SE8002939L (sv) | Vermekrympbart material | |
BR7903382A (pt) | Processo para a fabricacao de uma resina novolak de fenol aldeido modificada com zinco,lama de revestimento aquosa e material de registro sensivel a pressao ou calor | |
DK318881A (da) | Ved stuetemperatur vulkaniserbar en komponent siliconegummisammensaetning samt fremgangsmaade til fremstilling af samme | |
DE69529146D1 (de) | Destillationskolonne mit innerem wärmeaustausch | |
NO913693D0 (no) | Fremgangsmaate for aa forbedre egenskapene til magnesium-legeringer med henblikk paa mikrokrymping. | |
DK325078A (da) | Fremgangsmaade til fremstilling af 5-substitueret-1,2dihydro-3h-pyrrolo (1,2a)-pyrrol-1-carboxylsyrer af deres tilsvarende nitriler | |
NO905340D0 (no) | Fremgangsmaate til fremstilling av novolakharpikser med hoey glasstemperatur. | |
IT1098917B (it) | Dispositivo di fissaggio mediante adesivo | |
ES295638Y (es) | Dispositivo para variar el caudal de la valvula de una plancha de vapor electricamente calentada. | |
DE3862960D1 (de) | Vernetzung von hitzehaertbaren harzen durch erhitzung mit gesaettigten perfluorpolyaetherdaempfen. | |
DE3881450T2 (de) | Uebertragungsdruck durch waerme. | |
DE3851899D1 (de) | Photoempfindliche Zusammensetzungen mit an der Oberfläche konzentrierten Mikrokapseln. | |
NO160056C (no) | Fremgangsmaate for binding av en klebende epoksyharpiks til metalloverflater som har en adsorbert vannforurensning. | |
DE69402565D1 (de) | Wärmetauscher mit oben durch einen Überlauf gespeistes Sekundärfluid | |
DE69100522T2 (de) | Multifunktionelles Element für die Montage von zwei durch Verschraubung blockierten Teilen. | |
ES546147A0 (es) | Plancha de vapor perfeccionada | |
AU7581881A (en) | Composite element, particularly having the form of a plate | |
NO862607D0 (no) | Fremgangsmaate for bleking av husholdningsvask. | |
Kosar | The effect of heated foundations on oil sand | |
DE3581483D1 (de) | Ausgehaertetes ungesaettigtes polyester- oder vinylesterharz mit fluorhaltigen gruppen an der oberflaeche. | |
DE59505402D1 (de) | Dampfbügeleisen mit Tropfventil | |
DE69715619D1 (de) | Inhibition der matrix metalloproteasen durch 2-(omega-aroylalkyl)-4-biaryl-4-oxobutansäuren |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: AZ ELECTRONIC MATERIALS USA CORP. (N.D.GES.D. STAA |
|
8328 | Change in the person/name/address of the agent |
Representative=s name: PATENTANWAELTE ISENBRUCK BOESL HOERSCHLER WICHMANN HU |
|
8339 | Ceased/non-payment of the annual fee |