DE69504210D1 - Isolierung von novolakharzen durch wasserdampfdestillation bei niedrigen temperaturen mit zwangzufuhr unterhalb der oberfläche - Google Patents

Isolierung von novolakharzen durch wasserdampfdestillation bei niedrigen temperaturen mit zwangzufuhr unterhalb der oberfläche

Info

Publication number
DE69504210D1
DE69504210D1 DE69504210T DE69504210T DE69504210D1 DE 69504210 D1 DE69504210 D1 DE 69504210D1 DE 69504210 T DE69504210 T DE 69504210T DE 69504210 T DE69504210 T DE 69504210T DE 69504210 D1 DE69504210 D1 DE 69504210D1
Authority
DE
Germany
Prior art keywords
isolation
low temperatures
novolac resin
steam distillation
forced under
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69504210T
Other languages
English (en)
Other versions
DE69504210T2 (de
Inventor
M Rahman
Daniel Aubin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EMD Performance Materials Corp
Original Assignee
Clariant Finance BVI Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clariant Finance BVI Ltd filed Critical Clariant Finance BVI Ltd
Application granted granted Critical
Publication of DE69504210D1 publication Critical patent/DE69504210D1/de
Publication of DE69504210T2 publication Critical patent/DE69504210T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/12—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with monohydric phenols having only one hydrocarbon substituent ortho on para to the OH group, e.g. p-tert.-butyl phenol
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/24—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with mixtures of two or more phenols which are not covered by only one of the groups C08G8/10 - C08G8/20
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
DE69504210T 1994-12-30 1995-12-21 Isolierung von novolakharzen durch wasserdampfdestillation bei niedrigen temperaturen mit zwangzufuhr unterhalb der oberfläche Expired - Fee Related DE69504210T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/366,634 US5750632A (en) 1994-12-30 1994-12-30 Isolation of novolak resin by low temperature sub surface forced steam distillation
PCT/US1995/016786 WO1996021211A1 (en) 1994-12-30 1995-12-21 Isolation of novolak resin by low temperature sub-surface forced steam distillation

Publications (2)

Publication Number Publication Date
DE69504210D1 true DE69504210D1 (de) 1998-09-24
DE69504210T2 DE69504210T2 (de) 1999-04-22

Family

ID=23443859

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69504210T Expired - Fee Related DE69504210T2 (de) 1994-12-30 1995-12-21 Isolierung von novolakharzen durch wasserdampfdestillation bei niedrigen temperaturen mit zwangzufuhr unterhalb der oberfläche

Country Status (7)

Country Link
US (2) US5750632A (de)
EP (1) EP0800542B1 (de)
JP (1) JPH10512905A (de)
KR (1) KR100381288B1 (de)
CN (2) CN1085681C (de)
DE (1) DE69504210T2 (de)
WO (1) WO1996021211A1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW442710B (en) * 1995-12-07 2001-06-23 Clariant Finance Bvi Ltd Isolation of novolak resin without high temperature distillation and photoresist composition therefrom
US5665517A (en) * 1996-01-11 1997-09-09 Hoechst Celanese Corporation Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom
US5910559A (en) * 1996-12-18 1999-06-08 Clariant Finance (Bvi) Limited Fractionated novolak resin from cresol-formaldehyde reaction mixture and photoresist composition therefrom
TW475099B (en) * 1996-12-18 2002-02-01 Hoechst Celanese Corp Isolation of novolak resin without high temperature distillation and photoresist composition therefrom
US5853954A (en) * 1996-12-18 1998-12-29 Clariant Finance (Bvi) Limited Fractionated novolak resin and photoresist composition therefrom
US5928836A (en) * 1997-09-29 1999-07-27 Clariant Finance (Bvi) Limited Fractionated novolak resin copolymer and photoresist composition therefrom
US6045966A (en) * 1997-12-15 2000-04-04 Clariant Finance (Bvi) Limited Fractionated novolak resin and photoresist composition therefrom
US6121412A (en) * 1998-11-12 2000-09-19 Clariant Finance (Bvi) Limited Preparation of fractionated novolak resins by a novel extraction technique
US6297352B1 (en) * 1998-11-12 2001-10-02 Clariant Finance (Bvi) Limited Method of reducing metal ion content of film-forming resins using a liquid/liquid centrifuge
KR100594815B1 (ko) * 1999-12-24 2006-07-03 삼성전자주식회사 포토레지스트 린스용 씬너 및 이를 이용한 포토레지스트막의 처리 방법
KR100571721B1 (ko) * 2004-02-10 2006-04-17 삼성전자주식회사 신너 조성물 및 이를 이용한 포토레지스트의 제거 방법
KR101097908B1 (ko) * 2004-12-09 2011-12-23 주식회사 이엔에프테크놀로지 세정액 조성물 및 이의 제조방법
JP2016190968A (ja) * 2015-03-31 2016-11-10 住友ベークライト株式会社 摩擦材用レゾール型フェノール樹脂、その製造方法、摩擦材用接着剤及び湿式摩擦板

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5884814A (ja) * 1981-11-17 1983-05-21 Dainippon Ink & Chem Inc ノボラツク型フエノ−ル系樹脂の製造法
EP0385408B1 (de) * 1989-02-27 1997-02-05 Fuji Photo Film Co., Ltd. Lichtempfindliches photographisches Farbdiffusionsübertragungsmaterial
JP3063148B2 (ja) * 1989-12-27 2000-07-12 住友化学工業株式会社 ポジ型レジスト組成物
TW202504B (de) * 1990-02-23 1993-03-21 Sumitomo Chemical Co
JPH05239166A (ja) * 1991-08-22 1993-09-17 Hoechst Celanese Corp 高いガラス転位点と高い光感度を有するフォトレジスト用ノボラック樹脂組成物
US5374693A (en) * 1992-12-29 1994-12-20 Hoechst Celanese Corporation Novolak resin blends for photoresist applications

Also Published As

Publication number Publication date
CN1166710C (zh) 2004-09-15
KR100381288B1 (ko) 2003-08-19
WO1996021211A1 (en) 1996-07-11
DE69504210T2 (de) 1999-04-22
JPH10512905A (ja) 1998-12-08
EP0800542A1 (de) 1997-10-15
CN1085681C (zh) 2002-05-29
US5750632A (en) 1998-05-12
CN1171800A (zh) 1998-01-28
EP0800542B1 (de) 1998-08-19
CN1316444A (zh) 2001-10-10
US6165675A (en) 2000-12-26

Similar Documents

Publication Publication Date Title
DE69504210T2 (de) Isolierung von novolakharzen durch wasserdampfdestillation bei niedrigen temperaturen mit zwangzufuhr unterhalb der oberfläche
DE69006514T3 (de) Muskelkontraktionsregelung durch überwachung des intramuskulären druckes.
EP0596622A3 (de) Gegen hohe Temperaturen beständige Epoxidharzstrukturklebstoffzusammensetzung.
SE8002939L (sv) Vermekrympbart material
BR7903382A (pt) Processo para a fabricacao de uma resina novolak de fenol aldeido modificada com zinco,lama de revestimento aquosa e material de registro sensivel a pressao ou calor
DK318881A (da) Ved stuetemperatur vulkaniserbar en komponent siliconegummisammensaetning samt fremgangsmaade til fremstilling af samme
DE69529146D1 (de) Destillationskolonne mit innerem wärmeaustausch
NO913693D0 (no) Fremgangsmaate for aa forbedre egenskapene til magnesium-legeringer med henblikk paa mikrokrymping.
DK325078A (da) Fremgangsmaade til fremstilling af 5-substitueret-1,2dihydro-3h-pyrrolo (1,2a)-pyrrol-1-carboxylsyrer af deres tilsvarende nitriler
NO905340D0 (no) Fremgangsmaate til fremstilling av novolakharpikser med hoey glasstemperatur.
IT1098917B (it) Dispositivo di fissaggio mediante adesivo
ES295638Y (es) Dispositivo para variar el caudal de la valvula de una plancha de vapor electricamente calentada.
DE3862960D1 (de) Vernetzung von hitzehaertbaren harzen durch erhitzung mit gesaettigten perfluorpolyaetherdaempfen.
DE3881450T2 (de) Uebertragungsdruck durch waerme.
DE3851899D1 (de) Photoempfindliche Zusammensetzungen mit an der Oberfläche konzentrierten Mikrokapseln.
NO160056C (no) Fremgangsmaate for binding av en klebende epoksyharpiks til metalloverflater som har en adsorbert vannforurensning.
DE69402565D1 (de) Wärmetauscher mit oben durch einen Überlauf gespeistes Sekundärfluid
DE69100522T2 (de) Multifunktionelles Element für die Montage von zwei durch Verschraubung blockierten Teilen.
ES546147A0 (es) Plancha de vapor perfeccionada
AU7581881A (en) Composite element, particularly having the form of a plate
NO862607D0 (no) Fremgangsmaate for bleking av husholdningsvask.
Kosar The effect of heated foundations on oil sand
DE3581483D1 (de) Ausgehaertetes ungesaettigtes polyester- oder vinylesterharz mit fluorhaltigen gruppen an der oberflaeche.
DE59505402D1 (de) Dampfbügeleisen mit Tropfventil
DE69715619T2 (de) Inhibition der matrix metalloproteasen durch 2-(omega-aroylalkyl)-4-biaryl-4-oxobutansäuren

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: AZ ELECTRONIC MATERIALS USA CORP. (N.D.GES.D. STAA

8328 Change in the person/name/address of the agent

Representative=s name: PATENTANWAELTE ISENBRUCK BOESL HOERSCHLER WICHMANN HU

8339 Ceased/non-payment of the annual fee