DE2559833C2 - Aromatische Oniumsalze und deren Verwendung - Google Patents
Aromatische Oniumsalze und deren VerwendungInfo
- Publication number
- DE2559833C2 DE2559833C2 DE19752559833 DE2559833A DE2559833C2 DE 2559833 C2 DE2559833 C2 DE 2559833C2 DE 19752559833 DE19752559833 DE 19752559833 DE 2559833 A DE2559833 A DE 2559833A DE 2559833 C2 DE2559833 C2 DE 2559833C2
- Authority
- DE
- Germany
- Prior art keywords
- salts
- aromatic onium
- onium salts
- parts
- aromatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000003839 salts Chemical class 0.000 title claims description 15
- 125000003118 aryl group Chemical group 0.000 title claims description 11
- -1 aromatic diazonium salts Chemical class 0.000 description 12
- 239000003822 epoxy resin Substances 0.000 description 10
- 229920000647 polyepoxide Polymers 0.000 description 10
- 239000000203 mixture Substances 0.000 description 9
- 239000000047 product Substances 0.000 description 6
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- 125000005410 aryl sulfonium group Chemical group 0.000 description 4
- 238000001723 curing Methods 0.000 description 4
- 239000012954 diazonium Substances 0.000 description 4
- 239000011669 selenium Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- QGJOPFRUJISHPQ-UHFFFAOYSA-N Carbon disulfide Chemical compound S=C=S QGJOPFRUJISHPQ-UHFFFAOYSA-N 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 2
- OECTYKWYRCHAKR-UHFFFAOYSA-N 4-vinylcyclohexene dioxide Chemical compound C1OC1C1CC2OC2CC1 OECTYKWYRCHAKR-UHFFFAOYSA-N 0.000 description 2
- 229910017008 AsF 6 Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910018286 SbF 6 Inorganic materials 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- VUBUXALTYMBEQO-UHFFFAOYSA-N 2,2,3,3,3-pentafluoro-1-phenylpropan-1-one Chemical compound FC(F)(F)C(F)(F)C(=O)C1=CC=CC=C1 VUBUXALTYMBEQO-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 101710178035 Chorismate synthase 2 Proteins 0.000 description 1
- 101710152694 Cysteine synthase 2 Proteins 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-N Propionic acid Chemical class CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- IPEWNTLWCRYSRY-UHFFFAOYSA-N [CH2]C1=CC=CO1 Chemical compound [CH2]C1=CC=CO1 IPEWNTLWCRYSRY-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000002168 alkylating agent Substances 0.000 description 1
- 229940100198 alkylating agent Drugs 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 150000003842 bromide salts Chemical class 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- HVZWVEKIQMJYIK-UHFFFAOYSA-N nitryl chloride Chemical compound [O-][N+](Cl)=O HVZWVEKIQMJYIK-UHFFFAOYSA-N 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- ORQWTLCYLDRDHK-UHFFFAOYSA-N phenylselanylbenzene Chemical compound C=1C=CC=CC=1[Se]C1=CC=CC=C1 ORQWTLCYLDRDHK-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 238000003847 radiation curing Methods 0.000 description 1
- 238000005510 radiation hardening Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- VYQVAVNKQCPAOF-UHFFFAOYSA-M triphenylselanium;chloride Chemical compound [Cl-].C1=CC=CC=C1[Se+](C=1C=CC=CC=1)C1=CC=CC=C1 VYQVAVNKQCPAOF-UHFFFAOYSA-M 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/08—Saturated oxiranes
- C08G65/10—Saturated oxiranes characterised by the catalysts used
- C08G65/105—Onium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/66—Arsenic compounds
- C07F9/68—Arsenic compounds without As—C bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/90—Antimony compounds
- C07F9/902—Compounds without antimony-carbon linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F236/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
- C08F236/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
- C08F236/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
- C08F236/14—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
- C08F236/16—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Epoxy Resins (AREA)
- Reinforced Plastic Materials (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US46637474A | 1974-05-02 | 1974-05-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2559833C2 true DE2559833C2 (de) | 1983-12-22 |
Family
ID=23851510
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19752559833 Expired DE2559833C2 (de) | 1974-05-02 | 1975-04-26 | Aromatische Oniumsalze und deren Verwendung |
| DE19752559718 Expired DE2559718C2 (de) | 1974-05-02 | 1975-04-26 | Verfahren zur kationischen Polymerisation von Epoxyharz |
| DE19752518652 Expired DE2518652C2 (de) | 1974-05-02 | 1975-04-26 | Härtbare Zusammensetzungen |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19752559718 Expired DE2559718C2 (de) | 1974-05-02 | 1975-04-26 | Verfahren zur kationischen Polymerisation von Epoxyharz |
| DE19752518652 Expired DE2518652C2 (de) | 1974-05-02 | 1975-04-26 | Härtbare Zusammensetzungen |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5214278B2 (enExample) |
| BE (1) | BE828670A (enExample) |
| DE (3) | DE2559833C2 (enExample) |
| FR (1) | FR2269551B1 (enExample) |
| GB (2) | GB1516511A (enExample) |
Families Citing this family (111)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4256828A (en) * | 1975-09-02 | 1981-03-17 | Minnesota Mining And Manufacturing Company | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
| AU517415B2 (en) * | 1976-07-09 | 1981-07-30 | General Electric Company | Curable polymer composition |
| US4108747A (en) * | 1976-07-14 | 1978-08-22 | General Electric Company | Curable compositions and method for curing such compositions |
| US4090936A (en) | 1976-10-28 | 1978-05-23 | Minnesota Mining And Manufacturing Company | Photohardenable compositions |
| US4101513A (en) * | 1977-02-02 | 1978-07-18 | Minnesota Mining And Manufacturing Company | Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof |
| US4102687A (en) * | 1977-02-14 | 1978-07-25 | General Electric Company | UV Curable composition of a thermosetting condensation resin and Group VIa onium salt |
| GB1604954A (en) * | 1977-08-05 | 1981-12-16 | Gen Electric | Photocurable compositions and method for curing |
| GB1604953A (en) * | 1977-08-05 | 1981-12-16 | Gen Electric | Photocurable compositions and method for curing |
| GB1596000A (en) * | 1977-09-14 | 1981-08-19 | Gen Electric | Heterocyclic onium salts their preparation and their use for photopolymerisable organic materials |
| US4246298A (en) * | 1979-03-14 | 1981-01-20 | American Can Company | Rapid curing of epoxy resin coating compositions by combination of photoinitiation and controlled heat application |
| US4299938A (en) * | 1979-06-19 | 1981-11-10 | Ciba-Geigy Corporation | Photopolymerizable and thermally polymerizable compositions |
| US4319974A (en) * | 1980-04-21 | 1982-03-16 | General Electric Company | UV Curable compositions and substrates treated therewith |
| JPS57125212A (en) | 1981-01-27 | 1982-08-04 | Toshiba Corp | Photo-polymerizable composition |
| US4387216A (en) | 1981-05-06 | 1983-06-07 | Ciba-Geigy Corporation | Heat-polymerizable compositions comprising epoxide resins, aromatic sulfoxonium salts, and organic oxidants |
| DE3135636A1 (de) | 1981-09-09 | 1983-03-17 | Basf Ag, 6700 Ludwigshafen | Haertbare epoxidharze |
| GB2139369B (en) * | 1983-05-06 | 1987-01-21 | Sericol Group Ltd | Photosensitive systems showing visible indication of exposure |
| JPS61190524A (ja) * | 1985-01-25 | 1986-08-25 | Asahi Denka Kogyo Kk | エネルギ−線硬化性組成物 |
| JPS61242615A (ja) * | 1985-04-18 | 1986-10-28 | Nippon Air Filter Kk | 集塵方法及びその装置 |
| JPS61261365A (ja) * | 1985-05-14 | 1986-11-19 | Nippon Oil Co Ltd | 光硬化性被覆組成物 |
| DE3604580A1 (de) * | 1986-02-14 | 1987-08-20 | Basf Ag | Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren |
| US4751138A (en) | 1986-08-11 | 1988-06-14 | Minnesota Mining And Manufacturing Company | Coated abrasive having radiation curable binder |
| US5399596A (en) * | 1988-03-03 | 1995-03-21 | Sanshin Kagaku Kogyo Co., Ltd. | Polyfluoride sulfonium compounds and polymerization initiator thereof |
| US4882201A (en) * | 1988-03-21 | 1989-11-21 | General Electric Company | Non-toxic aryl onium salts, UV curable coating compositions and food packaging use |
| US4871786A (en) * | 1988-10-03 | 1989-10-03 | Minnesota Mining And Manufacturing Company | Organic fluoride sources |
| US5047568A (en) * | 1988-11-18 | 1991-09-10 | International Business Machines Corporation | Sulfonium salts and use and preparation thereof |
| DE3902114A1 (de) * | 1989-01-25 | 1990-08-02 | Basf Ag | Strahlungsempfindliche, ethylenisch ungesaettigte, copolymerisierbare sulfoniumsalze und verfahren zu deren herstellung |
| EP0410606B1 (en) | 1989-07-12 | 1996-11-13 | Fuji Photo Film Co., Ltd. | Siloxane polymers and positive working light-sensitive compositions comprising the same |
| JPH0347573A (ja) * | 1989-07-12 | 1991-02-28 | Ishigaki Kiko Kk | 微粉体の分級方法並びにその装置 |
| DE3933420C1 (enExample) * | 1989-10-06 | 1991-03-07 | Th. Goldschmidt Ag, 4300 Essen, De | |
| JP2697937B2 (ja) * | 1989-12-15 | 1998-01-19 | キヤノン株式会社 | 活性エネルギー線硬化性樹脂組成物 |
| KR960000980B1 (ko) * | 1990-03-27 | 1996-01-15 | 가부시기가이샤 히다찌 세이사꾸쇼 | 무전해도금용 기재 접착제, 이 접착제를 사용한 프린트 회로판 및 이의 용도 |
| US5108859A (en) * | 1990-04-16 | 1992-04-28 | Eastman Kodak Company | Photoelectrographic elements and imaging method |
| DE4027438C1 (en) * | 1990-08-30 | 1991-08-29 | Th. Goldschmidt Ag, 4300 Essen, De | Cationically curable organo-polysiloxane cpd. prodn. - by reacting di:hydro:propane with an organo-polysiloxane in presence of catalyst at elevated temp. |
| DE4027437C1 (en) * | 1990-08-30 | 1991-08-29 | Th. Goldschmidt Ag, 4300 Essen, De | Cationically curable organo-polysiloxane(s) - used as coating materials for laminar supports or modifying additives for cationically curable cpds. |
| US5354590A (en) * | 1991-02-16 | 1994-10-11 | Canon Kabushiki Kaisha | Optical recording medium |
| US5166125A (en) * | 1992-02-19 | 1992-11-24 | Eastman Kodak Company | Method of forming color filter array element with patternable overcoat layer |
| US5166126A (en) * | 1992-02-19 | 1992-11-24 | Eastman Kodak Company | Color filter array element with protective overcoat layer and method of forming same |
| DE4219376A1 (de) * | 1992-06-12 | 1993-12-16 | Wacker Chemie Gmbh | Sulfoniumsalze und Verfahren zu deren Herstellung |
| GB9309275D0 (en) * | 1993-05-05 | 1993-06-16 | Smith & Nephew | Orthopaedic material |
| US5502083A (en) * | 1993-06-18 | 1996-03-26 | Nippon Kayaku Kabushiki Kaisha | Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product |
| JP3442176B2 (ja) | 1995-02-10 | 2003-09-02 | 富士写真フイルム株式会社 | 光重合性組成物 |
| EP0927726B1 (en) | 1996-09-19 | 2004-11-10 | Nippon Soda Co., Ltd. | Photocatalytic composition |
| JPH1087963A (ja) * | 1996-09-20 | 1998-04-07 | Japan Synthetic Rubber Co Ltd | 樹脂組成物および繊維質材料成形型 |
| JP3786480B2 (ja) * | 1996-10-14 | 2006-06-14 | Ｊｓｒ株式会社 | 光硬化性樹脂組成物 |
| JP3626302B2 (ja) * | 1996-12-10 | 2005-03-09 | Ｊｓｒ株式会社 | 光硬化性樹脂組成物 |
| JP3765896B2 (ja) | 1996-12-13 | 2006-04-12 | Ｊｓｒ株式会社 | 光学的立体造形用光硬化性樹脂組成物 |
| JP4130030B2 (ja) | 1999-03-09 | 2008-08-06 | 富士フイルム株式会社 | 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物 |
| FR2794126B1 (fr) * | 1999-05-26 | 2003-07-18 | Gemplus Card Int | Nouvelle composition adhesive et conductrice, procede de connexion, procede de constitution de composants electriques ou electroniques, utilisation de cette composition, element conducteur |
| JP2003073481A (ja) | 2001-09-06 | 2003-03-12 | Brother Ind Ltd | 活性エネルギー線硬化型組成物、それを含有するインク及びそのインクを使用するプリンタ |
| JP2003105077A (ja) | 2001-09-28 | 2003-04-09 | Brother Ind Ltd | 活性エネルギー線硬化型組成物、それを含有するインク及びそのインクを使用するプリンタ |
| JP4701231B2 (ja) * | 2002-02-13 | 2011-06-15 | 富士フイルム株式会社 | 電子線、ｅｕｖ又はｘ線用ネガ型レジスト組成物及びそれを用いたパターン形成方法 |
| DE60237933D1 (de) * | 2002-03-04 | 2010-11-18 | Wako Pure Chem Ind Ltd | Heterozyklenhaltiges Oniumsalz |
| EP1348727A3 (en) | 2002-03-29 | 2003-12-03 | Brother Kogyo Kabushiki Kaisha | Image-receiving layer composition and overcoat layer composition for ink-jet recording |
| JP4533639B2 (ja) * | 2003-07-22 | 2010-09-01 | 富士フイルム株式会社 | 感刺激性組成物、化合物及び該感刺激性組成物を用いたパターン形成方法 |
| JP4452572B2 (ja) | 2004-07-06 | 2010-04-21 | 富士フイルム株式会社 | 感光性組成物およびそれを用いた画像記録方法 |
| EP1701213A3 (en) | 2005-03-08 | 2006-11-22 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
| JP4474317B2 (ja) | 2005-03-31 | 2010-06-02 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| JP2006335826A (ja) | 2005-05-31 | 2006-12-14 | Fujifilm Holdings Corp | インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法 |
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Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3412046A (en) * | 1965-07-01 | 1968-11-19 | Dexter Corp | Catalyzed polyepoxide-anhydride resin systems |
-
1975
- 1975-04-16 GB GB1570175A patent/GB1516511A/en not_active Expired
- 1975-04-16 GB GB49978A patent/GB1516512A/en not_active Expired
- 1975-04-26 DE DE19752559833 patent/DE2559833C2/de not_active Expired
- 1975-04-26 DE DE19752559718 patent/DE2559718C2/de not_active Expired
- 1975-04-26 DE DE19752518652 patent/DE2518652C2/de not_active Expired
- 1975-04-30 FR FR7513519A patent/FR2269551B1/fr not_active Expired
- 1975-05-01 JP JP5211175A patent/JPS5214278B2/ja not_active Expired
- 1975-05-02 BE BE156013A patent/BE828670A/xx not_active IP Right Cessation
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3412046A (en) * | 1965-07-01 | 1968-11-19 | Dexter Corp | Catalyzed polyepoxide-anhydride resin systems |
Non-Patent Citations (3)
| Title |
|---|
| Chem.Comm., 1968, 409 * |
| J.Amer.Chem.Soc., 86, 1964, 5360/1 * |
| J.Chem.Soc.C., 1970, 1764-1784 * |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2559718A1 (de) | 1977-08-18 |
| JPS50151997A (enExample) | 1975-12-06 |
| GB1516512A (en) | 1978-07-05 |
| DE2518652A1 (de) | 1975-11-06 |
| GB1516511A (en) | 1978-07-05 |
| JPS5214278B2 (enExample) | 1977-04-20 |
| DE2518652C2 (de) | 1983-05-11 |
| BE828670A (fr) | 1975-09-01 |
| FR2269551A1 (enExample) | 1975-11-28 |
| FR2269551B1 (enExample) | 1978-09-01 |
| DE2559718C2 (de) | 1983-08-04 |
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