CN1198482C - 复合衬底、用它的薄膜发光元件及其制造方法 - Google Patents
复合衬底、用它的薄膜发光元件及其制造方法 Download PDFInfo
- Publication number
- CN1198482C CN1198482C CNB018002927A CN01800292A CN1198482C CN 1198482 C CN1198482 C CN 1198482C CN B018002927 A CNB018002927 A CN B018002927A CN 01800292 A CN01800292 A CN 01800292A CN 1198482 C CN1198482 C CN 1198482C
- Authority
- CN
- China
- Prior art keywords
- film
- substrate
- layer
- compound
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/917—Electroluminescent
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Laminated Bodies (AREA)
Abstract
Description
溶胶凝胶溶液 | 表面粗糙度(单位:μm) | 备注 | |||||
组成 | 干燥温度 | Ra | RMS | Rmax | Rx | ||
比较例1 | 无 | 0.187 | 0.240 | 2.287 | 1.671 | ||
实施例1 | Pb(Zr,Ti)O3 | 120℃ | - | - | - | - | 薄膜绝缘体层上开裂多 |
实施例2 | Pb(zr,Ti)O3 | 350℃ | - | - | - | - | 薄膜绝缘体层上开裂多 |
实施例3 | Pb(Zr,Ti)O3 | 420℃ | 0.065 | 0.086 | 1.190 | 0.562 | 元开裂 |
实施例4 | (Pb,La)(Zr,Ti)O3 | 420℃ | 0.070 | 0.101 | 1.220 | 0.595 | 无开裂 |
比介电率 | tanδ(%) | 绝缘耐压(V/μm) | 发光开始电压V | 210V时的发光辉度(cd/m2) | |
比较例1 | 19300 | 2.0 | 14 | 150 | 1050 |
实施例1 | - | - | - | - | - |
实施例2 | - | - | - | - | - |
实施例3 | 12500 | 2.4 | 13 | 165 | 1350 |
实施例4 | 10300 | 3.8 | 11 | 170 | 1300 |
Claims (7)
Applications Claiming Priority (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000029465A JP2001220217A (ja) | 2000-02-07 | 2000-02-07 | 複合基板およびこれを用いたel素子 |
JP029465/00 | 2000-02-07 | ||
JP029465/2000 | 2000-02-07 | ||
JP2000059522A JP2001250677A (ja) | 2000-03-03 | 2000-03-03 | 複合基板の製造方法、複合基板およびこれを用いた薄膜発光素子 |
JP059522/2000 | 2000-03-03 | ||
JP059521/2000 | 2000-03-03 | ||
JP059521/00 | 2000-03-03 | ||
JP2000059521A JP2001250683A (ja) | 2000-03-03 | 2000-03-03 | 複合基板、これを用いた薄膜発光素子、およびその製造方法 |
JP059522/00 | 2000-03-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1363199A CN1363199A (zh) | 2002-08-07 |
CN1198482C true CN1198482C (zh) | 2005-04-20 |
Family
ID=27342273
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB018002927A Expired - Fee Related CN1198482C (zh) | 2000-02-07 | 2001-02-06 | 复合衬底、用它的薄膜发光元件及其制造方法 |
CNB018003192A Expired - Fee Related CN1204783C (zh) | 2000-02-07 | 2001-02-06 | 复合基板的制造方法、复合基板以及使用它的el元件 |
CNB018003338A Expired - Fee Related CN1173602C (zh) | 2000-02-07 | 2001-02-06 | 复合基板以及使用它的el元件 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB018003192A Expired - Fee Related CN1204783C (zh) | 2000-02-07 | 2001-02-06 | 复合基板的制造方法、复合基板以及使用它的el元件 |
CNB018003338A Expired - Fee Related CN1173602C (zh) | 2000-02-07 | 2001-02-06 | 复合基板以及使用它的el元件 |
Country Status (7)
Country | Link |
---|---|
US (3) | US6709695B2 (zh) |
EP (3) | EP1178707A1 (zh) |
KR (3) | KR100443276B1 (zh) |
CN (3) | CN1198482C (zh) |
CA (3) | CA2366571C (zh) |
TW (1) | TW524028B (zh) |
WO (3) | WO2001060124A1 (zh) |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003001615A1 (en) * | 2001-06-25 | 2003-01-03 | Showa Denko K. K. | Light-emitting material and organic light-emitting device |
JP4748435B2 (ja) * | 2001-08-21 | 2011-08-17 | 日本電気硝子株式会社 | 積層ガラスセラミック材料及び積層ガラスセラミック焼結体 |
KR100497213B1 (ko) | 2001-10-29 | 2005-06-28 | 더 웨스타임 코퍼레이션 | 복합기판 및 이를 사용한 el패널과 그 제조방법 |
CN100589672C (zh) * | 2001-12-21 | 2010-02-10 | 伊菲雷知识产权公司 | 用于电致发光显示器的低焙烧温度的厚膜介电层 |
US6730615B2 (en) * | 2002-02-19 | 2004-05-04 | Intel Corporation | High reflector tunable stress coating, such as for a MEMS mirror |
KR100506149B1 (ko) * | 2002-07-22 | 2005-08-08 | 이충훈 | 유기발광소자의 제조 방법 |
AU2003269623A1 (en) * | 2002-09-12 | 2004-04-30 | Ifire Technology Corp. | Silicon oxynitride passivated rare earth activated thioaluminate phosphors for electroluminescent displays |
JP3829935B2 (ja) * | 2002-12-27 | 2006-10-04 | 信越化学工業株式会社 | 高耐電圧性部材 |
KR20040068772A (ko) * | 2003-01-27 | 2004-08-02 | 엘지전자 주식회사 | 플라즈마 디스플레이 패널의 유전체층과 그 제조방법 |
JP2004265740A (ja) * | 2003-02-28 | 2004-09-24 | Tdk Corp | El機能膜及びel素子 |
US7659475B2 (en) * | 2003-06-20 | 2010-02-09 | Imec | Method for backside surface passivation of solar cells and solar cells with such passivation |
JP4131218B2 (ja) * | 2003-09-17 | 2008-08-13 | セイコーエプソン株式会社 | 表示パネル、及び表示装置 |
JPWO2005031681A1 (ja) * | 2003-09-30 | 2007-11-15 | 旭硝子株式会社 | 配線付き基体形成用積層体、配線付き基体およびそれらの製造方法 |
JP4085051B2 (ja) * | 2003-12-26 | 2008-04-30 | 株式会社東芝 | 半導体装置およびその製造方法 |
US7381671B2 (en) * | 2004-02-06 | 2008-06-03 | Murata Manufacturing Co., Ltd. | Ferroelectric ceramic composition and applied ferroelectric element including same |
JP3951055B2 (ja) * | 2004-02-18 | 2007-08-01 | セイコーエプソン株式会社 | 有機エレクトロルミネッセンス装置及び電子機器 |
JP4030515B2 (ja) * | 2004-03-30 | 2008-01-09 | 本田技研工業株式会社 | 排ガス浄化触媒 |
US7815854B2 (en) * | 2004-04-30 | 2010-10-19 | Kimberly-Clark Worldwide, Inc. | Electroluminescent illumination source for optical detection systems |
US20060019265A1 (en) * | 2004-04-30 | 2006-01-26 | Kimberly-Clark Worldwide, Inc. | Transmission-based luminescent detection systems |
US7796266B2 (en) * | 2004-04-30 | 2010-09-14 | Kimberly-Clark Worldwide, Inc. | Optical detection system using electromagnetic radiation to detect presence or quantity of analyte |
US20050253510A1 (en) * | 2004-05-11 | 2005-11-17 | Shogo Nasu | Light-emitting device and display device |
JP2006164708A (ja) | 2004-12-06 | 2006-06-22 | Semiconductor Energy Lab Co Ltd | 電子機器および発光装置 |
US20070121113A1 (en) * | 2004-12-22 | 2007-05-31 | Cohen David S | Transmission-based optical detection systems |
CN101218855B (zh) * | 2005-04-15 | 2011-03-23 | 伊菲雷知识产权公司 | 用于厚电介质电致发光显示器的含有氧化镁的阻挡层 |
KR100691437B1 (ko) * | 2005-11-02 | 2007-03-09 | 삼성전기주식회사 | 폴리머-세라믹의 유전체 조성물, 이를 이용하는 내장형캐패시터와 인쇄회로기판 |
US20080131673A1 (en) * | 2005-12-13 | 2008-06-05 | Yasuyuki Yamamoto | Method for Producing Metallized Ceramic Substrate |
KR100785022B1 (ko) * | 2006-07-05 | 2007-12-11 | 삼성전자주식회사 | 전계발광소자 |
WO2008075615A1 (en) * | 2006-12-21 | 2008-06-26 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting element and light-emitting device |
JP2009069288A (ja) | 2007-09-11 | 2009-04-02 | Seiko Epson Corp | スクリーン |
KR20090041639A (ko) * | 2007-10-24 | 2009-04-29 | 삼성전자주식회사 | 분산형 무기 전계발광 소자의 제조방법 및 분산형 무기전계발광 소자 |
US20090252933A1 (en) * | 2008-04-04 | 2009-10-08 | 3M Innovative Properties Company | Method for digitally printing electroluminescent lamps |
NL1036735A1 (nl) * | 2008-04-10 | 2009-10-13 | Asml Holding Nv | Shear-layer chuck for lithographic apparatus. |
JP5762715B2 (ja) * | 2010-10-06 | 2015-08-12 | 信越化学工業株式会社 | 磁気光学材料、ファラデー回転子、及び光アイソレータ |
US8908349B2 (en) * | 2011-03-31 | 2014-12-09 | Ngk Insulators, Ltd. | Member for semiconductor manufacturing apparatus |
JP2015199916A (ja) * | 2014-04-02 | 2015-11-12 | Jsr株式会社 | 膜形成用組成物及びパターン形成方法 |
CN105244450A (zh) * | 2015-10-09 | 2016-01-13 | 北京大学深圳研究生院 | 一种用于交流电场驱动的有机发光器件及其制备方法 |
US10186379B2 (en) * | 2016-06-28 | 2019-01-22 | Tdk Corporation | Dielectric composition and electronic component |
DE102018117210A1 (de) * | 2018-07-17 | 2020-02-20 | Helmholtz-Zentrum Dresden - Rossendorf E.V. | Schichtabfolge zur Erzeugung von Elektrolumineszenz und deren Verwendung |
Family Cites Families (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6084692A (ja) * | 1983-08-08 | 1985-05-14 | ライフ・ライト・システムズ | 緊急信号装置 |
JPH0744072B2 (ja) | 1985-04-05 | 1995-05-15 | 日本電気株式会社 | El素子とその製造方法 |
JPS61230294A (ja) * | 1985-04-05 | 1986-10-14 | 日本電気株式会社 | El素子の製造方法 |
US4757235A (en) * | 1985-04-30 | 1988-07-12 | Nec Corporation | Electroluminescent device with monolithic substrate |
JPS62278792A (ja) | 1986-05-27 | 1987-12-03 | 古河電気工業株式会社 | エレクトロルミネセンス発光素子の製造方法 |
JPS62278791A (ja) | 1986-05-27 | 1987-12-03 | 古河電気工業株式会社 | エレクトロルミネセンス発光素子の製造方法 |
JPS62281295A (ja) | 1986-05-30 | 1987-12-07 | 古河電気工業株式会社 | エレクトロルミネセンス発光素子の製造方法 |
JPS6369193A (ja) | 1986-09-10 | 1988-03-29 | 日本電気株式会社 | El素子とその製造方法 |
JPS63146398A (ja) * | 1986-12-09 | 1988-06-18 | 日産自動車株式会社 | 薄膜elパネル |
IT1221924B (it) * | 1987-07-01 | 1990-08-23 | Eniricerche Spa | Dispositivo elettroluminescente a film sottile e procedimento per la sua preparazione |
JPS6463297A (en) | 1987-09-01 | 1989-03-09 | Nec Corp | El element |
US5043631A (en) * | 1988-08-23 | 1991-08-27 | Westinghouse Electric Corp. | Thin film electroluminescent edge emitter structure on a silicon substrate |
JPH02199790A (ja) * | 1989-01-27 | 1990-08-08 | Furukawa Electric Co Ltd:The | エレクトロルミネセンス表示素子の製造方法 |
US5264714A (en) * | 1989-06-23 | 1993-11-23 | Sharp Kabushiki Kaisha | Thin-film electroluminescence device |
JP2753887B2 (ja) * | 1989-09-29 | 1998-05-20 | 京セラ株式会社 | コンデンサー内蔵複合回路基板 |
JPH0461791A (ja) * | 1990-06-26 | 1992-02-27 | Sharp Corp | 薄膜エレクトロルミネッセンス素子 |
JPH04277492A (ja) * | 1991-03-05 | 1992-10-02 | Toshiba Corp | El素子の製造方法 |
DE4220681C2 (de) * | 1991-06-27 | 1995-09-14 | Murata Manufacturing Co | Nichtreduzierende, dielektrische, keramische Zusammensetzung |
JP2958817B2 (ja) * | 1991-06-27 | 1999-10-06 | 株式会社村田製作所 | 非還元性誘電体磁器組成物 |
JPH05121169A (ja) * | 1991-10-24 | 1993-05-18 | Nippon Seiki Co Ltd | 有機分散型電界発光素子 |
US5352622A (en) * | 1992-04-08 | 1994-10-04 | National Semiconductor Corporation | Stacked capacitor with a thin film ceramic oxide layer |
US5432015A (en) * | 1992-05-08 | 1995-07-11 | Westaim Technologies, Inc. | Electroluminescent laminate with thick film dielectric |
JP3578786B2 (ja) * | 1992-12-24 | 2004-10-20 | アイファイアー テクノロジー インク | Elラミネート誘電層構造体および該誘電層構造体生成方法ならびにレーザパターン描画方法およびディスプレイパネル |
JPH06267656A (ja) * | 1993-03-15 | 1994-09-22 | Fuji Electric Co Ltd | 電場発光素子 |
JPH06283265A (ja) * | 1993-03-25 | 1994-10-07 | Nec Kansai Ltd | 電界発光灯及びその製造方法及びその製造装置 |
JP2770299B2 (ja) * | 1993-10-26 | 1998-06-25 | 富士ゼロックス株式会社 | 薄膜el素子及びその製造方法、並びにそのために使用するスパッタ用ターゲット |
JPH0883686A (ja) * | 1994-09-09 | 1996-03-26 | Nippon Hoso Kyokai <Nhk> | 薄膜発光素子 |
JPH0963769A (ja) * | 1995-08-25 | 1997-03-07 | Fuji Electric Co Ltd | 薄膜エレクトロルミネッセンス素子 |
WO1997026673A1 (en) * | 1996-01-16 | 1997-07-24 | Durel Corporation | Roll coated el panel |
JP2000223273A (ja) * | 1999-01-27 | 2000-08-11 | Tdk Corp | 有機el素子 |
JP2000260570A (ja) * | 1999-03-11 | 2000-09-22 | Tdk Corp | 薄膜el素子およびその製造方法 |
JP4252665B2 (ja) * | 1999-04-08 | 2009-04-08 | アイファイヤー アイピー コーポレイション | El素子 |
-
2001
- 2001-02-06 KR KR10-2001-7012290A patent/KR100443276B1/ko not_active IP Right Cessation
- 2001-02-06 KR KR10-2001-7012725A patent/KR100441284B1/ko not_active IP Right Cessation
- 2001-02-06 EP EP01902773A patent/EP1178707A1/en not_active Withdrawn
- 2001-02-06 CA CA002366571A patent/CA2366571C/en not_active Expired - Fee Related
- 2001-02-06 CN CNB018002927A patent/CN1198482C/zh not_active Expired - Fee Related
- 2001-02-06 CA CA002366572A patent/CA2366572C/en not_active Expired - Fee Related
- 2001-02-06 WO PCT/JP2001/000813 patent/WO2001060124A1/ja active Application Filing
- 2001-02-06 CN CNB018003192A patent/CN1204783C/zh not_active Expired - Fee Related
- 2001-02-06 WO PCT/JP2001/000814 patent/WO2001060125A1/ja active IP Right Grant
- 2001-02-06 CN CNB018003338A patent/CN1173602C/zh not_active Expired - Fee Related
- 2001-02-06 CA CA002366573A patent/CA2366573C/en not_active Expired - Fee Related
- 2001-02-06 KR KR10-2001-7012468A patent/KR100443277B1/ko not_active IP Right Cessation
- 2001-02-06 EP EP01902771A patent/EP1178705A4/en not_active Withdrawn
- 2001-02-06 EP EP01902772A patent/EP1173047A4/en not_active Withdrawn
- 2001-02-06 WO PCT/JP2001/000815 patent/WO2001060126A1/ja active IP Right Grant
- 2001-02-07 TW TW090102627A patent/TW524028B/zh not_active IP Right Cessation
- 2001-10-05 US US09/970,803 patent/US6709695B2/en not_active Expired - Lifetime
- 2001-10-09 US US09/971,707 patent/US6797413B2/en not_active Expired - Lifetime
- 2001-10-09 US US09/971,699 patent/US6800322B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR20010110473A (ko) | 2001-12-13 |
EP1178705A4 (en) | 2009-05-06 |
CA2366572C (en) | 2005-08-30 |
US6709695B2 (en) | 2004-03-23 |
EP1178707A1 (en) | 2002-02-06 |
KR20010109327A (ko) | 2001-12-08 |
WO2001060124A1 (fr) | 2001-08-16 |
KR100443277B1 (ko) | 2004-08-04 |
US20020037430A1 (en) | 2002-03-28 |
CA2366572A1 (en) | 2001-08-16 |
CA2366571C (en) | 2005-08-16 |
WO2001060125A1 (fr) | 2001-08-16 |
US6797413B2 (en) | 2004-09-28 |
KR100443276B1 (ko) | 2004-08-04 |
EP1173047A1 (en) | 2002-01-16 |
CN1204783C (zh) | 2005-06-01 |
CA2366573A1 (en) | 2001-08-16 |
WO2001060126A1 (fr) | 2001-08-16 |
CA2366573C (en) | 2005-01-04 |
KR20010109344A (ko) | 2001-12-08 |
CN1363197A (zh) | 2002-08-07 |
CN1173602C (zh) | 2004-10-27 |
EP1178705A1 (en) | 2002-02-06 |
CN1416664A (zh) | 2003-05-07 |
EP1173047A4 (en) | 2009-05-27 |
US6800322B2 (en) | 2004-10-05 |
KR100441284B1 (ko) | 2004-07-21 |
CA2366571A1 (en) | 2001-08-16 |
TW524028B (en) | 2003-03-11 |
US20020098368A1 (en) | 2002-07-25 |
US20020043930A1 (en) | 2002-04-18 |
CN1363199A (zh) | 2002-08-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1198482C (zh) | 复合衬底、用它的薄膜发光元件及其制造方法 | |
CN1300520A (zh) | 复合衬底、使用该衬底的薄膜电致发光器件以及该器件的生产方法 | |
CN1287640C (zh) | 复合基片和使用它的el面板、及其制造方法 | |
CN1104015C (zh) | 独石陶瓷电容器 | |
CN1192686C (zh) | 电致发光元件及其制造方法 | |
CN1178558C (zh) | 薄膜电致发光元件及其制造方法 | |
JP2002063987A (ja) | 複合基板の製造方法、複合基板およびel素子 | |
CN1774406A (zh) | 电介质瓷器组合物及电子部件 | |
CN1204785C (zh) | 薄膜电致发光元件及其制造方法 | |
JP2001250677A (ja) | 複合基板の製造方法、複合基板およびこれを用いた薄膜発光素子 | |
JP4705212B2 (ja) | 複合基板およびそれを用いたエレクトロルミネセンス素子 | |
JP2001250676A (ja) | 複合基板、複合基板の製造方法、およびel素子 | |
JP2001250683A (ja) | 複合基板、これを用いた薄膜発光素子、およびその製造方法 | |
JP4476412B2 (ja) | 複合基板、エレクトロルミネセンス素子および複合基板の製造方法 | |
JP2004356024A (ja) | 複合基板とel素子の製造方法、および複合基板とel素子の製造装置 | |
JP2002280173A (ja) | 複合基板の製造方法、この製造方法により得られた複合基板、el素子 | |
JP2003249374A (ja) | 薄膜el素子 | |
JP2002158094A (ja) | 薄膜el素子及びその製造方法 | |
JP2003203782A (ja) | 複合基板およびそれを用いたelパネルとその製造方法 | |
JP2004267879A (ja) | 厚膜のレベリング方法、厚膜のレベリング装置および薄膜el素子の製造方法 | |
JP2002216954A (ja) | 薄膜el素子及びその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C06 | Publication | ||
PB01 | Publication | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: YIFEILEI INTELLECTUAL PROPERTY CO.,LTD. Free format text: FORMER OWNER: IFIRE TECHNOLOGY INC. Effective date: 20080815 Owner name: IFIRE TECHNOLOGY INC. Free format text: FORMER OWNER: THE WESTAIM CORP. Effective date: 20080815 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20080815 Address after: Alberta Canada Patentee after: IFIRE IP Corp. Address before: Alberta Canada Patentee before: IFIRE TECHNOLOGY Inc. Effective date of registration: 20080815 Address after: Alberta Canada Patentee after: IFIRE TECHNOLOGY Inc. Address before: Alberta Canada Patentee before: The Westaim Corp. |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20050420 Termination date: 20170206 |
|
CF01 | Termination of patent right due to non-payment of annual fee |