CN105515450B - 具有增强射频及温度均匀性的静电夹盘 - Google Patents

具有增强射频及温度均匀性的静电夹盘 Download PDF

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Publication number
CN105515450B
CN105515450B CN201610056402.2A CN201610056402A CN105515450B CN 105515450 B CN105515450 B CN 105515450B CN 201610056402 A CN201610056402 A CN 201610056402A CN 105515450 B CN105515450 B CN 105515450B
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dielectric layer
substrate
heaters
pixelated
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CN105515450A (zh
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D·卢博米尔斯基
J·Y·孙
M·马尔科夫斯基
K·马赫拉切夫
D·A·小布齐伯格
S·巴纳
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Applied Materials Inc
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Applied Materials Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833—Details of electrostatic chucks
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S269/00—Work holders
    • Y10S269/903—Work holder for electrical circuit assemblages or wiring systems

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical Vapour Deposition (AREA)
CN201610056402.2A 2012-04-24 2013-04-23 具有增强射频及温度均匀性的静电夹盘 Active CN105515450B (zh)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201261637500P 2012-04-24 2012-04-24
US61/637,500 2012-04-24
US201361775372P 2013-03-08 2013-03-08
US61/775,372 2013-03-08
US13/867,515 US8937800B2 (en) 2012-04-24 2013-04-22 Electrostatic chuck with advanced RF and temperature uniformity
US13/867,515 2013-04-22
CN201380021270.4A CN104247002B (zh) 2012-04-24 2013-04-23 具有增强射频及温度均匀性的静电夹盘

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CN105515450A CN105515450A (zh) 2016-04-20
CN105515450B true CN105515450B (zh) 2020-02-18

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CN201380021270.4A Active CN104247002B (zh) 2012-04-24 2013-04-23 具有增强射频及温度均匀性的静电夹盘

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US (1) US8937800B2 (enExample)
JP (2) JP5938140B2 (enExample)
KR (3) KR20160006239A (enExample)
CN (2) CN105515450B (enExample)
TW (1) TWI509732B (enExample)
WO (1) WO2013163220A1 (enExample)

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