ZA854172B - Thermally stable polymer images and processes - Google Patents

Thermally stable polymer images and processes

Info

Publication number
ZA854172B
ZA854172B ZA854172A ZA854172A ZA854172B ZA 854172 B ZA854172 B ZA 854172B ZA 854172 A ZA854172 A ZA 854172A ZA 854172 A ZA854172 A ZA 854172A ZA 854172 B ZA854172 B ZA 854172B
Authority
ZA
South Africa
Prior art keywords
thermally stable
images
processes
stable polymer
substrate surfaces
Prior art date
Application number
ZA854172A
Other languages
English (en)
Inventor
Wayne Edmund Feely
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24469821&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ZA854172(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of ZA854172B publication Critical patent/ZA854172B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/16—Chemical modification with polymerisable compounds
    • C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Paints Or Removers (AREA)
  • Cosmetics (AREA)
  • Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Medical Uses (AREA)
  • Dental Preparations (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Paper (AREA)
  • Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
ZA854172A 1984-06-01 1985-06-03 Thermally stable polymer images and processes ZA854172B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US61651884A 1984-06-01 1984-06-01

Publications (1)

Publication Number Publication Date
ZA854172B true ZA854172B (en) 1986-07-30

Family

ID=24469821

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA854172A ZA854172B (en) 1984-06-01 1985-06-03 Thermally stable polymer images and processes

Country Status (18)

Country Link
EP (1) EP0164248B1 (ko)
JP (1) JPS60263143A (ko)
KR (1) KR920005773B1 (ko)
AT (1) ATE68272T1 (ko)
AU (1) AU595160B2 (ko)
BR (1) BR8502638A (ko)
CA (1) CA1283799C (ko)
DE (1) DE3584316D1 (ko)
DK (1) DK241885A (ko)
FI (1) FI84942C (ko)
HK (1) HK17492A (ko)
IE (1) IE57143B1 (ko)
IL (1) IL75373A (ko)
MX (1) MX170270B (ko)
MY (1) MY103545A (ko)
NO (1) NO173574C (ko)
SG (1) SG108091G (ko)
ZA (1) ZA854172B (ko)

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* Cited by examiner, † Cited by third party
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CN101308329B (zh) 2007-04-06 2013-09-04 罗门哈斯电子材料有限公司 涂料组合物
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HK17492A (en) 1992-03-13
NO173574C (no) 1993-12-29
FI852190L (fi) 1985-12-02
AU595160B2 (en) 1990-03-29
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IL75373A0 (en) 1985-09-29
AU4325185A (en) 1985-12-05
DE3584316D1 (de) 1991-11-14
BR8502638A (pt) 1986-02-12
ATE68272T1 (de) 1991-10-15
FI852190A0 (fi) 1985-05-31
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SG108091G (en) 1992-04-16
IE57143B1 (en) 1992-05-06
KR860000330A (ko) 1986-01-28
MX170270B (es) 1993-08-11
NO173574B (no) 1993-09-20
EP0164248A2 (en) 1985-12-11
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CA1283799C (en) 1991-05-07
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