WO2014030628A1 - 近赤外線カットフィルタおよび固体撮像装置 - Google Patents
近赤外線カットフィルタおよび固体撮像装置 Download PDFInfo
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- WO2014030628A1 WO2014030628A1 PCT/JP2013/072139 JP2013072139W WO2014030628A1 WO 2014030628 A1 WO2014030628 A1 WO 2014030628A1 JP 2013072139 W JP2013072139 W JP 2013072139W WO 2014030628 A1 WO2014030628 A1 WO 2014030628A1
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- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
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- 230000006866 deterioration Effects 0.000 description 1
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- 239000003063 flame retardant Substances 0.000 description 1
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- 239000003502 gasoline Substances 0.000 description 1
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- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
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- 230000007774 longterm Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
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- 239000010445 mica Substances 0.000 description 1
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- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- FTWUXYZHDFCGSV-UHFFFAOYSA-N n,n'-diphenyloxamide Chemical compound C=1C=CC=CC=1NC(=O)C(=O)NC1=CC=CC=C1 FTWUXYZHDFCGSV-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- LKKPNUDVOYAOBB-UHFFFAOYSA-N naphthalocyanine Chemical class N1C(N=C2C3=CC4=CC=CC=C4C=C3C(N=C3C4=CC5=CC=CC=C5C=C4C(=N4)N3)=N2)=C(C=C2C(C=CC=C2)=C2)C2=C1N=C1C2=CC3=CC=CC=C3C=C2C4=N1 LKKPNUDVOYAOBB-UHFFFAOYSA-N 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- TXIYCNRKHPXJMW-UHFFFAOYSA-N nickel;1-octyl-2-(2-octylphenyl)sulfanylbenzene Chemical compound [Ni].CCCCCCCCC1=CC=CC=C1SC1=CC=CC=C1CCCCCCCC TXIYCNRKHPXJMW-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- AUONHKJOIZSQGR-UHFFFAOYSA-N oxophosphane Chemical compound P=O AUONHKJOIZSQGR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
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- 238000000016 photochemical curing Methods 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
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- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
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- 229920002312 polyamide-imide Polymers 0.000 description 1
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- 229920000728 polyester Polymers 0.000 description 1
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- YGSDEFSMJLZEOE-UHFFFAOYSA-M salicylate Chemical compound OC1=CC=CC=C1C([O-])=O YGSDEFSMJLZEOE-UHFFFAOYSA-M 0.000 description 1
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- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
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- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 239000003017 thermal stabilizer Substances 0.000 description 1
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- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
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- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical class [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- BOXSVZNGTQTENJ-UHFFFAOYSA-L zinc dibutyldithiocarbamate Chemical compound [Zn+2].CCCCN(C([S-])=S)CCCC.CCCCN(C([S-])=S)CCCC BOXSVZNGTQTENJ-UHFFFAOYSA-L 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
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- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/10—Cameras or camera modules comprising electronic image sensors; Control thereof for generating image signals from different wavelengths
- H04N23/11—Cameras or camera modules comprising electronic image sensors; Control thereof for generating image signals from different wavelengths for generating image signals from visible and infrared light wavelengths
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
- C03C3/17—Silica-free oxide glass compositions containing phosphorus containing aluminium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
- C03C3/19—Silica-free oxide glass compositions containing phosphorus containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/23—Silica-free oxide glass compositions containing halogen and at least one oxide, e.g. oxide of boron
- C03C3/247—Silica-free oxide glass compositions containing halogen and at least one oxide, e.g. oxide of boron containing fluorine and phosphorus
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/08—Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths
- C03C4/082—Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths for infrared absorbing glass
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
- C08K5/3432—Six-membered rings
- C08K5/3437—Six-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/12—Compositions of unspecified macromolecular compounds characterised by physical features, e.g. anisotropy, viscosity or electrical conductivity
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/226—Glass filters
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/60—Noise processing, e.g. detecting, correcting, reducing or removing noise
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/365—Coating different sides of a glass substrate
Definitions
- the present invention relates to a near-infrared cut filter having a near-infrared shielding effect and a solid-state imaging device including the same.
- optical filters that sufficiently transmit light in the visible wavelength region but shield light in the near infrared wavelength region have been used for various applications.
- solid-state imaging devices CCD, CMOS, etc.
- CCD compact flash memory
- CMOS complementary metal-oxide-semiconductor
- An optical filter is disposed between the imaging lens and the solid-state imaging device in order to bring the sensitivity of the solid-state imaging device close to human visibility.
- an optical filter for an imaging device a near infrared absorbing glass in which CuO or the like is added to a fluorophosphate glass or a phosphate glass so as to selectively absorb light in the near infrared wavelength region
- a glass filter using the same is known (see Patent Document 1).
- the light-absorbing glass filter does not have sufficient performance to shield light having a wavelength in the near-infrared region and transparency in a wavelength band (630 to 700 nm) required for photographing a dark part more brightly.
- a restriction on layer formation that does not hinder the function of the solid-state imaging device, an optical filter having a sufficient near-infrared cut filter function has not been obtained.
- a silicon oxide (SiO 2 ) layer and a titanium oxide (TiO 2 ) layer are alternately stacked on the substrate, and light in the near infrared wavelength region is reflected by light interference.
- a reflective interference filter for shielding, a film containing a pigment that absorbs light in the near-infrared wavelength region in a transparent resin, and the like have been developed (for example, see Patent Document 2).
- an optical filter in which a resin layer containing a dye that absorbs near-infrared rays and a layer that reflects near-infrared light is combined has been developed (see, for example, Patent Document 3).
- dye which absorbs near infrared rays is described in patent document 4, for example.
- Near-infrared absorbing dyes having a maximum absorption wavelength in the vicinity of 700 to 750 nm and a steep slope of the absorption curve of light having a wavelength of 630 to 700 nm can be used in combination with other shielding components and shielding members to achieve good near infrared rays.
- a shielding characteristic is obtained.
- This is used for a near-infrared cut filter as a resin layer dispersed in a transparent resin, for example, a cycloolefin resin.
- such near-infrared absorbing dyes have a problem in that a near-infrared absorption wavelength region is narrow and a wavelength region in which absorption is not sufficient even when combined with other shielding members appears. For this reason, there has been a demand for an optical filter having a wide near-infrared absorption wavelength region and a steep slope of the absorption curve of light having a wavelength of 630 to 700 nm.
- An object of the present invention is to provide a near-infrared cut filter excellent in near-infrared shielding characteristics and effectively using a near-infrared absorbing glass and a near-infrared absorbing dye, and a high-sensitivity solid-state imaging device including the same.
- the present invention provides a near-infrared cut filter and a solid-state imaging device having the following configuration.
- a near-infrared absorbing glass substrate made of a CuO-containing fluorophosphate glass or a CuO-containing phosphate glass;
- a near-infrared cut filter characterized in that an average value of transmittance in a wavelength region of 400 to 550 nm is 80% or more and an average value of transmittance in a wavelength region of 650 to 720 nm is 15% or less.
- the absorption spectrum in the wavelength region of 400 to 850 nm of the resin film prepared by dispersing the near infrared absorbing dye (A) in the transparent resin (B) has an absorption maximum wavelength in the wavelength region of 650 to 750 nm.
- R 4 and R 6 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl or alkoxy group having 1 to 6 carbon atoms, an acyloxy group having 1 to 10 carbon atoms, or —NR 7 R 8 (R 7 And R 8 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, or —C ( ⁇ O) —R 9 (R 9 is a hydrogen atom or an optionally substituted carbon atom).
- At least one of R 1 and R 2 , R 2 and R 5 , and R 1 and R 3 is connected to each other and has a nitrogen atom and 5 or 6 members, respectively, heterocyclic ring A, heterocyclic ring B, and heterocyclic ring
- R 3 and R 5 do not form a heterocyclic ring each independently represents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 6 carbon atoms Or an alkoxy group is shown.
- Each R 1 independently represents a hydrogen atom, an optionally substituted alkyl group or allyl group having 1 to 6 carbon atoms, or an aryl group or aryl group having 6 to 11 carbon atoms;
- Each R 3 independently represents a hydrogen atom, a halogen atom, or an alkyl or alkoxy group having 1 to 6 carbon atoms;
- Each R 6 independently represents a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl or alkoxy group having 1 to 6 carbon atoms, or an acyloxy group having 1 to 10 carbon atoms;
- R 7 and R 8 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, or —C ( ⁇ O) —R 9 (R 9 may have a hydrogen atom or a substituent).
- R 9 may have a hydrogen atom or a substituent.
- X 1 is each independently a group represented by the following formula (1x) or (2x)
- Y 1 is each independently any group or single bond represented by the following formulas (1y) to (5y).
- Z's are each independently a hydrogen atom, a hydroxyl group, an alkyl group or an alkoxy group having 1 to 6 carbon atoms, or -NR 28 R 29 (R 28 and R 29 are each independently Represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms).
- R 21 to R 26 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or an aryl group having 6 to 10 carbon atoms.
- R 27 represents an alkyl group having 1 to 6 carbon atoms or an aryl group having 6 to 10 carbon atoms.
- the near-infrared cut filter according to [8], wherein at least one of the dielectric multilayer films has the following characteristics.
- (Ii-1) The transmittance in the wavelength region of 420 to 650 nm is 90% or more.
- Ii-2) The transmittance in the wavelength region of 750 to 1100 nm is 10% or less.
- (Ii-3) The wavelength region on the longer wavelength side than 600 nm. The wavelength on the shortest wavelength side at which the transmittance is 50% in FIG.
- a solid-state imaging device in which the near-infrared cut filter and the solid-state imaging device according to any one of [1] to [9] are arranged in order from a subject side or a light incident side of a light source.
- a near-infrared cut filter having an excellent near-infrared shielding function and a highly sensitive solid-state imaging device using the same can be provided.
- the near-infrared cut filter of the present invention (hereinafter also referred to as NIR filter) A near-infrared absorbing glass substrate made of CuO-containing fluorophosphate glass or CuO-containing phosphate glass, and a near-infrared absorbing dye (A) disposed on at least one main surface of the near-infrared absorbing glass substrate And having a near infrared absorbing layer containing transparent resin (B),
- the NIR filter has the following optical characteristics.
- I-1 The average value of transmittance in the wavelength range of 400 to 550 nm is 80% or more.
- I-2) The average value of transmittance in the wavelength range of 650 to 720 nm is 15% or less.
- the average value of the transmittance in the wavelength region of 400 to 550 nm is preferably 82% or more, and more preferably 85% or more. Further, the average transmittance in the wavelength region of 650 to 720 nm is preferably 13% or less, and more preferably 10% or less.
- the average value of the transmittance in the wavelength region of 400 to 550 nm of the NIR filter is particularly 83. % Or more is preferable, and 85% or more is more preferable.
- the NIR filter of the present invention is composed of the near-infrared absorbing glass substrate, the near-infrared absorbing layer, and further other components, the near-infrared absorbing glass substrate and the near-infrared absorbing layer.
- the average value of the transmittance in the wavelength region of 400 to 550 nm is preferably 83% or more, and more preferably 85% or more.
- the NIR filter of the present invention further has a dielectric film having a refractive index of 1.45 or more and less than 1.55 and a refractive index on at least one of the surface of the near infrared absorbing layer and the surface of the near infrared absorbing glass substrate. It is preferable to have a dielectric multilayer film in which 2.2 to 2.5 dielectric films are alternately stacked.
- the surface of the near-infrared absorbing layer refers to a main surface of the main surface of the near-infrared absorbing layer that is not in contact with another layer, a substrate, or the like, that is, a main surface in contact with the atmosphere.
- the surface of the near infrared absorbing glass substrate has the same meaning.
- the NIR filter of the present invention is an NIR filter having excellent near-infrared shielding characteristics that effectively uses near-infrared absorbing glass and a near-infrared absorbing dye.
- the light absorption characteristics of the dielectric multilayer film are not affected by the angle dependence of the absorption wavelength shifting due to the incident angle of light inherently possessed by the dielectric multilayer film. Can be sufficiently utilized, and as a result, a NIR filter having particularly excellent near-infrared shielding characteristics can be obtained.
- FIG. 1 is a cross-sectional view schematically showing an example of an NIR filter according to an embodiment of the present invention.
- the NIR filter 10A of this embodiment includes a near-infrared absorbing glass substrate 1 and a near-infrared absorbing layer 2 laminated on one main surface thereof.
- the near-infrared absorbing glass substrate 1 (hereinafter, the near-infrared absorbing glass substrate is also simply referred to as “glass substrate”) is a CuO-containing fluorophosphate glass or a CuO-containing phosphate glass (hereinafter referred to as “CuO”). It is also referred to as “containing glass”. Since the glass substrate 1 is made of CuO-containing glass, it has a high transmittance for visible light and a high shielding property for near infrared rays.
- the “phosphate glass” includes silicic acid phosphate glass in which a part of the glass skeleton is composed of SiO 2 .
- As a CuO containing glass used for the glass base material 1 the thing of the following compositions is mentioned, for example.
- Examples of commercially available products include, for example, NF50-E and NF50-EX (trade name, manufactured by Asahi Glass Co., Ltd.) as the glass of (1), and BG-60 and BG-61 (and above) as the glass of (2).
- As a glass of (5) such as Schott, product name), CD5000 (manufactured by HOYA, product name) and the like can be mentioned.
- the above-described CuO-containing glass may further contain a metal oxide.
- the metal oxide contains, for example, one or more of Fe 2 O 3 , MoO 3 , WO 3 , CeO 2 , Sb 2 O 3 , V 2 O 5, etc.
- the CuO-containing glass has ultraviolet absorption characteristics. Have.
- the near-infrared absorption performance of the glass substrate 1 has the optical characteristics (i-1) and (i-2) as an NIR filter 10A obtained by laminating with the near-infrared absorption layer 2 described below. I just need it.
- the thickness of the glass substrate 1 is preferably in the range of 0.03 to 5 mm from the viewpoint of reducing the size and thickness of the apparatus and damage during handling, and from the viewpoint of weight reduction and strength, 0.05 to A range of 1 mm is more preferable.
- the optical properties of the glass substrate 1 are such that the transmittance in the wavelength region of 400 to 550 nm is 80% or more and the transmittance in the wavelength region of 750 to 1000 nm is 40% at the preferable thickness of 0.03 to 5 mm. The following is preferable.
- the transmittance is a value measured using an ultraviolet-visible spectrophotometer.
- the transmittance of 70% or more in a specific wavelength region means that the transmittance is 70% or more at all wavelengths in the wavelength region, and the transmittance of 10% or less means that wavelength region. This means that the transmittance is 10% or less at all wavelengths, and the same applies to other transmittances.
- the light transmittance refers to the ratio of light that has traveled straight through the interior of the specimen and transmitted to the opposite side with respect to the light incident from the direction orthogonal to the main surface of the specimen.
- a straight line indicating the direction in which the light is incident on a line orthogonal to the main surface The angle formed by is called the incident angle.
- the glass substrate 1 side may be directly attached to, for example, a solid-state image sensor of an imaging device.
- the NIR filter 10A can contribute to the reduction in size and thickness of the solid-state imaging device.
- an ⁇ -ray emitting element radioisotope
- the CuO-containing glass constituting the glass substrate 1 has as little ⁇ -ray emitting element content as possible.
- the content of U and Th is preferably 20 ppb or less, and more preferably 5 ppb or less.
- the surface on which the layer is laminated may be subjected to a surface treatment with a silane coupling agent.
- Adhesiveness with the near-infrared absorption layer 2 can be enhanced by using the glass substrate 1 that has been surface-treated with a silane coupling agent.
- a silane coupling agent the same thing as used with the following near-infrared absorption layers 2 can be used, for example.
- the near infrared absorbing layer 2 is a layer containing a near infrared absorbing dye (A) and a transparent resin (B). Typically, the near infrared absorbing dye (A) is uniformly dispersed in the transparent resin (B). It is a layer formed.
- the near-infrared absorbing dye (A) (hereinafter referred to as “dye (A)”) transmits light in the visible wavelength region (450 to 600 nm) and absorbs light in the near-infrared wavelength region (700 to 1100 nm). If it is a near-infrared absorptive pigment
- the dye in the present invention may be a pigment, that is, a state in which molecules are aggregated.
- the near-infrared absorbing dye is referred to as “NIR absorbing dye” as necessary.
- the dye (A) has an absorption spectrum in the wavelength range of 400 to 850 nm measured using a resin film obtained by dispersing the dye (A) in the transparent resin (B). In particular, those that exhibit an absorption maximum wavelength are preferable.
- the near-infrared absorbing dye having such absorption characteristics is referred to as a dye (A1).
- the absorption maximum wavelength in the absorption spectrum is referred to as ⁇ max of the dye (A1).
- the absorption spectrum of the dye (A1) has an absorption peak having an absorption peak at the wavelength ⁇ max (hereinafter referred to as “ ⁇ max absorption peak”).
- the absorption spectrum of the dye (A1) preferably has ⁇ max in the wavelength range of 650 to 750 nm, has little absorption in the visible light region, and has a steep slope on the visible light side of the absorption peak of ⁇ max. Further, it is preferable that the absorption peak of ⁇ max has a gentle slope on the long wavelength side.
- Examples of the dye (A1) include cyanine compounds, phthalocyanine compounds, naphthalocyanine compounds, dithiol metal complex compounds, diimonium compounds, polymethine compounds, phthalide compounds, naphthoquinone compounds, anthraquinone compounds, indophenol compounds, Examples include squarylium compounds.
- the dye (A1) composed of a squarylium compound has little absorption in the visible light region, the absorption peak of ⁇ max has a steep slope on the visible light side, and has high storage stability and light stability. Therefore, it is preferable.
- the dye (A1) made of a cyanine compound is preferable because the absorption spectrum has little absorption in the visible light region and high light absorption on the long wavelength side in the wavelength region near ⁇ max.
- cyanine compounds are dyes that have been used as recording dyes such as CD-R for a long time, and are known to be low-cost and to ensure long-term stability by salt formation.
- a dye (A1) made of a phthalocyanine compound is preferable because of excellent heat resistance and weather resistance.
- the dye (A1) that is a squarylium compound include at least one selected from squarylium compounds represented by the following formula (F1).
- the compound represented by the formula (F1) is also referred to as a compound (F1). The same applies to other compounds.
- Compound (F1) is a squarylium compound having a structure in which a benzene ring is bonded to the left and right sides of the squarylium skeleton, and a nitrogen atom is bonded to the 4-position of the benzene ring and a saturated heterocyclic ring containing the nitrogen atom is formed. And a compound having a light-absorbing property as the dye (A1).
- other required characteristics such as increasing the solubility in the solvent (hereinafter sometimes referred to as “host solvent”) used for forming the near-infrared absorbing layer and the transparent resin (B). Accordingly, the substituent of the benzene ring can be appropriately adjusted within the following range.
- R 4 and R 6 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl or alkoxy group having 1 to 6 carbon atoms, an acyloxy group having 1 to 10 carbon atoms, or —NR 7 R 8 (R 7 And R 8 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, or —C ( ⁇ O) —R 9 (R 9 is a hydrogen atom or an optionally substituted carbon atom).
- At least one of R 1 and R 2 , R 2 and R 5 , and R 1 and R 3 is connected to each other and has 5 or 6 members together with a nitrogen atom, and heterocyclic ring A, heterocyclic ring B, and Heterocycle C is formed.
- R 1 and R 2 are a divalent group -Q- to which they are bonded, an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 10 carbon atoms, An alkylene group which may be substituted with an acyloxy group having 1 to 10 carbon atoms which may have a substituent, or an alkyleneoxy group.
- R 2 and R 5 when the heterocyclic ring B is formed, and R 1 and R 3 when the heterocyclic ring C is formed are each a divalent group —X 1 —Y 1 — and — X 2 —Y 2 — (X 1 and X 2 on the side bonded to nitrogen), X 1 and X 2 are each a group represented by the following formula (1x) or (2x), and Y 1 and Y 2 are each It is a group represented by any one selected from the following formulas (1y) to (5y). When X 1 and X 2 are groups represented by the following formula (2x), Y 1 and Y 2 may each be a single bond.
- Z's are each independently a hydrogen atom, a hydroxyl group, an alkyl group or an alkoxy group having 1 to 6 carbon atoms, or -NR 28 R 29 (R 28 and R 29 are each independently Represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms).
- R 21 to R 26 are each independently a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or an aryl group having 6 to 10 carbon atoms, and R 27 is an alkyl group having 1 to 6 carbon atoms or an alkyl group having 6 to 10 carbon atoms.
- An aryl group is shown.
- R 7 , R 8 , R 9 , R 4 , R 6 , R 21 to R 27 , R 1 to R 3 when not forming a heterocyclic ring, and R 5 are It may combine to form a 5-membered ring or a 6-membered ring.
- R 21 and R 26 , R 21 and R 27 may be directly bonded.
- R 1 and R 2 are each independently a hydrogen atom, an optionally substituted alkyl group or allyl group having 1 to 6 carbon atoms, or 6 carbon atoms. Represents an aryl group or an araryl group of ⁇ 11.
- R 3 and R 5 each independently represent a hydrogen atom, a halogen atom, or an alkyl group or alkoxy group having 1 to 6 carbon atoms.
- the heterocycle A may be simply referred to as ring A.
- R 4 and R 6 each independently represent the above atom or group.
- the halogen atom include a fluorine atom, a chlorine atom, and a bromine atom.
- the alkyl group may be linear, branched or cyclic.
- R 4 and R 6 are preferably a combination in which either one is a hydrogen atom and the other is —NR 7 R 8 .
- —NR 7 R 8 is either R 4 or R 6 May be introduced.
- —NR 7 R 8 is preferably introduced into R 4 .
- each of —NR 7 R 8 is preferably introduced into R 6 .
- R 9 is an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted aryl group having 6 to 10 carbon atoms, or an optionally substituted group.
- an araryl group having 7 to 18 carbon atoms which may have an oxygen atom between carbon atoms is preferable.
- substituents examples include a fluorine atom, an alkyl group having 1 to 6 carbon atoms, a fluoroalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and an acyloxy group having 1 to 6 carbon atoms.
- R 9 is a linear, branched or cyclic alkyl group having 1 to 17 carbon atoms, a fluoroalkyl group having 1 to 6 carbon atoms and / or carbon which may be substituted with a fluorine atom.
- a phenyl group which may be substituted with an alkoxy group having 1 to 6 carbon atoms, and a carbon atom having 7 to 18 carbon atoms which may have an oxygen atom between the carbon atoms, and substituted with a fluorine atom having 1 to 6 carbon atoms at the terminal A group selected from an alkyl group which may be substituted and / or an aryl group having a phenyl group which may be substituted with an alkoxy group having 1 to 6 carbon atoms is preferred.
- R 1 and R 2 , R 2 and R 5 , and R 1 and R 3 are connected to each other to form 5 or 6 members of ring A, ring B, and ring C, At least any one of these may be formed, and two or three may be formed.
- R 1 and R 2 are each independently a hydrogen atom, an optionally substituted alkyl group or allyl group having 1 to 6 carbon atoms, or 6 to 6 carbon atoms.
- 11 aryl groups or araryl groups are shown.
- the alkyl group may be linear, branched or cyclic. Examples of the substituent include a hydroxyl group, an alkoxy group having 1 to 3 carbon atoms, and an acyloxy group having 1 to 3 carbon atoms.
- R 3 and R 5 each independently represent a hydrogen atom, a halogen atom, or an alkyl group or alkoxy group having 1 to 6 carbon atoms.
- R 1 , R 2 , R 3 , and R 5 an alkyl group having 1 to 3 carbon atoms is preferable from the viewpoint of solubility in a host solvent or a transparent resin (B).
- a -propyl group is particularly preferred.
- the groups R 1 to R 6 of the benzene ring bonded to the left and right of the squarylium skeleton may be different on the left and right, but are preferably the same on the left and right.
- the compound (F1) includes the compound (F1-1) represented by the formula (F1-1) having a resonance structure having the structure represented by the general formula (F1).
- compound (F1) a compound represented by the following formula (F11) having only ring B as a ring structure, a compound represented by the following formula (F12) having only ring A as a ring structure, ring B And a compound represented by the following formula (F13) having two of ring C as a ring structure.
- the compound represented by the following formula (F11) is the same compound as the compound (F1) in which only the ring C is a ring structure and R 6 is —NR 7 R 8 .
- the compound represented by the following formula (F11) and the compound represented by the following formula (F13) are compounds described in US Pat. No. 5,543,086.
- X 1 is preferably an ethylene group in which the hydrogen atom represented by the above (2x) may be substituted with an alkyl group having 1 to 6 carbon atoms or an aryl group having 6 to 10 carbon atoms.
- the substituent is preferably an alkyl group having 1 to 3 carbon atoms, and more preferably a methyl group.
- X 1 specifically, — (CH 2 ) 2 —, —CH 2 —C (CH 3 ) 2 —, —CH (CH 3 ) —C (CH 3 ) 2 —, —C (CH 3 ) 2 -C (CH 3 ) 2- and the like.
- Examples of the compound (F11) include the following formula (F11-1), formula (F11-2), formula (F11-3), formula (F11-4), formula (F11-5), and formula (F11-6). And the like respectively.
- the compound (F11-2), the compound (F11-3), the compound (F11-4), the compound (F11-5), the compound (F11) are highly soluble in the host solvent and the transparent resin (B). -6) is more preferable.
- Q is substituted with a hydrogen atom by an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 10 carbon atoms, or an acyloxy group having 1 to 10 carbon atoms which may have a substituent. And an alkylene group having 4 or 5 carbon atoms and an alkyleneoxy group having 3 or 4 carbon atoms. In the case of an alkyleneoxy group, the position of oxygen is preferably other than next to N.
- Q is preferably a butylene group which may be substituted with an alkyl group having 1 to 3 carbon atoms, particularly a methyl group.
- —NR 7 R 8 is —NH—C ( ⁇ O) — (CH 2 ) m —CH 3 (m is 0 to 19), —NH—C ( ⁇ O) —Ph— R 10 (-Ph- represents a phenylene group, R 10 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms in which the hydrogen atom may be substituted with a fluorine atom, or an alkoxy group having 1 to 3 carbon atoms, respectively. And the like are preferred.
- the compound (F12) since the compound (F12) has a relatively long wavelength side in the above wavelength range, the compound (F12) can widen the transmission region in the visible wavelength band by using the compound (F12).
- Examples of the compound (F12) include compounds represented by the following formula (F12-1), formula (F12-2), and formula (F12-3).
- the hydrogen atom represented by the above (2x) may be independently substituted with an alkyl group having 1 to 6 carbon atoms or an aryl group having 6 to 10 carbon atoms
- An ethylene group is preferred.
- the substituent is preferably an alkyl group having 1 to 3 carbon atoms, and more preferably a methyl group.
- X 1 and X 2 specifically, — (CH 2 ) 2 —, —CH 2 —C (CH 3 ) 2 —, —CH (CH 3 ) —C (CH 3 ) 2 —, —C ( CH 3 ) 2 —C (CH 3 ) 2 — and the like.
- Y 1 and Y 2 are independently —CH 2 —, —C (CH 3 ) 2 —, —CH (C 6 H 5 ) —, —CH ((CH 2 ) m CH 3 ) — (m is 0-5) and the like.
- —NR 7 R 8 is —NH—C ( ⁇ O) —C m H 2m + 1 (m is 1 to 20, and C m H 2m + 1 is linear, branched, or cyclic.
- —NH—C ( ⁇ O) —Ph—R 10 (—Ph— represents a phenylene group, R 10 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, 1 carbon atom) An alkoxy group having 1 to 3 carbon atoms or a perfluoroalkyl group having 1 to 3 carbon atoms, respectively).
- Examples of the compound (F13) include compounds represented by the following formulas (F13-1) and (F13-2).
- Formula (F6) represents a compound in which none of Ring A, Ring B, and Ring C is formed in Formula (F1) (wherein R 1 to R 6 are as follows).
- R 1 and R 2 each independently represents a hydrogen atom, an optionally substituted alkyl group or allyl group having 1 to 12 carbon atoms, or an aryl group or aryl group having 6 to 11 carbon atoms.
- R 3 and R 5 each independently represents a hydrogen atom, a halogen atom, or an alkyl or alkoxy group having 1 to 6 carbon atoms.
- R 4 and R 6 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl or alkoxy group having 1 to 6 carbon atoms, an acyloxy group having 1 to 10 carbon atoms, or —NR 7 R 8 (R 7 And R 8 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, or —C ( ⁇ O) —R 9 (R 9 is a hydrogen atom or an optionally substituted carbon atom).
- Examples of the compound (F6) include compounds represented by the formula (F6-1) and the formula (F6-2).
- a squarylium compound represented by the following formula (F7) can also be used as the dye (A1).
- the compound (F1) such as the compound (F11), the compound (F12), the compound (F13), the compound (F6), and the compound (F7) can be produced by a conventionally known method.
- Compound (F11) such as compound (F11-1) can be produced, for example, by the method described in US Pat. No. 5,543,086.
- the compound (F12) is, for example, J.I. Org. Chem. 2005, 70 (13), 5164-5173.
- the compound (F12-1), the compound (F12-2) and the like can be produced, for example, according to the synthesis route shown in the following reaction formula (F3).
- Reaction Formula (F3) the carboxylic acid chloride having the desired substituent R 9 is reacted with the amino group of 1-methyl-2-iodo-4-aminobenzene to form an amide.
- pyrrolidine is reacted, and further reacted with 3,4-dihydroxy-3-cyclobutene-1,2-dione (hereinafter referred to as squaric acid), whereby compound (F12-1), compound (F12-2) Etc. are obtained.
- R 9 represents —Ph or — (CH 2 ) 5 —CH 3 .
- -Ph represents a phenyl group.
- Et represents an ethyl group, and THF represents tetrahydrofuran.
- compound (F13-1), compound (F13-2), and the like can be produced, for example, according to the synthetic route shown in the following reaction formula (F4).
- reaction formula (F4) first, 8-hydroxyjulolidine is reacted with trifluoromethanesulfonic anhydride (Tf 2 O) to form 8-trifluoromethanesulfonic acid julolidine, and then benzylamine (BnNH 2 ) is added thereto. Reaction is carried out to obtain 8-benzylaminojulolidine, which is further reduced to produce 8-aminojulolidine.
- Tf 2 O trifluoromethanesulfonic anhydride
- BnNH 2 benzylamine
- Me is a methyl group
- TEA is triethylamine
- Ac is an acetyl group
- BINAP is (2,2′-bis (diphenylphosphino) -1,1′-binaphthyl)
- NaOtBu is sodium t-butoxide Respectively.
- a commercially available product may be used as the dye (A1) which is a squarylium compound.
- Examples of commercially available products include S2098, S2084 (trade names, manufactured by FEW Chemicals) and the like.
- Specific examples of the dye (A1) that is a cyanine compound include at least one selected from cyanine compounds represented by the following formula (F5).
- R 11 each independently represents an alkyl group having 1 to 20 carbon atoms, an alkoxy group or an alkylsulfone group, or an anionic species thereof.
- R 12 and R 13 each independently represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms.
- Z represents PF 6 , ClO 4 , R f —SO 2 , (R f —SO 2 ) 2 —N (R f represents an alkyl group having 1 to 8 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom. shown.), or an BF 4.
- R 14 , R 15 , R 16 and R 17 each independently represent a hydrogen atom, a halogen atom or an alkyl group having 1 to 6 carbon atoms.
- n represents an integer of 1 to 6.
- R 11 in the compound (F5) is preferably an alkyl group having 1 to 20 carbon atoms
- R 12 and R 13 are each independently preferably a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
- R 14 , R 15 , R 16 and R 17 are each independently preferably a hydrogen atom, and the number of n is preferably 1 to 4.
- the left and right structures sandwiching n repeating units may be different, but the same structure is preferred.
- examples of the compound (F5) include a compound represented by the following formula (F51), a compound represented by the following formula (F52), and the like.
- Z - is an anion shown Z in the above (F5) - is the same as.
- a commercially available product may be used as the dye (A1) which is a cyanine compound.
- Examples of commercially available products include ADS680HO (trade name, manufactured by American dye), S0830 (trade name, manufactured by FEW Chemicals), S2137 (trade name, manufactured by FEW Chemicals), and the like.
- Examples of the phthalocyanine compound that can be used as the dye (A1) include FB22 (trade name, manufactured by Yamada Chemical Co., Ltd.), TXEX720 (trade name, manufactured by Nippon Shokubai Co., Ltd.), and PC142c (trade name, manufactured by Yamada Chemical Industry Co., Ltd.). And other commercially available products.
- Table 1 shows the ⁇ max of each compound used as the pigment (A1) exemplified above together with the type of the transparent resin (B) used in the measurement.
- B-OKP2 and Byron 103 used as the transparent resin (B) in the above are polyester resin, SP3810 is polycarbonate resin, and EA-F5003 is acrylic resin, and the details will be described later.
- the dye (A1) one kind selected from a plurality of compounds having light absorption characteristics as the dye (A1) may be used alone, or two or more kinds may be used in combination.
- the dye (A) preferably contains one or more of the dyes (A1).
- dye (A) may contain another NIR absorption pigment
- the absorption spectrum in the wavelength region of 400 to 850 nm measured for a resin film prepared by dispersing these in the transparent resin (B) has a wavelength of 650 to 750 nm.
- NIR absorbing dyes so as to develop an absorption maximum wavelength in the wavelength range. Further, in the absorption spectrum, an NIR absorbing dye is used in combination so that the absorption in the visible light region is small, the inclination of the absorption peak of ⁇ max is steep on the visible light side, and the inclination is gentle on the long wavelength side. It is preferable.
- Transparent resin (B) As the transparent resin (B), a transparent resin having a refractive index of 1.45 or more is preferable.
- the refractive index is more preferably 1.5 or more, and particularly preferably 1.6 or more.
- the upper limit of the refractive index of the transparent resin (B) is not particularly limited, but is preferably about 1.72 from the viewpoint of availability.
- the refractive index means a refractive index at a wavelength of 589 nm at 20 ° C., and unless otherwise specified, the refractive index means the refractive index.
- the transparent resin (B) include acrylic resin, epoxy resin, ene / thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyparaphenylene resin, and polyarylene.
- examples include ether phosphine oxide resin, polyimide resin, polyamideimide resin, polyolefin resin, cyclic olefin resin, and polyester resin.
- 1 type may be used individually from these resin, and 2 or more types may be mixed and used for it.
- a transparent resin (B) having a refractive index of 1.45 or more one kind of these resins may be used alone as long as the refractive index is 1.45 or more as a whole. You may mix and use a seed
- the transparent resin is selected from an acrylic resin, a polyester resin, a polycarbonate resin, an ene / thiol resin, an epoxy resin, and a cyclic olefin resin.
- the transparent resin is more preferably at least one selected from an acrylic resin, a polyester resin, a polycarbonate resin, and a cyclic olefin resin.
- the polyester resin polyethylene terephthalate resin, polyethylene naphthalate resin and the like are preferable.
- the refractive index of the transparent resin (B) can be adjusted to the above range by adjusting the molecular structure of the raw material component so that the polymer main chain and side chain have a specific structure, for example.
- Examples of the structure in the polymer for adjusting the refractive index within the above range include a fluorene skeleton represented by the following formula (B1). Of the fluorene skeletons, a 9,9-bisphenylfluorene skeleton represented by the following formula (B2) is preferable in that higher refractive index and heat resistance can be obtained.
- acrylic resin polycarbonate resin and polyester resin are preferable.
- an acrylic resin having a fluorene skeleton for example, 9,9-bis, in which at least one substituent having a (meth) acryloyl group at the terminal is introduced into at least two phenyl groups of 9,9-bisphenylfluorene.
- An acrylic resin obtained by polymerizing a raw material component containing a phenylfluorene derivative is mentioned.
- (meth) acryloyl Korean Is a general term for “methacryloyl...” And “acryloyl.
- an acrylic resin obtained by polymerizing a compound in which a hydroxyl group is introduced into the 9,9-bisphenylfluorene derivative having the (meth) acryloyl group and a urethane (meth) acrylate compound may be used.
- a urethane (meth) acrylate compound a compound obtained as a reaction product of a (meth) acrylate compound having a hydroxyl group and a polyisocyanate compound, or a reaction product of a (meth) acrylate compound having a hydroxyl group, a polyisocyanate compound and a polyol compound The compound obtained is mentioned.
- polyester resin into which the fluorene skeleton is introduced examples include a polyester resin in which a 9,9-bisphenylfluorene derivative represented by the following formula (B2-1) is introduced as an aromatic diol.
- the kind of dicarboxylic acid to be reacted with the aromatic diol is not particularly limited.
- Such a polyester resin is suitably used as the transparent resin (B) from the viewpoint of the refractive index value and transparency in the visible light region.
- R 41 is an alkylene group having 2 to 4 carbon atoms
- R 42 , R 43 , R 44 and R 45 are each independently a hydrogen atom, having 1 to 7 carbon atoms. Represents a saturated hydrocarbon group or an aryl group having 6 to 7 carbon atoms.
- a commercially available product may be used as the transparent resin (B).
- acrylic resins include resins obtained by curing Ogsol EA-F5003 (trade name, manufactured by Osaka Gas Chemical Co., Ltd., refractive index: 1.59).
- acrylic resin that can be purchased as a polymer include polymethyl methacrylate (refractive index: 1.49) and polyisobutyl methacrylate (refractive index: 1.48) manufactured by Tokyo Chemical Industry Co., Ltd.
- polyester resins include OKPH4HT (refractive index: 1.64), OKPH4 (refractive index: 1.61), B-OKP2 (refractive index: 1.63), and Byron manufactured by Osaka Gas Chemical Co., Ltd. 103 (made by Toyobo Co., Ltd., refractive index: 1.58).
- examples of commercially available polycarbonate resin include SP3810 (manufactured by Teijin Chemicals, Inc., refractive index: 1.64), LeXan ML9103 (manufactured by sabic, refractive index 1.59).
- the polymer alloy include Panlite AM-8 series (manufactured by Teijin Kasei Co., Ltd.) and xylex 7507 (manufactured by sabic), which are alloys of polycarbonate and polyester.
- the near-infrared absorption layer 2 is a layer containing a pigment (A) and a transparent resin (B).
- the near-infrared absorbing layer 2 preferably has any of the following optical characteristics (a1) and (a2), and more preferably has both optical characteristics.
- the transmittance is 80% or more in the wavelength region of 450 to 550 nm.
- A2 It has an absorption maximum wavelength ( ⁇ max) in the wavelength region of 650 to 750 nm.
- the NIR filter 10A obtained by laminating the near-infrared absorbing layer 2 and the glass substrate 1 is used as the above (i-1). And (i-2) are preferable because the optical properties can be easily obtained.
- the NIR filter 10A is used as an NIR filter such as a digital still camera or a digital video, it is possible to improve the efficiency of using the light in the visible light wavelength region while shielding the light in the near infrared wavelength region, thereby capturing the dark part. This is advantageous in terms of noise suppression.
- the content of the dye (A) is preferably 0.1 to 20 parts by weight, more preferably 0.1 to 6 parts by weight, based on 100 parts by weight of the transparent resin (B). Particularly preferred is 5 to 6 parts by mass. If content is the said range, since a near-infrared absorption layer can be made thin, it is preferable.
- the near-infrared absorbing layer 2 may contain an optional component, if necessary, in addition to the pigment (A) and the transparent resin (B) as long as the effects of the present invention are not impaired.
- optional components include near infrared or infrared absorbers, color tone correction dyes, ultraviolet absorbers, leveling agents, antistatic agents, thermal stabilizers, light stabilizers, antioxidants, dispersants, flame retardants, and lubricants. And plasticizers.
- the component added to the coating liquid used when forming the near-infrared absorption layer mentioned later for example, the component derived from a silane coupling agent, a heat
- the content of these optional components in the near-infrared absorbing layer is preferably 15 parts by mass or less for 100 parts by mass of the transparent resin (B).
- the film thickness of the near-infrared absorbing layer 2 is not particularly limited, and is appropriately determined according to the use, that is, the arrangement space in the apparatus to be used, the required absorption characteristics, and the like.
- the film thickness is preferably 0.1 to 100 ⁇ m. If the film thickness is less than 0.1 ⁇ m, the near-infrared absorbing ability may not be sufficiently exhibited. On the other hand, if the film thickness exceeds 100 ⁇ m, the flatness of the film is lowered, and there is a possibility that the absorption rate varies.
- the film thickness is more preferably 1 to 50 ⁇ m. If it exists in this range, sufficient near-infrared absorptivity and flatness of a film thickness can be compatible.
- the near-infrared or infrared absorber those which do not impair the effects of the optical properties of the dye (A), preferably the dye (A1) are used.
- inorganic fine particles can be preferably used. Specifically, fine particles such as ITO (Indium Tin Oxides), ATO (Antimony-doped Oxides), cesium tungstate, and lanthanum boride are used. Can be mentioned.
- ITO fine particles and cesium tungstate fine particles have a high light transmittance in the visible wavelength region and a wide range of light absorption including infrared wavelength regions exceeding 1200 nm. This is particularly preferable when shielding is required.
- the number average aggregate particle diameter of the ITO fine particles and cesium tungstate fine particles is preferably from 5 to 200 nm, more preferably from 5 to 100 nm, and even more preferably from 5 to 70 nm, from the viewpoint of suppressing scattering and maintaining transparency.
- the number average agglomerated particle size is a particle size measurement dispersion liquid in which specimen fine particles are dispersed in a dispersion medium such as water or alcohol, using a dynamic light scattering particle size distribution measurement device. The measured value.
- the content of near infrared rays or infrared absorbers is preferably 0.1 to 15 parts by mass, more preferably 0.3 to 10 parts by mass with respect to 100 parts by mass of the transparent resin (B).
- or infrared absorber can exhibit the function, ensuring the other physical property calculated
- UV absorbers benzotriazole UV absorbers, benzophenone UV absorbers, salicylate UV absorbers, cyanoacrylate UV absorbers, triazine UV absorbers, oxanilide UV absorbers, nickel complex UV absorbers Inorganic UV absorbers are preferred.
- a product name “TINUVIN 479” manufactured by Ciba and the like can be cited.
- the inorganic ultraviolet absorber examples include particles of zinc oxide, titanium oxide, cerium oxide, zirconium oxide, mica, kaolin, sericite, and the like.
- the number average aggregate particle diameter of the inorganic ultraviolet absorber is preferably 5 to 200 nm, more preferably 5 to 100 nm, and further preferably 5 to 70 nm from the viewpoint of transparency.
- the content of the ultraviolet absorber is preferably 0.01 to 10 parts by mass, more preferably 0.05 to 5 parts by mass with respect to 100 parts by mass of the transparent resin (B). Thereby, an ultraviolet absorber can exhibit the function, ensuring the other physical property calculated
- the light stabilizer examples include hindered amines and nickel complexes such as nickel bis (octylphenyl) sulfide, nickel complex-3,5-di-tert-butyl-4-hydroxybenzyl phosphate monoethylate, and nickel dibutyldithiocarbamate. Two or more of these may be used in combination.
- the content of the light stabilizer is preferably 0.01 to 10 parts by mass, more preferably 0.5 to 5 parts by mass with respect to 100 parts by mass of the transparent resin (B).
- silane coupling agent examples include 3-aminopropyltriethoxysilane, N-2- (aminoethyl) -3-aminopropyltrimethoxysilane, N-2- (aminoethyl) -N′-2- (amino Ethyl) -3-aminopropyltriethoxysilane, aminosilanes such as 3-anilinopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane Epoxy silanes such as, vinyltrimethoxysilane, vinylsilanes such as N-2- (N-vinylbenzylaminoethyl) -3-aminopropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-chloro Propyltrimethoxysilane, 3-
- the kind of silane coupling agent to be used can be appropriately selected according to the transparent resin (B) used in combination.
- the content of the silane coupling agent is preferably 1 to 20 parts by mass, more preferably 5 to 15 parts by mass with respect to 100 parts by mass of the transparent resin (B) in the coating liquid described below.
- Examples of the photopolymerization initiator include acetophenones, benzophenones, benzoins, benzyls, Michler ketones, benzoin alkyl ethers, benzyl dimethyl ketals, and thioxanthones.
- Examples of the thermal polymerization initiator include azobis-based and peroxide-based polymerization initiators. Two or more of these may be used in combination.
- the content of the light or thermal polymerization initiator is preferably 0.01 to 10 parts by mass, more preferably 0.5 to 5 parts by weight with respect to 100 parts by mass of the transparent resin (B) in the coating liquid described below. Part by mass.
- the near-infrared absorbing layer 2 is prepared by, for example, applying a coating liquid prepared by dispersing and dissolving a pigment (A) and a transparent resin (B) or a raw resin component of a transparent resin (B) on a glass substrate 1. It can be produced by coating, drying, and curing as necessary. By forming the near-infrared absorbing layer 2 by such a method, it can be manufactured uniformly with a desired film thickness. When the near-infrared absorption layer 2 contains the said arbitrary component, a coating liquid contains this arbitrary component.
- the solvent is not particularly limited as long as it is a dispersion medium or a solvent that can stably disperse the pigment (A) and the transparent resin (B) or the raw material components of the transparent resin (B).
- solvent is used in a concept including both a dispersion medium and a solvent.
- the solvent include ketones such as acetone and cyclohexanone; ethers such as tetrahydrofuran, 1,4-dioxane and 1,2-dimethoxyethane; esters such as ethyl acetate, butyl acetate and methoxyethyl acetate; methanol Ethanol, 1-propanol, 2-propanol, 1-butanol, 2-butanol, 2-methyl-1-propanol, 2-methoxyethanol, 4-methyl-2-pentanol, 2-butoxyethanol, 1-methoxy- Examples include alcohols such as 2-propanol and diacetone alcohol; hydrocarbons such as n-hexane, n-heptane, isooctane, benzene, toluene, xylene, gasoline, light oil, and kerosene; acetonitrile, nitromethane, and water. Two or more of these may be used in combination.
- the amount of the solvent is preferably 10 to 5000 parts by mass, particularly preferably 30 to 2000 parts by mass with respect to 100 parts by mass of the transparent resin (B).
- the content of the non-volatile component (solid content) in the coating liquid is preferably 2 to 50% by mass, particularly preferably 5 to 40% by mass, based on the total amount of the coating liquid.
- a stirring device such as a magnetic stirrer, a rotation / revolution mixer, a bead mill, a planetary mill, or an ultrasonic homogenizer can be used.
- a stirring device such as a magnetic stirrer, a rotation / revolution mixer, a bead mill, a planetary mill, or an ultrasonic homogenizer.
- Stirring may be performed continuously or intermittently.
- a coating method such as a gravure coater method, a slit reverse coater method, a micro gravure method, an ink jet method, or a comma coater method can be used.
- a bar coater method, a screen printing method, a flexographic printing method, etc. can also be used.
- the near-infrared absorbing layer 2 is formed on the glass substrate 1 by applying the coating liquid onto the glass substrate 1 and then drying it.
- the coating solution contains the raw material component of the transparent resin (B)
- a curing treatment is further performed.
- the reaction is thermosetting, drying and curing can be performed simultaneously.
- a curing process is provided separately from the drying.
- the NIR filter 10A can be obtained simultaneously with the production of the near-infrared absorbing layer 2.
- the above-described method in which the near-infrared absorbing layer 2 is directly formed on the glass substrate 1 is preferable from the viewpoint of workability and the performance of the obtained NIR filter 10A.
- the near-infrared absorbing layer 2 can be produced into a film by extrusion depending on the type of the transparent resin (B). Further, a plurality of films thus produced are laminated and subjected to thermocompression bonding or the like. It can also be integrated. Moreover, it can also manufacture by peeling the near-infrared absorption layer 2 formed on the peelable base material. In this way, the NIR filter 10A may be manufactured using the near-infrared absorbing layer 2 obtained as a single substance. In this case, the near-infrared absorbing layer 2 is made of glass by an ordinary method, for example, using an adhesive or the like.
- the NIR filter 10 ⁇ / b> A can be manufactured by pasting on the substrate 1.
- the NIR filter of the present invention may have a structure including one near-infrared absorbing layer 2 and one glass substrate 1 like the NIR filter 10A shown in FIG. 1, but the near-infrared absorbing layer 2 is composed of two glass substrates. A configuration in which 1 is sandwiched or a configuration in which the near-infrared absorbing layer 2 is formed or adhered to both main surfaces of the glass substrate 1 may be used. Moreover, the laminated body of the near-infrared absorption layer 2 and the glass base material 1 may comprise a NIR filter with another component.
- NIR filter of the present invention has these various functional films and functional layers, it is preferable that these are composed of dielectric multilayer films.
- the NIR filter of the present invention may be used in combination with a low-pass filter having an ultraviolet shielding ability as a selective wavelength shielding layer. Further, a black frame-shaped light shielding member may be disposed at the end of the main surface of the NIR filter. The position where the light shielding member is disposed in the NIR filter may be either one or both of the main surfaces, or may be the side surfaces.
- the surface on which the NIR filter 10A is bonded to the low-pass filter may be either the surface on the near infrared absorption layer 2 side of the NIR filter 10A or the surface on the glass substrate 1 side, and can be selected as appropriate.
- a dielectric film having a thickness of about 50 to 500 nm on the near infrared absorption layer 2.
- the constituent material of the dielectric film can be appropriately selected from materials that do not impair the spectral characteristics after bonding, such as SiO 2 , SiO x N y , MgF 2 , ZrO 2 , Ta 2 O 5 , and TiO 2 .
- the NIR filter 10A may have the antireflection film, the reflection film, the selective wavelength shielding film, the radiation shielding film, or the like on one or both main surfaces depending on the purpose.
- FIG. 2 is a cross-sectional view schematically showing another example of the NIR filter according to the embodiment of the present invention.
- the NIR filter 10B shown in FIG. 2 includes a glass substrate 1, a near infrared absorption layer 2 formed on one main surface thereof, and a surface of the near infrared absorption layer 2 opposite to the glass substrate 1 side.
- the first dielectric multilayer film 3 formed on the surface of the near-infrared absorbing layer 2 and the surface of the glass substrate 1 opposite to the near-infrared absorbing layer 2 side, that is, on the surface of the glass substrate 1
- the second dielectric multilayer film 4 is formed.
- the glass substrate 1 and the near-infrared absorbing layer 2 can be formed in the same manner as the NIR filter 10A.
- the NIR filter 10B is configured to have the first dielectric multilayer film 3 and the second dielectric multilayer film 4 on the surface of the near-infrared absorbing layer 2 and the surface of the glass substrate 1, respectively.
- the NIR filter of the present invention may have a structure having a dielectric multilayer film only on the surface of the near-infrared absorbing layer among the surface of the near-infrared absorbing layer and the surface of the glass substrate, if necessary.
- the structure which has a dielectric multilayer film only on the surface of a base material may be sufficient.
- the first dielectric multilayer film 3 and the second dielectric multilayer film 4 are films having an optical function obtained by alternately laminating a low refractive index dielectric film and a high refractive index dielectric film. is there. Depending on the design, it can be used as an antireflection film, a reflection film, a selective wavelength shielding layer, or the like that expresses the function of controlling the transmission and shielding of light in a specific wavelength region by utilizing light interference.
- the low refractive index and the high refractive index mean that the refractive index has a high refractive index and a low refractive index with respect to the refractive index of the adjacent layer.
- the high refractive index material constituting the high refractive index dielectric film and the low refractive index material constituting the low refractive index dielectric film two types of materials having different refractive indices are prepared, and a material having a high refractive index is prepared.
- a material having a high refractive index and a material having a low refractive index may be a low refractive index material.
- a dielectric multilayer using a material having a refractive index of 1.45 or more and less than 1.55 as a low refractive index material and a material having a refractive index of 2.2 or more and 2.5 or less as a high refractive index material. It is preferable to form a film.
- examples of the low refractive index material include SiO 2 (1.45), SiO x N y (1.46 or more and less than 1.55), MgF 2 (1.38), and the like.
- a low refractive index material within the above refractive index range is preferable, and SiO 2 is particularly preferable in terms of reproducibility, stability, economy, and the like in film formability.
- the number in the parenthesis after the compound indicates the refractive index.
- the numbers in parentheses after the compounds similarly indicate the refractive index of the high refractive index material.
- a high refractive index material more specifically, Ta 2 O 5 (2.22), TiO 2 (2.41), Nb 2 O 5 (2.3), ZrO 2 (1.99), etc. Is mentioned.
- a high refractive index material in the range of the refractive index of the above preferred, its reproducibility refractive index such as film formability, comprehensively judges including stability, TiO 2, etc. Is particularly preferably used.
- the first dielectric multi-layer film 3 and the second dielectric multi-layer film 4 are made up of the specific number of layers and film thickness, and the high-refractive index material and low-refractive index material used depending on the required optical characteristics.
- the refractive index can be designed using conventional techniques.
- the dielectric multilayer can be manufactured as per the design.
- the number of layers of the dielectric multilayer film depends on the optical characteristics of the dielectric multilayer film, but the total number of laminated layers of the low refractive index dielectric film and the high refractive index dielectric film is preferably 2 to 100. Is more preferable.
- the tact time at the time of manufacture becomes longer, warping of the dielectric multilayer film occurs, and the film thickness of the dielectric multilayer film is increased.
- the first layer may be a low refractive index dielectric film or a high refractive index dielectric film.
- the thinner one is preferable from the viewpoint of reducing the thickness of the NIR filter while satisfying the preferable number of stacked layers.
- the film thickness of such a dielectric multilayer film is preferably 2 to 10 ⁇ m, depending on the optical characteristics of the dielectric multilayer film.
- the film thickness is preferably 0.1 to 1 ⁇ m.
- Warpage may occur due to the stress of the multilayer film.
- the difference in the thickness of the dielectric multilayer film formed on each surface should be as small as possible after forming the film so as to have a desired selective wavelength shielding characteristic. preferable.
- a vacuum film formation process such as a CVD method, a sputtering method, or a vacuum deposition method, or a wet film formation process such as a spray method or a dip method can be used.
- the first dielectric multilayer film 3 is preferably designed as a film having an antireflection function.
- the dielectric multilayer film (antireflection film) improves the transmittance by preventing the reflection of light incident on the NIR filter 10B, and efficiently It has a function of using incident light, can be designed by the usual method using the above materials, and can be formed by the above method accordingly.
- the second dielectric multilayer film 4 has a wavelength selection characteristic that transmits light in the visible region and shields light having a wavelength other than the light shielding region of the glass substrate 1 and the near infrared absorption layer 2.
- the light shielding region of the second dielectric multilayer film 4 may include a light shielding region in the near infrared wavelength region of the glass substrate 1 or the near infrared absorption layer 2.
- the second dielectric multilayer film 4 is preferably a dielectric multilayer film having the following optical characteristics.
- (Ii-1) The transmittance in the wavelength region of 420 to 650 nm is 90% or more.
- Ii-2) The transmittance in the wavelength region of 750 to 1100 nm is 10% or less.
- (Ii-3) The wavelength region on the longer wavelength side than 600 nm. The wavelength on the shortest wavelength side at which the transmittance is 50% in FIG.
- the transmittance of (ii-1) is preferably as high as possible, and more preferably 95% or more.
- the transmittance in (ii-2) is more preferably 5% or less.
- a NIR filter having a light shielding performance with no gap between the glass substrate and the light shielding region in the near infrared wavelength region of the near infrared absorption layer can be obtained.
- Such a second dielectric multilayer film 4 further preferably has a light transmittance of 1% or less in the ultraviolet wavelength region of 400 nm or less. It is particularly preferable that the transmittance of light of 410 nm or less is 1% or less.
- the second dielectric multilayer film 4 is configured to achieve light shielding in a predetermined wavelength region by providing only the film on the surface of the glass substrate 1, but it is necessary. Accordingly, the same function of shielding light in a predetermined wavelength region as this may be achieved by combining a plurality of dielectric multilayer films.
- a dielectric multilayer film having a function of blocking the selected wavelength is obtained by using the NIR filter 10A according to the application of the NIR filter of the present invention. You may arrange
- the number of dielectric multilayer films disposed is not limited.
- One or more dielectric multilayer films may be disposed only on one side, or an independent number of one or more dielectric multilayer films may be disposed on both.
- the stacking order of each component of the NIR filter of the present invention is not particularly limited. It is appropriately set according to the use of the NIR filter of the present invention.
- the NIR filter of the present invention may be provided with a configuration that reduces surface reflection, such as a moth-eye structure, in order to increase the light utilization efficiency.
- the moth-eye structure is a structure in which regular protrusion arrays are formed with a period smaller than 400 nm, for example, and the effective refractive index continuously changes in the thickness direction, so that the surface reflectance of light having a wavelength longer than the period can be increased.
- the surface of the NIR filter for example, the NIR filter 10B shown in FIG. 2 can be formed on the first dielectric multilayer film 3 by molding or the like.
- each absorber is dispersed in a transparent resin by a conventionally known method as a layer that absorbs light of a specific wavelength containing at least one selected from near infrared rays or infrared absorbers, color correction dyes and ultraviolet absorbers.
- a light absorbing layer may also be used.
- Transparent resins include polyester resins, acrylic resins, polyolefin resins, polycarbonate resins, polyamide resins, alkyd resins, and other thermoplastic resins, ene thiol resins, epoxy resins, thermosetting acrylic resins, photocurable acrylic resins, silsesquiskies. Examples thereof include resins that are cured by heat and light, such as oxane resin. The content of each absorbent in these light absorbing layers is appropriately adjusted in a range that does not impair the effects of the present invention, according to the light absorbing ability of each absorbent.
- a light absorption layer for example, an infrared absorption layer in which ITO fine particles are dispersed in a transparent resin can be used.
- the content of the ITO fine particles can be the same as in the case of the near infrared absorption layer. Thereby, it does not show absorption in the light in the visible wavelength region and can maintain transparency.
- the CuO-containing fluorophosphate In the case of adding a dye for the purpose of absorbing near infrared rays or infrared rays in a wide wavelength region as the light absorbing layer, generally, absorption in the visible region is often accompanied, and in this respect, the CuO-containing fluorophosphate according to the present invention.
- a near-infrared absorbing glass substrate made of glass or CuO-containing phosphate glass it is preferable that near-infrared rays or infrared rays can be absorbed while the absorption in the visible light region is kept low.
- the CuO-containing fluorophosphate glass or the CuO-containing phosphate according to the present invention It is preferable to use a near-infrared absorbing glass substrate made of glass.
- the NIR filter of the present invention has a dielectric multilayer film having a function of shielding a selected wavelength, like the NIR filter 10B shown in FIG. 2, the near-infrared absorbing layer 2 and the glass substrate 1 are laminated.
- the evaluation of the angle dependency is performed by, for example, determining the transmittance (T 0 ) when the NIR filter has an incident angle of 0 ° (incident from a direction orthogonal to the main surface) and the transmittance (T 30 ) at an incident angle of 30 °.
- the area in the wavelength range of 550 to 750 nm in the difference spectrum obtained by measuring and subtracting T 30 from T 0 can be used as an index.
- the angle dependence of the NIR filter (1) can be evaluated by the ratio of the area in the wavelength range of 550 to 750 nm in the difference spectrum obtained when T 30 is subtracted from.
- the ratio is preferably 0.9 or less, more 0.9 or less
- the NIR filter 10A and the NIR filter 10B shown in FIGS. 1 and 2 have been described above by taking the NIR filter 10A and the NIR filter 10B shown in FIGS. 1 and 2 as examples.
- the NIR filter of the present invention is not limited to these. As long as it does not contradict the spirit of the present invention, the configuration can be changed as necessary.
- the NIR filter of the present invention can be used as an NIR filter such as a digital still camera, a digital video camera, a surveillance camera, an in-vehicle camera, a webcam, an automatic exposure meter, a PDP NIR filter, or the like.
- the NIR filter of the present invention is preferably used in a solid-state imaging device such as a digital still camera, a digital video camera, a surveillance camera, an in-vehicle camera, and a web camera.
- the NIR filter is, for example, between an imaging lens and a solid-state imaging device. Be placed.
- FIG. 3 is a cross-sectional view schematically showing a main part of an example of a solid-state imaging device using the near NIR filter 10B.
- the solid-state imaging device 20 includes a solid-state imaging element 21, a NIR filter 10B, an imaging lens 23, and a casing 24 for fixing them in the following order on the front surface thereof.
- the imaging lens 23 is fixed by a lens unit 22 further provided inside the housing 24.
- the NIR filter 10B is arranged so that the first dielectric multilayer film 3 is located on the solid-state imaging device 21 side and the second dielectric multilayer film 4 is located on the imaging lens 23 side.
- the solid-state imaging device 21 and the imaging lens 23 are arranged along the optical axis X. Thus, the direction when installing the NIR filter in the apparatus is appropriately selected according to the design.
- the solid-state imaging device of the present invention is a NIR filter having an excellent near-infrared shielding characteristic, which effectively uses near-infrared absorbing glass and a near-infrared absorbing dye, and has an angle dependency even when it has a dielectric multilayer film.
- the solid-state imaging device has high sensitivity.
- Examples 1 to 11 and Examples 14 to 24 are examples of the present invention, and Examples 12, 13, and 25 and 26 are comparative examples.
- the NIR filters of Examples 1 to 11 are NIR filters having a cross-sectional view similar to that shown in FIG.
- the NIR filters of Examples 14 to 24 are NIR filters having a cross-sectional view similar to that shown in FIG.
- NIR filter comprising a glass substrate and a near-infrared absorbing layer
- a squarylium dye compound (F11-2)
- a NIR absorbing dye is added to a 15% by mass cyclohexanone solution of a polyester resin (manufactured by Osaka Gas Chemical Co., Ltd., trade name: B-OKP2, refractive index 1.63).
- a coating solution was obtained by stirring and dissolving at room temperature.
- the obtained coating solution was applied on a fluorophosphate glass (trade name: NF50-E, manufactured by Asahi Glass Co., Ltd.) plate having a thickness of 0.56 mm as a base material by a die coating method using an applicator with a gap of 30 ⁇ m, and 100 ° C.
- a fluorophosphate glass trade name: NF50-E, manufactured by Asahi Glass Co., Ltd.
- Table 2 shows the results of transmittance (average transmittance of 400 to 550 nm and average transmittance of 650 to 720 nm) of the NIR filter 1 measured using a spectrophotometer (trade name: U4100) manufactured by Hitachi, Ltd.
- Example 2 A squarylium dye (compound (F11-3)) as a NIR absorbing dye is added to a 15% by mass cyclohexanone solution of a polyester resin (trade name: B-OKP2, refractive index: 1.63, manufactured by Osaka Gas Chemical Co., Ltd.). After mixing at a ratio of 0.6 parts by mass with respect to parts by mass, a coating solution was obtained by stirring and dissolving at room temperature.
- the obtained coating solution was applied on a fluorophosphate glass (trade name: NF50-E, manufactured by Asahi Glass Co., Ltd.) plate having a thickness of 0.56 mm as a base material by a die coating method using an applicator with a gap of 30 ⁇ m, and 100 ° C.
- NIR filter 2 having a near infrared absorption layer having a film thickness of 2.3 ⁇ m was obtained.
- Table 2 shows the transmittance results of the NIR filter 2 measured using a Hitachi spectrophotometer (trade name: U4100).
- Example 3 A squarylium dye (compound (F12-1)) as a NIR absorbing dye is added to a 15% by mass cyclohexanone solution of a polyester resin (manufactured by Osaka Gas Chemical Co., Ltd., trade name: B-OKP2, refractive index 1.63). After mixing at a ratio of 1.0 part by mass with respect to part by mass, a coating solution was obtained by stirring and dissolving at room temperature.
- a squarylium dye compound (F12-1)
- B-OKP2 refractive index 1.63
- the obtained coating solution was applied on a fluorophosphate glass (trade name: NF50-E, manufactured by Asahi Glass Co., Ltd.) plate having a thickness of 0.56 mm as a base material by a die coating method using an applicator with a gap of 30 ⁇ m, and 100 ° C.
- NIR filter 3 having a near infrared absorption layer having a film thickness of 2.3 ⁇ m was obtained.
- Table 2 shows the transmittance results of the NIR filter 3 measured using a spectrophotometer (trade name: U4100) manufactured by Hitachi, Ltd.
- Example 4 To a 15% by mass cyclohexanone solution of polyisobutyl methacrylate resin (manufactured by Tokyo Chemical Industry Co., Ltd., refractive index 1.48, hereinafter abbreviated as “PIBM”), squarylium dye (compound (F11-3)) as NIR absorbing dye, After mixing at a ratio of 0.6 parts by mass with respect to 100 parts by mass of the acrylic resin, a coating solution was obtained by stirring and dissolving at room temperature.
- PIBM polyisobutyl methacrylate resin
- F11-3 compound (F11-3)
- the obtained coating solution was applied on a fluorophosphate glass (trade name: NF50-E, manufactured by Asahi Glass Co., Ltd.) plate having a thickness of 0.56 mm as a base material by a die coating method using an applicator with a gap of 30 ⁇ m, and 100 ° C.
- a fluorophosphate glass trade name: NF50-E, manufactured by Asahi Glass Co., Ltd.
- Table 2 shows the transmittance results of the NIR filter 4 measured using a spectrophotometer (trade name: U4100) manufactured by Hitachi, Ltd.
- Example 5 A squarylium dye (compound (F11-4)) as a NIR absorbing dye in a 15% by mass cyclohexanone solution of polycarbonate resin (manufactured by Teijin Chemicals Ltd., trade name: SP3810, refractive index 1.64, hereinafter abbreviated as “SP3810”). ) was mixed at a ratio of 2.0 parts by mass with respect to 100 parts by mass of the polycarbonate resin, and then stirred and dissolved at room temperature to obtain a coating solution.
- SP3810 refractive index 1.64
- the obtained coating solution was applied on a fluorophosphate glass (trade name: NF50-E, manufactured by Asahi Glass Co., Ltd.) plate having a thickness of 0.56 mm as a base material by a die coating method using an applicator with a gap of 30 ⁇ m, and 100 ° C.
- NIR filter 5 in which a near-infrared absorption layer having a thickness of 1.1 ⁇ m was formed was obtained.
- Table 2 shows the results of transmittance of the NIR filter 5 measured using a spectrophotometer (trade name: U4100) manufactured by Hitachi, Ltd.
- Example 6 A squarylium dye (compound (F11-5)) as a NIR absorbing dye is added to a 7 mass% cyclohexanone solution of a polyester resin (manufactured by Osaka Gas Chemical Co., Ltd., trade name: B-OKP2, refractive index 1.63), and polyester resin 100 After mixing at a ratio of 3.0 parts by mass with respect to parts by mass, a coating solution was obtained by stirring and dissolving at room temperature.
- a polyester resin manufactured by Osaka Gas Chemical Co., Ltd., trade name: B-OKP2, refractive index 1.63
- the obtained coating solution was applied to a fluorophosphate glass (trade name: NF50-EX, manufactured by Asahi Glass Co., Ltd.) plate having a thickness of 0.23 mm as a base material by a spin coat method, and was heated and dried at 150 ° C. for 60 minutes.
- a fluorophosphate glass trade name: NF50-EX, manufactured by Asahi Glass Co., Ltd.
- Table 2 shows the results of transmittance of the NIR filter 6 measured using a spectrophotometer (trade name: U4100) manufactured by Hitachi, Ltd.
- Example 7 As a NIR absorbing dye, a 50% by mass tetrahydride of squarylium dye (S2084 (trade name, manufactured by FEW Chemicals)) and an acrylic monomer (trade name: Ogsol EA-F5003, refractive index 1.59) manufactured by Osaka Gas Chemical Co., Ltd.
- S2084 trade name, manufactured by FEW Chemicals
- acrylic monomer trade name: Ogsol EA-F5003, refractive index 1.59 manufactured by Osaka Gas Chemical Co., Ltd.
- the obtained coating solution was applied to a fluorophosphate glass (Asahi Glass Co., Ltd., trade name: NF50-E) plate having a thickness of 0.56 mm by a die coating method using an applicator with a gap of 30 ⁇ m, and at 100 ° C. for 5 minutes. Heat-dried. Thereafter, the coating film was cured by irradiating 360 mJ / cm 2 of ultraviolet light having a wavelength of 365 nm to obtain a NIR filter 7 having a near-infrared absorbing layer having a thickness of 8 ⁇ m formed on a fluorophosphate glass plate.
- Table 2 shows the transmittance results of the NIR filter 7 measured using a spectrophotometer (trade name: U4100) manufactured by Hitachi, Ltd.
- Example 8 A phthalocyanine dye (FB22 (trade name, manufactured by Yamada Chemical Co., Ltd.)) as a NIR absorbing dye is added to a 15% by mass cyclohexanone solution of a polyester resin (manufactured by Toyobo Co., Ltd., trade name: Byron 103, refractive index 1.58), After mixing at a ratio of 0.5 parts by mass with respect to 100 parts by mass of the polyester resin, a coating solution was obtained by stirring and dissolving at room temperature.
- FB22 trade name, manufactured by Yamada Chemical Co., Ltd.
- the obtained coating solution was applied on a fluorophosphate glass (trade name: NF50-E, manufactured by Asahi Glass Co., Ltd.) plate having a thickness of 0.56 mm as a base material by a die coating method using an applicator with a gap of 30 ⁇ m, and 100 ° C.
- NIR filter 8 having a near infrared absorption layer with a film thickness of 2.3 ⁇ m was obtained.
- Table 2 shows the results of transmittance of the NIR filter 8 measured using a spectrophotometer (trade name: U4100) manufactured by Hitachi, Ltd.
- Example 9 As a NIR absorbing dye, a cyanine dye (ADS680HO (trade name, manufactured by American dye)) and an acrylic monomer (manufactured by Osaka Gas Chemical Co., trade name: Ogsol EA-F5003, refractive index 1.59) 50% by mass tetrahydride
- the furan solution is obtained by adding 2.0 parts by mass of the cyanine dye to 100 parts by mass of an acrylic monomer (the same amount as the acrylic resin to be obtained), IRGACURE 184 (trade name, manufactured by BASF) as a photopolymerization initiator. After mixing at a ratio of 2.0 parts by mass, a coating solution was obtained by stirring and dissolving at room temperature.
- the obtained coating solution was applied to a fluorophosphate glass (Asahi Glass Co., Ltd., trade name: NF50-E) plate having a thickness of 0.56 mm by a die coating method using an applicator with a gap of 30 ⁇ m, and at 100 ° C. for 5 minutes. Heat-dried. Then, the NIR filter 9 in which a near-infrared absorption layer having a thickness of 8 ⁇ m was formed on a fluorophosphate glass plate was obtained by irradiating the coating film with 360 mJ / cm 2 of ultraviolet light having a wavelength of 365 nm. Table 2 shows the transmittance results of the NIR filter 9 measured using a spectrophotometer (trade name: U4100) manufactured by Hitachi, Ltd.
- Example 10 A squarylium dye (compound (F13-2)) as a NIR absorbing dye is added to a 15% by mass cyclohexanone solution of a polyester resin (manufactured by Osaka Gas Chemical Co., Ltd., trade name: B-OKP2, refractive index 1.63). After mixing at a ratio of 0.6 parts by mass with respect to parts by mass, a coating solution was obtained by stirring and dissolving at room temperature.
- a squarylium dye compound (F13-2)
- B-OKP2 refractive index 1.63
- the obtained coating solution was applied on a fluorophosphate glass (trade name: NF50-E, manufactured by Asahi Glass Co., Ltd.) plate having a thickness of 0.56 mm as a base material by a die coating method using an applicator with a gap of 30 ⁇ m, and 100 ° C.
- NIR filter 10 having a near infrared absorption layer having a film thickness of 2.3 ⁇ m was obtained.
- Table 2 shows the transmittance results of the NIR filter 10 measured using a Hitachi spectrophotometer (trade name: U4100).
- Example 11 A compound (F12-1) and a compound (F11-2) as NIR absorbing dyes are added to a 15% by mass cyclohexanone solution of a polyester resin (trade name: B-OKP2, refractive index: 1.63, manufactured by Osaka Gas Chemical Co., Ltd.) After mixing at a ratio of 4.5 parts by weight and 0.9 parts by weight, respectively, with respect to 100 parts by weight of the resin, a coating liquid was obtained by stirring and dissolving at room temperature.
- a polyester resin trade name: B-OKP2, refractive index: 1.63, manufactured by Osaka Gas Chemical Co., Ltd.
- the obtained coating solution was applied on a fluorophosphate glass (trade name: NF50-E, manufactured by Asahi Glass Co., Ltd.) plate having a thickness of 0.56 mm as a base material by a die coating method using an applicator with a gap of 30 ⁇ m, and 100 ° C.
- NIR filter 11 having a near infrared absorption layer having a film thickness of 2.3 ⁇ m was obtained.
- Table 2 shows the transmittance results of the NIR filter 11 measured using a spectrophotometer (trade name: U4100) manufactured by Hitachi, Ltd.
- Example 12 As a comparative example, the spectral transmittance of a fluorophosphate glass (trade name: NF50-E manufactured by Asahi Glass Co., Ltd.) plate having a thickness of 0.56 mm used as a base material in Examples 1 to 11 (excluding Example 6) was measured by Hitachi, Ltd. Table 2 shows the results measured using a spectrophotometer (trade name: U4100).
- the fluorophosphate glass plate had a transmittance of 10% or less in the wavelength region of 750 to 1000 nm.
- Example 13 Further, as another comparative example, the spectral transmittance of a 0.23 mm thick fluorophosphate glass (manufactured by Asahi Glass Co., Ltd., trade name: NF50-EX) used as a base material in Example 6 was measured using a spectrophotometer manufactured by Hitachi, Ltd. The results measured using (trade name: U4100) are shown in Table 2. The transmittance of this fluorophosphate glass plate in the wavelength region of 750 to 1000 nm was 15% or less.
- NIR filter having dielectric multilayer film (Example 14 to Example 26)
- the NIR filter further having a dielectric multilayer film on both sides of the NIR filters 1 to 11 obtained in Examples 1 to 11, that is, the first dielectric multilayer film (antireflection film) 3 shown in FIG.
- the NIR filters of Examples 14 to 24 having the configuration in which the layer 2, the glass substrate 1, and the second dielectric multilayer film 4 were laminated in this order were produced as NIR filters 14 to 24, respectively.
- a dielectric multilayer film that is, a first dielectric multilayer film (antireflection film) 3 and a second dielectric multilayer are further formed on both sides of the fluorophosphate glass of Examples 12 and 13.
- NIR filters 25 and 26 having the film 4 were produced.
- the first dielectric multilayer film (antireflection film) 3 and the second dielectric multilayer film 4 are the same dielectric films designed and formed as follows in all examples of Examples 14 to 26. A body multilayer film was used.
- Second dielectric multilayer film 4 has a configuration of laminating a SiO 2 film is TiO 2 film and a low refractive index dielectric film is a high refractive index dielectric film alternately was formed by vapor deposition.
- the configuration was determined by simulating to have desired optical characteristics using the number of stacked second dielectric multilayer films 4, the thickness of the TiO 2 film, and the thickness of the SiO 2 film as parameters.
- the transmittance characteristic of the second dielectric multilayer film 4 when the incident angle of light is 0 ° is 90% or more in the wavelength region of 420 to 670 nm, and 1% or less in the wavelength region of 730 to 1100 nm.
- the transmittance was 5% or less over the entire region of 400 nm or less.
- the wavelength on the shortest wavelength side at which the transmittance is 50% in the wavelength region longer than 600 nm of the second dielectric multilayer film 4 is 680 nm.
- the transmittance characteristics of the second dielectric multilayer film 4 when the incident angle of light is 30 ° are such that the transmittance in the wavelength region of 400 to 600 nm is 90% or more and the transmittance in the wavelength region of 730 to 1100 nm.
- the transmittance was 20% or less over the entire region of 5% or less and 400 nm or less.
- FIG. 4 shows a transmission spectrum of the obtained second dielectric multilayer film 4 in the wavelength region of 350 to 1100 nm.
- the total number of layers was 52, and the total film thickness was 6.6 ⁇ m.
- the first dielectric multilayer film (antireflection film) 3 includes a TiO 2 film that is a high refractive index dielectric film and an SiO 2 film that is a low refractive index dielectric film. In a configuration in which layers are alternately stacked, a film was formed by an evaporation method.
- the first dielectric multilayer film (antireflection film) 3 is also designed to have desired optical characteristics by using the number of dielectric multilayer films, the thickness of the TiO 2 film, and the thickness of the SiO 2 film as parameters. And decided the configuration. The total number of layers was 5, and the total film thickness was 0.25 ⁇ m.
- the area of T 0 -T 30 obtained a (550 ⁇ 750 nm), in the area of T 0 -T 30 of NIR filter 25 (550 ⁇ 750nm)
- the area ratio for a filter having no NIR absorption layer was calculated.
- the area ratio of the area of T 0 -T 30 (550 to 750 nm) with respect to the NIR filter 26 was calculated.
- the wavelength of the transmittance spectrum of the transmittance (T 0 ) and transmittance (T 30 ) measured above is 600 to 700 nm. These ranges are shown in FIGS. 5 and 6, respectively. 5 and 6, the spectrum of transmittance (T 0 ) is shown by a solid line, the spectrum of transmittance (T 30 ) is shown by a broken line, and the area of the region surrounded by the solid line and the broken line is T 0 -T This corresponds to an area of 30 (550 to 750 nm).
- FIG. 5 and FIG. 6 show that the transmittance (T 0 ) and the transmittance (T 30 ) of the NIR filter 14 according to Example 14 and the NIR filter 25 according to Example 25 are compared with each other in terms of the slopes of the light absorption curves of wavelengths 630 to 700 nm. In either case, it can be seen that the slope of the absorption curve of light having a wavelength of 630 to 700 nm in the NIR filter is steep. Further, the area of T 0 -T 30 (550 to 750 nm) of the NIR filter 14 is smaller than the same area of the NIR filter 25 and is 0.78 times as shown in Table 3.
- the NIR filter 14 according to Example 14 is an NIR filter having a small near-infrared shielding characteristic with a small incident angle dependency.
- NIR filters 15 to 24 of Examples 15 to 24 from Table 3 all have an area ratio of 0.9 or less, and NIR having good near-infrared shielding characteristics with a small angle dependency of the incident angle like NIR filter 14. It turns out that it is a filter.
- the NIR filter of the present invention has good near-infrared shielding characteristics, it is useful for imaging devices such as digital still cameras, display devices such as plasma displays, glass windows for vehicles (automobiles, etc.), lamps and the like.
- SYMBOLS 10A, 10B ... NIR filter, 1 ... Glass base material, 2 ... Near-infrared absorption layer, 3 ... 1st derivative multilayer film, 4 ... 2nd derivative multilayer film, 20 ... Solid-state imaging device, 21 ... Solid-state image sensor, 22 ... Lens unit, 23 ... Imaging lens, 24 ... Housing.
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Abstract
Description
しかし、このような近赤外線吸収色素は、近赤外線吸収波長域が狭く、他の遮蔽部材と組合せても吸収が十分でない波長域が出現する場合が多く問題であった。このため、近赤外線吸収波長域が広く、かつ、波長630~700nmの光の吸収曲線の傾斜が急峻である光学フィルタが求められていた。
[1] CuO含有フツリン酸塩ガラスまたはCuO含有リン酸塩ガラスからなる近赤外線吸収ガラス基材と、
該近赤外線吸収ガラス基材の少なくとも一方の主面上に近赤外線吸収色素(A)および透明樹脂(B)を含有する近赤外線吸収層と、を有し、
400~550nmの波長域における透過率の平均値が80%以上であり、かつ650~720nmの波長域における透過率の平均値が15%以下であることを特徴とする近赤外線カットフィルタ。
R4およびR6は、それぞれ独立して、水素原子、ハロゲン原子、水酸基、炭素数1~6のアルキル基もしくはアルコキシ基、炭素数1~10のアシルオキシ基、または-NR7R8(R7およびR8は、それぞれ独立して、水素原子、炭素数1~20のアルキル基、または-C(=O)-R9(R9は、水素原子、置換基を有していてもよい炭素数1~20のアルキル基もしくは炭素数6~11のアリール基または、置換基を有していてもよく、炭素原子間に酸素原子を有していてもよい炭素数7~18のアルアリール基))を示す。
R1は、それぞれ独立して、水素原子、置換基を有していてもよい炭素数1~6のアルキル基もしくはアリル基、または炭素数6~11のアリール基もしくはアルアリール基を示し、
R6は、それぞれ独立して、水素原子、ハロゲン原子、水酸基、炭素数1~6のアルキル基もしくはアルコキシ基、または炭素数1~10のアシルオキシ基を示し、
X1は、それぞれ独立して、下記式(1x)または(2x)で示される基であり、
Y1は、それぞれ独立して、下記式(1y)~(5y)で示されるいずれかの基または単結合である。
前記近赤外線吸収層の表面および前記近赤外線吸収ガラス基材の表面の少なくとも一方に有する[1]~[7]のいずれかに記載の近赤外線カットフィルタ。
(ii-1)420~650nmの波長域において透過率が90%以上
(ii-2)750~1100nmの波長域における透過率が10%以下
(ii-3)600nmよりも長波長側の波長域において透過率が50%となる最も短波長側の波長が650nm超730nm以下の波長域内に存在する。
本発明の近赤外線カットフィルタ(以下、NIRフィルタともいう)は、
CuO含有フツリン酸塩ガラスまたはCuO含有リン酸塩ガラスからなる近赤外線吸収ガラス基材と、前記近赤外線吸収ガラス基材の少なくとも一方の主面上に配設される、近赤外線吸収色素(A)および透明樹脂(B)を含有する近赤外線吸収層を有するとともに、
下記光学特性を有するNIRフィルタである。
(i-1)400~550nmの波長域における透過率の平均値が80%以上
(i-2)650~720nmの波長域における透過率の平均値が15%以下
また、本発明のNIRフィルタが、上記近赤外線吸収ガラス基材と上記近赤外線吸収層のみから構成される場合には、特に該NIRフィルタの400~550nmの波長域における透過率の平均値は83%以上が好ましく、85%以上がより好ましい。本発明のNIRフィルタが、上記近赤外線吸収ガラス基材と、上記近赤外線吸収層と、さらに他の構成要素とから構成される場合には、上記近赤外線吸収ガラス基材に上記近赤外線吸収層が積層された積層体において、400~550nmの波長域における透過率の平均値は83%以上が好ましく、85%以上がより好ましい
近赤外線吸収ガラス基材1(以下、近赤外線吸収ガラス基材を単に「ガラス基材」ともいう)は、CuO含有フツリン酸塩ガラスまたはCuO含有リン酸塩ガラス(以下、これらをまとめて「CuO含有ガラス」ともいう。)で構成される。ガラス基材1は、CuO含有ガラスで構成されることで、可視光に対し高い透過率を有するとともに近赤外線に対しても高い遮蔽性を有する。なお、「リン酸塩ガラス」には、ガラスの骨格の一部がSiO2で構成されるケイリン酸塩ガラスも含むものとする。ガラス基材1に使用されるCuO含有ガラスとしては、例えば、以下の組成のものが挙げられる。
近赤外線吸収層2は、近赤外線吸収色素(A)と透明樹脂(B)とを含有する層であり、典型的には、透明樹脂(B)に近赤外線吸収色素(A)が均一に分散してなる層である。
近赤外線吸収色素(A)(以下、「色素(A)」という。)は、可視波長領域(450~600nm)の光を透過し、近赤外波長領域(700~1100nm)の光を吸収する能力を有する近赤外線吸収色素であれば特に制限されない。なお、本発明における色素は顔料、すなわち分子が凝集した状態であってもよい。以下、近赤外線吸収色素を必要に応じて「NIR吸収色素」という。
R4およびR6は、それぞれ独立して、水素原子、ハロゲン原子、水酸基、炭素数1~6のアルキル基もしくはアルコキシ基、炭素数1~10のアシルオキシ基、または-NR7R8(R7およびR8は、それぞれ独立して、水素原子、炭素数1~20のアルキル基、または-C(=O)-R9(R9は、水素原子、置換基を有していてもよい炭素数1~20のアルキル基もしくは炭素数6~11のアリール基または、置換基を有していてもよく、炭素原子間に酸素原子を有していてもよい炭素数7~18のアルアリール基))を示す。
以下、複素環Aは単に環Aということもある。複素環B、複素環Cについても同様である。
なお、化合物(F1)は、上記一般式(F1)で示される構造の共鳴構造を有する式(F1-1)で示される化合物(F1-1)を含む。
化合物(F13)として、例えば、下記式(F13-1)、式(F13-2)でそれぞれ示される化合物等が挙げられる。
R1およびR2は、それぞれ独立して、水素原子、置換基を有していてもよい炭素数1~12のアルキル基もしくはアリル基、または炭素数6~11のアリール基もしくはアルアリール基を示す。R3およびR5は、それぞれ独立して、水素原子、ハロゲン原子、または、炭素数1~6のアルキル基もしくはアルコキシ基を示す。R4およびR6は、それぞれ独立して、水素原子、ハロゲン原子、水酸基、炭素数1~6のアルキル基もしくはアルコキシ基、炭素数1~10のアシルオキシ基、または-NR7R8(R7およびR8は、それぞれ独立して、水素原子、炭素数1~20のアルキル基、または-C(=O)-R9(R9は、水素原子、置換基を有していてもよい炭素数1~20のアルキル基もしくは炭素数6~11のアリール基または、置換基を有していてもよく、炭素原子間に酸素原子を有していてもよい炭素数7~18のアルアリール基))を示す。
化合物(F6)として、例えば、式(F6-1)、式(F6-2)で示される化合物等が挙げられる。
化合物(F11-1)等の化合物(F11)は、例えば、米国特許第5,543,086号明細書に記載された方法で製造できる。
また、化合物(F12)は、例えば、J.Org.Chem.2005,70(13),5164-5173に記載の方法で製造できる。
反応式(F3)によれば、1-メチル-2-ヨード-4-アミノベンゼンのアミノ基に所望の置換基R9を有するカルボン酸塩化物を反応させてアミドを形成する。次いで、ピロリジンを反応させ、さらに3,4-ジヒドロキシ-3-シクロブテン-1,2-ジオン(以下、スクアリン酸という。)と反応させることで、化合物(F12-1)、化合物(F12-2)等が得られる。
反応式(F4)では、まず、8-ヒドロキシジュロリジンにトリフルオロメタンスルホン酸無水物(Tf2O)を反応させ、8-トリフルオロメタンスルホン酸ジュロリジンとし、次いで、これにベンジルアミン(BnNH2)を反応させ8-ベンジルアミノジュロリジンを得、さらにこれを還元して8-アミノジュロリジンを製造する。次いで、8-アミノジュロリジンのアミノ基に所望の置換基R9(化合物(F13-1)の場合-(CH2)6-CH3、化合物(F13-2)の場合-CH(CH(CH3)-CH2-C(CH3)3)-(CH2)2-CH(CH3)-CH2-C(CH3)3)を有するカルボン酸塩化物を反応させてジュロリジンの8位に-NH-C(=O)R9を有する化合物を得る。次いで、この化合物の2モルをスクアリン酸1モルと反応させることで、化合物(F13-1)、化合物(F13-2)等が得られる。
R11は、それぞれ独立して、炭素数1~20のアルキル基、アルコキシ基もしくはアルキルスルホン基、またはそのアニオン種を示す。
R12およびR13は、それぞれ独立して、水素原子または炭素数1~20のアルキル基を示す。
R14、R15、R16およびR17は、それぞれ独立して、水素原子、ハロゲン原子、または炭素数1~6のアルキル基を示す。
nは1~6の整数を示す。
色素(A)は、好ましくは色素(A1)の1種または2種以上を含有する。なお、色素(A)は、色素(A1)以外に、必要に応じてその他のNIR吸収色素を含有してもよい。色素(A)として複数のNIR吸収色素を用いる場合、これらを透明樹脂(B)に分散して作製した樹脂膜に対して測定される400~850nmの波長域の吸収スペクトルにおいて、650~750nmの波長域内に吸収極大波長を発現するようにNIR吸収色素を組合せて用いることが好ましい。さらには、該吸収スペクトルにおいて、可視光域の吸収が少なく、λmaxの吸収ピークの可視光側の傾きが急峻であり、長波長側では傾きは緩やかとなるように、NIR吸収色素を組合せて用いることが好ましい。
透明樹脂(B)としては、屈折率が、1.45以上の透明樹脂が好ましい。屈折率は1.5以上がより好ましく、1.6以上が特に好ましい。透明樹脂(B)の屈折率の上限は特にないが、入手のしやすさ等から1.72程度が好ましい。
本明細書において屈折率とは、20℃において波長589nmにおける屈折率をいい、特に断りのない限り、屈折率とは該屈折率をいう。
近赤外線吸収層2は、色素(A)と透明樹脂(B)を含有する層である。
(a1)450~550nmの波長域において透過率が80%以上である。
(a2)650~750nmの波長域において吸収極大波長(λmax)を有する。
紫外線吸収剤の含有量は、透明樹脂(B)100質量部に対して、好ましくは0.01~10質量部、より好ましくは0.05~5質量部である。これにより、近赤外線吸収層に求められる他の物性を確保しながら、紫外線吸収剤がその機能を発揮できる。
本発明のNIRフィルタは、図1に示すNIRフィルタ10Aのように近赤外線吸収層2とガラス基材1を各1個ずつ有する構成でもよいが、近赤外線吸収層2を2枚のガラス基材1が挟み込む構成や、ガラス基材1の両方の主面に近赤外線吸収層2が形成または貼着された構成でもよい。また、近赤外線吸収層2およびガラス基材1の積層体が、他の構成要素とともにNIRフィルタを構成してもよい。他の構成要素としては、反射防止膜、特定の波長域の光を反射する反射膜、特定の波長域の光の透過と遮蔽を制御する選択波長遮蔽層、α線等の放射線を遮蔽する放射線遮蔽膜等が挙げられる。本発明のNIRフィルタが、これら各種機能膜や機能層を有する場合、これらは誘電体多層膜で構成されることが好ましい。
(ii-1)420~650nmの波長域において透過率が90%以上
(ii-2)750~1100nmの波長域における透過率が10%以下
(ii-3)600nmよりも長波長側の波長域において透過率が50%となる最も短波長側の波長が650nm超730nm以下の波長域内に存在する。
以下に図3を参照しながら、本発明のNIRフィルタを撮像レンズと固体撮像素子との間に配置して用いた本発明の固体撮像装置の一例を説明する。
図3は、上記近NIRフィルタ10Bを用いた固体撮像装置の一例の要部を概略的に示す断面図である。この固体撮像装置20は、図3に示すように、固体撮像素子21と、その前面に以下の順に、NIRフィルタ10Bと、撮像レンズ23を有し、さらにこれらを固定する筐体24とを有する。撮像レンズ23は、筐体24の内側にさらに設けられたレンズユニット22により固定されている。NIRフィルタ10Bは固体撮像素子21側に第1の誘電体多層膜3が、撮像レンズ23側に第2の誘電体多層膜4が位置するように配置されている。固体撮像素子21と、撮像レンズ23とは、光軸Xに沿って配置されている。このようにNIRフィルタを装置に設置する際の方向については、設計に応じて適宜選択される。
(例1)
ポリエステル樹脂(大阪ガスケミカル社製、商品名:B-OKP2、屈折率1.63)の15質量%シクロヘキサノン溶液に、NIR吸収色素としてスクアリリウム系色素(化合物(F11-2))を、ポリエステル樹脂100質量部に対して0.6質量部となる割合で混合した後、室温にて撹拌・溶解することで塗工液を得た。得られた塗工液を、基材として厚さ0.56mmのフツリン酸ガラス(旭硝子社製、商品名:NF50-E)板上にギャップ30μmのアプリケーターを用いてダイコート法により塗布し、100℃で5分間加熱乾燥させ、膜厚2.3μmの近赤外線吸収層が形成されたNIRフィルタ1を得た。日立製作所社製分光光度計(商品名:U4100)を用いて測定されたNIRフィルタ1の透過率(400~550nmの平均透過率および650~720nmの平均透過率)の結果を表2に示す。
ポリエステル樹脂(大阪ガスケミカル社製、商品名:B-OKP2、屈折率1.63)の15質量%シクロヘキサノン溶液に、NIR吸収色素としてスクアリリウム系色素(化合物(F11-3))を、ポリエステル樹脂100質量部に対して0.6質量部となる割合で混合した後、室温にて撹拌・溶解することで塗工液を得た。得られた塗工液を、基材として厚さ0.56mmのフツリン酸ガラス(旭硝子社製、商品名:NF50-E)板上にギャップ30μmのアプリケーターを用いてダイコート法により塗布し、100℃で5分間加熱乾燥させ、膜厚2.3μmの近赤外線吸収層が形成されたNIRフィルタ2を得た。日立製作所社製分光光度計(商品名:U4100)を用いて測定されたNIRフィルタ2の透過率の結果を表2に示す。
ポリエステル樹脂(大阪ガスケミカル社製、商品名:B-OKP2、屈折率1.63)の15質量%シクロヘキサノン溶液に、NIR吸収色素としてスクアリリウム系色素(化合物(F12-1))を、ポリエステル樹脂100質量部に対して1.0質量部となる割合で混合した後、室温にて撹拌・溶解することで塗工液を得た。得られた塗工液を、基材として厚さ0.56mmのフツリン酸ガラス(旭硝子社製、商品名:NF50-E)板上にギャップ30μmのアプリケーターを用いてダイコート法により塗布し、100℃で5分間加熱乾燥させ、膜厚2.3μmの近赤外線吸収層が形成されたNIRフィルタ3を得た。日立製作所社製分光光度計(商品名:U4100)を用いて測定されたNIRフィルタ3の透過率の結果を表2に示す。
ポリイソブチルメタクリレート樹脂(東京化成社製、屈折率1.48、以下「PIBM」と省略する。)の15質量%シクロヘキサノン溶液に、NIR吸収色素としてスクアリリウム系色素(化合物(F11-3))を、アクリル樹脂100質量部に対して0.6質量部となる割合で混合した後、室温にて撹拌・溶解することで塗工液を得た。得られた塗工液を、基材として厚さ0.56mmのフツリン酸ガラス(旭硝子社製、商品名:NF50-E)板上にギャップ30μmのアプリケーターを用いてダイコート法により塗布し、100℃で5分間加熱乾燥させ、膜厚2.3μmの近赤外線吸収層が形成されたNIRフィルタ4を得た。日立製作所社製分光光度計(商品名:U4100)を用いて測定されたNIRフィルタ4の透過率の結果を表2に示す。
ポリカーボネート樹脂(帝人化成社製、商品名:SP3810、屈折率1.64、以下「SP3810」と省略する。)の15質量%シクロヘキサノン溶液に、NIR吸収色素としてスクアリリウム系色素(化合物(F11-4))を、ポリカーボネート樹脂100質量部に対して2.0質量部となる割合で混合した後、室温にて撹拌・溶解することで塗工液を得た。得られた塗工液を、基材として厚さ0.56mmのフツリン酸ガラス(旭硝子社製、商品名:NF50-E)板上にギャップ30μmのアプリケーターを用いてダイコート法により塗布し、100℃で5分間加熱乾燥させ、膜厚1.1μmの近赤外線吸収層が形成されたNIRフィルタ5を得た。日立製作所社製分光光度計(商品名:U4100)を用いて測定されたNIRフィルタ5の透過率の結果を表2に示す。
ポリエステル樹脂(大阪ガスケミカル社製、商品名:B-OKP2、屈折率1.63)の7質量%シクロヘキサノン溶液に、NIR吸収色素としてスクアリリウム系色素(化合物(F11-5))を、ポリエステル樹脂100質量部に対して3.0質量部となる割合で混合した後、室温にて撹拌・溶解することで塗工液を得た。得られた塗工液を、基材として厚さ0.23mmのフツリン酸ガラス(旭硝子社製、商品名:NF50-EX)板上にスピンコート法により塗布し、150℃で60分間加熱乾燥させ、膜厚1μmの近赤外線吸収層が形成されたNIRフィルタ6を得た。日立製作所社製分光光度計(商品名:U4100)を用いて測定されたNIRフィルタ6の透過率の結果を表2に示す。
NIR吸収色素としてスクアリリウム系色素(S2084(商品名、FEWケミカルズ社製))と、アクリルモノマー(大阪ガスケミカル社製、商品名:オグソールEA-F5003、屈折率1.59)の50質量%テトラヒドフラン溶液とを、アクリルモノマー(得られるアクリル樹脂と同量である)100質量部に対して上記スクアリリウム系色素が2.5質量部、光重合開始剤としてIRGACURE184(商品名、1-ヒドロキシ-シクロヘキシル-フェニル-ケトン、BASF社製)を2.0質量部となる割合で混合した後、室温にて撹拌・溶解することで塗工液を得た。得られた塗工液を、厚さ0.56mmのフツリン酸ガラス(旭硝子社製、商品名:NF50-E)板上にギャップ30μmのアプリケーターを用いてダイコート法により塗布し、100℃で5分間加熱乾燥させた。その後、塗膜に波長365nmの紫外線を360mJ/cm2照射して硬化させ、フツリン酸ガラス板上に膜厚8μmの近赤外線吸収層が形成されたNIRフィルタ7を得た。日立製作所社製分光光度計(商品名:U4100)を用いて測定されたNIRフィルタ7の透過率の結果を表2に示す。
ポリエステル樹脂(東洋紡績社製、商品名:バイロン103、屈折率1.58)の15質量%シクロヘキサノン溶液に、NIR吸収色素としてフタロシアニン系色素(FB22(商品名、山田化学工業社製))を、ポリエステル樹脂100質量部に対して0.5質量部となる割合で混合した後、室温にて撹拌・溶解することで塗工液を得た。得られた塗工液を、基材として厚さ0.56mmのフツリン酸ガラス(旭硝子社製、商品名:NF50-E)板上にギャップ30μmのアプリケーターを用いてダイコート法により塗布し、100℃で5分間加熱乾燥させ、膜厚2.3μmの近赤外線吸収層が形成されたNIRフィルタ8を得た。日立製作所社製分光光度計(商品名:U4100)を用いて測定されたNIRフィルタ8の透過率の結果を表2に示す。
NIR吸収色素としてシアニン系色素(ADS680HO(商品名、American dye社製))と、アクリルモノマー(大阪ガスケミカル社製、商品名:オグソールEA-F5003、屈折率1.59)の50質量%テトラヒドフラン溶液とを、アクリルモノマー(得られるアクリル樹脂と同量である)100質量部に対して上記シアニン系色素が2.0質量部、光重合開始剤としてIRGACURE184(商品名、BASF社製)を2.0質量部となる割合で混合した後、室温にて撹拌・溶解することで塗工液を得た。得られた塗工液を、厚さ0.56mmのフツリン酸ガラス(旭硝子社製、商品名:NF50-E)板上にギャップ30μmのアプリケーターを用いてダイコート法により塗布し、100℃で5分間加熱乾燥させた。その後、塗膜に波長365nmの紫外線を360mJ/cm2照射して硬化させ、フツリン酸ガラス板上に膜厚8μmの近赤外線吸収層が形成されたNIRフィルタ9を得た。日立製作所社製分光光度計(商品名:U4100)を用いて測定されたNIRフィルタ9の透過率の結果を表2に示す。
ポリエステル樹脂(大阪ガスケミカル社製、商品名:B-OKP2、屈折率1.63)の15質量%シクロヘキサノン溶液に、NIR吸収色素としてスクアリリウム系色素(化合物(F13-2))を、ポリエステル樹脂100質量部に対して0.6質量部となる割合で混合した後、室温にて撹拌・溶解することで塗工液を得た。得られた塗工液を、基材として厚さ0.56mmのフツリン酸ガラス(旭硝子社製、商品名:NF50-E)板上にギャップ30μmのアプリケーターを用いてダイコート法により塗布し、100℃で5分間加熱乾燥させ、膜厚2.3μmの近赤外線吸収層が形成されたNIRフィルタ10を得た。日立製作所社製分光光度計(商品名:U4100)を用いて測定されたNIRフィルタ10の透過率の結果を表2に示す。
ポリエステル樹脂(大阪ガスケミカル社製、商品名:B-OKP2、屈折率1.63)の15質量%シクロヘキサノン溶液に、NIR吸収色素として化合物(F12-1)と化合物(F11-2)を、ポリエステル樹脂100質量部に対して各々4.5質量部と0.9質量部となる割合で混合した後、室温にて撹拌・溶解することで塗工液を得た。得られた塗工液を、基材として厚さ0.56mmのフツリン酸ガラス(旭硝子社製、商品名:NF50-E)板上にギャップ30μmのアプリケーターを用いてダイコート法により塗布し、100℃で5分間加熱乾燥させ、膜厚2.3μmの近赤外線吸収層が形成されたNIRフィルタ11を得た。日立製作所社製分光光度計(商品名:U4100)を用いて測定されたNIRフィルタ11の透過率の結果を表2に示す。
比較例として例1~11(例6を除く)において基材として用いた厚さ0.56mmのフツリン酸ガラス(旭硝子社製、商品名:NF50-E)板の分光透過率を、日立製作所社製分光光度計(商品名:U4100)を用いて測定された結果を表2に示す。なお、このフツリン酸ガラス板の750~1000nmの波長域における透過率は10%以下であった。
さらに、別の比較例として例6において基材として用いた厚さ0.23mmのフツリン酸ガラス(旭硝子社製、商品名:NF50-EX)板の分光透過率を、日立製作所社製分光光度計(商品名:U4100)を用いて測定された結果を表2に示す。なお、このフツリン酸ガラス板の750~1000nmの波長域における透過率は15%以下であった。
(例14~例26)
上記例1~11で得られたNIRフィルタ1~11の両側にさらに誘電体多層膜を有するNIRフィルタ、すなわち、図2に示す第1の誘電体多層膜(反射防止膜)3、近赤外線吸収層2、ガラス基材1、第2の誘電体多層膜4の順に積層された構成の例14~24のNIRフィルタを、それぞれNIRフィルタ14~24として作製した。同様にして、例25、例26として、例12、例13のフツリン酸ガラスの両側にさらに誘電体多層膜、すなわち第1の誘電体多層膜(反射防止膜)3および第2の誘電体多層膜4を有するNIRフィルタ25、26を作製した。なお、第1の誘電体多層膜(反射防止膜)3および第2の誘電体多層膜4としては、例14~例26の全ての例において、以下のとおりに設計し成膜した同一の誘電体多層膜を用いた。
第2の誘電体多層膜4は、高屈折率誘電体膜であるTiO2膜と低屈折率誘電体膜であるSiO2膜を交互に積層する構成において、蒸着法により成膜した。
第2の誘電体多層膜4の積層数、TiO2膜の膜厚およびSiO2膜の膜厚をパラメータとして、所望の光学特性を有するようにシミュレーションして構成を決定した。
得られたNIRフィルタ14~26について、入射角0°のときの透過率(T0)と、入射角30°の透過率(T30)を測定し、T0からT30を差し引いたときに得られる差スペクトルにおける、波長550~750nmの範囲の面積(「T0-T30の面積(550~750nm)」と示す。)を算出した。また、NIRフィルタ14~18およびNIRフィルタ20~24については、得られたT0-T30の面積(550~750nm)を、NIRフィルタ25のT0-T30の面積(550~750nm)で除して、NIR吸収層を有しないフィルタに対する面積比を算出した。同様にNIRフィルタ19については、NIRフィルタ26に対するT0-T30の面積(550~750nm)の面積比を算出した。これらの結果をNIRフィルタの構成および平均透過率(透過率(T0)における、400~550nmの平均透過率および650~720nmの平均透過率)とともに表3に示す。
Claims (10)
- CuO含有フツリン酸塩ガラスまたはCuO含有リン酸塩ガラスからなる近赤外線吸収ガラス基材と、
該近赤外線吸収ガラス基材の少なくとも一方の主面上に近赤外線吸収色素(A)および透明樹脂(B)を含有する近赤外線吸収層と、を有し、
400~550nmの波長域における透過率の平均値が80%以上であり、かつ650~720nmの波長域における透過率の平均値が15%以下であることを特徴とする近赤外線カットフィルタ。 - 前記透明樹脂(B)の屈折率は1.45以上である請求項1に記載の近赤外線カットフィルタ。
- 前記近赤外線吸収色素(A)が、透明樹脂(B)に分散して作製した樹脂膜の400~850nmの波長域の吸収スペクトルにおいて、650~750nmの波長域内に吸収極大波長を有する請求項1または2に記載の近赤外線カットフィルタ。
- 前記近赤外線吸収色素(A)が、シアニン系化合物、フタロシアニン系化合物、およびスクアリリウム系化合物からなる群から選ばれる少なくとも1種である請求項3に記載の近赤外線カットフィルタ。
- 前記スクアリリウム系化合物が、下記式(F1)で示されるスクアリリウム系化合物から選ばれる少なくとも1種である請求項4に記載の近赤外線カットフィルタ。
R4およびR6は、それぞれ独立して、水素原子、ハロゲン原子、水酸基、炭素数1~6のアルキル基もしくはアルコキシ基、炭素数1~10のアシルオキシ基、または-NR7R8(R7およびR8は、それぞれ独立して、水素原子、炭素数1~20のアルキル基、または-C(=O)-R9(R9は、水素原子、置換基を有していてもよい炭素数1~20のアルキル基もしくは炭素数6~11のアリール基または、置換基を有していてもよく、炭素原子間に酸素原子を有していてもよい炭素数7~18のアルアリール基))を示す。
R1とR2、R2とR5、およびR1とR3のうち少なくとも1組は、互いに連結して窒素原子と共に員数が5または6のそれぞれ複素環A、複素環B、および複素環Cを形成し、R1およびR2は複素環を形成していない場合、それぞれ独立して、水素原子、置換基を有していてもよい炭素数1~6のアルキル基もしくはアリル基、または炭素数6~11のアリール基もしくはアルアリール基を示し、R3およびR5は複素環を形成していない場合、それぞれ独立して、水素原子、ハロゲン原子、または、炭素数1~6のアルキル基もしくはアルコキシ基を示す。 - 前記スクアリリウム系化合物が、下記式(F11)で示されるスクアリリウム系化合物から選ばれる少なくとも1種である請求項4または5に記載の近赤外線カットフィルタ。
R1は、それぞれ独立して、水素原子、置換基を有していてもよい炭素数1~6のアルキル基もしくはアリル基、または炭素数6~11のアリール基もしくはアルアリール基を示し、
R3は、それぞれ独立して、水素原子、ハロゲン原子、または炭素数1~6のアルキル基もしくはアルコキシ基を示し、
R6は、それぞれ独立して、水素原子、ハロゲン原子、水酸基、炭素数1~6のアルキル基もしくはアルコキシ基、または炭素数1~10のアシルオキシ基を示し、
R7およびR8は、それぞれ独立して、水素原子、炭素数1~20のアルキル基、または-C(=O)-R9(R9は、水素原子、置換基を有していてもよい炭素数1~20のアルキル基もしくは炭素数6~11のアリール基または、置換基を有していてもよく、炭素原子間に酸素原子を有していてもよい炭素数7~18のアルアリール基)を示し、
X1は、それぞれ独立して、下記式(1x)または(2x)で示される基であり、
Y1は、それぞれ独立して、下記式(1y)~(5y)で示されるいずれかの基または単結合である。
- 前記透明樹脂(B)100質量部に対する前記近赤外線吸収色素(A)の割合が0.1~20質量部である請求項1~6のいずれか1項に記載の近赤外線カットフィルタ。
- 屈折率が1.45以上1.55未満の誘電体膜と屈折率が2.2以上2.5以下の誘電体膜とを交互に積層した誘電体多層膜を、
前記近赤外線吸収層の表面および前記近赤外線吸収ガラス基材の表面の少なくとも一方に有する請求項1~7のいずれか1項に記載の近赤外線カットフィルタ。 - 前記誘電体多層膜の少なくとも一方が、下記特性を備える請求項8に記載の近赤外線カットフィルタ。
(ii-1)420~650nmの波長域において透過率が90%以上
(ii-2)750~1100nmの波長域における透過率が10%以下
(ii-3)600nmよりも長波長側の波長域において透過率が50%となる最も短波長側の波長が650nm超730nm以下の波長域内に存在する。 - 被写体側または光源の光が入射する側から順に、請求項1~9のいずれか1項に記載の近赤外線カットフィルタと固体撮像素子が配置された固体撮像装置。
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CN104755969B (zh) | 2018-06-08 |
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JP6233308B2 (ja) | 2017-11-22 |
US9445017B2 (en) | 2016-09-13 |
KR102056613B1 (ko) | 2019-12-17 |
CN104755969A (zh) | 2015-07-01 |
CN108761612B (zh) | 2021-04-06 |
JP6504226B2 (ja) | 2019-04-24 |
US20150146057A1 (en) | 2015-05-28 |
CN108761612A (zh) | 2018-11-06 |
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