WO2012102501A3 - 웨이퍼 레벨 발광 다이오드 패키지 및 그것을 제조하는 방법 - Google Patents
웨이퍼 레벨 발광 다이오드 패키지 및 그것을 제조하는 방법 Download PDFInfo
- Publication number
- WO2012102501A3 WO2012102501A3 PCT/KR2012/000314 KR2012000314W WO2012102501A3 WO 2012102501 A3 WO2012102501 A3 WO 2012102501A3 KR 2012000314 W KR2012000314 W KR 2012000314W WO 2012102501 A3 WO2012102501 A3 WO 2012102501A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- wafer
- light emitting
- emitting diode
- diode package
- level light
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 5
- 239000004065 semiconductor Substances 0.000 abstract 3
- 230000008878 coupling Effects 0.000 abstract 2
- 238000010168 coupling process Methods 0.000 abstract 2
- 238000005859 coupling reaction Methods 0.000 abstract 2
- 238000000638 solvent extraction Methods 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0095—Post-treatment of devices, e.g. annealing, recrystallisation or short-circuit elimination
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/22—Roughened surfaces, e.g. at the interface between epitaxial layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/507—Wavelength conversion elements the elements being in intimate contact with parts other than the semiconductor body or integrated with parts other than the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
- H01L2933/0041—Processes relating to semiconductor body packages relating to wavelength conversion elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
- H01L2933/0066—Processes relating to semiconductor body packages relating to arrangements for conducting electric current to or from the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/483—Containers
- H01L33/486—Containers adapted for surface mounting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/52—Encapsulations
- H01L33/56—Materials, e.g. epoxy or silicone resin
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Led Device Packages (AREA)
- Led Devices (AREA)
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP12739572.1A EP2669963B1 (en) | 2011-01-28 | 2012-01-13 | Method of fabricating a light emitting diode package |
JP2013551891A JP2014507804A (ja) | 2011-01-28 | 2012-01-13 | ウエハーレベル発光ダイオードパッケージ及びそれを製造する方法 |
CN201280006927.5A CN103339749B (zh) | 2011-01-28 | 2012-01-13 | 晶片级发光二极管封装件及制造此的方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020110008736A KR101761834B1 (ko) | 2011-01-28 | 2011-01-28 | 웨이퍼 레벨 발광 다이오드 패키지 및 그것을 제조하는 방법 |
KR10-2011-0008736 | 2011-01-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2012102501A2 WO2012102501A2 (ko) | 2012-08-02 |
WO2012102501A3 true WO2012102501A3 (ko) | 2012-09-20 |
Family
ID=46581248
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2012/000314 WO2012102501A2 (ko) | 2011-01-28 | 2012-01-13 | 웨이퍼 레벨 발광 다이오드 패키지 및 그것을 제조하는 방법 |
Country Status (7)
Country | Link |
---|---|
US (2) | US8592232B2 (ko) |
EP (2) | EP2720283B1 (ko) |
JP (1) | JP2014507804A (ko) |
KR (1) | KR101761834B1 (ko) |
CN (1) | CN103339749B (ko) |
TW (1) | TWI528595B (ko) |
WO (1) | WO2012102501A2 (ko) |
Families Citing this family (60)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9269878B2 (en) | 2011-05-27 | 2016-02-23 | Lg Innotek Co., Ltd. | Light emitting device and light emitting apparatus |
KR101350159B1 (ko) * | 2012-08-31 | 2014-02-13 | 한국광기술원 | 백색 발광 다이오드 제조방법 |
JP2014150196A (ja) | 2013-02-01 | 2014-08-21 | Toshiba Corp | 半導体発光装置およびその製造方法 |
TWI622189B (zh) | 2013-02-08 | 2018-04-21 | 晶元光電股份有限公司 | 發光二極體元件 |
JP6071661B2 (ja) * | 2013-03-11 | 2017-02-01 | 株式会社東芝 | 半導体発光装置 |
DE102013103079A1 (de) * | 2013-03-26 | 2014-10-02 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip und Verfahren zur Herstellung eines optoelektronischen Halbleiterchips |
CN105378952B (zh) * | 2013-05-13 | 2018-01-12 | 首尔半导体(株) | 发光器件封装件及其制造方法以及包含该发光器件封装件的车灯和背光单元 |
JP6394052B2 (ja) * | 2013-05-13 | 2018-09-26 | 日亜化学工業株式会社 | 発光装置及びその製造方法 |
CN104183682A (zh) * | 2013-05-27 | 2014-12-03 | 崴发控股有限公司 | 覆晶式发光二极管元件及其封装结构 |
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JP2015056652A (ja) * | 2013-09-13 | 2015-03-23 | 株式会社東芝 | 窒化物半導体発光装置 |
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DE102013222200A1 (de) * | 2013-10-31 | 2015-08-27 | Osram Opto Semiconductors Gmbh | Elektronisches Bauelement und Verfahren zum Herstellen eines elektronischen Bauelements |
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JP6349953B2 (ja) * | 2014-05-20 | 2018-07-04 | 日亜化学工業株式会社 | 発光装置の製造方法 |
US10910350B2 (en) * | 2014-05-24 | 2021-02-02 | Hiphoton Co., Ltd. | Structure of a semiconductor array |
JP6398381B2 (ja) * | 2014-06-30 | 2018-10-03 | 日亜化学工業株式会社 | 発光装置及びその製造方法 |
TWI634675B (zh) * | 2014-07-14 | 2018-09-01 | 新世紀光電股份有限公司 | 發光元件結構 |
JP6384202B2 (ja) * | 2014-08-28 | 2018-09-05 | 日亜化学工業株式会社 | 発光装置の製造方法 |
JP6519127B2 (ja) * | 2014-09-19 | 2019-05-29 | 日亜化学工業株式会社 | 発光装置の製造方法 |
KR20160036862A (ko) | 2014-09-26 | 2016-04-05 | 서울바이오시스 주식회사 | 발광 소자 제조 방법 및 그것에 의해 제조된 발광 소자 |
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CN107210344B (zh) * | 2014-11-18 | 2020-05-15 | 首尔半导体株式会社 | 发光装置及包括该发光装置的车辆用照明灯 |
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US9755105B2 (en) * | 2015-01-30 | 2017-09-05 | Nichia Corporation | Method for producing light emitting device |
US10270008B2 (en) * | 2015-03-16 | 2019-04-23 | Seoul Viosys Co., Ltd. | Light emitting element including metal bulk |
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TWI581460B (zh) * | 2015-09-04 | 2017-05-01 | 錼創科技股份有限公司 | 發光元件及其製作方法 |
TWI552385B (zh) * | 2015-09-04 | 2016-10-01 | 錼創科技股份有限公司 | 發光元件 |
US10170455B2 (en) | 2015-09-04 | 2019-01-01 | PlayNitride Inc. | Light emitting device with buffer pads |
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JP6776855B2 (ja) * | 2016-12-06 | 2020-10-28 | 日亜化学工業株式会社 | 発光装置 |
WO2018113922A1 (en) * | 2016-12-20 | 2018-06-28 | Osram Opto Semiconductors Gmbh | Light emitting element with an optoelectronic semiconductor chip |
CN107039363A (zh) * | 2017-03-09 | 2017-08-11 | 广东美的制冷设备有限公司 | 功率模块及其制造方法 |
US10937768B2 (en) | 2017-03-13 | 2021-03-02 | Seoul Semiconductor Co., Ltd. | Method of manufacturing display device |
US11018285B2 (en) | 2017-03-23 | 2021-05-25 | Seoul Semiconductor Co., Ltd. | Display device and manufacturing method thereof |
DE102017107834A1 (de) * | 2017-04-11 | 2018-10-11 | Osram Opto Semiconductors Gmbh | Strahlungsemittierendes bauelement |
US10658558B2 (en) | 2017-10-10 | 2020-05-19 | Lumileds Llc | LED package including converter confinement |
BR112020009088B1 (pt) | 2017-11-08 | 2023-12-12 | Seoul Viosys Co., Ltd | Unidade de led para exibição e aparelho de exibição utilizando a mesma |
CN109994593A (zh) * | 2017-12-29 | 2019-07-09 | 中芯长电半导体(江阴)有限公司 | 发光二极管芯片的封装结构及封装方法 |
TWI672834B (zh) * | 2018-01-25 | 2019-09-21 | 致伸科技股份有限公司 | 光源模組以及光源模組之製造方法 |
US10998297B1 (en) * | 2018-05-15 | 2021-05-04 | Facebook Technologies, Llc | Nano-porous metal interconnect for light sources |
US10643964B2 (en) * | 2018-07-02 | 2020-05-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | Structures for bonding a group III-V device to a substrate by stacked conductive bumps |
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KR20210065353A (ko) | 2019-11-27 | 2021-06-04 | 삼성전자주식회사 | 반도체 패키지 |
TWI768433B (zh) * | 2020-08-19 | 2022-06-21 | 聯嘉光電股份有限公司 | 三合一RGB mini-LED製程方法 |
DE102021116242A1 (de) * | 2021-06-23 | 2022-12-29 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zum Herstellen eines optoelektronischen Bauelements und optoelektronisches Bauelement |
CN113991004A (zh) * | 2021-10-26 | 2022-01-28 | 东莞市中麒光电技术有限公司 | Led基板制作方法、led基板、led器件制作方法及led器件 |
DE102022121519A1 (de) * | 2022-08-25 | 2024-03-07 | Ams-Osram International Gmbh | Strahlung emittierendes halbleiterbauelement und verfahren zur herstellung von strahlung emittierenden halbleiterbauelementen |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002118293A (ja) * | 2000-07-31 | 2002-04-19 | Nichia Chem Ind Ltd | 発光装置とその形成方法 |
JP2005268431A (ja) * | 2004-03-17 | 2005-09-29 | Nichia Chem Ind Ltd | 発光装置及びその製造方法 |
KR20060029418A (ko) * | 2004-10-01 | 2006-04-06 | 엘지이노텍 주식회사 | 발광 다이오드 및 그 제조방법 |
KR20060095271A (ko) * | 2005-02-28 | 2006-08-31 | 삼성전기주식회사 | 파장변환형 발광 다이오드 패키지 제조방법 |
JP2010141176A (ja) * | 2008-12-12 | 2010-06-24 | Toshiba Corp | 発光装置及びその製造方法 |
Family Cites Families (51)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06151977A (ja) * | 1992-11-11 | 1994-05-31 | Sharp Corp | 光半導体装置 |
US5886383A (en) * | 1997-01-10 | 1999-03-23 | International Rectifier Corporation | Integrated schottky diode and mosgated device |
JPH10335383A (ja) * | 1997-05-28 | 1998-12-18 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
US6706546B2 (en) * | 1998-10-09 | 2004-03-16 | Fujitsu Limited | Optical reflective structures and method for making |
JP4234269B2 (ja) * | 1999-07-16 | 2009-03-04 | 浜松ホトニクス株式会社 | 半導体装置及びその製造方法 |
US6835963B2 (en) * | 1999-12-22 | 2004-12-28 | Kabushiki Kaisha Toshiba | Light-emitting element and method of fabrication thereof |
US6734453B2 (en) * | 2000-08-08 | 2004-05-11 | Translucent Photonics, Inc. | Devices with optical gain in silicon |
FI114740B (fi) * | 2001-04-27 | 2004-12-15 | Wallac Oy | Kuvantavan mittauslaitteen varjostinlevy |
US7042024B2 (en) * | 2001-11-09 | 2006-05-09 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting apparatus and method for manufacturing the same |
US6611052B2 (en) * | 2001-11-16 | 2003-08-26 | Micron Technology, Inc. | Wafer level stackable semiconductor package |
JP4277496B2 (ja) * | 2001-11-21 | 2009-06-10 | 富士電機デバイステクノロジー株式会社 | 半導体装置 |
JP2004087253A (ja) * | 2002-08-26 | 2004-03-18 | Toyota Central Res & Dev Lab Inc | 有機電子デバイス |
CN1759492B (zh) * | 2003-03-10 | 2010-04-28 | 丰田合成株式会社 | 固体元件装置的制造方法 |
DE10311820A1 (de) * | 2003-03-13 | 2004-09-30 | Schott Glas | Halbleiterlichtquelle |
KR20050034936A (ko) * | 2003-10-10 | 2005-04-15 | 삼성전기주식회사 | 형광체를 이용한 파장변환형 발광 다이오드 패키지 및제조방법 |
US7518158B2 (en) * | 2003-12-09 | 2009-04-14 | Cree, Inc. | Semiconductor light emitting devices and submounts |
JP4954712B2 (ja) * | 2003-12-24 | 2012-06-20 | ジーイー ライティング ソリューションズ エルエルシー | 窒化物フリップチップからのサファイヤのレーザ・リフトオフ |
JP4163641B2 (ja) * | 2004-02-25 | 2008-10-08 | 株式会社東芝 | Led素子 |
CN1977404B (zh) * | 2004-02-20 | 2010-05-12 | 欧瑞康太阳Ip股份公司(特吕巴赫) | 扩散阻挡层和扩散阻挡层的制造方法 |
JP2005294820A (ja) * | 2004-03-12 | 2005-10-20 | Showa Denko Kk | Iii族窒化物半導体発光素子及びその形成方法、それを用いたランプ、光源 |
JP2006066868A (ja) * | 2004-03-23 | 2006-03-09 | Toyoda Gosei Co Ltd | 固体素子および固体素子デバイス |
US7256483B2 (en) * | 2004-10-28 | 2007-08-14 | Philips Lumileds Lighting Company, Llc | Package-integrated thin film LED |
US7462502B2 (en) * | 2004-11-12 | 2008-12-09 | Philips Lumileds Lighting Company, Llc | Color control by alteration of wavelength converting element |
US7098070B2 (en) * | 2004-11-16 | 2006-08-29 | International Business Machines Corporation | Device and method for fabricating double-sided SOI wafer scale package with through via connections |
JP2006269079A (ja) * | 2005-03-22 | 2006-10-05 | Hitachi Lighting Ltd | 光源モジュール、液晶表示装置および光源モジュールの製造方法 |
TWI294694B (en) * | 2005-06-14 | 2008-03-11 | Ind Tech Res Inst | Led wafer-level chip scale packaging |
JP2009509326A (ja) * | 2005-09-19 | 2009-03-05 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 可変色の発光装置及びその制御方法 |
US7375379B2 (en) * | 2005-12-19 | 2008-05-20 | Philips Limileds Lighting Company, Llc | Light-emitting device |
JP2007250629A (ja) * | 2006-03-14 | 2007-09-27 | Toshiba Corp | 発光装置及びその製造方法、並びに蛍光パターン形成物 |
KR100854328B1 (ko) * | 2006-07-07 | 2008-08-28 | 엘지전자 주식회사 | 발광 소자 패키지 및 그 제조방법 |
TWI418054B (zh) * | 2006-08-08 | 2013-12-01 | Lg Electronics Inc | 發光裝置封裝與製造此封裝之方法 |
JP4905009B2 (ja) * | 2006-09-12 | 2012-03-28 | 豊田合成株式会社 | 発光装置の製造方法 |
KR100845856B1 (ko) * | 2006-12-21 | 2008-07-14 | 엘지전자 주식회사 | 발광 소자 패키지 및 그 제조방법 |
JP2008171997A (ja) * | 2007-01-11 | 2008-07-24 | Rohm Co Ltd | GaN系半導体発光素子 |
JP5251038B2 (ja) * | 2007-08-23 | 2013-07-31 | 豊田合成株式会社 | 発光装置 |
EP2040316B1 (de) * | 2007-09-20 | 2014-08-06 | OSRAM Opto Semiconductors GmbH | Optoelektronisches Bauelement und Verfahren zur Herstellung eines optoelektronischen Bauelements |
JP2009099647A (ja) * | 2007-10-15 | 2009-05-07 | Yokogawa Electric Corp | 半導体実装方法 |
JP2009111102A (ja) * | 2007-10-29 | 2009-05-21 | Mitsubishi Chemicals Corp | 集積型発光源およびその製造方法 |
US20090140279A1 (en) * | 2007-12-03 | 2009-06-04 | Goldeneye, Inc. | Substrate-free light emitting diode chip |
US8878219B2 (en) * | 2008-01-11 | 2014-11-04 | Cree, Inc. | Flip-chip phosphor coating method and devices fabricated utilizing method |
KR101428719B1 (ko) * | 2008-05-22 | 2014-08-12 | 삼성전자 주식회사 | 발광 소자 및 발광 장치의 제조 방법, 상기 방법을이용하여 제조한 발광 소자 및 발광 장치 |
JP2008263246A (ja) * | 2008-08-06 | 2008-10-30 | Sanyo Electric Co Ltd | 発光装置 |
KR101539246B1 (ko) * | 2008-11-10 | 2015-07-24 | 삼성전자 주식회사 | 광추출 효율이 향상된 발광 장치의 제조 방법 및 그 방법으로 제조된 발광 장치 |
JP4799606B2 (ja) * | 2008-12-08 | 2011-10-26 | 株式会社東芝 | 光半導体装置及び光半導体装置の製造方法 |
EP2380217A2 (en) * | 2008-12-24 | 2011-10-26 | 3M Innovative Properties Company | Method of making double-sided wavelength converter and light generating device using same |
JP5518502B2 (ja) * | 2009-01-27 | 2014-06-11 | シチズン電子株式会社 | 発光ダイオードの製造方法 |
US7842544B2 (en) * | 2009-02-20 | 2010-11-30 | National Semiconductor Corporation | Integrated circuit micro-module |
JP2011009572A (ja) * | 2009-06-26 | 2011-01-13 | Citizen Electronics Co Ltd | フリップチップ実装型led及びフリップチップ実装型ledの製造方法。 |
US9254506B2 (en) * | 2010-07-02 | 2016-02-09 | 3M Innovative Properties Company | Moisture resistant coating for barrier films |
KR101230622B1 (ko) * | 2010-12-10 | 2013-02-06 | 이정훈 | 집단 본딩을 이용한 반도체 디바이스 제조 방법 및 그것에 의해 제조된 반도체 디바이스 |
JP5679869B2 (ja) * | 2011-03-07 | 2015-03-04 | スタンレー電気株式会社 | 光半導体素子の製造方法 |
-
2011
- 2011-01-28 KR KR1020110008736A patent/KR101761834B1/ko active IP Right Grant
-
2012
- 2012-01-13 EP EP14150304.5A patent/EP2720283B1/en active Active
- 2012-01-13 WO PCT/KR2012/000314 patent/WO2012102501A2/ko active Application Filing
- 2012-01-13 EP EP12739572.1A patent/EP2669963B1/en active Active
- 2012-01-13 CN CN201280006927.5A patent/CN103339749B/zh active Active
- 2012-01-13 JP JP2013551891A patent/JP2014507804A/ja not_active Withdrawn
- 2012-01-26 US US13/359,287 patent/US8592232B2/en active Active
- 2012-01-30 TW TW101102898A patent/TWI528595B/zh active
-
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- 2013-11-07 US US14/074,098 patent/US8916898B2/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002118293A (ja) * | 2000-07-31 | 2002-04-19 | Nichia Chem Ind Ltd | 発光装置とその形成方法 |
JP2005268431A (ja) * | 2004-03-17 | 2005-09-29 | Nichia Chem Ind Ltd | 発光装置及びその製造方法 |
KR20060029418A (ko) * | 2004-10-01 | 2006-04-06 | 엘지이노텍 주식회사 | 발광 다이오드 및 그 제조방법 |
KR20060095271A (ko) * | 2005-02-28 | 2006-08-31 | 삼성전기주식회사 | 파장변환형 발광 다이오드 패키지 제조방법 |
JP2010141176A (ja) * | 2008-12-12 | 2010-06-24 | Toshiba Corp | 発光装置及びその製造方法 |
Also Published As
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JP2014507804A (ja) | 2014-03-27 |
EP2720283B1 (en) | 2018-05-16 |
EP2669963A2 (en) | 2013-12-04 |
US8916898B2 (en) | 2014-12-23 |
EP2720283A3 (en) | 2015-12-23 |
US20140061709A1 (en) | 2014-03-06 |
CN103339749B (zh) | 2016-03-30 |
TW201244183A (en) | 2012-11-01 |
TWI528595B (zh) | 2016-04-01 |
US20130026518A1 (en) | 2013-01-31 |
EP2669963B1 (en) | 2018-08-22 |
EP2669963A4 (en) | 2015-12-23 |
CN103339749A (zh) | 2013-10-02 |
KR20120087505A (ko) | 2012-08-07 |
KR101761834B1 (ko) | 2017-07-27 |
US8592232B2 (en) | 2013-11-26 |
EP2720283A2 (en) | 2014-04-16 |
WO2012102501A2 (ko) | 2012-08-02 |
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