WO2008156049A1 - 固体撮像素子及びこれを用いた撮像装置 - Google Patents
固体撮像素子及びこれを用いた撮像装置 Download PDFInfo
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- WO2008156049A1 WO2008156049A1 PCT/JP2008/060965 JP2008060965W WO2008156049A1 WO 2008156049 A1 WO2008156049 A1 WO 2008156049A1 JP 2008060965 W JP2008060965 W JP 2008060965W WO 2008156049 A1 WO2008156049 A1 WO 2008156049A1
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- pixel
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- exit pupil
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- 238000003384 imaging method Methods 0.000 title abstract 3
- 210000001747 pupil Anatomy 0.000 abstract 4
- 238000006243 chemical reaction Methods 0.000 abstract 2
- 230000003287 optical effect Effects 0.000 abstract 2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14609—Pixel-elements with integrated switching, control, storage or amplification elements
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/702—SSIS architectures characterised by non-identical, non-equidistant or non-planar pixel layout
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1462—Coatings
- H01L27/14621—Colour filter arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1462—Coatings
- H01L27/14623—Optical shielding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14625—Optical elements or arrangements associated with the device
- H01L27/14627—Microlenses
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/80—Camera processing pipelines; Components thereof
- H04N23/84—Camera processing pipelines; Components thereof for processing colour signals
- H04N23/843—Demosaicing, e.g. interpolating colour pixel values
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/10—Circuitry of solid-state image sensors [SSIS]; Control thereof for transforming different wavelengths into image signals
- H04N25/11—Arrangement of colour filter arrays [CFA]; Filter mosaics
- H04N25/13—Arrangement of colour filter arrays [CFA]; Filter mosaics characterised by the spectral characteristics of the filter elements
- H04N25/134—Arrangement of colour filter arrays [CFA]; Filter mosaics characterised by the spectral characteristics of the filter elements based on three different wavelength filter elements
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/703—SSIS architectures incorporating pixels for producing signals other than image signals
- H04N25/704—Pixels specially adapted for focusing, e.g. phase difference pixel sets
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Focusing (AREA)
- Color Television Image Signal Generators (AREA)
- Studio Devices (AREA)
- Automatic Focus Adjustment (AREA)
Abstract
光学系により結像される被写体像を光電変換する固体撮像素子は、2次元状に配置され各々が入射光に応じた電荷を生成し蓄積する光電変換部を有する複数の画素を備え、複数の画素の各々は、光学系の射出瞳の中心から実質的に偏心していない射出瞳の領域からの光束を受光して光電変換して得た信号を出力する第1の画素、及び、光学系の射出瞳の中心から実質的に偏心した射出瞳の領域からの光束を選択的に受光して光電変換して得た信号を出力する第2の画素のうちのいずれかであり、複数の画素が2次元状に配置された複数の画素ブロックに分けられ、m及びnをそれぞれ2以上の整数としたとき、各画素ブロックは、複数の画素のうち列方向にm個、行方向にn個、2次元状に並んだm×n個の画素からなり、各画素ブロックの画素のうちの少なくとも1つの画素は、第1の画素であり、同じ画素ブロックの第1の画素には、同じ色のカラーフィルタが設けられ、複数の画素ブロックのうちの少なくとも1つの画素ブロックのm×n個の画素のうちの少なくとも1つの画素は第2の画素である。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08765648.4A EP2164269B1 (en) | 2007-06-16 | 2008-06-16 | Solid-state image sensor and imaging apparatus equipped with solid-state image sensor |
EP20213761.8A EP3823272A1 (en) | 2007-06-16 | 2008-06-16 | Solid-state image sensor and imaging apparatus equipped with solid-state image sensor |
US12/591,987 US8466998B2 (en) | 2007-06-16 | 2009-12-07 | Solid-state image sensor and imaging apparatus equipped with solid-state image sensor |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-159607 | 2007-06-16 | ||
JP2007159607A JP5040458B2 (ja) | 2007-06-16 | 2007-06-16 | 固体撮像素子及びこれを用いた撮像装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/591,987 Continuation US8466998B2 (en) | 2007-06-16 | 2009-12-07 | Solid-state image sensor and imaging apparatus equipped with solid-state image sensor |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008156049A1 true WO2008156049A1 (ja) | 2008-12-24 |
Family
ID=40156208
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/060965 WO2008156049A1 (ja) | 2007-06-16 | 2008-06-16 | 固体撮像素子及びこれを用いた撮像装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8466998B2 (ja) |
EP (2) | EP2164269B1 (ja) |
JP (1) | JP5040458B2 (ja) |
WO (1) | WO2008156049A1 (ja) |
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US9338341B2 (en) | 2008-07-10 | 2016-05-10 | Canon Kabushiki Kaisha | Image pickup apparatus capable of reading proper functional pixels when image signals are mixed or skipped and are read out, and method of controlling the same |
WO2017057293A1 (ja) * | 2015-09-30 | 2017-04-06 | 株式会社ニコン | 被写体検出装置および撮像装置 |
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Also Published As
Publication number | Publication date |
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EP2164269A1 (en) | 2010-03-17 |
EP3823272A1 (en) | 2021-05-19 |
US20100091161A1 (en) | 2010-04-15 |
EP2164269A4 (en) | 2013-08-07 |
US8466998B2 (en) | 2013-06-18 |
EP2164269B1 (en) | 2021-01-20 |
JP2008312073A (ja) | 2008-12-25 |
JP5040458B2 (ja) | 2012-10-03 |
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