US20040019176A1 - Curable fluoropolymer, curable resin composition containing the same, and antireflection film - Google Patents
Curable fluoropolymer, curable resin composition containing the same, and antireflection film Download PDFInfo
- Publication number
- US20040019176A1 US20040019176A1 US10/362,719 US36271903A US2004019176A1 US 20040019176 A1 US20040019176 A1 US 20040019176A1 US 36271903 A US36271903 A US 36271903A US 2004019176 A1 US2004019176 A1 US 2004019176A1
- Authority
- US
- United States
- Prior art keywords
- fluorine
- structural unit
- formula
- carbon atoms
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 0 *C1(B)C2CC(C3C4/C=C\C(C4)C32)C1([2H])C.C1=C\C2CC/1C1C3CCC(C3)C21 Chemical compound *C1(B)C2CC(C3C4/C=C\C(C4)C32)C1([2H])C.C1=C\C2CC/1C1C3CCC(C3)C21 0.000 description 8
- HNUKTDKISXPDPA-UHFFFAOYSA-N C=C(C)=O Chemical compound C=C(C)=O HNUKTDKISXPDPA-UHFFFAOYSA-N 0.000 description 6
- GJMYTVANQYQILM-UHFFFAOYSA-N C=C(F)C(=O)CC(CCCC(COC(=O)C(=C)F)OC(=O)C(=C)F)COC(=O)C(=C)F Chemical compound C=C(F)C(=O)CC(CCCC(COC(=O)C(=C)F)OC(=O)C(=C)F)COC(=O)C(=C)F GJMYTVANQYQILM-UHFFFAOYSA-N 0.000 description 4
- KKGPOEPDLHUJCN-UHFFFAOYSA-N C.C.C.C.C.C.C.CCOCC(C)CC Chemical compound C.C.C.C.C.C.C.CCOCC(C)CC KKGPOEPDLHUJCN-UHFFFAOYSA-N 0.000 description 3
- INBPAKAZSSZPLT-UHFFFAOYSA-N C.C.C.C.C.CCC(C)CC=C[Rf] Chemical compound C.C.C.C.C.CCC(C)CC=C[Rf] INBPAKAZSSZPLT-UHFFFAOYSA-N 0.000 description 3
- GDVNAQVUTZRCEL-UHFFFAOYSA-N C.C.C.C.C.CCOCC(C)CC Chemical compound C.C.C.C.C.CCOCC(C)CC GDVNAQVUTZRCEL-UHFFFAOYSA-N 0.000 description 3
- IUHWRHYSZLTHRR-UHFFFAOYSA-N C.C.C.C.CC=CCC(C)CC Chemical compound C.C.C.C.CC=CCC(C)CC IUHWRHYSZLTHRR-UHFFFAOYSA-N 0.000 description 3
- OFFSYFDUGVFSAJ-UHFFFAOYSA-N C=C.C=CC(=O)OCFC(F)(F)(F)(F)(F)(F)(F)(F)(F)(F)(F)#CC#CC#CCOC(=O)F Chemical compound C=C.C=CC(=O)OCFC(F)(F)(F)(F)(F)(F)(F)(F)(F)(F)(F)#CC#CC#CCOC(=O)F OFFSYFDUGVFSAJ-UHFFFAOYSA-N 0.000 description 3
- JGJACFAJDXEHCU-UHFFFAOYSA-N CC(C)(OC(=O)CF)C(=O)C1=CC=CC=C1.CC(C)(OC(=O)F)C(=O)C1=CC=CC=C1 Chemical compound CC(C)(OC(=O)CF)C(=O)C1=CC=CC=C1.CC(C)(OC(=O)F)C(=O)C1=CC=CC=C1 JGJACFAJDXEHCU-UHFFFAOYSA-N 0.000 description 3
- LBXHTCBFQHMKOZ-UHFFFAOYSA-N C.C.C.C.C.CC=CCC(C)CC Chemical compound C.C.C.C.C.CC=CCC(C)CC LBXHTCBFQHMKOZ-UHFFFAOYSA-N 0.000 description 2
- QXGNFCXEQZIVJY-UHFFFAOYSA-N C.C.C.C.C.CCC(C)CO[Rf] Chemical compound C.C.C.C.C.CCC(C)CO[Rf] QXGNFCXEQZIVJY-UHFFFAOYSA-N 0.000 description 2
- HPPDSAHWRHZBAF-UHFFFAOYSA-N C.C.CCCO[Rf].CF Chemical compound C.C.CCCO[Rf].CF HPPDSAHWRHZBAF-UHFFFAOYSA-N 0.000 description 2
- MXHAMIKTNDJXTH-UHFFFAOYSA-N C=C(=O)C(COCC1(F)OC(F)(F)C2(F)OC(F)(F)C(F)=C12)C(C(=C)=O)(C(F)(F)F)C(F)(F)F Chemical compound C=C(=O)C(COCC1(F)OC(F)(F)C2(F)OC(F)(F)C(F)=C12)C(C(=C)=O)(C(F)(F)F)C(F)(F)F MXHAMIKTNDJXTH-UHFFFAOYSA-N 0.000 description 2
- IIHAWKUTPSERGB-UHFFFAOYSA-N CCOCFCCF.CF Chemical compound CCOCFCCF.CF IIHAWKUTPSERGB-UHFFFAOYSA-N 0.000 description 2
- LJWZGBHGYYIYCA-UHFFFAOYSA-N C.C.C.C.CCC(C)CC=C[Rf] Chemical compound C.C.C.C.CCC(C)CC=C[Rf] LJWZGBHGYYIYCA-UHFFFAOYSA-N 0.000 description 1
- GWERYQLNKWFEES-UHFFFAOYSA-N C.C.CC(C)(C(=O)F)C(=O)C1=CC=CC=C1.CC(C)(OC(=O)CF)C(O)C1=CC=CC=C1 Chemical compound C.C.CC(C)(C(=O)F)C(=O)C1=CC=CC=C1.CC(C)(OC(=O)CF)C(O)C1=CC=CC=C1 GWERYQLNKWFEES-UHFFFAOYSA-N 0.000 description 1
- DXWFHRUHBGKIJY-UHFFFAOYSA-N C.C.CCCCF.CCOF.CF Chemical compound C.C.CCCCF.CCOF.CF DXWFHRUHBGKIJY-UHFFFAOYSA-N 0.000 description 1
- WXYTZVAREYCCLD-UHFFFAOYSA-N C=C(=C)(=O)C(F)(F)F Chemical compound C=C(=C)(=O)C(F)(F)F WXYTZVAREYCCLD-UHFFFAOYSA-N 0.000 description 1
- UXDYZNFKTPKSOO-UHFFFAOYSA-M C=C(C)C(=O)O[Rf] Chemical compound C=C(C)C(=O)O[Rf] UXDYZNFKTPKSOO-UHFFFAOYSA-M 0.000 description 1
- CLTVMRNAHINTIP-UHFFFAOYSA-N C=C(CC)C(F)(F)F.CF.FCC(F)(F)O1C=C(F)C1(F)F Chemical compound C=C(CC)C(F)(F)F.CF.FCC(F)(F)O1C=C(F)C1(F)F CLTVMRNAHINTIP-UHFFFAOYSA-N 0.000 description 1
- ZVBNCLFXAHQOSA-UHFFFAOYSA-N C=C(F)C(F)(F)COCC(C)CC Chemical compound C=C(F)C(F)(F)COCC(C)CC ZVBNCLFXAHQOSA-UHFFFAOYSA-N 0.000 description 1
- KSLPBAXDROXKIG-UHFFFAOYSA-N C=C(F)C(F)(F)OC(F)(F)CC(F)(F)F.CCF.CF.FC1=CC(C(F)(F)F)C(F)(F)OC1(F)F Chemical compound C=C(F)C(F)(F)OC(F)(F)CC(F)(F)F.CCF.CF.FC1=CC(C(F)(F)F)C(F)(F)OC1(F)F KSLPBAXDROXKIG-UHFFFAOYSA-N 0.000 description 1
- XBHJCIZYGIIWOZ-UHFFFAOYSA-N C=C(F)OC(F)(F)C(F)(F)OC(F)(F)COCC(C)CC Chemical compound C=C(F)OC(F)(F)C(F)(F)OC(F)(F)COCC(C)CC XBHJCIZYGIIWOZ-UHFFFAOYSA-N 0.000 description 1
- WGOKUAKGAGQMNO-UHFFFAOYSA-K C=C.C=C(F)C(F)(F)O[Rf]CC(C)CC.C=C(F)CF.C=CF[Rf]CC(C)CC.C=CO[Rf]C.C=C[Rf]C.C=C[Rf]CC(C)CC.CCC(C)C[Rf]1C=CO1.C[Rf]F.C[Rf]OF Chemical compound C=C.C=C(F)C(F)(F)O[Rf]CC(C)CC.C=C(F)CF.C=CF[Rf]CC(C)CC.C=CO[Rf]C.C=C[Rf]C.C=C[Rf]CC(C)CC.CCC(C)C[Rf]1C=CO1.C[Rf]F.C[Rf]OF WGOKUAKGAGQMNO-UHFFFAOYSA-K 0.000 description 1
- JWZSFLMJWDQTGD-UHFFFAOYSA-N C=CC(F)(F)C(F)(F)C(F)(F)C(F)(F)COCC(C)CC Chemical compound C=CC(F)(F)C(F)(F)C(F)(F)C(F)(F)COCC(C)CC JWZSFLMJWDQTGD-UHFFFAOYSA-N 0.000 description 1
- GRYMSDIEHWBQSB-UHFFFAOYSA-N CC(C)(C(=O)F)C(=O)C1=CC=CC=C1.CC1(C)(C(O)C2=CC=CC=C2)OC1(=O)CF Chemical compound CC(C)(C(=O)F)C(=O)C1=CC=CC=C1.CC1(C)(C(O)C2=CC=CC=C2)OC1(=O)CF GRYMSDIEHWBQSB-UHFFFAOYSA-N 0.000 description 1
- JMTKRYVBNBXEDM-UHFFFAOYSA-N CC(C)(C)C(F)(F)F.CCC1(F)(C(F)(F)F)C=C(F)C(F)(F)OC1(F)F.CF.FC1=CC(C(F)(F)F)C(F)(F)OC1(F)F Chemical compound CC(C)(C)C(F)(F)F.CCC1(F)(C(F)(F)F)C=C(F)C(F)(F)OC1(F)F.CF.FC1=CC(C(F)(F)F)C(F)(F)OC1(F)F JMTKRYVBNBXEDM-UHFFFAOYSA-N 0.000 description 1
- ZVCBHDGYWYYOFN-UHFFFAOYSA-N CC(C)(F)F.CC(F)(C(F)(F)F)C(F)(F)F.CCC(C)(C(F)(F)F)C(F)(F)F.CCF.CCF.CCF.CCF.CCF.CCF.CCF.CCFC(F)(F)F.CCFCC(F)(F)CF.FC1(F)CC1.FCC(F)(F)CF1C(C(F)(F)F)C1(F)F.FCCCF1C(C(F)(F)F)C1(F)F Chemical compound CC(C)(F)F.CC(F)(C(F)(F)F)C(F)(F)F.CCC(C)(C(F)(F)F)C(F)(F)F.CCF.CCF.CCF.CCF.CCF.CCF.CCF.CCFC(F)(F)F.CCFCC(F)(F)CF.FC1(F)CC1.FCC(F)(F)CF1C(C(F)(F)F)C1(F)F.FCCCF1C(C(F)(F)F)C1(F)F ZVCBHDGYWYYOFN-UHFFFAOYSA-N 0.000 description 1
- SGVUHPSBDNVHKL-UHFFFAOYSA-N CC1CCCC(C)C1 Chemical compound CC1CCCC(C)C1 SGVUHPSBDNVHKL-UHFFFAOYSA-N 0.000 description 1
- GGQOXKOHMFKMLR-UHFFFAOYSA-N CC1OCOC1C Chemical compound CC1OCOC1C GGQOXKOHMFKMLR-UHFFFAOYSA-N 0.000 description 1
- DFJOMBFBBATLBC-UHFFFAOYSA-N CCC(F)(F)C(F)(F)OC1(F)(C(F)(F)F)C=C(F)OC1(F)F Chemical compound CCC(F)(F)C(F)(F)OC1(F)(C(F)(F)F)C=C(F)OC1(F)F DFJOMBFBBATLBC-UHFFFAOYSA-N 0.000 description 1
- OJXZQPBBSBIYKD-UHFFFAOYSA-N O=C(F)CC(=O)F Chemical compound O=C(F)CC(=O)F OJXZQPBBSBIYKD-UHFFFAOYSA-N 0.000 description 1
- VSOLAKXGOZUIKZ-UHFFFAOYSA-N OCC(O)COCC1(F)OC(F)(F)C2(F)(C(F)(F)F)(C(F)(F)F)OC(F)(F)C(F)=C12 Chemical compound OCC(O)COCC1(F)OC(F)(F)C2(F)(C(F)(F)F)(C(F)(F)F)OC(F)(F)C(F)=C12 VSOLAKXGOZUIKZ-UHFFFAOYSA-N 0.000 description 1
- NQMPMIVOSCRWDY-UHFFFAOYSA-N OCC1(F)(C(F)(F)F)(C(F)(F)F)OC(F)(F)C2(F)OC(F)(F)C(F)=C21 Chemical compound OCC1(F)(C(F)(F)F)(C(F)(F)F)OC(F)(F)C2(F)OC(F)(F)C(F)=C21 NQMPMIVOSCRWDY-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
- C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
- C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/14—Esterification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F16/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
- C08F16/12—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
- C08F16/32—Monomers containing two or more unsaturated aliphatic radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F214/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
- C08F214/18—Monomers containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/04—Polymers provided for in subclasses C08C or C08F
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/226,355 US7670640B2 (en) | 2000-08-29 | 2005-09-15 | Curable fluorine-containing polymer, curable resin composition prepared from same and antireflection film |
US12/684,622 US20100144993A1 (en) | 2000-08-29 | 2010-01-08 | Curable fluorine-containing polymer, curable resin composition prepared from same and antireflection film |
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000259583 | 2000-08-29 | ||
JP2000-259583 | 2000-08-29 | ||
JP2000303723 | 2000-10-03 | ||
JP2000-303723 | 2000-10-03 | ||
JP2001-73025 | 2001-03-14 | ||
JP2001073025 | 2001-03-14 | ||
PCT/JP2001/007344 WO2002018457A1 (fr) | 2000-08-29 | 2001-08-28 | Fluoropolymère durcissable, composition de résine durcissable le contenant, et film antireflet |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/226,335 Continuation US7545808B2 (en) | 1996-12-16 | 2005-09-15 | Memory organization in a switching device |
US11/226,355 Continuation US7670640B2 (en) | 2000-08-29 | 2005-09-15 | Curable fluorine-containing polymer, curable resin composition prepared from same and antireflection film |
Publications (1)
Publication Number | Publication Date |
---|---|
US20040019176A1 true US20040019176A1 (en) | 2004-01-29 |
Family
ID=27344456
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/362,719 Abandoned US20040019176A1 (en) | 2000-08-29 | 2001-08-28 | Curable fluoropolymer, curable resin composition containing the same, and antireflection film |
US11/226,355 Active 2024-09-07 US7670640B2 (en) | 2000-08-29 | 2005-09-15 | Curable fluorine-containing polymer, curable resin composition prepared from same and antireflection film |
US12/684,622 Abandoned US20100144993A1 (en) | 2000-08-29 | 2010-01-08 | Curable fluorine-containing polymer, curable resin composition prepared from same and antireflection film |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/226,355 Active 2024-09-07 US7670640B2 (en) | 2000-08-29 | 2005-09-15 | Curable fluorine-containing polymer, curable resin composition prepared from same and antireflection film |
US12/684,622 Abandoned US20100144993A1 (en) | 2000-08-29 | 2010-01-08 | Curable fluorine-containing polymer, curable resin composition prepared from same and antireflection film |
Country Status (8)
Country | Link |
---|---|
US (3) | US20040019176A1 (zh) |
EP (1) | EP1347001B1 (zh) |
JP (2) | JP3742861B2 (zh) |
KR (1) | KR100711156B1 (zh) |
AT (1) | ATE323726T1 (zh) |
DE (1) | DE60118965T2 (zh) |
TW (1) | TW526213B (zh) |
WO (1) | WO2002018457A1 (zh) |
Cited By (23)
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---|---|---|---|---|
US20050072336A1 (en) * | 2003-10-03 | 2005-04-07 | Tdk Corporation | Hard coat agent composition and optical information medium using the same |
US20050158504A1 (en) * | 2003-12-24 | 2005-07-21 | Tdk Corporation | Hard coat agent composition and optical information medium using the same |
US20050182199A1 (en) * | 2000-12-06 | 2005-08-18 | Naiyong Jing | Fluoropolymer coating compositions with multifunctional fluoroalkyl crosslinkers for anti-reflective polymer films |
US20060148996A1 (en) * | 2004-12-30 | 2006-07-06 | Coggio William D | Low refractive index fluoropolymer compositions having improved coating and durability properties |
US20060147723A1 (en) * | 2004-12-30 | 2006-07-06 | Naiyong Jing | Low refractive index fluoropolymer coating compositions for use in antireflective polymer films |
US20060147177A1 (en) * | 2004-12-30 | 2006-07-06 | Naiyong Jing | Fluoropolymer coating compositions with olefinic silanes for anti-reflective polymer films |
US20060148971A1 (en) * | 2004-12-30 | 2006-07-06 | 3M Innovative Properties Company | Fluoropolymer nanoparticle coating composition |
US20060269733A1 (en) * | 2003-08-28 | 2006-11-30 | Dai Nippon Printing Co., Ltd. | Antireflection laminate |
US20080032053A1 (en) * | 2006-08-04 | 2008-02-07 | Kostantinos Kourtakis | Low refractive index composition |
US20080032052A1 (en) * | 2006-08-04 | 2008-02-07 | Kostantinos Kourtakis | Low refractive index composition |
US20080108769A1 (en) * | 2004-11-25 | 2008-05-08 | Jun Kanega | Fluorine-Containing Copolymer |
US20080135091A1 (en) * | 2006-12-08 | 2008-06-12 | Lap Kin Cheng | Process and device to produce a solar panel with enhanced light capture |
US20080292366A1 (en) * | 2004-06-09 | 2008-11-27 | Bridgestone Corporation | Developing Roller, Charging Roller, Conductive Roller and Method for Producing the Same |
US20090080073A1 (en) * | 2005-03-22 | 2009-03-26 | Fujifilm Corporation | Antireflection film, polarizing plate, and image display device |
US20100010164A1 (en) * | 2007-02-02 | 2010-01-14 | Daikin Industries, Ltd | Curable resin composition and process for preparing same |
US7847028B2 (en) | 2006-06-12 | 2010-12-07 | Asahi Glass Company, Limited | Curable composition and fluorinated cured product |
TWI420569B (zh) * | 2005-12-28 | 2013-12-21 | Az Electronic Mat Ip Japan Kk | 圖案及配線圖案與彼等之製法 |
US20150024189A1 (en) * | 2012-02-23 | 2015-01-22 | Toray Advanced Film Co., Ltd. | Fluorine resin film |
CN107430341A (zh) * | 2015-02-05 | 2017-12-01 | 旭硝子株式会社 | 感光性树脂组合物、树脂膜的制造方法、有机半导体元件的制造方法以及含氟聚合物 |
US10214619B2 (en) | 2013-12-26 | 2019-02-26 | AGC Inc. | Process for producing fluorinated crosslinked product and use thereof |
US11078314B2 (en) | 2017-03-28 | 2021-08-03 | Fujifilm Corporation | Fluorine-containing copolymer, composition for forming film, and optical film |
CN116194225A (zh) * | 2020-09-16 | 2023-05-30 | Agc株式会社 | 组合物、带表面层的基材、带表面层的基材的制造方法、化合物和化合物的制造方法 |
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---|---|---|---|---|
EP1403668A4 (en) * | 2001-03-08 | 2008-06-25 | Daikin Ind Ltd | FLUOROUS MATERIAL FOR AN OPTICAL WAVEGUIDE |
AU2003254841A1 (en) * | 2002-08-13 | 2004-03-03 | Daikin Industries, Ltd. | Optical material containing photocurable fluoropolymer and photocurable fluororesin composition |
JP2005015753A (ja) | 2003-06-05 | 2005-01-20 | Daikin Ind Ltd | 硬化性表面改質剤およびそれを用いた硬化性表面改質用組成物 |
JP4779293B2 (ja) * | 2003-10-21 | 2011-09-28 | Tdk株式会社 | ハードコート剤組成物及びこれを用いた光情報媒体 |
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Also Published As
Publication number | Publication date |
---|---|
KR100711156B1 (ko) | 2007-04-24 |
US20060008652A1 (en) | 2006-01-12 |
DE60118965T2 (de) | 2007-09-06 |
US20100144993A1 (en) | 2010-06-10 |
ATE323726T1 (de) | 2006-05-15 |
KR20030040426A (ko) | 2003-05-22 |
WO2002018457A1 (fr) | 2002-03-07 |
EP1347001B1 (en) | 2006-04-19 |
TW526213B (en) | 2003-04-01 |
EP1347001A1 (en) | 2003-09-24 |
DE60118965D1 (de) | 2006-05-24 |
JP2009009138A (ja) | 2009-01-15 |
US7670640B2 (en) | 2010-03-02 |
JP3742861B2 (ja) | 2006-02-08 |
JP4760868B2 (ja) | 2011-08-31 |
EP1347001A4 (en) | 2003-09-24 |
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