TWI629743B - 基材處理設備 - Google Patents
基材處理設備 Download PDFInfo
- Publication number
- TWI629743B TWI629743B TW102105348A TW102105348A TWI629743B TW I629743 B TWI629743 B TW I629743B TW 102105348 A TW102105348 A TW 102105348A TW 102105348 A TW102105348 A TW 102105348A TW I629743 B TWI629743 B TW I629743B
- Authority
- TW
- Taiwan
- Prior art keywords
- transfer
- arm
- substrate
- module
- substrate processing
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 530
- 238000012545 processing Methods 0.000 title claims description 420
- 238000012546 transfer Methods 0.000 claims abstract description 717
- 239000012636 effector Substances 0.000 claims abstract description 70
- 230000032258 transport Effects 0.000 claims description 225
- 230000005540 biological transmission Effects 0.000 claims description 51
- 210000000245 forearm Anatomy 0.000 claims description 46
- 235000012431 wafers Nutrition 0.000 claims description 46
- 238000000034 method Methods 0.000 claims description 37
- 230000008569 process Effects 0.000 claims description 31
- 239000000463 material Substances 0.000 claims description 11
- 230000009057 passive transport Effects 0.000 claims description 6
- 230000006870 function Effects 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 4
- 238000000429 assembly Methods 0.000 claims description 3
- 230000000712 assembly Effects 0.000 claims description 3
- 239000002131 composite material Substances 0.000 claims description 2
- 230000013011 mating Effects 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 35
- 239000004065 semiconductor Substances 0.000 description 20
- 230000008878 coupling Effects 0.000 description 15
- 238000010168 coupling process Methods 0.000 description 15
- 238000005859 coupling reaction Methods 0.000 description 15
- 230000033001 locomotion Effects 0.000 description 15
- 238000003860 storage Methods 0.000 description 15
- 230000007246 mechanism Effects 0.000 description 8
- 238000004804 winding Methods 0.000 description 7
- 238000009434 installation Methods 0.000 description 4
- 239000000969 carrier Substances 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 230000009977 dual effect Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004320 controlled atmosphere Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000000407 epitaxy Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
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- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
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- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
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- 230000003068 static effect Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 210000000707 wrist Anatomy 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J18/00—Arms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/02—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type
- B25J9/04—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical coordinate type or polar coordinate type
- B25J9/041—Cylindrical coordinate type
- B25J9/042—Cylindrical coordinate type comprising an articulated arm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G47/00—Article or material-handling devices associated with conveyors; Methods employing such devices
- B65G47/74—Feeding, transfer, or discharging devices of particular kinds or types
- B65G47/90—Devices for picking-up and depositing articles or materials
- B65G47/904—Devices for picking-up and depositing articles or materials provided with rotary movements only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/061—Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67184—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the presence of more than one transfer chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67196—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2201/00—Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
- B65G2201/02—Articles
- B65G2201/0214—Articles of special size, shape or weigh
- B65G2201/022—Flat
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manipulator (AREA)
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261597507P | 2012-02-10 | 2012-02-10 | |
| US61/597,507 | 2012-02-10 | ||
| US201261660900P | 2012-06-18 | 2012-06-18 | |
| US61/660,900 | 2012-06-18 | ||
| US201261662690P | 2012-06-21 | 2012-06-21 | |
| US61/662,690 | 2012-06-21 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201349376A TW201349376A (zh) | 2013-12-01 |
| TWI629743B true TWI629743B (zh) | 2018-07-11 |
Family
ID=48948087
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102105348A TWI629743B (zh) | 2012-02-10 | 2013-02-08 | 基材處理設備 |
| TW110109529A TW202203356A (zh) | 2012-02-10 | 2013-02-08 | 基材處理設備 |
| TW107113574A TWI725303B (zh) | 2012-02-10 | 2013-02-08 | 基材處理設備 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW110109529A TW202203356A (zh) | 2012-02-10 | 2013-02-08 | 基材處理設備 |
| TW107113574A TWI725303B (zh) | 2012-02-10 | 2013-02-08 | 基材處理設備 |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US12142511B2 (enExample) |
| JP (4) | JP6843493B2 (enExample) |
| KR (3) | KR102096074B1 (enExample) |
| CN (2) | CN104349872B (enExample) |
| TW (3) | TWI629743B (enExample) |
| WO (1) | WO2013120054A1 (enExample) |
Families Citing this family (75)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2701402A1 (en) * | 2007-10-24 | 2009-04-30 | Oc Oerlikon Balzers Ag | Method for manufacturing workpieces and apparatus |
| US8383202B2 (en) | 2008-06-13 | 2013-02-26 | Kateeva, Inc. | Method and apparatus for load-locked printing |
| US9048344B2 (en) | 2008-06-13 | 2015-06-02 | Kateeva, Inc. | Gas enclosure assembly and system |
| US12064979B2 (en) | 2008-06-13 | 2024-08-20 | Kateeva, Inc. | Low-particle gas enclosure systems and methods |
| US8899171B2 (en) | 2008-06-13 | 2014-12-02 | Kateeva, Inc. | Gas enclosure assembly and system |
| US10434804B2 (en) | 2008-06-13 | 2019-10-08 | Kateeva, Inc. | Low particle gas enclosure systems and methods |
| US11975546B2 (en) | 2008-06-13 | 2024-05-07 | Kateeva, Inc. | Gas enclosure assembly and system |
| US12018857B2 (en) | 2008-06-13 | 2024-06-25 | Kateeva, Inc. | Gas enclosure assembly and system |
| US10224232B2 (en) | 2013-01-18 | 2019-03-05 | Persimmon Technologies Corporation | Robot having two arms with unequal link lengths |
| CN105164799B (zh) * | 2013-03-15 | 2020-04-07 | 应用材料公司 | 基板沉积系统、机械手移送设备及用于电子装置制造的方法 |
| KR102285254B1 (ko) | 2013-08-26 | 2021-08-03 | 브룩스 오토메이션 인코퍼레이티드 | 기판 이송 장치 |
| US10424498B2 (en) | 2013-09-09 | 2019-09-24 | Persimmon Technologies Corporation | Substrate transport vacuum platform |
| KR102161685B1 (ko) * | 2013-09-26 | 2020-10-05 | 어플라이드 머티어리얼스, 인코포레이티드 | 기판 프로세싱을 위한 혼합형-플랫폼 장치, 시스템들, 및 방법들 |
| WO2015066624A1 (en) * | 2013-11-04 | 2015-05-07 | Applied Materials, Inc | Transfer chambers with an increased number of sides, semiconductor device manufacturing processing tools, and processing methods |
| US10468279B2 (en) | 2013-12-26 | 2019-11-05 | Kateeva, Inc. | Apparatus and techniques for thermal treatment of electronic devices |
| KR20230104993A (ko) | 2014-01-17 | 2023-07-11 | 브룩스 오토메이션 인코퍼레이티드 | 기판 이송 장치 |
| EP3975229A1 (en) | 2014-01-21 | 2022-03-30 | Kateeva, Inc. | Apparatus and techniques for electronic device encapsulation |
| KR102424958B1 (ko) | 2014-01-21 | 2022-07-25 | 퍼시몬 테크놀로지스 코포레이션 | 기판 이송 진공 플랫폼 |
| KR102315014B1 (ko) * | 2014-04-30 | 2021-10-20 | 카티바, 인크. | 가스 쿠션 장비 및 기판 코팅 기술 |
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| JP6577965B2 (ja) * | 2015-02-12 | 2019-09-18 | 株式会社Fuji | 部品供給装置、および保持具決定方法 |
| US10131020B2 (en) * | 2015-03-10 | 2018-11-20 | James P. Sullivan | Part orienter with removable rotating fixture |
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| JP6918770B2 (ja) * | 2015-07-13 | 2021-08-11 | ブルックス オートメーション インコーポレイテッド | オンザフライ方式の自動ウェハセンタリング方法および装置 |
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| JP6700130B2 (ja) * | 2016-07-12 | 2020-05-27 | 東京エレクトロン株式会社 | 接合システム |
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| JP7759192B2 (ja) * | 2020-05-12 | 2025-10-23 | エーエスエム・アイピー・ホールディング・ベー・フェー | 高スループットマルチチャンバ基材処理システム |
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| US12142511B2 (en) | 2024-11-12 |
| TW202203356A (zh) | 2022-01-16 |
| CN107598909B (zh) | 2024-01-30 |
| KR20220019075A (ko) | 2022-02-15 |
| KR20160098524A (ko) | 2016-08-18 |
| US20160329234A1 (en) | 2016-11-10 |
| WO2013120054A1 (en) | 2013-08-15 |
| CN104349872B (zh) | 2017-10-13 |
| JP2015508236A (ja) | 2015-03-16 |
| CN104349872A (zh) | 2015-02-11 |
| JP6843493B2 (ja) | 2021-03-17 |
| KR102529273B1 (ko) | 2023-05-04 |
| TW201349376A (zh) | 2013-12-01 |
| JP2016219831A (ja) | 2016-12-22 |
| JP6325612B2 (ja) | 2018-05-16 |
| JP2023113831A (ja) | 2023-08-16 |
| TW201839895A (zh) | 2018-11-01 |
| CN107598909A (zh) | 2018-01-19 |
| JP7292249B2 (ja) | 2023-06-16 |
| TWI725303B (zh) | 2021-04-21 |
| JP2021010011A (ja) | 2021-01-28 |
| US20150013910A1 (en) | 2015-01-15 |
| KR102096074B1 (ko) | 2020-04-01 |
| US20250069939A1 (en) | 2025-02-27 |
| KR20230067705A (ko) | 2023-05-16 |
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