SG10202110040SA - Reduced footprint platform architecture with linear vacuum transfer module - Google Patents
Reduced footprint platform architecture with linear vacuum transfer moduleInfo
- Publication number
- SG10202110040SA SG10202110040SA SG10202110040SA SG10202110040SA SG 10202110040S A SG10202110040S A SG 10202110040SA SG 10202110040S A SG10202110040S A SG 10202110040SA SG 10202110040S A SG10202110040S A SG 10202110040SA
- Authority
- SG
- Singapore
- Prior art keywords
- transfer module
- vacuum transfer
- platform architecture
- reduced footprint
- linear vacuum
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67769—Storage means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67178—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers vertical arrangement
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201762471478P | 2017-03-15 | 2017-03-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10202110040SA true SG10202110040SA (en) | 2021-10-28 |
Family
ID=63523643
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201908188S SG11201908188SA (en) | 2017-03-15 | 2018-03-14 | Reduced footprint platform architecture with linear vacuum transfer module |
SG10202110040S SG10202110040SA (en) | 2017-03-15 | 2018-03-14 | Reduced footprint platform architecture with linear vacuum transfer module |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201908188S SG11201908188SA (en) | 2017-03-15 | 2018-03-14 | Reduced footprint platform architecture with linear vacuum transfer module |
Country Status (7)
Country | Link |
---|---|
US (2) | US11521869B2 (en) |
EP (1) | EP3596752A4 (en) |
JP (2) | JP7275039B2 (en) |
KR (2) | KR20230131969A (en) |
SG (2) | SG11201908188SA (en) |
TW (2) | TWI793000B (en) |
WO (1) | WO2018170104A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11164769B2 (en) * | 2019-07-30 | 2021-11-02 | Brooks Automation, Inc. | Robot embedded vision apparatus |
WO2021206940A1 (en) * | 2020-04-06 | 2021-10-14 | Lam Research Corporation | Slide and pivot assemblies for process module bias assemblies of substrate processing systems |
CN113644005A (en) * | 2020-05-11 | 2021-11-12 | 中微半导体设备(上海)股份有限公司 | Semiconductor processing system |
KR20240004090A (en) * | 2021-04-28 | 2024-01-11 | 램 리써치 코포레이션 | Semiconductor tool batches |
JP2023070364A (en) | 2021-11-09 | 2023-05-19 | 東京エレクトロン株式会社 | Substrate processing system |
WO2023086848A1 (en) * | 2021-11-11 | 2023-05-19 | Lam Research Corporation | Nesting atmospheric robot arms for high throughput |
WO2023205361A1 (en) * | 2022-04-22 | 2023-10-26 | Lam Research Corporation | Shallow-depth equipment front end module with robot |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5789890A (en) * | 1996-03-22 | 1998-08-04 | Genmark Automation | Robot having multiple degrees of freedom |
US6062798A (en) * | 1996-06-13 | 2000-05-16 | Brooks Automation, Inc. | Multi-level substrate processing apparatus |
US6050891A (en) * | 1998-02-06 | 2000-04-18 | Applied Materials, Inc. | Vacuum processing system with turbo-axial fan in clean-air supply system of front end environment |
US6142722A (en) | 1998-06-17 | 2000-11-07 | Genmark Automation, Inc. | Automated opening and closing of ultra clean storage containers |
JP4558981B2 (en) | 2000-11-14 | 2010-10-06 | 株式会社ダイヘン | Transfer robot |
WO2004010476A2 (en) * | 2002-07-22 | 2004-01-29 | Brooks Automation, Inc. | Substrate processing apparatus |
JP4283559B2 (en) * | 2003-02-24 | 2009-06-24 | 東京エレクトロン株式会社 | Conveying apparatus, vacuum processing apparatus, and atmospheric pressure conveying apparatus |
US7246985B2 (en) * | 2004-04-16 | 2007-07-24 | Axcelis Technologies, Inc. | Work-piece processing system |
JP4907077B2 (en) * | 2004-11-30 | 2012-03-28 | 株式会社Sen | Wafer processing apparatus, wafer processing method, and ion implantation apparatus |
US20080206036A1 (en) * | 2007-02-27 | 2008-08-28 | Smith John M | Magnetic media processing tool with storage bays and multi-axis robot arms |
JP5006122B2 (en) * | 2007-06-29 | 2012-08-22 | 株式会社Sokudo | Substrate processing equipment |
KR101413762B1 (en) | 2007-08-22 | 2014-07-01 | 위순임 | Substrate processing system |
JP4473343B2 (en) * | 2007-11-09 | 2010-06-02 | キヤノンアネルバ株式会社 | Inline wafer transfer device |
KR100998663B1 (en) | 2010-05-24 | 2010-12-07 | 지이에스(주) | Apparatus for forming vacuum in load-lock chamber |
JP5387622B2 (en) * | 2011-06-17 | 2014-01-15 | 株式会社安川電機 | Transfer robot |
KR101829397B1 (en) | 2011-09-16 | 2018-02-19 | 퍼시몬 테크놀로지스 코포레이션 | Low variability robot |
JP5810929B2 (en) | 2012-01-13 | 2015-11-11 | シンフォニアテクノロジー株式会社 | Wafer transfer device |
TW202203356A (en) | 2012-02-10 | 2022-01-16 | 美商布魯克斯自動機械公司 | Substrate processing apparatus |
US9213565B2 (en) | 2013-06-28 | 2015-12-15 | Vmware, Inc. | Methods and systems for mining datacenter telemetry data |
KR20160034378A (en) | 2013-07-24 | 2016-03-29 | 어플라이드 머티어리얼스, 인코포레이티드 | Cobalt substrate processing systems, apparatus, and methods |
US10424498B2 (en) | 2013-09-09 | 2019-09-24 | Persimmon Technologies Corporation | Substrate transport vacuum platform |
WO2015057959A1 (en) * | 2013-10-18 | 2015-04-23 | Brooks Automation, Inc. | Processing apparatus |
US9299598B2 (en) * | 2013-12-23 | 2016-03-29 | Lam Research Corp. | Robot with integrated aligner |
US10278501B2 (en) * | 2014-04-25 | 2019-05-07 | Applied Materials, Inc. | Load lock door assembly, load lock apparatus, electronic device processing systems, and methods |
US9818633B2 (en) * | 2014-10-17 | 2017-11-14 | Lam Research Corporation | Equipment front end module for transferring wafers and method of transferring wafers |
US10347516B2 (en) | 2014-11-11 | 2019-07-09 | Applied Materials, Inc. | Substrate transfer chamber |
KR102417929B1 (en) | 2015-08-07 | 2022-07-06 | 에이에스엠 아이피 홀딩 비.브이. | Apparatus for substrate processing |
JP6710518B2 (en) * | 2015-12-03 | 2020-06-17 | 東京エレクトロン株式会社 | Conveying device and correction method |
JP2018174186A (en) * | 2017-03-31 | 2018-11-08 | 東京エレクトロン株式会社 | Substrate processing apparatus |
-
2018
- 2018-03-14 JP JP2019548638A patent/JP7275039B2/en active Active
- 2018-03-14 SG SG11201908188S patent/SG11201908188SA/en unknown
- 2018-03-14 KR KR1020237030422A patent/KR20230131969A/en active Application Filing
- 2018-03-14 EP EP18767005.4A patent/EP3596752A4/en active Pending
- 2018-03-14 TW TW111116765A patent/TWI793000B/en active
- 2018-03-14 KR KR1020197030174A patent/KR102577199B1/en active IP Right Grant
- 2018-03-14 US US16/493,145 patent/US11521869B2/en active Active
- 2018-03-14 TW TW107108573A patent/TWI765984B/en active
- 2018-03-14 WO PCT/US2018/022397 patent/WO2018170104A1/en unknown
- 2018-03-14 SG SG10202110040S patent/SG10202110040SA/en unknown
-
2022
- 2022-11-07 US US17/981,997 patent/US11908714B2/en active Active
-
2023
- 2023-05-02 JP JP2023076062A patent/JP2023099172A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
US20200083071A1 (en) | 2020-03-12 |
TW201901835A (en) | 2019-01-01 |
KR20230131969A (en) | 2023-09-14 |
JP2023099172A (en) | 2023-07-11 |
TWI765984B (en) | 2022-06-01 |
CN110447095A (en) | 2019-11-12 |
TWI793000B (en) | 2023-02-11 |
SG11201908188SA (en) | 2019-10-30 |
EP3596752A4 (en) | 2021-01-06 |
WO2018170104A1 (en) | 2018-09-20 |
US11521869B2 (en) | 2022-12-06 |
JP2020510310A (en) | 2020-04-02 |
EP3596752A1 (en) | 2020-01-22 |
JP7275039B2 (en) | 2023-05-17 |
TW202232632A (en) | 2022-08-16 |
US11908714B2 (en) | 2024-02-20 |
US20230062737A1 (en) | 2023-03-02 |
KR102577199B1 (en) | 2023-09-08 |
KR20190120834A (en) | 2019-10-24 |
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