TWD186209S - 用於沈積之晶圓載體 - Google Patents

用於沈積之晶圓載體

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Publication number
TWD186209S
TWD186209S TW105301929D04F TW105301929D04F TWD186209S TW D186209 S TWD186209 S TW D186209S TW 105301929D04 F TW105301929D04 F TW 105301929D04F TW 105301929D04 F TW105301929D04 F TW 105301929D04F TW D186209 S TWD186209 S TW D186209S
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TW
Taiwan
Prior art keywords
deposition
wafer carrier
design
carrier used
item usage
Prior art date
Application number
TW105301929D04F
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English (en)
Inventor
Sandeep Krishnan
Alexander I Gurary
Chenghung Paul Chang
Earl Marcelo
Original Assignee
維克儀器公司
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Publication date
Application filed by 維克儀器公司 filed Critical 維克儀器公司
Publication of TWD186209S publication Critical patent/TWD186209S/zh

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Abstract

【物品用途】;本設計係關於一種用於沈積之晶圓載體。;【設計說明】
TW105301929D04F 2016-04-01 2016-04-14 用於沈積之晶圓載體 TWD186209S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/559,939 USD819580S1 (en) 2016-04-01 2016-04-01 Self-centering wafer carrier for chemical vapor deposition

Publications (1)

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TWD186209S true TWD186209S (zh) 2017-10-21

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ID=62234941

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TW105301929D03F TWD186208S (zh) 2016-04-01 2016-04-14 用於沈積之晶圓載體
TW105301929D02F TWD183208S (zh) 2016-04-01 2016-04-14 用於沈積之晶圓載體
TW105301929D01F TWD183207S (zh) 2016-04-01 2016-04-14 用於沈積之晶圓載體
TW105301929D04F TWD186209S (zh) 2016-04-01 2016-04-14 用於沈積之晶圓載體
TW105301929F TWD183206S (zh) 2016-04-01 2016-04-14 用於沈積之晶圓載體

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TW105301929D02F TWD183208S (zh) 2016-04-01 2016-04-14 用於沈積之晶圓載體
TW105301929D01F TWD183207S (zh) 2016-04-01 2016-04-14 用於沈積之晶圓載體

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US (1) USD819580S1 (zh)
TW (5) TWD186208S (zh)

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