JP1648519S - - Google Patents

Info

Publication number
JP1648519S
JP1648519S JPD2018-21799F JP2018021799F JP1648519S JP 1648519 S JP1648519 S JP 1648519S JP 2018021799 F JP2018021799 F JP 2018021799F JP 1648519 S JP1648519 S JP 1648519S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2018-21799F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2018-21799F priority Critical patent/JP1648519S/ja
Priority to TW108301945F priority patent/TWD203027S/zh
Priority to US35/355,090 priority patent/USD935425S1/en
Application granted granted Critical
Publication of JP1648519S publication Critical patent/JP1648519S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4585—Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
JPD2018-21799F 2018-10-04 2018-10-04 Active JP1648519S (zh)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2018-21799F JP1648519S (zh) 2018-10-04 2018-10-04
TW108301945F TWD203027S (zh) 2018-10-04 2019-04-03 基座
US35/355,090 USD935425S1 (en) 2018-10-04 2019-04-04 Susceptor for use in production of a semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2018-21799F JP1648519S (zh) 2018-10-04 2018-10-04

Publications (1)

Publication Number Publication Date
JP1648519S true JP1648519S (zh) 2019-12-23

Family

ID=68916791

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2018-21799F Active JP1648519S (zh) 2018-10-04 2018-10-04

Country Status (3)

Country Link
US (1) USD935425S1 (zh)
JP (1) JP1648519S (zh)
TW (1) TWD203027S (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD975665S1 (en) * 2019-05-17 2023-01-17 Asm Ip Holding B.V. Susceptor shaft
USD965044S1 (en) * 2019-08-19 2022-09-27 Asm Ip Holding B.V. Susceptor shaft
USD1012873S1 (en) 2020-09-24 2024-01-30 Asm Ip Holding B.V. Electrode for semiconductor processing apparatus
USD980813S1 (en) 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
JP1711119S (ja) * 2021-10-22 2022-03-29 サセプタリング

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7122844B2 (en) * 2002-05-13 2006-10-17 Cree, Inc. Susceptor for MOCVD reactor
US8366830B2 (en) * 2003-03-04 2013-02-05 Cree, Inc. Susceptor apparatus for inverted type MOCVD reactor
CN101001978B (zh) * 2004-07-22 2010-10-13 东洋炭素株式会社 衬托器
TWI397113B (zh) 2008-08-29 2013-05-21 Veeco Instr Inc 具有可變熱阻之晶圓載體
US8801857B2 (en) * 2008-10-31 2014-08-12 Asm America, Inc. Self-centering susceptor ring assembly
JP1438319S (zh) * 2011-09-20 2015-04-06
JP1438320S (zh) * 2011-09-20 2015-04-06
USD810705S1 (en) * 2016-04-01 2018-02-20 Veeco Instruments Inc. Self-centering wafer carrier for chemical vapor deposition
USD819580S1 (en) * 2016-04-01 2018-06-05 Veeco Instruments, Inc. Self-centering wafer carrier for chemical vapor deposition

Also Published As

Publication number Publication date
USD935425S1 (en) 2021-11-09
TWD203027S (zh) 2020-03-01

Similar Documents

Publication Publication Date Title
BR112021012225A2 (zh)
BR122022006221A2 (zh)
BR122022015534A2 (zh)
BR112021008873A2 (zh)
BR122022002102A2 (zh)
JP1648519S (zh)
AT524834A2 (zh)
AT524874A5 (zh)
AU2018438767B1 (zh)
AT524266A2 (zh)
AT521543A3 (zh)
AT524961A5 (zh)
BR122022005529A2 (zh)
BR122022016585A2 (zh)
BR112020012832A2 (zh)
BR102018016915A2 (zh)
BE2018C025I2 (zh)
BR112020025288A2 (zh)
BR102018007062A2 (zh)
BR202018002487U2 (zh)
CN304434491S (zh)
CN304442285S (zh)
CN304444593S (zh)
CN304444280S (zh)
CN304448506S (zh)