TW311904B - - Google Patents
Download PDFInfo
- Publication number
- TW311904B TW311904B TW084103815A TW84103815A TW311904B TW 311904 B TW311904 B TW 311904B TW 084103815 A TW084103815 A TW 084103815A TW 84103815 A TW84103815 A TW 84103815A TW 311904 B TW311904 B TW 311904B
- Authority
- TW
- Taiwan
- Prior art keywords
- silica
- silicon
- agent
- ministry
- page
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 376
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 181
- 238000000034 method Methods 0.000 claims abstract description 103
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 68
- 239000007788 liquid Substances 0.000 claims abstract description 40
- 229910052809 inorganic oxide Inorganic materials 0.000 claims abstract description 8
- 239000000443 aerosol Substances 0.000 claims abstract description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 89
- 229910052710 silicon Inorganic materials 0.000 claims description 63
- 239000010703 silicon Substances 0.000 claims description 63
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 57
- 239000007789 gas Substances 0.000 claims description 50
- 239000000203 mixture Substances 0.000 claims description 45
- 229910052757 nitrogen Inorganic materials 0.000 claims description 44
- 239000000126 substance Substances 0.000 claims description 44
- 238000001179 sorption measurement Methods 0.000 claims description 36
- 238000010521 absorption reaction Methods 0.000 claims description 17
- 238000011049 filling Methods 0.000 claims description 17
- 229920001296 polysiloxane Polymers 0.000 claims description 17
- 239000004575 stone Substances 0.000 claims description 17
- 239000002245 particle Substances 0.000 claims description 13
- 150000003377 silicon compounds Chemical class 0.000 claims description 13
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 11
- 239000000843 powder Substances 0.000 claims description 11
- 238000011282 treatment Methods 0.000 claims description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 claims description 9
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- 150000002430 hydrocarbons Chemical group 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 8
- 230000002079 cooperative effect Effects 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 239000003595 mist Substances 0.000 claims description 5
- 239000003921 oil Substances 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 238000005259 measurement Methods 0.000 claims description 4
- 125000005375 organosiloxane group Chemical group 0.000 claims description 4
- 238000000746 purification Methods 0.000 claims description 4
- 230000002745 absorbent Effects 0.000 claims description 3
- 239000002250 absorbent Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000012545 processing Methods 0.000 claims description 3
- 239000003586 protic polar solvent Substances 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- DCRIQAAPAFMPKP-UHFFFAOYSA-N aluminum oxygen(2-) titanium(4+) Chemical compound [O-2].[O-2].[Al+3].[Ti+4] DCRIQAAPAFMPKP-UHFFFAOYSA-N 0.000 claims 1
- 230000003254 anti-foaming effect Effects 0.000 claims 1
- 125000004429 atom Chemical group 0.000 claims 1
- 239000000284 extract Substances 0.000 claims 1
- 239000006260 foam Substances 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 239000003208 petroleum Substances 0.000 claims 1
- 238000006303 photolysis reaction Methods 0.000 claims 1
- 230000015843 photosynthesis, light reaction Effects 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- 238000004611 spectroscopical analysis Methods 0.000 claims 1
- 230000008569 process Effects 0.000 abstract description 4
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 3
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 230000001698 pyrogenic effect Effects 0.000 abstract 1
- 238000006884 silylation reaction Methods 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 81
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 55
- -1 polysiloxane Polymers 0.000 description 49
- 230000000694 effects Effects 0.000 description 47
- 229920004482 WACKER® Polymers 0.000 description 44
- 230000008719 thickening Effects 0.000 description 41
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 38
- 239000000243 solution Substances 0.000 description 28
- 230000008520 organization Effects 0.000 description 24
- 238000003860 storage Methods 0.000 description 24
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 23
- 238000006243 chemical reaction Methods 0.000 description 23
- 229910000077 silane Inorganic materials 0.000 description 23
- 229910021485 fumed silica Inorganic materials 0.000 description 22
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 21
- 239000000463 material Substances 0.000 description 21
- 238000012360 testing method Methods 0.000 description 20
- 238000001035 drying Methods 0.000 description 19
- 229920006337 unsaturated polyester resin Polymers 0.000 description 18
- 150000003961 organosilicon compounds Chemical class 0.000 description 16
- 229920005989 resin Polymers 0.000 description 15
- 239000011347 resin Substances 0.000 description 15
- 239000006185 dispersion Substances 0.000 description 11
- 239000004576 sand Substances 0.000 description 11
- 238000003756 stirring Methods 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 10
- 238000002444 silanisation Methods 0.000 description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 9
- 229920000555 poly(dimethylsilanediyl) polymer Polymers 0.000 description 9
- 238000000921 elemental analysis Methods 0.000 description 8
- 239000011261 inert gas Substances 0.000 description 8
- 239000012071 phase Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 7
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
- 229910052737 gold Inorganic materials 0.000 description 7
- 239000010931 gold Substances 0.000 description 7
- 238000012856 packing Methods 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 150000001298 alcohols Chemical class 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 239000004205 dimethyl polysiloxane Substances 0.000 description 6
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 6
- 238000002309 gasification Methods 0.000 description 6
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 125000005372 silanol group Chemical group 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- 229920001567 vinyl ester resin Polymers 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- 229920002554 vinyl polymer Polymers 0.000 description 5
- 241000196324 Embryophyta Species 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- 238000000889 atomisation Methods 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 229940125904 compound 1 Drugs 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 238000011010 flushing procedure Methods 0.000 description 4
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 235000019198 oils Nutrition 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000005864 Sulphur Substances 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 230000029936 alkylation Effects 0.000 description 3
- 238000005804 alkylation reaction Methods 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000013043 chemical agent Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 235000013399 edible fruits Nutrition 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 3
- 239000004014 plasticizer Substances 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 238000000197 pyrolysis Methods 0.000 description 3
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 3
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 description 2
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 2
- 125000006043 5-hexenyl group Chemical group 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 239000004594 Masterbatch (MB) Substances 0.000 description 2
- 101000905241 Mus musculus Heart- and neural crest derivatives-expressed protein 1 Proteins 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 244000062793 Sorghum vulgare Species 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 229910021536 Zeolite Inorganic materials 0.000 description 2
- WZGNVVUXVXNNOX-UHFFFAOYSA-N [Fe+] Chemical compound [Fe+] WZGNVVUXVXNNOX-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 125000006267 biphenyl group Chemical group 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 235000013339 cereals Nutrition 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004185 ester group Chemical group 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 238000005243 fluidization Methods 0.000 description 2
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 229910052743 krypton Inorganic materials 0.000 description 2
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 2
- 238000009533 lab test Methods 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920001709 polysilazane Polymers 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 229920001290 polyvinyl ester Polymers 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 239000006254 rheological additive Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 238000004154 testing of material Methods 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- 239000010457 zeolite Substances 0.000 description 2
- QKDIBALFMZCURP-UHFFFAOYSA-N 1-methyl-1$l^{3}-silinane Chemical compound C[Si]1CCCCC1 QKDIBALFMZCURP-UHFFFAOYSA-N 0.000 description 1
- WSULUIILRBXVFA-UHFFFAOYSA-N 2-methyloxirane;propane Chemical compound CCC.CC1CO1 WSULUIILRBXVFA-UHFFFAOYSA-N 0.000 description 1
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- CONKBQPVFMXDOV-QHCPKHFHSA-N 6-[(5S)-5-[[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]methyl]-2-oxo-1,3-oxazolidin-3-yl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C[C@H]1CN(C(O1)=O)C1=CC2=C(NC(O2)=O)C=C1 CONKBQPVFMXDOV-QHCPKHFHSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical compound NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052778 Plutonium Inorganic materials 0.000 description 1
- 241001354471 Pseudobahia Species 0.000 description 1
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- ABRVLXLNVJHDRQ-UHFFFAOYSA-N [2-pyridin-3-yl-6-(trifluoromethyl)pyridin-4-yl]methanamine Chemical compound FC(C1=CC(=CC(=N1)C=1C=NC=CC=1)CN)(F)F ABRVLXLNVJHDRQ-UHFFFAOYSA-N 0.000 description 1
- JAWMENYCRQKKJY-UHFFFAOYSA-N [3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-ylmethyl)-1-oxa-2,8-diazaspiro[4.5]dec-2-en-8-yl]-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]methanone Chemical compound N1N=NC=2CN(CCC=21)CC1=NOC2(C1)CCN(CC2)C(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F JAWMENYCRQKKJY-UHFFFAOYSA-N 0.000 description 1
- LTBMQCDTTPBRRC-UHFFFAOYSA-N [SiH4].CC1(OCCOC1)C Chemical compound [SiH4].CC1(OCCOC1)C LTBMQCDTTPBRRC-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229940024548 aluminum oxide Drugs 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000001485 argon Chemical class 0.000 description 1
- XTKDAFGWCDAMPY-UHFFFAOYSA-N azaperone Chemical compound C1=CC(F)=CC=C1C(=O)CCCN1CCN(C=2N=CC=CC=2)CC1 XTKDAFGWCDAMPY-UHFFFAOYSA-N 0.000 description 1
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000010428 baryte Substances 0.000 description 1
- 229910052601 baryte Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000000319 biphenyl-4-yl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 239000001055 blue pigment Substances 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- KFVUXNKQQOUCAH-UHFFFAOYSA-N butan-1-ol;propan-2-ol Chemical compound CC(C)O.CCCCO KFVUXNKQQOUCAH-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 230000002925 chemical effect Effects 0.000 description 1
- 238000009388 chemical precipitation Methods 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical class Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 229940008099 dimethicone Drugs 0.000 description 1
- 125000001891 dimethoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- JZZIHCLFHIXETF-UHFFFAOYSA-N dimethylsilicon Chemical compound C[Si]C JZZIHCLFHIXETF-UHFFFAOYSA-N 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000006735 epoxidation reaction Methods 0.000 description 1
- ZYBWTEQKHIADDQ-UHFFFAOYSA-N ethanol;methanol Chemical compound OC.CCO ZYBWTEQKHIADDQ-UHFFFAOYSA-N 0.000 description 1
- ZLNAFSPCNATQPQ-UHFFFAOYSA-N ethenyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C=C ZLNAFSPCNATQPQ-UHFFFAOYSA-N 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 230000030279 gene silencing Effects 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000008240 homogeneous mixture Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 125000001183 hydrocarbyl group Chemical group 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- YRXICXUINRGLJP-UHFFFAOYSA-N hydroxy(dimethyl)silicon Chemical compound C[Si](C)O YRXICXUINRGLJP-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000019713 millet Nutrition 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 235000010446 mineral oil Nutrition 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 210000000056 organ Anatomy 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000005005 perfluorohexyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 1
- 125000006187 phenyl benzyl group Chemical group 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- OYEHPCDNVJXUIW-UHFFFAOYSA-N plutonium atom Chemical compound [Pu] OYEHPCDNVJXUIW-UHFFFAOYSA-N 0.000 description 1
- 229920006112 polar polymer Polymers 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000011527 polyurethane coating Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000013641 positive control Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000011085 pressure filtration Methods 0.000 description 1
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000008159 sesame oil Substances 0.000 description 1
- 235000011803 sesame oil Nutrition 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000002336 sorption--desorption measurement Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 208000024891 symptom Diseases 0.000 description 1
- 229920001864 tannin Polymers 0.000 description 1
- 239000001648 tannin Substances 0.000 description 1
- 235000018553 tannin Nutrition 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 229910001258 titanium gold Inorganic materials 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- AXJAWMUPFHKOHY-UHFFFAOYSA-N trimethyl(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](C)(C)C AXJAWMUPFHKOHY-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/12—Water-insoluble compounds
- C11D3/124—Silicon containing, e.g. silica, silex, quartz or glass beads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D19/00—Degasification of liquids
- B01D19/02—Foam dispersion or prevention
- B01D19/04—Foam dispersion or prevention by addition of chemical substances
- B01D19/0404—Foam dispersion or prevention by addition of chemical substances characterised by the nature of the chemical substance
- B01D19/0409—Foam dispersion or prevention by addition of chemical substances characterised by the nature of the chemical substance compounds containing Si-atoms
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
- C01B13/145—After-treatment of oxides or hydroxides, e.g. pulverising, drying, decreasing the acidity
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3081—Treatment with organo-silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/12—Treatment with organosilicon compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/43—Thickening agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/67—Particle size smaller than 100 nm
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/32—Materials not provided for elsewhere for absorbing liquids to remove pollution, e.g. oil, gasoline, fat
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/08—Ingredients agglomerated by treatment with a binding agent
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Environmental & Geological Engineering (AREA)
- Public Health (AREA)
- Nanotechnology (AREA)
- Toxicology (AREA)
- Dispersion Chemistry (AREA)
- Silicon Compounds (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Developing Agents For Electrophotography (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
- Paper (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4419234A DE4419234A1 (de) | 1994-06-01 | 1994-06-01 | Verfahren zur Silylierung von anorganischen Oxiden |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW311904B true TW311904B (enExample) | 1997-08-01 |
Family
ID=6519579
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW084103815A TW311904B (enExample) | 1994-06-01 | 1995-04-18 |
Country Status (15)
| Country | Link |
|---|---|
| US (2) | US5686054A (enExample) |
| EP (1) | EP0686676B1 (enExample) |
| JP (1) | JP2918092B2 (enExample) |
| CN (1) | CN1051747C (enExample) |
| AT (1) | ATE169948T1 (enExample) |
| AU (1) | AU669647B2 (enExample) |
| BR (1) | BR9502619A (enExample) |
| CA (1) | CA2149821C (enExample) |
| DE (2) | DE4419234A1 (enExample) |
| ES (1) | ES2121261T3 (enExample) |
| FI (1) | FI116832B (enExample) |
| NO (1) | NO316383B1 (enExample) |
| RU (1) | RU2137712C1 (enExample) |
| TW (1) | TW311904B (enExample) |
| UA (1) | UA43328C2 (enExample) |
Families Citing this family (128)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6191122B1 (en) | 1996-03-29 | 2001-02-20 | DEGUSSA HüLS AKTIENGESELLSCHAFT | Partially hydrophobic precipitated silicas |
| IN191468B (enExample) * | 1996-03-29 | 2003-12-06 | Degussa | |
| DE19742761A1 (de) * | 1997-09-27 | 1999-04-01 | Gerd Dr Rossmy | An ihrer Oberfläche anisotrop verteilte überwiegend hydrophile und überwiegend hydrophobe Domänen aufweisende amphiphile Teilchen oder Moleküle |
| DE19756831A1 (de) | 1997-12-19 | 1999-07-01 | Wacker Chemie Gmbh | Siliciumdioxid, das an seiner Oberfläche teil- oder vollständig silylierte Polykieselsäureketten trägt |
| DE19757210A1 (de) * | 1997-12-22 | 1999-07-01 | Degussa | Hydrophobierte, pyrogen hergestellte Oxide |
| US6159540A (en) * | 1998-01-15 | 2000-12-12 | Cabot Corporation | Polyfunctional organosilane treatment of silica |
| DE69915590T2 (de) * | 1998-01-15 | 2004-08-05 | Cabot Corp., Boston | Verfahren zur herstellung von organisch modifizierter kieselgel |
| WO1999036480A1 (en) * | 1998-01-15 | 1999-07-22 | Cabot Corporation | Method of preparing treated silica |
| US5981131A (en) * | 1998-07-27 | 1999-11-09 | Mitsubishi Chemical America, Inc. | Electrostatic toner composition to enhance copy quality by rejection of ghosting and method of manufacturing same |
| US6383466B1 (en) * | 1998-12-28 | 2002-05-07 | Battelle Memorial Institute | Method of dehydroxylating a hydroxylated material and method of making a mesoporous film |
| US6174926B1 (en) | 1999-01-13 | 2001-01-16 | Cabot Corporation | Method of preparing organically modified silica |
| RU2152967C1 (ru) * | 1999-04-27 | 2000-07-20 | Акционерное общество "Российская инновационная топливно-энергетическая компания" | Способ получения гидрофобного, органофильного кремнезема |
| GB9927431D0 (en) * | 1999-11-22 | 2000-01-19 | Ciba Sc Holding Ag | Casting resin and process for the fabrication of resin molds |
| GB2357497A (en) * | 1999-12-22 | 2001-06-27 | Degussa | Hydrophobic silica |
| DE19963187B4 (de) * | 1999-12-27 | 2006-10-26 | Deutsche Amphibolin-Werke Von Robert Murjahn Gmbh & Co. Kg | Wässriges Beschichtungsmaterial mit schmutz- und wasserabweisender Wirkung, Verfahren zu seiner Herstellung und dessen Verwendung |
| ATE315068T1 (de) * | 2000-02-29 | 2006-02-15 | Feron Aluminium | Verfahren zur herstellung eines schichtwerkstoffs und so erhaltener schichtwerkstoff |
| US20010036437A1 (en) * | 2000-04-03 | 2001-11-01 | Andreas Gutsch | Nanoscale pyrogenic oxides |
| DE50005683D1 (de) | 2000-04-11 | 2004-04-22 | Degussa | Streichfarben für Inkjet-Medien |
| DE10109484A1 (de) * | 2001-02-28 | 2002-09-12 | Degussa | Oberflächenmodifizierte, dotierte, pyrogen hergestellte Oxide |
| US6861115B2 (en) * | 2001-05-18 | 2005-03-01 | Cabot Corporation | Ink jet recording medium comprising amine-treated silica |
| ATE330256T1 (de) * | 2001-07-11 | 2006-07-15 | Seiko Epson Corp | Nichtmagnetischer einkomponententoner, herstellungsmethode und bildaufzeichungsapparat |
| DE10138492A1 (de) * | 2001-08-04 | 2003-02-13 | Degussa | Hydrophobe, nicht getemperte Fällungskieselsäure mit hohem Weißgrad |
| DE10145162A1 (de) * | 2001-09-13 | 2003-04-10 | Wacker Chemie Gmbh | Kieselsäure mit geringem Gehalt an Kieselsäure-Silanolgruppen |
| DE10150274A1 (de) | 2001-10-12 | 2003-04-30 | Wacker Chemie Gmbh | Kieselsäure mit homogener Silyliermittelschicht |
| JP3886363B2 (ja) * | 2001-11-14 | 2007-02-28 | 電気化学工業株式会社 | 疎水性シリカ微粉体の製造方法 |
| DE10211313A1 (de) | 2002-03-14 | 2003-10-02 | Wacker Chemie Gmbh | Mehrfachemulsionen |
| DE10239425A1 (de) * | 2002-08-28 | 2004-03-11 | Degussa Ag | Lackformulierungen |
| DE10260323A1 (de) * | 2002-12-20 | 2004-07-08 | Wacker-Chemie Gmbh | Wasserbenetzbare silylierte Metalloxide |
| EP1597198B1 (de) * | 2003-02-20 | 2009-04-29 | Wacker Chemie AG | Verfahren zur stabilisierung von dispersionen |
| US7241704B1 (en) | 2003-03-31 | 2007-07-10 | Novellus Systems, Inc. | Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups |
| US7208389B1 (en) | 2003-03-31 | 2007-04-24 | Novellus Systems, Inc. | Method of porogen removal from porous low-k films using UV radiation |
| US7176144B1 (en) | 2003-03-31 | 2007-02-13 | Novellus Systems, Inc. | Plasma detemplating and silanol capping of porous dielectric films |
| US7265061B1 (en) | 2003-05-09 | 2007-09-04 | Novellus Systems, Inc. | Method and apparatus for UV exposure of low dielectric constant materials for porogen removal and improved mechanical properties |
| DE10330020A1 (de) * | 2003-07-03 | 2005-01-20 | Degussa Ag | Hochgefüllte Silan-Zubereitung |
| US7169375B2 (en) * | 2003-08-29 | 2007-01-30 | General Electric Company | Metal oxide nanoparticles, methods of making, and methods of use |
| DE10342828A1 (de) * | 2003-09-17 | 2005-04-14 | Degussa Ag | Hochreines, pyrogen hergestelltes Siliciumdioxid |
| DE10343411B4 (de) * | 2003-09-19 | 2009-07-23 | Gallus Druckmaschinen Gmbh | Rotationsdruckmaschine und Verfahren zum freien Zugänglichmachen eines Druckzylinders oder eines Linearführungs-Zylinders |
| US7390537B1 (en) | 2003-11-20 | 2008-06-24 | Novellus Systems, Inc. | Methods for producing low-k CDO films with low residual stress |
| US20050205102A1 (en) * | 2004-01-30 | 2005-09-22 | Philip Morris Usa Inc. | Method of making surface modified silica gel |
| US7341761B1 (en) | 2004-03-11 | 2008-03-11 | Novellus Systems, Inc. | Methods for producing low-k CDO films |
| US7094713B1 (en) | 2004-03-11 | 2006-08-22 | Novellus Systems, Inc. | Methods for improving the cracking resistance of low-k dielectric materials |
| US7381662B1 (en) | 2004-03-11 | 2008-06-03 | Novellus Systems, Inc. | Methods for improving the cracking resistance of low-k dielectric materials |
| DE102004014704A1 (de) * | 2004-03-25 | 2005-10-13 | Wacker-Chemie Gmbh | Partikelstabilisierte Emulsionen |
| US7781351B1 (en) | 2004-04-07 | 2010-08-24 | Novellus Systems, Inc. | Methods for producing low-k carbon doped oxide films with low residual stress |
| US7253125B1 (en) | 2004-04-16 | 2007-08-07 | Novellus Systems, Inc. | Method to improve mechanical strength of low-k dielectric film using modulated UV exposure |
| US7622400B1 (en) | 2004-05-18 | 2009-11-24 | Novellus Systems, Inc. | Method for improving mechanical properties of low dielectric constant materials |
| DE102004039212A1 (de) * | 2004-08-12 | 2006-03-02 | Wacker-Chemie Gmbh | Rheologiesteuerung von Pickering-Emulsion durch Elektrolyte |
| US7326444B1 (en) | 2004-09-14 | 2008-02-05 | Novellus Systems, Inc. | Methods for improving integration performance of low stress CDO films |
| US9659769B1 (en) | 2004-10-22 | 2017-05-23 | Novellus Systems, Inc. | Tensile dielectric films using UV curing |
| US7790633B1 (en) | 2004-10-26 | 2010-09-07 | Novellus Systems, Inc. | Sequential deposition/anneal film densification method |
| US7695765B1 (en) | 2004-11-12 | 2010-04-13 | Novellus Systems, Inc. | Methods for producing low-stress carbon-doped oxide films with improved integration properties |
| US7166531B1 (en) | 2005-01-31 | 2007-01-23 | Novellus Systems, Inc. | VLSI fabrication processes for introducing pores into dielectric materials |
| US7510982B1 (en) | 2005-01-31 | 2009-03-31 | Novellus Systems, Inc. | Creation of porosity in low-k films by photo-disassociation of imbedded nanoparticles |
| DE102005006870A1 (de) * | 2005-02-14 | 2006-08-24 | Byk-Chemie Gmbh | Oberflächenmodifizierte Nanopartikel, Verfahren zu ihrer Herstellung und ihre Verwendung |
| DE102005007753A1 (de) * | 2005-02-18 | 2006-08-31 | Wacker Chemie Ag | Partikel mit geringer spezifischer Oberfläche und hoher Verdickungswirkung |
| DE102005012409A1 (de) | 2005-03-17 | 2006-09-21 | Wacker Chemie Ag | Wäßrige Dispersionen teilhydrophober Kieselsäuren |
| US8137465B1 (en) | 2005-04-26 | 2012-03-20 | Novellus Systems, Inc. | Single-chamber sequential curing of semiconductor wafers |
| US8980769B1 (en) | 2005-04-26 | 2015-03-17 | Novellus Systems, Inc. | Multi-station sequential curing of dielectric films |
| US8889233B1 (en) | 2005-04-26 | 2014-11-18 | Novellus Systems, Inc. | Method for reducing stress in porous dielectric films |
| US8282768B1 (en) | 2005-04-26 | 2012-10-09 | Novellus Systems, Inc. | Purging of porogen from UV cure chamber |
| US8454750B1 (en) | 2005-04-26 | 2013-06-04 | Novellus Systems, Inc. | Multi-station sequential curing of dielectric films |
| DE102005035442A1 (de) | 2005-07-28 | 2007-05-16 | Wacker Chemie Ag | Stabilisierte HDK-Suspensionen zur Verstärkung von Reaktivharzen |
| US7892985B1 (en) | 2005-11-15 | 2011-02-22 | Novellus Systems, Inc. | Method for porogen removal and mechanical strength enhancement of low-k carbon doped silicon oxide using low thermal budget microwave curing |
| US9308520B2 (en) | 2005-12-16 | 2016-04-12 | Akzo Nobel N.V. | Silica based material |
| CA2633444C (en) * | 2005-12-16 | 2012-07-17 | Akzo Nobel N.V. | Organo-modified silica based material |
| US7381644B1 (en) | 2005-12-23 | 2008-06-03 | Novellus Systems, Inc. | Pulsed PECVD method for modulating hydrogen content in hard mask |
| US8110493B1 (en) | 2005-12-23 | 2012-02-07 | Novellus Systems, Inc. | Pulsed PECVD method for modulating hydrogen content in hard mask |
| WO2007084245A2 (en) * | 2006-01-19 | 2007-07-26 | Dow Corning Corporation | Systems and methods for functionalizing particulates silane-containing materials |
| US7923376B1 (en) | 2006-03-30 | 2011-04-12 | Novellus Systems, Inc. | Method of reducing defects in PECVD TEOS films |
| DE102006014875A1 (de) | 2006-03-30 | 2007-10-04 | Wacker Chemie Ag | Partikel mit strukturierter Oberfläche |
| US7527838B2 (en) * | 2006-04-06 | 2009-05-05 | Momentive Performance Materials Inc. | Architectural unit possessing translucent silicone rubber component |
| DE102006017592A1 (de) * | 2006-04-13 | 2007-10-18 | Wacker Chemie Ag | Rheologiesteuerung stark basischer Flüssigkeiten |
| EP2049603B1 (de) * | 2006-08-06 | 2013-09-04 | Byk-Chemie GmbH | Mit polysiloxan oberflächenmodifizierte partikel und herstellungsverfahren |
| CN101522821B (zh) * | 2006-08-06 | 2013-07-03 | 比克化学股份有限公司 | 用聚硅氧烷表面改性的颗粒和其生产方法 |
| JP5133993B2 (ja) * | 2006-09-01 | 2013-01-30 | キャボット コーポレイション | 表面処理された金属酸化物粒子 |
| US20080070146A1 (en) | 2006-09-15 | 2008-03-20 | Cabot Corporation | Hydrophobic-treated metal oxide |
| US8202502B2 (en) | 2006-09-15 | 2012-06-19 | Cabot Corporation | Method of preparing hydrophobic silica |
| US8435474B2 (en) | 2006-09-15 | 2013-05-07 | Cabot Corporation | Surface-treated metal oxide particles |
| US8455165B2 (en) | 2006-09-15 | 2013-06-04 | Cabot Corporation | Cyclic-treated metal oxide |
| US7851232B2 (en) | 2006-10-30 | 2010-12-14 | Novellus Systems, Inc. | UV treatment for carbon-containing low-k dielectric repair in semiconductor processing |
| US10037905B2 (en) | 2009-11-12 | 2018-07-31 | Novellus Systems, Inc. | UV and reducing treatment for K recovery and surface clean in semiconductor processing |
| US8465991B2 (en) * | 2006-10-30 | 2013-06-18 | Novellus Systems, Inc. | Carbon containing low-k dielectric constant recovery using UV treatment |
| US7906174B1 (en) | 2006-12-07 | 2011-03-15 | Novellus Systems, Inc. | PECVD methods for producing ultra low-k dielectric films using UV treatment |
| US20080145545A1 (en) * | 2006-12-15 | 2008-06-19 | Bret Ja Chisholm | Metal oxide and sulfur-containing coating compositions, methods of use, and articles prepared therefrom |
| DE102006061057A1 (de) * | 2006-12-22 | 2008-06-26 | Wacker Chemie Ag | Organofunktionelle Silikonharzschichten auf Metalloxiden |
| US8242028B1 (en) | 2007-04-03 | 2012-08-14 | Novellus Systems, Inc. | UV treatment of etch stop and hard mask films for selectivity and hermeticity enhancement |
| DE102007024963A1 (de) | 2007-05-30 | 2008-12-04 | Wacker Polymer Systems Gmbh & Co. Kg | Verfahren zur Herstellung von dämmenden Beschichtungen |
| US7622162B1 (en) | 2007-06-07 | 2009-11-24 | Novellus Systems, Inc. | UV treatment of STI films for increasing tensile stress |
| US8501856B2 (en) * | 2007-07-13 | 2013-08-06 | Momentive Performance Materials Inc. | Curable silicon-containing compositions possessing high translucency |
| DE102007033448A1 (de) | 2007-07-18 | 2009-01-22 | Wacker Chemie Ag | Hochdisperse Metalloxide mit einer hohen positiven Oberflächenladung |
| DE102007035955A1 (de) * | 2007-07-30 | 2009-02-05 | Evonik Degussa Gmbh | Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren |
| DE102007035956A1 (de) * | 2007-07-30 | 2009-02-05 | Evonik Degussa Gmbh | Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren |
| US8211510B1 (en) | 2007-08-31 | 2012-07-03 | Novellus Systems, Inc. | Cascaded cure approach to fabricate highly tensile silicon nitride films |
| DE102007055879A1 (de) * | 2007-12-19 | 2009-06-25 | Wacker Chemie Ag | Hydrophobierung von Kieselsäuren und oxidierenden Bedingungen |
| DE102008041466A1 (de) | 2008-08-22 | 2010-02-25 | Wacker Chemie Ag | Wäßrige Dispersionen hydrophober Kieselsäuren |
| US9050623B1 (en) | 2008-09-12 | 2015-06-09 | Novellus Systems, Inc. | Progressive UV cure |
| FR2937338B1 (fr) * | 2008-10-17 | 2013-03-22 | Biomerieux Sa | Milieu reactionnel pour la detection et/ou l'identification de bacteries du genre legionella |
| DE102008054592A1 (de) | 2008-12-12 | 2010-06-17 | Wacker Chemie Ag | Pyrogene Kieselsäure hergestellt in einer Produktions-Anlage mit kleiner Kapazität |
| JP5730279B2 (ja) * | 2009-03-18 | 2015-06-03 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | 修飾シリカ粒子およびそれらを含む防塵ポリマー組成物 |
| JP4893836B2 (ja) * | 2010-01-29 | 2012-03-07 | オムロン株式会社 | 一液性エポキシ樹脂組成物およびその利用 |
| FR2979107A1 (fr) * | 2011-08-16 | 2013-02-22 | Bluestar Silicones France | Procede de preparation d'une silice greffee par un compose organosilicie |
| DE102011084048A1 (de) | 2011-10-05 | 2013-04-11 | Wacker Chemie Ag | Polymerpulver enthaltende Baustofftrockenformulierungen |
| DE102012203826A1 (de) | 2012-03-12 | 2013-09-12 | Wacker Chemie Ag | Verfahren zur Oberflächenmodifikation von partikulären Feststoffen |
| WO2013156337A1 (en) * | 2012-04-20 | 2013-10-24 | Evonik Degussa Gmbh | Reinforced epoxy resin adhesive |
| EP2781558B1 (de) | 2013-03-19 | 2016-12-14 | Evonik Degussa GmbH | Modifizierte kieselsäure enthaltende zusammensetzung und diese zusammensetzung enthaltender silikonkautschuk |
| DE102013224210A1 (de) | 2013-11-27 | 2015-05-28 | Wacker Chemie Ag | Silanisierte hochhydrophobe Kieselsäuren |
| DE102013224206A1 (de) * | 2013-11-27 | 2015-05-28 | Wacker Chemie Ag | Oberflächenmodifizierte partikuläre Metalloxide |
| DE102013226494A1 (de) | 2013-12-18 | 2015-06-18 | Wacker Chemie Ag | Modifizierung der Oberflächen von Metalloxiden mittels kettenartiger Strukturen |
| FR3020766B1 (fr) * | 2014-05-07 | 2020-05-08 | Pylote | Particules inorganiques individualisees |
| DE102015214883A1 (de) | 2015-08-04 | 2017-02-09 | Wacker Chemie Ag | Verfahren zur Herstellung von Formkörpern |
| DE102015216505A1 (de) | 2015-08-28 | 2017-03-02 | Wacker Chemie Ag | Silica Formkörper mit geringer thermischer Leitfähigkeit |
| WO2017081028A1 (de) | 2015-11-09 | 2017-05-18 | Wacker Chemie Ag | Siliconzusammensetzungen zur herstellung elastomerer formteile mittels ballistischer verfahren |
| EP3322581B1 (de) | 2015-11-26 | 2019-01-02 | Wacker Chemie AG | Hochviskose siliconzusammensetzungen zur herstellung elastomerer formteile mittels ballistischer generativer verfahren |
| WO2018036640A1 (de) | 2016-08-26 | 2018-03-01 | Wacker Chemie Ag | Verfahren zur herstellung von formkörpern |
| US9847221B1 (en) | 2016-09-29 | 2017-12-19 | Lam Research Corporation | Low temperature formation of high quality silicon oxide films in semiconductor device manufacturing |
| KR102123926B1 (ko) | 2017-02-23 | 2020-06-18 | 와커 헤미 아게 | 왁스로 제조된 지지 재료를 사용하여 성형체를 제조하기 위한 생성 방법 |
| DE102017209782A1 (de) | 2017-06-09 | 2018-12-13 | Evonik Degussa Gmbh | Verfahren zur Wärmedämmung eines evakuierbaren Behälters |
| WO2019170264A1 (de) | 2018-03-05 | 2019-09-12 | Evonik Degussa Gmbh | Verfahren zur herstellung eines aerogelmaterials |
| CN111886124A (zh) | 2018-03-28 | 2020-11-03 | 瓦克化学股份公司 | 用于生产模制体的生成性方法 |
| CN112638490B (zh) | 2018-06-15 | 2023-01-03 | 格雷斯公司 | 消泡剂活性物质、其制造方法和消泡制剂 |
| MX2021000623A (es) | 2018-07-17 | 2021-04-13 | Evonik Operations Gmbh | Composicion de aislamiento termico a base de granulados de silice, procesos para su preparacion y usos de la misma. |
| EP3597615A1 (en) | 2018-07-17 | 2020-01-22 | Evonik Operations GmbH | Granular mixed oxide material and thermal insulating composition on its basis |
| MX2021000626A (es) | 2018-07-18 | 2021-03-25 | Evonik Operations Gmbh | Procedimiento de hidrofobizacion de cuerpos de material de aislamiento conformados a base de silice a presion ambiental. |
| JP6792682B1 (ja) * | 2019-09-02 | 2020-11-25 | 株式会社トクヤマ | 金属酸化物粉末の薬剤処理方法及び製造方法 |
| KR102057036B1 (ko) * | 2019-10-04 | 2019-12-18 | 박희대 | 소수성 나노실리카가 배합된 접착력이 우수한 열가소성 핫멜트 필름 |
| WO2021144170A1 (en) | 2020-01-14 | 2021-07-22 | Evonik Operations Gmbh | Silica-based hydrophobic granular material with an increased polarity |
| PL3877332T3 (pl) | 2020-01-14 | 2022-07-11 | Evonik Operations Gmbh | Krzemionka koloidalna o zmodyfikowanej aktywności powierzchniowej |
| JP7707308B2 (ja) * | 2021-03-05 | 2025-07-14 | ワッカー ケミー アクチエンゲゼルシャフト | シロキサンで官能化されたシリカ |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1163784C2 (de) * | 1962-03-30 | 1973-05-03 | Degussa | Verfahren zur Oberflaechenbehandlung von hochdispersen Oxyden |
| US3635743A (en) * | 1969-01-06 | 1972-01-18 | Gen Electric | Reinforcing silica filler |
| GB1348372A (en) * | 1970-02-16 | 1974-03-13 | Ici Ltd | Foam-compatible powder compositions |
| US3963627A (en) * | 1970-02-16 | 1976-06-15 | Imperial Chemical Industries Limited | Surface treatment of particulate solids |
| US3830738A (en) * | 1970-02-16 | 1974-08-20 | Ici Ltd | Surface treatment of particulate solids |
| DE2344388B2 (de) * | 1973-09-03 | 1978-06-22 | Elektroschmelzwerk Kempten Gmbh, 8000 Muenchen | Verfahren zum Herstellen von hydrophobem Siliciumdioxyd |
| US4036933A (en) * | 1974-01-18 | 1977-07-19 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler | Highly-active, finely divided super-dry silicon dioxide |
| DE2403783C2 (de) * | 1974-01-26 | 1982-10-21 | Bayer Ag, 5090 Leverkusen | Verfahren zur Herstellung hydrophobierter pyrogener Kieselsäure |
| DE2513608C2 (de) * | 1975-03-27 | 1982-08-05 | Degussa Ag, 6000 Frankfurt | Verfahren zur Hydrophobierung von Kieselsäuren und Silikaten mit Organosilanen |
| DE2620737C2 (de) * | 1976-05-11 | 1982-07-29 | Wacker-Chemie GmbH, 8000 München | Verfahren zum Herstellen von hochdispersem Siliciumdioxid |
| DE2728490C2 (de) * | 1977-06-24 | 1981-09-17 | Degussa Ag, 6000 Frankfurt | Verfahren zur Hydrophobierung von Kieselsäure |
| DE3211431A1 (de) * | 1982-03-27 | 1983-09-29 | Degussa Ag, 6000 Frankfurt | Verfahren zur hydrophobierung von pyrogen hergestelltem siliciumdioxid |
| DE3616133A1 (de) * | 1985-09-25 | 1987-11-19 | Merck Patent Gmbh | Kugelfoermige sio(pfeil abwaerts)2(pfeil abwaerts)-partikel |
| DE3707226A1 (de) * | 1987-03-06 | 1988-09-15 | Wacker Chemie Gmbh | Verfahren zur herstellung von hochdispersem metalloxid mit ammoniumfunktionellem organopolysiloxan modifizierter oberflaeche als positiv steuerndes ladungsmittel fuer toner |
| US5614177A (en) * | 1987-11-04 | 1997-03-25 | Rhone-Poulenc Chimie | Dentifrice-compatible silica particulates |
| SU1528780A1 (ru) * | 1987-11-11 | 1989-12-15 | Калушское Производственное Объединение "Хлорвинил" Им.60-Летия Великой Октябрьской Революции | Способ получени привитых полиорганосилоксанов на неорганическом наполнителе |
| JPH0657337B2 (ja) * | 1988-11-18 | 1994-08-03 | キヤボツト コーポレーシヨン | 低嵩密度材料連続処理方法 |
| US5153030A (en) * | 1988-11-18 | 1992-10-06 | Cabot Corporation | Continuous treatment process for particulate material |
| DE3913938A1 (de) * | 1989-04-27 | 1990-10-31 | Degussa | Presslinge auf basis von pyrogen hergestelltem titandioxid, verfahren zu ihrer herstellung sowie ihre verwendung |
| DE3919940A1 (de) * | 1989-06-19 | 1990-12-20 | Merck Patent Gmbh | Dispersionen kugelfoermiger anorganischer partikel |
| JPH0616971A (ja) * | 1992-06-30 | 1994-01-25 | Nippon Shirika Kogyo Kk | 塗料の耐アルカリ性を改良する方法 |
| DE4221716A1 (de) * | 1992-07-02 | 1994-01-05 | Wacker Chemie Gmbh | Verfahren zur Hydrophobierung von pyrogen hergestelltem Siliciumdioxid |
| JP3146679B2 (ja) * | 1992-08-31 | 2001-03-19 | 三菱マテリアル株式会社 | 疎水性金属酸化物粉体 |
| JP3318997B2 (ja) * | 1993-02-03 | 2002-08-26 | 三菱マテリアル株式会社 | 疎水性シリカ粉体、その製法および電子写真用現像剤 |
-
1994
- 1994-06-01 DE DE4419234A patent/DE4419234A1/de not_active Withdrawn
-
1995
- 1995-04-18 TW TW084103815A patent/TW311904B/zh active
- 1995-05-16 US US08/442,452 patent/US5686054A/en not_active Expired - Lifetime
- 1995-05-19 CA CA002149821A patent/CA2149821C/en not_active Expired - Fee Related
- 1995-05-30 AU AU20375/95A patent/AU669647B2/en not_active Ceased
- 1995-05-30 FI FI952622A patent/FI116832B/fi active IP Right Grant
- 1995-05-31 NO NO19952158A patent/NO316383B1/no unknown
- 1995-05-31 RU RU95109149A patent/RU2137712C1/ru not_active IP Right Cessation
- 1995-05-31 JP JP7134467A patent/JP2918092B2/ja not_active Expired - Lifetime
- 1995-05-31 BR BR9502619A patent/BR9502619A/pt not_active IP Right Cessation
- 1995-05-31 UA UA95058463A patent/UA43328C2/uk unknown
- 1995-06-01 EP EP95108429A patent/EP0686676B1/de not_active Expired - Lifetime
- 1995-06-01 AT AT95108429T patent/ATE169948T1/de not_active IP Right Cessation
- 1995-06-01 CN CN95106688A patent/CN1051747C/zh not_active Expired - Lifetime
- 1995-06-01 ES ES95108429T patent/ES2121261T3/es not_active Expired - Lifetime
- 1995-06-01 DE DE59503235T patent/DE59503235D1/de not_active Expired - Lifetime
-
1997
- 1997-06-18 US US08/878,338 patent/US5851715A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| AU669647B2 (en) | 1996-06-13 |
| EP0686676A1 (de) | 1995-12-13 |
| NO316383B1 (no) | 2004-01-19 |
| CN1051747C (zh) | 2000-04-26 |
| JPH07330324A (ja) | 1995-12-19 |
| ATE169948T1 (de) | 1998-09-15 |
| CA2149821C (en) | 2000-05-16 |
| US5686054A (en) | 1997-11-11 |
| US5851715A (en) | 1998-12-22 |
| NO952158D0 (no) | 1995-05-31 |
| RU95109149A (ru) | 1997-06-20 |
| EP0686676B1 (de) | 1998-08-19 |
| CN1121044A (zh) | 1996-04-24 |
| JP2918092B2 (ja) | 1999-07-12 |
| FI116832B (fi) | 2006-03-15 |
| DE59503235D1 (de) | 1998-09-24 |
| ES2121261T3 (es) | 1998-11-16 |
| UA43328C2 (uk) | 2001-12-17 |
| FI952622L (fi) | 1995-12-02 |
| CA2149821A1 (en) | 1995-12-02 |
| RU2137712C1 (ru) | 1999-09-20 |
| NO952158L (no) | 1995-12-04 |
| FI952622A0 (fi) | 1995-05-30 |
| AU2037595A (en) | 1996-01-04 |
| DE4419234A1 (de) | 1995-12-07 |
| BR9502619A (pt) | 1996-01-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW311904B (enExample) | ||
| AU597989B2 (en) | Method for modifying the surface of finely divided silica | |
| JP3217759B2 (ja) | その表面に部分的又は完全にシリル化されたポリ珪酸連鎖を有する二酸化珪素及びその製法、これを含有するトナー、シリコン組成物及びシリコンエラストマー | |
| JP4688895B2 (ja) | シリカのシラノール基含有率が低いシリカ | |
| TWI830873B (zh) | 無機氧化物粒子、無機氧化物粒子分散液及其製造方法以及表面修飾劑之製造方法 | |
| EP1304361B1 (de) | Verfahren zur Herstellung von Kieselsäure mit homogener Silyliermittelschicht | |
| KR0159835B1 (ko) | 무기산화물의 실릴화 방법 | |
| CN101568603B (zh) | 金属氧化物上的有机官能硅树脂层 | |
| JP5394390B2 (ja) | 酸化条件下でのシリカの疎水化法 | |
| JP2009513741A (ja) | 高い充填剤含量を有するシラン製剤 | |
| ATE312868T1 (de) | Aminoalkylalkoxysiloxanhaltige gemische, deren herstellung und deren verwendung | |
| US7585993B2 (en) | Organosilane-modified polysiloxanes and their use for surface modification | |
| JPH01266137A (ja) | 第４級アンモニウム基含有シリコーン樹脂微粉末 | |
| JP2008521980A (ja) | 広範囲のｐＨで永久的な正の表面電荷を有する金属酸化物 | |
| Barczak et al. | Structure-adsorption properties of ethylene-bridged polysilsesquioxanes and polysiloxanes functionalized with different groups | |
| TW399087B (en) | The metallic powder whose surface is treated and the usage in the aqueous coating compositions | |
| JPS6189268A (ja) | 塗膜形成材組成物 | |
| CN118078655A (zh) | 一种高疏水性化妆品级云母材料及其制备方法 | |
| JPS61159467A (ja) | 防塵性塗膜形成材組成物 |