SV1994000042A - Metodos y aparatos para producir dispositivos de circuitos integrados - Google Patents
Metodos y aparatos para producir dispositivos de circuitos integradosInfo
- Publication number
- SV1994000042A SV1994000042A SV1994000042A SV1994000042A SV1994000042A SV 1994000042 A SV1994000042 A SV 1994000042A SV 1994000042 A SV1994000042 A SV 1994000042A SV 1994000042 A SV1994000042 A SV 1994000042A SV 1994000042 A SV1994000042 A SV 1994000042A
- Authority
- SV
- El Salvador
- Prior art keywords
- devices
- methods
- integrated circuit
- producing integrated
- circuit devices
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/944—Shadow
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
EL PRESENTE INVENTO SE RELACIONA CON UN METODO PARA LITOGRAFIA TRIDIMENSIONAL QUE INCLUYE LOS PASOS DE PROVEER UN SUBSTRSATO QUE TIENE SUPERFICIES QUE SE EXTIENDEN EN TRES DIMENSIONES Y UN REVESTIMIENTO SENSIBLE A LA LUZ, E ILUMINAR EL SUBSTRATO POR MEDIO DE UNA MASCARILLA CON LUZ QUE CHOCA SOBRE LAS SUPERFICIES A UN ANGULO NO PERPENDICUALR CON RESPECTO A ELLAS.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IL106892A IL106892A0 (en) | 1993-09-02 | 1993-09-02 | Methods and apparatus for producing integrated circuit devices |
Publications (1)
Publication Number | Publication Date |
---|---|
SV1994000042A true SV1994000042A (es) | 1996-10-16 |
Family
ID=11065234
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SV1994000042A SV1994000042A (es) | 1993-09-02 | 1994-09-02 | Metodos y aparatos para producir dispositivos de circuitos integrados |
Country Status (8)
Country | Link |
---|---|
US (1) | US5716759A (es) |
JP (1) | JPH09507607A (es) |
AU (1) | AU7537694A (es) |
IL (1) | IL106892A0 (es) |
SV (1) | SV1994000042A (es) |
TW (1) | TW288183B (es) |
WO (1) | WO1995006899A1 (es) |
ZA (1) | ZA946593B (es) |
Families Citing this family (72)
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-
1993
- 1993-09-02 IL IL106892A patent/IL106892A0/xx unknown
-
1994
- 1994-08-30 ZA ZA946593A patent/ZA946593B/xx unknown
- 1994-09-01 WO PCT/EP1994/002908 patent/WO1995006899A1/en active Application Filing
- 1994-09-01 US US08/602,853 patent/US5716759A/en not_active Expired - Lifetime
- 1994-09-01 AU AU75376/94A patent/AU7537694A/en not_active Abandoned
- 1994-09-01 JP JP7507954A patent/JPH09507607A/ja active Pending
- 1994-09-02 SV SV1994000042A patent/SV1994000042A/es not_active Application Discontinuation
- 1994-09-02 TW TW083108069A patent/TW288183B/zh active
Also Published As
Publication number | Publication date |
---|---|
WO1995006899A1 (en) | 1995-03-09 |
IL106892A0 (en) | 1993-12-28 |
AU7537694A (en) | 1995-03-22 |
US5716759A (en) | 1998-02-10 |
JPH09507607A (ja) | 1997-07-29 |
TW288183B (es) | 1996-10-11 |
ZA946593B (en) | 1995-04-03 |
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