SG111309A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG111309A1
SG111309A1 SG200406939A SG200406939A SG111309A1 SG 111309 A1 SG111309 A1 SG 111309A1 SG 200406939 A SG200406939 A SG 200406939A SG 200406939 A SG200406939 A SG 200406939A SG 111309 A1 SG111309 A1 SG 111309A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200406939A
Other languages
English (en)
Inventor
Christiaan Alexander Hoogendam
Erik Roelof Loopstra
Bob Streefkerk
Bernard Gellrich
Andreas Wurmbrand
Original Assignee
Asml Netherlands Bv
Zeiss Carl Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv, Zeiss Carl Smt Ag filed Critical Asml Netherlands Bv
Publication of SG111309A1 publication Critical patent/SG111309A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200406939A 2003-10-28 2004-10-22 Lithographic apparatus and device manufacturing method SG111309A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03256809 2003-10-28

Publications (1)

Publication Number Publication Date
SG111309A1 true SG111309A1 (en) 2005-05-30

Family

ID=34639339

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200406939A SG111309A1 (en) 2003-10-28 2004-10-22 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (6) US7352433B2 (de)
JP (1) JP4146828B2 (de)
KR (1) KR100632891B1 (de)
CN (1) CN1612051B (de)
DE (1) DE602004025893D1 (de)
SG (1) SG111309A1 (de)
TW (1) TWI263261B (de)

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US8860922B2 (en) 2014-10-14
US20120120377A1 (en) 2012-05-17
US7532304B2 (en) 2009-05-12
CN1612051A (zh) 2005-05-04
US9182679B2 (en) 2015-11-10
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US20090197211A1 (en) 2009-08-06
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US20080204679A1 (en) 2008-08-28
CN1612051B (zh) 2010-10-27
US8810771B2 (en) 2014-08-19
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JP4146828B2 (ja) 2008-09-10
US7352433B2 (en) 2008-04-01
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US8102502B2 (en) 2012-01-24
US20150015858A1 (en) 2015-01-15

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