SG108997A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG108997A1
SG108997A1 SG200404366A SG200404366A SG108997A1 SG 108997 A1 SG108997 A1 SG 108997A1 SG 200404366 A SG200404366 A SG 200404366A SG 200404366 A SG200404366 A SG 200404366A SG 108997 A1 SG108997 A1 SG 108997A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200404366A
Other languages
English (en)
Inventor
Timotheus Franciscus Sengers
Sjoerd Nicolaas Lamber Donders
Hans Jansen
Arjen Boogaard
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG108997A1 publication Critical patent/SG108997A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200404366A 2003-07-24 2004-07-22 Lithographic apparatus and device manufacturing method SG108997A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03255228A EP1500982A1 (fr) 2003-07-24 2003-07-24 Appareil lithographique et méthode de fabrication d'un dispositif

Publications (1)

Publication Number Publication Date
SG108997A1 true SG108997A1 (en) 2005-02-28

Family

ID=33484041

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200404366A SG108997A1 (en) 2003-07-24 2004-07-22 Lithographic apparatus and device manufacturing method

Country Status (8)

Country Link
US (8) US7184122B2 (fr)
EP (2) EP1500982A1 (fr)
JP (1) JP4037391B2 (fr)
KR (1) KR100649176B1 (fr)
CN (2) CN100568103C (fr)
DE (1) DE602004032091D1 (fr)
SG (1) SG108997A1 (fr)
TW (1) TWI245171B (fr)

Families Citing this family (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG121819A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE10261775A1 (de) 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
SG10201404132YA (en) 2003-04-11 2014-09-26 Nippon Kogaku Kk Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2738792B1 (fr) 2003-06-13 2015-08-05 Nikon Corporation Procédé et appareil d'exposition, support de substrat et procédé de fabrication d'un dispositif
KR101134957B1 (ko) * 2003-06-19 2012-04-10 가부시키가이샤 니콘 노광 장치 및 디바이스 제조방법
EP1500982A1 (fr) 2003-07-24 2005-01-26 ASML Netherlands B.V. Appareil lithographique et méthode de fabrication d'un dispositif
EP3346485A1 (fr) 2003-07-25 2018-07-11 Nikon Corporation Procédé d'inspection de système optique de projection et appareil d'inspection, et procédé de fabrication de système optique de projection
EP2264534B1 (fr) * 2003-07-28 2013-07-17 Nikon Corporation Appareil d'exposition, procédé de fabrication d'un dispositif et procédé de commande de l'appareil
US7779781B2 (en) 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR101419192B1 (ko) * 2003-08-29 2014-07-15 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR20170070264A (ko) 2003-09-03 2017-06-21 가부시키가이샤 니콘 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
JP4444920B2 (ja) * 2003-09-19 2010-03-31 株式会社ニコン 露光装置及びデバイス製造方法
JP5136566B2 (ja) * 2003-09-29 2013-02-06 株式会社ニコン 露光装置及び露光方法並びにデバイス製造方法
SG2014014971A (en) 2003-09-29 2014-04-28 Nippon Kogaku Kk Exposure apparatus, exposure method, and device manufacturing method
JP2005136364A (ja) * 2003-10-08 2005-05-26 Zao Nikon Co Ltd 基板搬送装置、露光装置、並びにデバイス製造方法
WO2005036623A1 (fr) 2003-10-08 2005-04-21 Zao Nikon Co., Ltd. Appareil et procede de transport de substrat, appareil et procede d'exposition, et procede de production de dispositif
EP1672681B8 (fr) 2003-10-08 2011-09-21 Miyagi Nikon Precision Co., Ltd. Appareil d'exposition, procede de transport de substrat, procede d'exposition, et procede de production d'un dispositif
TWI598934B (zh) * 2003-10-09 2017-09-11 Nippon Kogaku Kk Exposure apparatus, exposure method, and device manufacturing method
WO2005043607A1 (fr) 2003-10-31 2005-05-12 Nikon Corporation Appareil d'expostion et procede de production de dispositif
SG148993A1 (en) * 2003-12-03 2009-01-29 Nikon Corp Exposure apparatus, exposure method, method for producing device, and optical part
US20070081133A1 (en) * 2004-12-14 2007-04-12 Niikon Corporation Projection exposure apparatus and stage unit, and exposure method
JPWO2005057635A1 (ja) * 2003-12-15 2007-07-05 株式会社ニコン 投影露光装置及びステージ装置、並びに露光方法
JP4720506B2 (ja) 2003-12-15 2011-07-13 株式会社ニコン ステージ装置、露光装置、及び露光方法
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
KR101377815B1 (ko) * 2004-02-03 2014-03-26 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US8054448B2 (en) 2004-05-04 2011-11-08 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
EP1774405B1 (fr) 2004-06-04 2014-08-06 Carl Zeiss SMT GmbH Systeme permettant de mesurer la qualite d'une image d'un systeme d'imagerie optique
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1780772B1 (fr) 2004-07-12 2009-09-02 Nikon Corporation Equipement d'exposition et procede de fabrication de dispositif
EP3258318B1 (fr) 2004-08-03 2019-02-27 Nikon Corporation Appareil d'exposition, procédé d'exposition et procédé de production d'un dispositif
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7397533B2 (en) * 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8692973B2 (en) * 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
KR20160135859A (ko) 2005-01-31 2016-11-28 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
EP1849040A2 (fr) * 2005-02-10 2007-10-31 ASML Netherlands B.V. Liquide d'immersion, dispositif d'exposition et technique d'exposition
US7282701B2 (en) 2005-02-28 2007-10-16 Asml Netherlands B.V. Sensor for use in a lithographic apparatus
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7525638B2 (en) * 2005-03-23 2009-04-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
JP2006303193A (ja) 2005-04-20 2006-11-02 Canon Inc 露光装置、較正方法、およびデバイス製造方法
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317507B2 (en) * 2005-05-03 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7291569B2 (en) * 2005-06-29 2007-11-06 Infineon Technologies Ag Fluids for immersion lithography systems
US8054445B2 (en) * 2005-08-16 2011-11-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2007029829A1 (fr) * 2005-09-09 2007-03-15 Nikon Corporation Appareil et procédé d’exposition, et procédé de production de dispositif
US20070124987A1 (en) * 2005-12-05 2007-06-07 Brown Jeffrey K Electronic pest control apparatus
US7649611B2 (en) * 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN100590173C (zh) * 2006-03-24 2010-02-17 北京有色金属研究总院 一种荧光粉及其制造方法和所制成的电光源
KR101444632B1 (ko) * 2006-09-01 2014-09-26 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 디바이스 제조 방법, 그리고 캘리브레이션 방법
US8817226B2 (en) 2007-02-15 2014-08-26 Asml Holding N.V. Systems and methods for insitu lens cleaning using ozone in immersion lithography
US8654305B2 (en) * 2007-02-15 2014-02-18 Asml Holding N.V. Systems and methods for insitu lens cleaning in immersion lithography
JP5097166B2 (ja) * 2008-05-28 2012-12-12 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及び装置の動作方法
NL2005126A (en) * 2009-09-21 2011-03-22 Asml Netherlands Bv Lithographic apparatus, coverplate and device manufacturing method.
US20150124234A1 (en) * 2012-04-19 2015-05-07 Asml Netherlands B.V. Substrate holder, lithographic apparatus, and device manufacturing method
CN104321702B (zh) * 2012-05-22 2016-11-23 Asml荷兰有限公司 传感器、光刻设备以及器件制造方法
DE102015202800A1 (de) * 2015-02-17 2016-08-18 Carl Zeiss Smt Gmbh Baugruppe eines optischen Systems, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
NL2019979A (en) 2016-12-22 2018-06-28 Asml Netherlands Bv An Object in a Lithographic Apparatus
CN106831787B (zh) 2017-01-20 2018-10-23 成都倍特药业有限公司 用作布鲁顿酪氨酸激酶抑制剂的化合物及其制备方法和应用
NL2020440A (en) * 2017-03-15 2018-09-19 Asml Netherlands Bv A Sensor Mark and a Method of Manufacturing a Sensor Mark
CN110832399B (zh) 2017-06-29 2021-09-28 Asml荷兰有限公司 系统、光刻设备和减少衬底支撑件上的氧化或去除衬底支撑件上的氧化物的方法
US10871715B2 (en) 2018-12-06 2020-12-22 Asml Netherlands B.V. Lithographic apparatus and a device manufacturing method
JP7256292B2 (ja) 2019-04-16 2023-04-11 エーエスエムエル ネザーランズ ビー．ブイ． 液浸リソグラフィのためのイメージセンサ

Family Cites Families (106)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE242880C (fr)
DE221563C (fr)
DE206607C (fr)
DE224448C (fr)
GB1242527A (en) * 1967-10-20 1971-08-11 Kodak Ltd Optical instruments
US3560812A (en) * 1968-07-05 1971-02-02 Gen Electric High selectively electromagnetic radiation detecting devices
US3573975A (en) * 1968-07-10 1971-04-06 Ibm Photochemical fabrication process
EP0023231B1 (fr) 1979-07-27 1982-08-11 Tabarelli, Werner, Dr. Procédé de lithographic optique et dispositif pour copier un dessin sur une plaquette semiconductrice
FR2474708B1 (fr) 1980-01-24 1987-02-20 Dme Procede de microphotolithographie a haute resolution de traits
JPS5754317A (en) * 1980-09-19 1982-03-31 Hitachi Ltd Method and device for forming pattern
US4509852A (en) * 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
US4346164A (en) * 1980-10-06 1982-08-24 Werner Tabarelli Photolithographic method for the manufacture of integrated circuits
US4390273A (en) * 1981-02-17 1983-06-28 Censor Patent-Und Versuchsanstalt Projection mask as well as a method and apparatus for the embedding thereof and projection printing system
JPS57153433A (en) * 1981-03-18 1982-09-22 Hitachi Ltd Manufacturing device for semiconductor
US4880910A (en) * 1981-09-18 1989-11-14 Genentech, Inc. Terminal methionyl bovine growth hormone and its use
JPS58202448A (ja) 1982-05-21 1983-11-25 Hitachi Ltd 露光装置
DD206607A1 (de) 1982-06-16 1984-02-01 Mikroelektronik Zt Forsch Tech Verfahren und vorrichtung zur beseitigung von interferenzeffekten
US4510436A (en) 1982-07-15 1985-04-09 Southwest Medical Products, Incorporated Dielectric measuring systems
DD242880A1 (de) 1983-01-31 1987-02-11 Kuch Karl Heinz Einrichtung zur fotolithografischen strukturuebertragung
DD221563A1 (de) 1983-09-14 1985-04-24 Mikroelektronik Zt Forsch Tech Immersionsobjektiv fuer die schrittweise projektionsabbildung einer maskenstruktur
DD224448A1 (de) 1984-03-01 1985-07-03 Zeiss Jena Veb Carl Einrichtung zur fotolithografischen strukturuebertragung
JPS6265326A (ja) 1985-09-18 1987-03-24 Hitachi Ltd 露光装置
JPS62121417A (ja) 1985-11-22 1987-06-02 Hitachi Ltd 液浸対物レンズ装置
JPS62298728A (ja) 1986-06-18 1987-12-25 Fujitsu Ltd 照度測定装置
JPS63157419A (ja) 1986-12-22 1988-06-30 Toshiba Corp 微細パタ−ン転写装置
US5040020A (en) * 1988-03-31 1991-08-13 Cornell Research Foundation, Inc. Self-aligned, high resolution resonant dielectric lithography
JPH03209479A (ja) 1989-09-06 1991-09-12 Sanee Giken Kk 露光方法
JPH04196514A (ja) 1990-11-28 1992-07-16 Olympus Optical Co Ltd 投影露光装置
US5121256A (en) * 1991-03-14 1992-06-09 The Board Of Trustees Of The Leland Stanford Junior University Lithography system employing a solid immersion lens
JPH04305915A (ja) 1991-04-02 1992-10-28 Nikon Corp 密着型露光装置
JPH04305917A (ja) 1991-04-02 1992-10-28 Nikon Corp 密着型露光装置
JPH06124873A (ja) 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
JP2520833B2 (ja) 1992-12-21 1996-07-31 東京エレクトロン株式会社 浸漬式の液処理装置
JPH06232379A (ja) * 1993-02-01 1994-08-19 Sharp Corp 固体撮像素子
JPH07220990A (ja) 1994-01-28 1995-08-18 Hitachi Ltd パターン形成方法及びその露光装置
JPH08316124A (ja) * 1995-05-19 1996-11-29 Hitachi Ltd 投影露光方法及び露光装置
US6104687A (en) * 1996-08-26 2000-08-15 Digital Papyrus Corporation Method and apparatus for coupling an optical lens to a disk through a coupling medium having a relatively high index of refraction
US5825043A (en) * 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
US5712710A (en) * 1996-10-15 1998-01-27 Cetin Karakus Spectrophotometric probe for insitu measurement
US6259099B1 (en) * 1996-12-18 2001-07-10 Commissariat A L'energie Atomique Ultra-thin ionizing radiation detector and methods for making same
JP3612920B2 (ja) 1997-02-14 2005-01-26 ソニー株式会社 光学記録媒体の原盤作製用露光装置
JPH10255319A (ja) 1997-03-12 1998-09-25 Hitachi Maxell Ltd 原盤露光装置及び方法
JP3747566B2 (ja) 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
JP3817836B2 (ja) 1997-06-10 2006-09-06 株式会社ニコン 露光装置及びその製造方法並びに露光方法及びデバイス製造方法
US5900354A (en) * 1997-07-03 1999-05-04 Batchelder; John Samuel Method for optical inspection and lithography
JPH11176727A (ja) 1997-12-11 1999-07-02 Nikon Corp 投影露光装置
AU1505699A (en) 1997-12-12 1999-07-05 Nikon Corporation Projection exposure method and projection aligner
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
JP2000058436A (ja) 1998-08-11 2000-02-25 Nikon Corp 投影露光装置及び露光方法
JP2934726B2 (ja) 1998-08-20 1999-08-16 株式会社ニコン 投影露光方法
TWI242111B (en) * 1999-04-19 2005-10-21 Asml Netherlands Bv Gas bearings for use in vacuum chambers and their application in lithographic projection apparatus
JP4504479B2 (ja) 1999-09-21 2010-07-14 オリンパス株式会社 顕微鏡用液浸対物レンズ
JP2001272604A (ja) * 2000-03-27 2001-10-05 Olympus Optical Co Ltd 液浸対物レンズおよびそれを用いた光学装置
TW591653B (en) * 2000-08-08 2004-06-11 Koninkl Philips Electronics Nv Method of manufacturing an optically scannable information carrier
US6576972B1 (en) * 2000-08-24 2003-06-10 Heetronix High temperature circuit structures with expansion matched SiC, AlN and/or AlxGa1-xN(x>0.69) circuit device
DE60131203T2 (de) * 2000-08-25 2008-08-07 Asml Netherlands B.V. Lithographischer Apparat
KR100866818B1 (ko) * 2000-12-11 2008-11-04 가부시키가이샤 니콘 투영광학계 및 이 투영광학계를 구비한 노광장치
WO2002091078A1 (fr) * 2001-05-07 2002-11-14 Massachusetts Institute Of Technology Procedes et appareil utilisant un support d'adaptation d'indice
US6600547B2 (en) 2001-09-24 2003-07-29 Nikon Corporation Sliding seal
US6633385B2 (en) * 2001-10-11 2003-10-14 Teraxion Inc. System and method for recording interference fringes in a photosensitive medium
JP2006502558A (ja) * 2001-11-07 2006-01-19 アプライド　マテリアルズ　インコーポレイテッド 光学式スポット格子アレイ印刷装置
DE10210899A1 (de) * 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
DE10229818A1 (de) * 2002-06-28 2004-01-15 Carl Zeiss Smt Ag Verfahren zur Fokusdetektion und Abbildungssystem mit Fokusdetektionssystem
KR20050035890A (ko) 2002-08-23 2005-04-19 가부시키가이샤 니콘 투영 광학계, 포토리소그래피 방법, 노광 장치 및 그 이용방법
US6788477B2 (en) * 2002-10-22 2004-09-07 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus for method for immersion lithography
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
DE60335595D1 (de) 2002-11-12 2011-02-17 Asml Netherlands Bv Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung
SG121819A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
CN101382738B (zh) 2002-11-12 2011-01-12 Asml荷兰有限公司 光刻投射装置
JP3977324B2 (ja) 2002-11-12 2007-09-19 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置
EP1420300B1 (fr) 2002-11-12 2015-07-29 ASML Netherlands B.V. Appareil lithographique et méthode de fabrication d'un dispositif
SG131766A1 (en) 2002-11-18 2007-05-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
SG121829A1 (en) 2002-11-29 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
DE10258718A1 (de) * 2002-12-09 2004-06-24 Carl Zeiss Smt Ag Projektionsobjektiv, insbesondere für die Mikrolithographie, sowie Verfahren zur Abstimmung eines Projektionsobjektives
JP4232449B2 (ja) 2002-12-10 2009-03-04 株式会社ニコン 露光方法、露光装置、及びデバイス製造方法
WO2004053950A1 (fr) 2002-12-10 2004-06-24 Nikon Corporation Appareil d'exposition et procede de fabrication du dispositif
US7948604B2 (en) * 2002-12-10 2011-05-24 Nikon Corporation Exposure apparatus and method for producing device
AU2003302831A1 (en) 2002-12-10 2004-06-30 Nikon Corporation Exposure method, exposure apparatus and method for manufacturing device
SG171468A1 (en) 2002-12-10 2011-06-29 Nikon Corp Exposure apparatus and method for producing device
EP1571695A4 (fr) 2002-12-10 2008-10-15 Nikon Corp Appareil d'exposition et son procede de fabrication
AU2003289272A1 (en) 2002-12-10 2004-06-30 Nikon Corporation Surface position detection apparatus, exposure method, and device porducing method
AU2003289271A1 (en) 2002-12-10 2004-06-30 Nikon Corporation Exposure apparatus, exposure method and method for manufacturing device
KR20130010039A (ko) 2002-12-10 2013-01-24 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US6992750B2 (en) * 2002-12-10 2006-01-31 Canon Kabushiki Kaisha Exposure apparatus and method
DE10257766A1 (de) 2002-12-10 2004-07-15 Carl Zeiss Smt Ag Verfahren zur Einstellung einer gewünschten optischen Eigenschaft eines Projektionsobjektivs sowie mikrolithografische Projektionsbelichtungsanlage
JP4179283B2 (ja) 2002-12-10 2008-11-12 株式会社ニコン 光学素子及びその光学素子を用いた投影露光装置
JP4352874B2 (ja) 2002-12-10 2009-10-28 株式会社ニコン 露光装置及びデバイス製造方法
WO2004053954A1 (fr) 2002-12-10 2004-06-24 Nikon Corporation Dispositif d'exposition, et procede de fabrication
ATE424026T1 (de) 2002-12-13 2009-03-15 Koninkl Philips Electronics Nv Flüssigkeitsentfernung in einem verfahren und einer einrichtung zum bestrahlen von flecken auf einer schicht
DE60314668T2 (de) 2002-12-19 2008-03-06 Koninklijke Philips Electronics N.V. Verfahren und anordnung zum bestrahlen einer schicht mittels eines lichtpunkts
WO2004057590A1 (fr) 2002-12-19 2004-07-08 Koninklijke Philips Electronics N.V. Procede et dispositif d'eclairage de points sur une couche
US6781670B2 (en) * 2002-12-30 2004-08-24 Intel Corporation Immersion lithography
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1652003B1 (fr) * 2003-07-08 2015-01-07 Nikon Corporation Table porte-plaquettes pour lithographie par immersion
EP1500982A1 (fr) * 2003-07-24 2005-01-26 ASML Netherlands B.V. Appareil lithographique et méthode de fabrication d'un dispositif
US7326522B2 (en) 2004-02-11 2008-02-05 Asml Netherlands B.V. Device manufacturing method and a substrate
US6954256B2 (en) 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7528929B2 (en) * 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7545481B2 (en) 2003-11-24 2009-06-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG148993A1 (en) * 2003-12-03 2009-01-29 Nikon Corp Exposure apparatus, exposure method, method for producing device, and optical part
US7589818B2 (en) 2003-12-23 2009-09-15 Asml Netherlands B.V. Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
US7394521B2 (en) 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7050146B2 (en) 2004-02-09 2006-05-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1774405B1 (fr) * 2004-06-04 2014-08-06 Carl Zeiss SMT GmbH Systeme permettant de mesurer la qualite d'une image d'un systeme d'imagerie optique

Also Published As

Publication number Publication date
US7557901B2 (en) 2009-07-07
CN101694564A (zh) 2010-04-14
CN101694564B (zh) 2012-07-04
US10444644B2 (en) 2019-10-15
US20190086820A1 (en) 2019-03-21
US20050041225A1 (en) 2005-02-24
US20070097343A1 (en) 2007-05-03
KR20050012176A (ko) 2005-01-31
DE602004032091D1 (de) 2011-05-19
US20170176876A1 (en) 2017-06-22
JP4037391B2 (ja) 2008-01-23
US9594308B2 (en) 2017-03-14
EP1500986B1 (fr) 2011-04-06
CN100568103C (zh) 2009-12-09
US10146143B2 (en) 2018-12-04
KR100649176B1 (ko) 2006-11-24
US20160070178A1 (en) 2016-03-10
US7184122B2 (en) 2007-02-27
US20180046095A1 (en) 2018-02-15
EP1500986A1 (fr) 2005-01-26
US8711333B2 (en) 2014-04-29
CN1577100A (zh) 2005-02-09
US9804509B2 (en) 2017-10-31
US9213247B2 (en) 2015-12-15
JP2005045265A (ja) 2005-02-17
US20140313494A1 (en) 2014-10-23
TW200508817A (en) 2005-03-01
EP1500982A1 (fr) 2005-01-26
US20090251674A1 (en) 2009-10-08
TWI245171B (en) 2005-12-11

Similar Documents

Publication Publication Date Title
HK1258606A1 (zh) 曝光設備以及裝置製造方法
TWI347741B (en) Lithographic apparatus and device manufacturing method
SG109610A1 (en) Lithographic apparatus and device manufacturing method
SG118281A1 (en) Lithographic apparatus and device manufacturing method
SG118282A1 (en) Lithographic apparatus and device manufacturing method
SG109000A1 (en) Lithographic apparatus and device manufacturing method
SG109609A1 (en) Lithographic apparatus and device manufacturing method
SG109608A1 (en) Lithographic apparatus and device manufacturing method
SG108997A1 (en) Lithographic apparatus and device manufacturing method
SG112968A1 (en) Lithographic apparatus and device manufacturing method
SG111309A1 (en) Lithographic apparatus and device manufacturing method
SG121820A1 (en) Lithographic apparatus and device manufacturing method
SG2010050110A (en) Lithographic apparatus and device manufacturing method
SG121819A1 (en) Lithographic apparatus and device manufacturing method
SG130007A1 (en) Lithographic apparatus and device manufacturing method
SG121829A1 (en) Lithographic apparatus and device manufacturing method
SG108317A1 (en) Lithographic apparatus and device manufacturing method
SG112064A1 (en) Lithographic apparatus and device manufacturing method
SG110196A1 (en) Lithographic apparatus and device manufacturing method
SG116555A1 (en) Lithographic apparatus and device manufacturing method.
SG106138A1 (en) Lithographic apparatus and device manufacturing method
SG111313A1 (en) Lithographic apparatus and device manufacturing method
SG112954A1 (en) Lithographic apparatus and device manufacturing method
SG127713A1 (en) Lithographic apparatus and device manufacturing method
SG111314A1 (en) Lithographic apparatus and device manufacturing method