NO930194D0 - Fremgangsmaate og anordning for mikromoenstringer av overflater - Google Patents

Fremgangsmaate og anordning for mikromoenstringer av overflater

Info

Publication number
NO930194D0
NO930194D0 NO930194A NO930194A NO930194D0 NO 930194 D0 NO930194 D0 NO 930194D0 NO 930194 A NO930194 A NO 930194A NO 930194 A NO930194 A NO 930194A NO 930194 D0 NO930194 D0 NO 930194D0
Authority
NO
Norway
Prior art keywords
micromo
strips
procedure
micromo strips
Prior art date
Application number
NO930194A
Other languages
English (en)
Other versions
NO930194L (no
Inventor
Peter B Mumola
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of NO930194D0 publication Critical patent/NO930194D0/no
Publication of NO930194L publication Critical patent/NO930194L/no

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NO93930194A 1992-01-21 1993-01-21 Fremgangsmaate og anordning for mikromoenstringer av overflater NO930194L (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/822,794 US5229872A (en) 1992-01-21 1992-01-21 Exposure device including an electrically aligned electronic mask for micropatterning

Publications (2)

Publication Number Publication Date
NO930194D0 true NO930194D0 (no) 1993-01-21
NO930194L NO930194L (no) 1993-07-22

Family

ID=25236997

Family Applications (1)

Application Number Title Priority Date Filing Date
NO93930194A NO930194L (no) 1992-01-21 1993-01-21 Fremgangsmaate og anordning for mikromoenstringer av overflater

Country Status (6)

Country Link
US (1) US5229872A (no)
EP (1) EP0552953A1 (no)
JP (1) JPH05259026A (no)
IL (1) IL104469A (no)
NO (1) NO930194L (no)
TW (1) TW213515B (no)

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