DE60322331D1 - Verfahren zur Herstellung eines Artikels unter Verwendung einer lithographischen Projektionsmaske - Google Patents

Verfahren zur Herstellung eines Artikels unter Verwendung einer lithographischen Projektionsmaske

Info

Publication number
DE60322331D1
DE60322331D1 DE60322331T DE60322331T DE60322331D1 DE 60322331 D1 DE60322331 D1 DE 60322331D1 DE 60322331 T DE60322331 T DE 60322331T DE 60322331 T DE60322331 T DE 60322331T DE 60322331 D1 DE60322331 D1 DE 60322331D1
Authority
DE
Germany
Prior art keywords
article
making
lithographic projection
projection mask
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60322331T
Other languages
English (en)
Inventor
Keith Frank Best
Joseph J Consolini
Alexander Friz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE60322331D1 publication Critical patent/DE60322331D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
DE60322331T 2002-12-19 2003-12-18 Verfahren zur Herstellung eines Artikels unter Verwendung einer lithographischen Projektionsmaske Expired - Fee Related DE60322331D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02258762 2002-12-19

Publications (1)

Publication Number Publication Date
DE60322331D1 true DE60322331D1 (de) 2008-09-04

Family

ID=32748763

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60322331T Expired - Fee Related DE60322331D1 (de) 2002-12-19 2003-12-18 Verfahren zur Herstellung eines Artikels unter Verwendung einer lithographischen Projektionsmaske

Country Status (7)

Country Link
US (1) US7019814B2 (de)
JP (1) JP4058405B2 (de)
KR (1) KR100549781B1 (de)
CN (1) CN100335974C (de)
DE (1) DE60322331D1 (de)
SG (1) SG123589A1 (de)
TW (1) TWI264619B (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4340638B2 (ja) * 2004-03-02 2009-10-07 エーエスエムエル ネザーランズ ビー．ブイ． 基板の表側または裏側に結像するためのリソグラフィ装置、基板識別方法、デバイス製造方法、基板、およびコンピュータプログラム
CN1296776C (zh) * 2004-09-22 2007-01-24 中国电子科技集团公司第二十四研究所 厚外延层上进行投影光刻的方法
JP4577231B2 (ja) * 2006-02-21 2010-11-10 株式会社島津製作所 磁気マッピング装置ならびにその位置決め方法
US7808613B2 (en) * 2006-08-03 2010-10-05 Asml Netherlands B.V. Individual wafer history storage for overlay corrections
US7879514B2 (en) * 2006-08-04 2011-02-01 Asml Netherlands B.V. Lithographic method and patterning device
JP5253916B2 (ja) * 2008-03-10 2013-07-31 株式会社ジャパンディスプレイイースト マスクレス露光方法
NL2003762A (en) * 2008-11-18 2010-05-20 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP5126370B2 (ja) * 2008-12-16 2013-01-23 株式会社村田製作所 回路モジュール
WO2011024289A1 (ja) * 2009-08-28 2011-03-03 富士通株式会社 光学部品製造方法および光学部品製造装置
TWI424471B (zh) * 2009-10-27 2014-01-21 Chunghwa Picture Tubes Ltd 用以製造具有可辨識標記之基板之方法
CN101726989B (zh) * 2009-11-16 2011-09-07 华映光电股份有限公司 用以制造具有可辨识标记的基板的方法
CN103246172B (zh) * 2012-02-10 2016-12-28 约翰内斯﹒海德汉博士有限公司 具有位置测量装置的多个扫描单元的装置
CN105051611B (zh) * 2013-03-14 2017-04-12 Asml荷兰有限公司 图案形成装置、在衬底上生成标记的方法以及器件制造方法
CN103592823B (zh) * 2013-11-25 2015-08-26 杭州士兰集成电路有限公司 光栅位置的测量方法
US9087740B2 (en) 2013-12-09 2015-07-21 International Business Machines Corporation Fabrication of lithographic image fields using a proximity stitch metrology
KR102392043B1 (ko) * 2015-05-06 2022-04-28 삼성디스플레이 주식회사 표시 기판 노광 방법
IT201700079201A1 (it) * 2017-07-13 2019-01-13 Lfoundry Srl Metodo di allineamento di maschere fotolitografiche e relativo procedimento di fabbricazione di circuiti integrati in una fetta di materiale semiconduttore
TWI639886B (zh) * 2017-10-23 2018-11-01 Powerchip Technology Corporation 光罩承載平台的維護方法
US11251096B2 (en) * 2018-09-05 2022-02-15 Micron Technology, Inc. Wafer registration and overlay measurement systems and related methods

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Publication number Priority date Publication date Assignee Title
US4355892A (en) * 1980-12-18 1982-10-26 Censor Patent- Und Versuchs-Anstalt Method for the projection printing
JPH0616476B2 (ja) * 1984-05-11 1994-03-02 株式会社ニコン パターン露光方法
JPS61201427A (ja) * 1985-03-04 1986-09-06 Nippon Kogaku Kk <Nikon> 位置ずれ検出方法
JP2593440B2 (ja) * 1985-12-19 1997-03-26 株式会社ニコン 投影型露光装置
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
EP0527166B1 (de) 1990-05-02 1995-06-14 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Belichtungsvorrichtung
JPH0444307A (ja) * 1990-06-12 1992-02-14 Nec Corp 半導体装置の製造方法
US5298761A (en) * 1991-06-17 1994-03-29 Nikon Corporation Method and apparatus for exposure process
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
JP3198310B2 (ja) * 1993-01-06 2001-08-13 株式会社ニコン 露光方法及び装置
JPH08316134A (ja) * 1995-05-24 1996-11-29 Nikon Corp 露光方法
KR970016827A (ko) * 1995-09-13 1997-04-28 오노 시게오 노광 방법 및 노광 장치
JP2988393B2 (ja) * 1996-08-29 1999-12-13 日本電気株式会社 露光方法
JPH10172890A (ja) * 1996-12-12 1998-06-26 Nikon Corp 投影露光方法
EP1197801B1 (de) 1996-12-24 2005-12-28 ASML Netherlands B.V. Lithographisches Gerät mit zwei Objekthaltern
EP0956516B1 (de) 1997-01-29 2002-04-10 Micronic Laser Systems Ab Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
WO1998040791A1 (en) 1997-03-10 1998-09-17 Koninklijke Philips Electronics N.V. Positioning device having two object holders
JPH11219878A (ja) 1998-01-30 1999-08-10 Sony Corp 電子ビーム露光方法、電子ビーム露光装置、及びパターン形成方法
TW419720B (en) * 1999-03-26 2001-01-21 Mosel Vitelic Inc The method of monitoring the overlay accuracy of the stepper and the device using the same
JP2002134397A (ja) * 2000-10-25 2002-05-10 Sony Corp フォトマスク、半導体装置、半導体チップパターンの露光方法、チップアライメント精度検査装置

Also Published As

Publication number Publication date
CN1508632A (zh) 2004-06-30
SG123589A1 (en) 2006-07-26
TW200424812A (en) 2004-11-16
JP4058405B2 (ja) 2008-03-12
US20040156027A1 (en) 2004-08-12
CN100335974C (zh) 2007-09-05
KR20040054559A (ko) 2004-06-25
KR100549781B1 (ko) 2006-02-06
US7019814B2 (en) 2006-03-28
JP2004200701A (ja) 2004-07-15
TWI264619B (en) 2006-10-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee