DE60307668D1 - Thermisches verfahren zur herstellung einer maske für den flexodruck - Google Patents

Thermisches verfahren zur herstellung einer maske für den flexodruck

Info

Publication number
DE60307668D1
DE60307668D1 DE60307668T DE60307668T DE60307668D1 DE 60307668 D1 DE60307668 D1 DE 60307668D1 DE 60307668 T DE60307668 T DE 60307668T DE 60307668 T DE60307668 T DE 60307668T DE 60307668 D1 DE60307668 D1 DE 60307668D1
Authority
DE
Germany
Prior art keywords
flexodruck
mask
production
thermal method
thermal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60307668T
Other languages
English (en)
Other versions
DE60307668T2 (de
Inventor
Ken-Ichi Shimazu
B Ray
John Kalamen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Kodak Graphics Holding Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Graphics Holding Inc filed Critical Kodak Graphics Holding Inc
Application granted granted Critical
Publication of DE60307668D1 publication Critical patent/DE60307668D1/de
Publication of DE60307668T2 publication Critical patent/DE60307668T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/02—Letterpress printing, e.g. book printing
    • B41M1/04—Flexographic printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/54—Diazonium salts or diazo anhydrides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/18—Diazo-type processes, e.g. thermal development, or agents therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C9/00—Stereo-photographic or similar processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE60307668T 2002-10-28 2003-10-22 Thermisches verfahren zur herstellung einer maske für den flexodruck Expired - Fee Related DE60307668T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US349794 1982-02-18
US28299402A 2002-10-28 2002-10-28
US282994 2002-10-28
US10/349,794 US6794107B2 (en) 2002-10-28 2003-01-23 Thermal generation of a mask for flexography
PCT/US2003/033407 WO2004039601A1 (en) 2002-10-28 2003-10-22 Thermal generation of a mask for flexography

Publications (2)

Publication Number Publication Date
DE60307668D1 true DE60307668D1 (de) 2006-09-28
DE60307668T2 DE60307668T2 (de) 2007-08-30

Family

ID=32233090

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60307668T Expired - Fee Related DE60307668T2 (de) 2002-10-28 2003-10-22 Thermisches verfahren zur herstellung einer maske für den flexodruck

Country Status (5)

Country Link
US (1) US6794107B2 (de)
EP (1) EP1558446B1 (de)
AU (1) AU2003286562A1 (de)
DE (1) DE60307668T2 (de)
WO (1) WO2004039601A1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005225023A (ja) * 2004-02-12 2005-08-25 Konica Minolta Medical & Graphic Inc 印刷版材料
US7632625B2 (en) * 2004-05-25 2009-12-15 Roberts David H Method of pre-exposing relief image printing plate
EP1605309A1 (de) * 2004-06-10 2005-12-14 Degraf S.P.A. Verfahren und Apparat zum Trocknen von Druckplatten für den Flexodruck
US20070160935A1 (en) * 2006-01-12 2007-07-12 Keiichi Okajima Lithographic printing plate material for CTP
US20070202442A1 (en) * 2006-02-24 2007-08-30 Eastman Kodak Company Method and apparatus for merging a mask and a printing plate
US8691116B2 (en) * 2006-03-24 2014-04-08 Clemson University Conducting polymer ink
NL2001744C2 (nl) * 2008-06-04 2009-12-07 Stork Prints Bv Werkwijze voor de vervaardiging van een zeefdrukvorm.
US20100044926A1 (en) * 2008-08-25 2010-02-25 Seoul National University Research & Development Business Foundation (Snu R&Db Foundation) Fabricating polymeric nanowires
JP5558567B2 (ja) * 2009-07-15 2014-07-23 オプトドット コーポレイション 二重ベシキュラーおよび赤外線画像形成媒体
ITMI20102097A1 (it) * 2010-11-12 2012-05-13 Carminati & Guizzardi Srl Procedimento di realizzazione di lastre flessografiche, particolarmente per sistemi di stampa flessografica.
US8492074B2 (en) * 2011-01-05 2013-07-23 Laurie A. Bryant Method of improving print performance in flexographic printing plates
US8652761B2 (en) * 2011-02-18 2014-02-18 David A. Recchia Photosensitive resin laminate and thermal processing of the same
US8551688B2 (en) 2011-04-21 2013-10-08 Ryan W. Vest Photosensitive resin laminate and thermal processing of the same
PL3047336T3 (pl) * 2013-09-18 2018-07-31 Flint Group Germany Gmbh Obrazowalny cyfrowo element fleksodrukowy i sposób wytwarzania płyt fleksodrukowych
US9937703B2 (en) 2013-09-30 2018-04-10 Flint Group Germany Gmbh Device and method for the in-line production of flexographic printing plates
CN105636793A (zh) * 2013-10-11 2016-06-01 3M创新有限公司 柔性版印刷表面的等离子处理
ES2848716T3 (es) * 2016-10-10 2021-08-11 Akk Gmbh Panel compuesto con capa de barrera y procedimiento para la fabricación de una plancha de impresión tipográfica
DE102018214343A1 (de) * 2018-08-24 2020-02-27 Heidelberg Schweiz AG Verfahren zum Herstellen von Flexodruckplatten
EP3832389A1 (de) * 2019-12-06 2021-06-09 Folex AG Hochauflösende flexodruckplatte und mittel zu deren herstellung mit verbesserter sperrschicht und haftungsmodulierende schicht

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US2703756A (en) 1951-12-12 1955-03-08 Gen Aniline & Film Corp Vesicular prints and process of making same
US2923703A (en) 1954-12-28 1960-02-02 Kalvar Corp Diazonium compounds
US3032414A (en) 1956-11-19 1962-05-01 Kalvar Corp System of photographic reproduction
US2976145A (en) 1957-06-04 1961-03-21 Kalvar Corp Photographic materials
US2993805A (en) 1958-09-12 1961-07-25 Ibm Method of printing on vesicular material
US3171743A (en) 1962-02-23 1965-03-02 Ibm Process of forming latent and visible images in refractive image films
US3383213A (en) 1965-06-14 1968-05-14 Kalvar Corp Vesicular photographic materials and process of forming vesicular images
GB1191926A (en) 1966-05-26 1970-05-13 Xerox Corp Improvements in or relating to Vesicular Imaging
US3458311A (en) 1966-06-27 1969-07-29 Du Pont Photopolymerizable elements with solvent removable protective layers
US3547630A (en) 1967-02-06 1970-12-15 Norman Thomas Notley Photographic reproduction
US3615475A (en) 1968-03-14 1971-10-26 Ibm Photographic elements and process for producing vesicular images
US3977875A (en) 1970-03-13 1976-08-31 Ciba-Geigy Ag Method for modifying vesicular images
CH543107A (de) 1970-03-13 1973-10-15 Ciba Geigy Ag Verfahren zum Modifizieren von Vesicularbildern
CA1099435A (en) 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
US3979211A (en) 1974-02-11 1976-09-07 Xidex Corporation Vesicular image transfer process
FR2269106A1 (de) * 1974-04-25 1975-11-21 Mitsubishi Chem Ind
GB1584779A (en) 1976-09-24 1981-02-18 Agfa Gevaert Laserbeam recording
US4128422A (en) 1976-11-08 1978-12-05 Eastman Kodak Company Cyclopropenone vesicular imaging composition, element and process
GB1565903A (en) 1977-03-01 1980-04-23 Bexford Ltd Vesicular image recording materials
US4106938A (en) 1977-05-23 1978-08-15 Eastman Kodak Company Vesicular composition, element and process utilizing a diol
US4272603A (en) 1977-06-03 1981-06-09 Chenevert Donald J Resin blends for improved vesicular systems
EP0002323B1 (de) 1977-11-29 1981-10-07 Bexford Limited Aufzeichnungsmaterial für das Vesikularverfahren
EP0012521B1 (de) 1978-12-11 1983-03-23 Bexford Limited Aufzeichnungsmaterialien für Vesikularverfahren und Verfahren zu deren Herstellung
EP0033200B1 (de) 1980-01-24 1984-02-29 Bexford Limited Verfahren zur Herstellung von Vesikularaufzeichnungsmaterialien
US4302524A (en) 1980-03-19 1981-11-24 Gaf Corporation Vesicular film elements
CH644471A5 (fr) 1981-02-02 1984-07-31 Michael Graetzel Produit destine a etre utilise comme photocatalyseur, procede de preparation de ce produit et utilisation de ce produit.
US4442305A (en) 1981-08-24 1984-04-10 The United States Of America As Represented By The United States Department Of Energy Polycatecholamide chelating agents
US4430414A (en) 1982-11-12 1984-02-07 Minnesota Mining & Manufacturing Company Image stabilizers for vesicular film
US4515885A (en) 1983-08-01 1985-05-07 Minnesota Mining And Manufacturing Company Diazo vesicular imaging films with nitrate salt
US4863819A (en) 1986-09-11 1989-09-05 Drexler Technology Corporation Read-only optical data card
US4894315A (en) 1988-08-30 1990-01-16 E. I. Du Pont De Nemours And Company Process for making flexographic printing plates with increased flexibility
JP2571115B2 (ja) 1989-01-17 1997-01-16 富士写真フイルム株式会社 感光性組成物の増感方法及び増感された感光性組成物
US6238837B1 (en) 1995-05-01 2001-05-29 E.I. Du Pont De Nemours And Company Flexographic element having an infrared ablatable layer
DE69714225T2 (de) 1996-04-23 2003-03-27 Kodak Polychrome Graphics Co Wärmeempfindliche Zusammensetzung zur Herstellung eines lithographischen Druckformvorläufers
US6358669B1 (en) 1998-06-23 2002-03-19 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
IL131202A0 (en) 1999-08-02 2001-01-28 Scitex Corp Ltd Method for proof-reading printing plates
US6294311B1 (en) 1999-12-22 2001-09-25 Kodak Polychrome Graphics Llc Lithographic printing plate having high chemical resistance

Also Published As

Publication number Publication date
EP1558446B1 (de) 2006-08-16
DE60307668T2 (de) 2007-08-30
EP1558446A1 (de) 2005-08-03
US20040081908A1 (en) 2004-04-29
AU2003286562A1 (en) 2004-05-25
US6794107B2 (en) 2004-09-21
WO2004039601A1 (en) 2004-05-13

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: EASTMAN KODAK CO., ROCHESTER, N.Y., US

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee