DE602004007608D1 - Lithographischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Lithographischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE602004007608D1
DE602004007608D1 DE602004007608T DE602004007608T DE602004007608D1 DE 602004007608 D1 DE602004007608 D1 DE 602004007608D1 DE 602004007608 T DE602004007608 T DE 602004007608T DE 602004007608 T DE602004007608 T DE 602004007608T DE 602004007608 D1 DE602004007608 D1 DE 602004007608D1
Authority
DE
Germany
Prior art keywords
making
projection apparatus
lithographic projection
lithographic
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE602004007608T
Other languages
English (en)
Other versions
DE602004007608T2 (de
Inventor
Jager Pieter Williem Herman De
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE602004007608D1 publication Critical patent/DE602004007608D1/de
Application granted granted Critical
Publication of DE602004007608T2 publication Critical patent/DE602004007608T2/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE602004007608T 2003-12-22 2004-12-15 Lithographischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung Expired - Fee Related DE602004007608T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/740,836 US6995830B2 (en) 2003-12-22 2003-12-22 Lithographic projection apparatus and device manufacturing method
US740836 2003-12-22

Publications (2)

Publication Number Publication Date
DE602004007608D1 true DE602004007608D1 (de) 2007-08-30
DE602004007608T2 DE602004007608T2 (de) 2008-04-10

Family

ID=34552800

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004007608T Expired - Fee Related DE602004007608T2 (de) 2003-12-22 2004-12-15 Lithographischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung

Country Status (8)

Country Link
US (2) US6995830B2 (de)
EP (1) EP1548505B1 (de)
JP (1) JP4246692B2 (de)
KR (1) KR100747783B1 (de)
CN (1) CN100468197C (de)
DE (1) DE602004007608T2 (de)
SG (1) SG112970A1 (de)
TW (1) TWI269124B (de)

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GB2408143B (en) * 2003-10-20 2006-11-15 Ims Nanofabrication Gmbh Charged-particle multi-beam exposure apparatus
US6995830B2 (en) * 2003-12-22 2006-02-07 Asml Netherlands B.V. Lithographic projection apparatus and device manufacturing method
US20060198018A1 (en) * 2005-02-04 2006-09-07 Carl Zeiss Smt Ag Imaging system
US7342641B2 (en) * 2005-02-22 2008-03-11 Nikon Corporation Autofocus methods and devices for lithography
US20070046917A1 (en) * 2005-08-31 2007-03-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method that compensates for reticle induced CDU
US8207907B2 (en) * 2006-02-16 2012-06-26 The Invention Science Fund I Llc Variable metamaterial apparatus
US7649182B2 (en) * 2006-10-26 2010-01-19 Searete Llc Variable multi-stage waveform detector
US7601967B2 (en) * 2005-12-21 2009-10-13 Searete Llc Multi-stage waveform detector
US7427762B2 (en) * 2005-12-21 2008-09-23 Searete Llc Variable multi-stage waveform detector
US7649180B2 (en) * 2005-12-21 2010-01-19 Searete Llc Multi-stage waveform detector
US7391032B1 (en) * 2005-12-21 2008-06-24 Searete Llc Multi-stage waveform detector
DE102006019963B4 (de) * 2006-04-28 2023-12-07 Envisiontec Gmbh Vorrichtung und Verfahren zur Herstellung eines dreidimensionalen Objekts durch schichtweises Verfestigen eines unter Einwirkung von elektromagnetischer Strahlung verfestigbaren Materials mittels Maskenbelichtung
DE102006019964C5 (de) * 2006-04-28 2021-08-26 Envisiontec Gmbh Vorrichtung und Verfahren zur Herstellung eines dreidimensionalen Objekts mittels Maskenbelichtung
KR101440762B1 (ko) 2007-02-06 2014-09-17 칼 짜이스 에스엠테 게엠베하 마이크로리소그래피 투영 노광 장치의 조명 시스템 내의 다수의 미러 어레이들을 감시하는 방법 및 장치
DE102007034652A1 (de) * 2007-07-25 2009-01-29 Carl Zeiss Smt Ag Vorrichtung zur Temperatureinstellung eines optischen Elements
US8048359B2 (en) 2008-10-20 2011-11-01 3D Systems, Inc. Compensation of actinic radiation intensity profiles for three-dimensional modelers
TWI448830B (zh) * 2010-02-09 2014-08-11 Asml Netherlands Bv 微影裝置及元件製造方法
US8134719B2 (en) * 2010-03-19 2012-03-13 Carestream Health, Inc. 3-D imaging using telecentric defocus
NL2006573A (en) * 2010-05-18 2011-11-21 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US8767170B2 (en) 2011-06-03 2014-07-01 Silicon Light Machines Corporation Flow through MEMS package
US8691476B2 (en) 2011-12-16 2014-04-08 Taiwan Semiconductor Manufacturing Company, Ltd. EUV mask and method for forming the same
US8982481B2 (en) * 2011-12-30 2015-03-17 Asml Holding N.V. Catadioptric objective for scatterometry
KR102120624B1 (ko) * 2013-04-04 2020-06-10 삼성디스플레이 주식회사 Glv를 이용한 디지털 노광기 및 dmd를 이용한 디지털 노광기
US10399179B2 (en) 2016-12-14 2019-09-03 General Electric Company Additive manufacturing systems and methods
CN114415480B (zh) * 2022-03-08 2022-09-09 广东科视光学技术股份有限公司 一种光刻机光源发生装置

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US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
US6219015B1 (en) 1992-04-28 2001-04-17 The Board Of Directors Of The Leland Stanford, Junior University Method and apparatus for using an array of grating light valves to produce multicolor optical images
JP3224041B2 (ja) 1992-07-29 2001-10-29 株式会社ニコン 露光方法及び装置
US5729331A (en) 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JP3339149B2 (ja) 1993-12-08 2002-10-28 株式会社ニコン 走査型露光装置ならびに露光方法
US5677703A (en) 1995-01-06 1997-10-14 Texas Instruments Incorporated Data loading circuit for digital micro-mirror device
US5530482A (en) 1995-03-21 1996-06-25 Texas Instruments Incorporated Pixel data processing for spatial light modulator having staggered pixels
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US6177980B1 (en) 1997-02-20 2001-01-23 Kenneth C. Johnson High-throughput, maskless lithography system
US5982553A (en) 1997-03-20 1999-11-09 Silicon Light Machines Display device incorporating one-dimensional grating light-valve array
EP0881542A1 (de) 1997-05-26 1998-12-02 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Lithographisches System
US6214633B1 (en) 1997-08-28 2001-04-10 Mems Optical Inc. System for controlling light including a micromachined foucault shutter array and a method of manufacturing the same
SE9800665D0 (sv) 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
US6271957B1 (en) 1998-05-29 2001-08-07 Affymetrix, Inc. Methods involving direct write optical lithography
US6424404B1 (en) 1999-01-11 2002-07-23 Kenneth C. Johnson Multi-stage microlens array
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AU2001281019A1 (en) * 2000-08-03 2002-02-18 Reflectivity, Inc. Micromirror elements, package for the micromirror elements, and protection system therefor
DE20017320U1 (de) 2000-10-06 2001-01-18 Paul Voss Gmbh & Co Kg Markise mit Neigungsverstellung
US6430328B1 (en) 2000-10-13 2002-08-06 William H. Culver Optical switch
US6775048B1 (en) * 2000-10-31 2004-08-10 Microsoft Corporation Microelectrical mechanical structure (MEMS) optical modulator and optical display system
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JP3563384B2 (ja) 2001-11-08 2004-09-08 大日本スクリーン製造株式会社 画像記録装置
JP4338434B2 (ja) * 2002-06-07 2009-10-07 富士フイルム株式会社 透過型２次元光変調素子及びそれを用いた露光装置
TWI298825B (en) * 2002-06-12 2008-07-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US6870554B2 (en) 2003-01-07 2005-03-22 Anvik Corporation Maskless lithography with multiplexed spatial light modulators
EP1480080A1 (de) * 2003-05-22 2004-11-24 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
EP1482375B1 (de) 2003-05-30 2014-09-17 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
US6995830B2 (en) 2003-12-22 2006-02-07 Asml Netherlands B.V. Lithographic projection apparatus and device manufacturing method

Also Published As

Publication number Publication date
JP4246692B2 (ja) 2009-04-02
KR20050063738A (ko) 2005-06-28
TW200525310A (en) 2005-08-01
TWI269124B (en) 2006-12-21
SG112970A1 (en) 2005-07-28
DE602004007608T2 (de) 2008-04-10
KR100747783B1 (ko) 2007-08-08
US20050134819A1 (en) 2005-06-23
JP2005183998A (ja) 2005-07-07
EP1548505A1 (de) 2005-06-29
US20060072093A1 (en) 2006-04-06
US7081944B2 (en) 2006-07-25
EP1548505B1 (de) 2007-07-18
US6995830B2 (en) 2006-02-07
CN100468197C (zh) 2009-03-11
CN1637605A (zh) 2005-07-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee