TWI264619B - A lithographic projection mask, a device manufacturing method using a lithographic projection mask and a device manufactured thereby - Google Patents

A lithographic projection mask, a device manufacturing method using a lithographic projection mask and a device manufactured thereby

Info

Publication number
TWI264619B
TWI264619B TW092135991A TW92135991A TWI264619B TW I264619 B TWI264619 B TW I264619B TW 092135991 A TW092135991 A TW 092135991A TW 92135991 A TW92135991 A TW 92135991A TW I264619 B TWI264619 B TW I264619B
Authority
TW
Taiwan
Prior art keywords
lithographic projection
projection mask
device manufacturing
device manufactured
mask
Prior art date
Application number
TW092135991A
Other languages
English (en)
Other versions
TW200424812A (en
Inventor
Keith Frank Best
Joseph J Consolini
Alexander Friz
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW200424812A publication Critical patent/TW200424812A/zh
Application granted granted Critical
Publication of TWI264619B publication Critical patent/TWI264619B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW092135991A 2002-12-19 2003-12-18 A lithographic projection mask, a device manufacturing method using a lithographic projection mask and a device manufactured thereby TWI264619B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02258762 2002-12-19

Publications (2)

Publication Number Publication Date
TW200424812A TW200424812A (en) 2004-11-16
TWI264619B true TWI264619B (en) 2006-10-21

Family

ID=32748763

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092135991A TWI264619B (en) 2002-12-19 2003-12-18 A lithographic projection mask, a device manufacturing method using a lithographic projection mask and a device manufactured thereby

Country Status (7)

Country Link
US (1) US7019814B2 (zh)
JP (1) JP4058405B2 (zh)
KR (1) KR100549781B1 (zh)
CN (1) CN100335974C (zh)
DE (1) DE60322331D1 (zh)
SG (1) SG123589A1 (zh)
TW (1) TWI264619B (zh)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7480028B2 (en) * 2004-03-02 2009-01-20 Asml Netherlands B.V. Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer program
CN1296776C (zh) * 2004-09-22 2007-01-24 中国电子科技集团公司第二十四研究所 厚外延层上进行投影光刻的方法
JP4577231B2 (ja) * 2006-02-21 2010-11-10 株式会社島津製作所 磁気マッピング装置ならびにその位置決め方法
US7808613B2 (en) * 2006-08-03 2010-10-05 Asml Netherlands B.V. Individual wafer history storage for overlay corrections
US7879514B2 (en) * 2006-08-04 2011-02-01 Asml Netherlands B.V. Lithographic method and patterning device
JP5253916B2 (ja) * 2008-03-10 2013-07-31 株式会社ジャパンディスプレイイースト マスクレス露光方法
NL2003762A (en) * 2008-11-18 2010-05-20 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
CN102246605B (zh) * 2008-12-16 2013-08-07 株式会社村田制作所 电路模块
WO2011024289A1 (ja) * 2009-08-28 2011-03-03 富士通株式会社 光学部品製造方法および光学部品製造装置
TWI424471B (zh) * 2009-10-27 2014-01-21 Chunghwa Picture Tubes Ltd 用以製造具有可辨識標記之基板之方法
CN101726989B (zh) * 2009-11-16 2011-09-07 华映光电股份有限公司 用以制造具有可辨识标记的基板的方法
CN103246172B (zh) * 2012-02-10 2016-12-28 约翰内斯﹒海德汉博士有限公司 具有位置测量装置的多个扫描单元的装置
CN105051611B (zh) * 2013-03-14 2017-04-12 Asml荷兰有限公司 图案形成装置、在衬底上生成标记的方法以及器件制造方法
CN103592823B (zh) * 2013-11-25 2015-08-26 杭州士兰集成电路有限公司 光栅位置的测量方法
US9087740B2 (en) 2013-12-09 2015-07-21 International Business Machines Corporation Fabrication of lithographic image fields using a proximity stitch metrology
KR102392043B1 (ko) * 2015-05-06 2022-04-28 삼성디스플레이 주식회사 표시 기판 노광 방법
IT201700079201A1 (it) 2017-07-13 2019-01-13 Lfoundry Srl Metodo di allineamento di maschere fotolitografiche e relativo procedimento di fabbricazione di circuiti integrati in una fetta di materiale semiconduttore
TWI639886B (zh) * 2017-10-23 2018-11-01 Powerchip Technology Corporation 光罩承載平台的維護方法

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US4355892A (en) * 1980-12-18 1982-10-26 Censor Patent- Und Versuchs-Anstalt Method for the projection printing
JPH0616476B2 (ja) * 1984-05-11 1994-03-02 株式会社ニコン パターン露光方法
JPS61201427A (ja) * 1985-03-04 1986-09-06 Nippon Kogaku Kk <Nikon> 位置ずれ検出方法
JP2593440B2 (ja) * 1985-12-19 1997-03-26 株式会社ニコン 投影型露光装置
US5523193A (en) * 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
EP0527166B1 (de) * 1990-05-02 1995-06-14 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Belichtungsvorrichtung
JPH0444307A (ja) 1990-06-12 1992-02-14 Nec Corp 半導体装置の製造方法
US5298761A (en) * 1991-06-17 1994-03-29 Nikon Corporation Method and apparatus for exposure process
US5229872A (en) * 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
JP3198310B2 (ja) * 1993-01-06 2001-08-13 株式会社ニコン 露光方法及び装置
JPH08316134A (ja) * 1995-05-24 1996-11-29 Nikon Corp 露光方法
KR970016827A (ko) * 1995-09-13 1997-04-28 오노 시게오 노광 방법 및 노광 장치
JP2988393B2 (ja) * 1996-08-29 1999-12-13 日本電気株式会社 露光方法
JPH10172890A (ja) * 1996-12-12 1998-06-26 Nikon Corp 投影露光方法
EP0890136B9 (en) * 1996-12-24 2003-12-10 ASML Netherlands B.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
JP4126096B2 (ja) 1997-01-29 2008-07-30 マイクロニック レーザー システムズ アクチボラゲット 感光性被覆を有する基板上に集束レーザ放射により構造物を製作する方法と装置
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
JP3626504B2 (ja) 1997-03-10 2005-03-09 アーエスエム リソグラフィ ベスローテン フェンノートシャップ ２個の物品ホルダを有する位置決め装置
JPH11219878A (ja) 1998-01-30 1999-08-10 Sony Corp 電子ビーム露光方法、電子ビーム露光装置、及びパターン形成方法
TW419720B (en) * 1999-03-26 2001-01-21 Mosel Vitelic Inc The method of monitoring the overlay accuracy of the stepper and the device using the same
JP2002134397A (ja) * 2000-10-25 2002-05-10 Sony Corp フォトマスク、半導体装置、半導体チップパターンの露光方法、チップアライメント精度検査装置

Also Published As

Publication number Publication date
JP2004200701A (ja) 2004-07-15
JP4058405B2 (ja) 2008-03-12
KR20040054559A (ko) 2004-06-25
SG123589A1 (en) 2006-07-26
TW200424812A (en) 2004-11-16
US7019814B2 (en) 2006-03-28
CN1508632A (zh) 2004-06-30
US20040156027A1 (en) 2004-08-12
DE60322331D1 (de) 2008-09-04
KR100549781B1 (ko) 2006-02-06
CN100335974C (zh) 2007-09-05

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees