NL1025056A1 - Vervaardigingswerkwijze voor een fotomasker voor een geïntegreerde schakeling en overeenkomstig fotomasker. - Google Patents
Vervaardigingswerkwijze voor een fotomasker voor een geïntegreerde schakeling en overeenkomstig fotomasker.Info
- Publication number
- NL1025056A1 NL1025056A1 NL1025056A NL1025056A NL1025056A1 NL 1025056 A1 NL1025056 A1 NL 1025056A1 NL 1025056 A NL1025056 A NL 1025056A NL 1025056 A NL1025056 A NL 1025056A NL 1025056 A1 NL1025056 A1 NL 1025056A1
- Authority
- NL
- Netherlands
- Prior art keywords
- photomask
- integrated circuit
- production method
- trench
- reflective region
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Landscapes
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10259331A DE10259331B4 (de) | 2002-12-18 | 2002-12-18 | Herstellungsverfahren für eine Photomaske für eine integrierte Schaltung und entsprechende Photomaske |
DE10259331 | 2002-12-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
NL1025056A1 true NL1025056A1 (nl) | 2004-07-05 |
NL1025056C2 NL1025056C2 (nl) | 2008-02-25 |
Family
ID=32519088
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL1025056A NL1025056C2 (nl) | 2002-12-18 | 2003-12-18 | Vervaardigingswerkwijze voor een fotomasker voor een geïntegreerde schakeling en overeenkomstig fotomasker. |
Country Status (3)
Country | Link |
---|---|
US (1) | US7073969B2 (nl) |
DE (1) | DE10259331B4 (nl) |
NL (1) | NL1025056C2 (nl) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7067385B2 (en) * | 2003-09-04 | 2006-06-27 | Micron Technology, Inc. | Support for vertically oriented capacitors during the formation of a semiconductor device |
US7125781B2 (en) * | 2003-09-04 | 2006-10-24 | Micron Technology, Inc. | Methods of forming capacitor devices |
US7387939B2 (en) | 2004-07-19 | 2008-06-17 | Micron Technology, Inc. | Methods of forming semiconductor structures and capacitor devices |
US7202127B2 (en) * | 2004-08-27 | 2007-04-10 | Micron Technology, Inc. | Methods of forming a plurality of capacitors |
US7439152B2 (en) * | 2004-08-27 | 2008-10-21 | Micron Technology, Inc. | Methods of forming a plurality of capacitors |
US20060046055A1 (en) * | 2004-08-30 | 2006-03-02 | Nan Ya Plastics Corporation | Superfine fiber containing grey dope dyed component and the fabric made of the same |
US7320911B2 (en) * | 2004-12-06 | 2008-01-22 | Micron Technology, Inc. | Methods of forming pluralities of capacitors |
US7557015B2 (en) * | 2005-03-18 | 2009-07-07 | Micron Technology, Inc. | Methods of forming pluralities of capacitors |
US7544563B2 (en) * | 2005-05-18 | 2009-06-09 | Micron Technology, Inc. | Methods of forming a plurality of capacitors |
US7517753B2 (en) * | 2005-05-18 | 2009-04-14 | Micron Technology, Inc. | Methods of forming pluralities of capacitors |
US7199005B2 (en) | 2005-08-02 | 2007-04-03 | Micron Technology, Inc. | Methods of forming pluralities of capacitors |
US7557013B2 (en) * | 2006-04-10 | 2009-07-07 | Micron Technology, Inc. | Methods of forming a plurality of capacitors |
US7902081B2 (en) * | 2006-10-11 | 2011-03-08 | Micron Technology, Inc. | Methods of etching polysilicon and methods of forming pluralities of capacitors |
US7785962B2 (en) | 2007-02-26 | 2010-08-31 | Micron Technology, Inc. | Methods of forming a plurality of capacitors |
US7923373B2 (en) | 2007-06-04 | 2011-04-12 | Micron Technology, Inc. | Pitch multiplication using self-assembling materials |
US7682924B2 (en) | 2007-08-13 | 2010-03-23 | Micron Technology, Inc. | Methods of forming a plurality of capacitors |
US8388851B2 (en) | 2008-01-08 | 2013-03-05 | Micron Technology, Inc. | Capacitor forming methods |
US8274777B2 (en) | 2008-04-08 | 2012-09-25 | Micron Technology, Inc. | High aspect ratio openings |
US7759193B2 (en) * | 2008-07-09 | 2010-07-20 | Micron Technology, Inc. | Methods of forming a plurality of capacitors |
KR101525497B1 (ko) | 2008-09-18 | 2015-06-04 | 삼성전자주식회사 | 이온 트랩막을 포함하는 포토마스크 및 이를 이용하는 반도체 소자의 제조 방법 |
US8518788B2 (en) | 2010-08-11 | 2013-08-27 | Micron Technology, Inc. | Methods of forming a plurality of capacitors |
KR101691024B1 (ko) * | 2010-11-29 | 2016-12-30 | 삼성전자주식회사 | 반사형 극자외선 마스크 및 그의 제조 방법 |
US9076680B2 (en) | 2011-10-18 | 2015-07-07 | Micron Technology, Inc. | Integrated circuitry, methods of forming capacitors, and methods of forming integrated circuitry comprising an array of capacitors and circuitry peripheral to the array |
US8946043B2 (en) | 2011-12-21 | 2015-02-03 | Micron Technology, Inc. | Methods of forming capacitors |
US8652926B1 (en) | 2012-07-26 | 2014-02-18 | Micron Technology, Inc. | Methods of forming capacitors |
US20180126485A1 (en) * | 2016-11-10 | 2018-05-10 | Goodrich Corporation | Surface finishing for glass components using a laser |
WO2020081842A1 (en) * | 2018-10-17 | 2020-04-23 | Astrileux Corporation | Photomask having reflective layer with non-reflective regions |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0279670B1 (en) * | 1987-02-18 | 1997-10-29 | Canon Kabushiki Kaisha | A reflection type mask |
US5618643A (en) * | 1995-12-15 | 1997-04-08 | Intel Corporation | Embedded phase shifting mask with improved relative attenuated film transmission |
US6607862B2 (en) * | 2001-08-24 | 2003-08-19 | Intel Corporation | Damascene extreme ultraviolet lithography alternative phase shift photomask and method of making |
US6919146B2 (en) * | 2002-06-25 | 2005-07-19 | International Business Machines Corporation | Planar reticle design/fabrication method for rapid inspection and cleaning |
-
2002
- 2002-12-18 DE DE10259331A patent/DE10259331B4/de not_active Expired - Fee Related
-
2003
- 2003-12-17 US US10/736,775 patent/US7073969B2/en not_active Expired - Fee Related
- 2003-12-18 NL NL1025056A patent/NL1025056C2/nl not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE10259331A1 (de) | 2004-07-15 |
NL1025056C2 (nl) | 2008-02-25 |
DE10259331B4 (de) | 2005-02-10 |
US20040198047A1 (en) | 2004-10-07 |
US7073969B2 (en) | 2006-07-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AD1A | A request for search or an international type search has been filed | ||
RD2N | Patents in respect of which a decision has been taken or a report has been made (novelty report) |
Effective date: 20071220 |
|
PD2B | A search report has been drawn up | ||
VD1 | Lapsed due to non-payment of the annual fee |
Effective date: 20090701 |