TWI266970B - Scatterometry alignment for imprint lithography - Google Patents

Scatterometry alignment for imprint lithography

Info

Publication number
TWI266970B
TWI266970B TW92120993A TW92120993A TWI266970B TW I266970 B TWI266970 B TW I266970B TW 92120993 A TW92120993 A TW 92120993A TW 92120993 A TW92120993 A TW 92120993A TW I266970 B TWI266970 B TW I266970B
Authority
TW
Taiwan
Prior art keywords
imprint lithography
scatterometry
alignment
liquid
template
Prior art date
Application number
TW92120993A
Other versions
TW200406651A (en
Inventor
Michael P C Watts
Ian Mcmackin
Sidlgata V Sreenivasan
Byung-Jin Choi
Ronald D Voisin
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US10/210,780 priority Critical patent/US6916584B2/en
Priority to US10/210,894 priority patent/US7070405B2/en
Priority to US10/210,785 priority patent/US7027156B2/en
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Publication of TW200406651A publication Critical patent/TW200406651A/en
Application granted granted Critical
Publication of TWI266970B publication Critical patent/TWI266970B/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049Technique, e.g. interferometric
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength

Abstract

Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with a previously formed layer on a substrate, in one embodiment, is accomplished by suing scatterometry.
TW92120993A 2002-08-01 2003-07-31 Scatterometry alignment for imprint lithography TWI266970B (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US10/210,780 US6916584B2 (en) 2002-08-01 2002-08-01 Alignment methods for imprint lithography
US10/210,894 US7070405B2 (en) 2002-08-01 2002-08-01 Alignment systems for imprint lithography
US10/210,785 US7027156B2 (en) 2002-08-01 2002-08-01 Scatterometry alignment for imprint lithography

Publications (2)

Publication Number Publication Date
TW200406651A TW200406651A (en) 2004-05-01
TWI266970B true TWI266970B (en) 2006-11-21

Family

ID=31499238

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92120993A TWI266970B (en) 2002-08-01 2003-07-31 Scatterometry alignment for imprint lithography

Country Status (6)

Country Link
EP (1) EP1573395A4 (en)
JP (2) JP2006516065A (en)
KR (1) KR20050026088A (en)
AU (1) AU2003261317A1 (en)
TW (1) TWI266970B (en)
WO (1) WO2004013693A2 (en)

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Also Published As

Publication number Publication date
WO2004013693A2 (en) 2004-02-12
JP2006516065A (en) 2006-06-15
EP1573395A4 (en) 2010-09-29
EP1573395A2 (en) 2005-09-14
AU2003261317A1 (en) 2004-02-23
AU2003261317A8 (en) 2004-02-23
KR20050026088A (en) 2005-03-14
WO2004013693A3 (en) 2006-01-19
JP5421221B2 (en) 2014-02-19
JP2011101016A (en) 2011-05-19
TW200406651A (en) 2004-05-01

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