TWI266970B - Scatterometry alignment for imprint lithography - Google Patents
Scatterometry alignment for imprint lithographyInfo
- Publication number
- TWI266970B TWI266970B TW092120993A TW92120993A TWI266970B TW I266970 B TWI266970 B TW I266970B TW 092120993 A TW092120993 A TW 092120993A TW 92120993 A TW92120993 A TW 92120993A TW I266970 B TWI266970 B TW I266970B
- Authority
- TW
- Taiwan
- Prior art keywords
- imprint lithography
- scatterometry
- alignment
- liquid
- template
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Composite Materials (AREA)
- Materials Engineering (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Micromachines (AREA)
Abstract
Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with a previously formed layer on a substrate, in one embodiment, is accomplished by suing scatterometry.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/210,780 US6916584B2 (en) | 2002-08-01 | 2002-08-01 | Alignment methods for imprint lithography |
US10/210,785 US7027156B2 (en) | 2002-08-01 | 2002-08-01 | Scatterometry alignment for imprint lithography |
US10/210,894 US7070405B2 (en) | 2002-08-01 | 2002-08-01 | Alignment systems for imprint lithography |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200406651A TW200406651A (en) | 2004-05-01 |
TWI266970B true TWI266970B (en) | 2006-11-21 |
Family
ID=31499238
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW092120993A TWI266970B (en) | 2002-08-01 | 2003-07-31 | Scatterometry alignment for imprint lithography |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP1573395A4 (en) |
JP (2) | JP2006516065A (en) |
KR (1) | KR20050026088A (en) |
AU (1) | AU2003261317A1 (en) |
TW (1) | TWI266970B (en) |
WO (1) | WO2004013693A2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI483225B (en) * | 2011-11-30 | 2015-05-01 | Screen Holdings Co Ltd | Alignment method, transfer method, and transfer apparatus |
Families Citing this family (84)
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US6926929B2 (en) | 2002-07-09 | 2005-08-09 | Molecular Imprints, Inc. | System and method for dispensing liquids |
US7442336B2 (en) * | 2003-08-21 | 2008-10-28 | Molecular Imprints, Inc. | Capillary imprinting technique |
DE10311855B4 (en) | 2003-03-17 | 2005-04-28 | Infineon Technologies Ag | Arrangement for transferring information / structures to wafers using a stamp |
US7090716B2 (en) * | 2003-10-02 | 2006-08-15 | Molecular Imprints, Inc. | Single phase fluid imprint lithography method |
US7261830B2 (en) | 2003-10-16 | 2007-08-28 | Molecular Imprints, Inc. | Applying imprinting material to substrates employing electromagnetic fields |
US20060115999A1 (en) * | 2004-12-01 | 2006-06-01 | Molecular Imprints, Inc. | Methods of exposure for the purpose of thermal management for imprint lithography processes |
KR100585951B1 (en) * | 2004-02-18 | 2006-06-01 | 한국기계연구원 | A construction/separation type individually actuating imprinting apparatus |
JP2006013400A (en) * | 2004-06-29 | 2006-01-12 | Canon Inc | Method and apparatus for detecting relative positional deviation between two objects |
US20060062922A1 (en) | 2004-09-23 | 2006-03-23 | Molecular Imprints, Inc. | Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor |
US7292326B2 (en) | 2004-11-30 | 2007-11-06 | Molecular Imprints, Inc. | Interferometric analysis for the manufacture of nano-scale devices |
US7630067B2 (en) * | 2004-11-30 | 2009-12-08 | Molecular Imprints, Inc. | Interferometric analysis method for the manufacture of nano-scale devices |
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JP4641835B2 (en) * | 2005-03-16 | 2011-03-02 | リコー光学株式会社 | Method of manufacturing phase shifter optical element and element obtained |
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US7692771B2 (en) | 2005-05-27 | 2010-04-06 | Asml Netherlands B.V. | Imprint lithography |
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US20060267231A1 (en) | 2005-05-27 | 2006-11-30 | Asml Netherlands B.V. | Imprint lithography |
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JP4958614B2 (en) * | 2006-04-18 | 2012-06-20 | キヤノン株式会社 | Pattern transfer apparatus, imprint apparatus, pattern transfer method, and alignment apparatus |
JP4795300B2 (en) * | 2006-04-18 | 2011-10-19 | キヤノン株式会社 | Alignment method, imprint method, alignment apparatus, imprint apparatus, and position measurement method |
JP4848832B2 (en) * | 2006-05-09 | 2011-12-28 | 凸版印刷株式会社 | Nanoimprint apparatus and nanoimprint method |
US7832416B2 (en) | 2006-10-10 | 2010-11-16 | Hewlett-Packard Development Company, L.P. | Imprint lithography apparatus and methods |
CN101594980B (en) * | 2006-10-31 | 2013-01-30 | 莫迪尼斯有限公司 | Method and arrangement for manufacturing optical products with complex three-dimensional forms |
CN101600993B (en) * | 2007-02-06 | 2013-01-16 | 佳能株式会社 | Imprint method and imprint apparatus |
US8142702B2 (en) * | 2007-06-18 | 2012-03-27 | Molecular Imprints, Inc. | Solvent-assisted layer formation for imprint lithography |
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JP4892025B2 (en) * | 2008-09-26 | 2012-03-07 | 株式会社東芝 | Imprint method |
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JP4881403B2 (en) * | 2009-03-26 | 2012-02-22 | 株式会社東芝 | Pattern formation method |
JP5446434B2 (en) * | 2009-04-30 | 2014-03-19 | Jsr株式会社 | Curable composition for nanoimprint lithography and nanoimprint method |
US20120128891A1 (en) * | 2009-07-29 | 2012-05-24 | Nissan Chemical Industries, Ltd. | Composition for forming resist underlayer film for nanoimprint |
JP5284212B2 (en) | 2009-07-29 | 2013-09-11 | 株式会社東芝 | Manufacturing method of semiconductor device |
KR101105410B1 (en) * | 2009-08-20 | 2012-01-17 | 주식회사 디엠에스 | imprint apparatus |
NL2005259A (en) * | 2009-09-29 | 2011-03-30 | Asml Netherlands Bv | Imprint lithography. |
JP5671302B2 (en) * | 2009-11-10 | 2015-02-18 | 富士フイルム株式会社 | Curable composition for imprint, pattern forming method and pattern |
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US8691124B2 (en) | 2009-11-24 | 2014-04-08 | Asml Netherlands B.V. | Alignment and imprint lithography |
JP5658271B2 (en) * | 2009-12-18 | 2015-01-21 | エーエスエムエル ネザーランズ ビー.ブイ. | Imprint lithography |
JP5351069B2 (en) | 2010-02-08 | 2013-11-27 | 株式会社東芝 | Imprint method and imprint apparatus |
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JP2013021194A (en) * | 2011-07-12 | 2013-01-31 | Canon Inc | Imprint device and manufacturing method of article |
JP5967924B2 (en) | 2011-12-21 | 2016-08-10 | キヤノン株式会社 | Position detection apparatus, imprint apparatus, and device manufacturing method |
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JP5824379B2 (en) * | 2012-02-07 | 2015-11-25 | キヤノン株式会社 | Imprint apparatus, imprint method, and article manufacturing method |
JP6326916B2 (en) * | 2013-04-23 | 2018-05-23 | 大日本印刷株式会社 | Imprint mold and imprint method |
JP6361238B2 (en) * | 2013-04-23 | 2018-07-25 | 大日本印刷株式会社 | Imprint mold and imprint method |
JP6230353B2 (en) * | 2013-09-25 | 2017-11-15 | キヤノン株式会社 | Manufacturing method of film having pattern shape, manufacturing method of optical component, manufacturing method of circuit board, manufacturing method of electronic device |
JP5865332B2 (en) * | 2013-11-01 | 2016-02-17 | キヤノン株式会社 | Imprint apparatus, article manufacturing method, and imprint method |
KR102154561B1 (en) * | 2014-04-01 | 2020-09-10 | 다이니폰 인사츠 가부시키가이샤 | Imprinting mold and imprinting method |
JP6356996B2 (en) * | 2014-04-01 | 2018-07-11 | キヤノン株式会社 | Pattern forming method, exposure apparatus, and article manufacturing method |
JP6499898B2 (en) | 2014-05-14 | 2019-04-10 | 株式会社ニューフレアテクノロジー | Inspection method, template substrate and focus offset method |
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JP5754535B2 (en) * | 2014-07-08 | 2015-07-29 | 大日本印刷株式会社 | Imprint method and imprint apparatus |
JP2015144278A (en) * | 2015-01-26 | 2015-08-06 | 東洋合成工業株式会社 | Composition and method for producing composite material |
US9797846B2 (en) | 2015-04-17 | 2017-10-24 | Nuflare Technology, Inc. | Inspection method and template |
JP6748461B2 (en) | 2016-03-22 | 2020-09-02 | キヤノン株式会社 | Imprint apparatus, method of operating imprint apparatus, and article manufacturing method |
JP6685821B2 (en) * | 2016-04-25 | 2020-04-22 | キヤノン株式会社 | Measuring apparatus, imprint apparatus, article manufacturing method, light quantity determination method, and light quantity adjustment method |
JP2018101671A (en) | 2016-12-19 | 2018-06-28 | キヤノン株式会社 | Imprint device and manufacturing method of article |
KR102213854B1 (en) | 2019-07-24 | 2021-02-10 | 한국기계연구원 | Imprinting head and imprinting apparatus comprising the same |
TWI728489B (en) * | 2019-10-04 | 2021-05-21 | 永嘉光電股份有限公司 | Imprint method using a soluble mold and its related imprint system |
KR102302901B1 (en) * | 2020-01-30 | 2021-09-17 | 주식회사 제이스텍 | Stage backup structure of equipment which forms laser pattern on display side |
TWI773231B (en) * | 2021-04-07 | 2022-08-01 | 國立成功大學 | Method of manufacturing metal nanoparticles |
WO2023001795A1 (en) * | 2021-07-21 | 2023-01-26 | Koninklijke Philips N.V. | Imprinting apparatus |
EP4123377A1 (en) * | 2021-07-21 | 2023-01-25 | Koninklijke Philips N.V. | Imprinting apparatus |
EP4123373A1 (en) * | 2021-07-21 | 2023-01-25 | Koninklijke Philips N.V. | Imprinting apparatus |
EP4123378A1 (en) * | 2021-07-21 | 2023-01-25 | Koninklijke Philips N.V. | Imprinting apparatus |
EP4123374A1 (en) * | 2021-07-21 | 2023-01-25 | Koninklijke Philips N.V. | Imprinting apparatus |
EP4123376A1 (en) * | 2021-07-21 | 2023-01-25 | Koninklijke Philips N.V. | Imprinting apparatus |
EP4123379A1 (en) * | 2021-07-21 | 2023-01-25 | Koninklijke Philips N.V. | Imprinting apparatus |
TWI803129B (en) * | 2021-12-30 | 2023-05-21 | 致茂電子股份有限公司 | Method and optical detection apparatus for detecting posture of surface under test |
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KR20030040378A (en) | 2000-08-01 | 2003-05-22 | 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 | Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography |
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-
2003
- 2003-07-31 KR KR1020057001792A patent/KR20050026088A/en not_active Application Discontinuation
- 2003-07-31 EP EP03767009A patent/EP1573395A4/en not_active Withdrawn
- 2003-07-31 TW TW092120993A patent/TWI266970B/en not_active IP Right Cessation
- 2003-07-31 WO PCT/US2003/023948 patent/WO2004013693A2/en active Search and Examination
- 2003-07-31 JP JP2004526254A patent/JP2006516065A/en active Pending
- 2003-07-31 AU AU2003261317A patent/AU2003261317A1/en not_active Abandoned
-
2010
- 2010-11-05 JP JP2010248314A patent/JP5421221B2/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI483225B (en) * | 2011-11-30 | 2015-05-01 | Screen Holdings Co Ltd | Alignment method, transfer method, and transfer apparatus |
US9327488B2 (en) | 2011-11-30 | 2016-05-03 | SCREEN Holdings Co., Ltd. | Alignment method, transfer method and transfer apparatus |
Also Published As
Publication number | Publication date |
---|---|
AU2003261317A1 (en) | 2004-02-23 |
JP2011101016A (en) | 2011-05-19 |
WO2004013693A2 (en) | 2004-02-12 |
KR20050026088A (en) | 2005-03-14 |
TW200406651A (en) | 2004-05-01 |
EP1573395A4 (en) | 2010-09-29 |
WO2004013693A3 (en) | 2006-01-19 |
AU2003261317A8 (en) | 2004-02-23 |
JP2006516065A (en) | 2006-06-15 |
EP1573395A2 (en) | 2005-09-14 |
JP5421221B2 (en) | 2014-02-19 |
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