DE60230663D1 - Bilderzeugungsapparat - Google Patents
BilderzeugungsapparatInfo
- Publication number
- DE60230663D1 DE60230663D1 DE60230663T DE60230663T DE60230663D1 DE 60230663 D1 DE60230663 D1 DE 60230663D1 DE 60230663 T DE60230663 T DE 60230663T DE 60230663 T DE60230663 T DE 60230663T DE 60230663 D1 DE60230663 D1 DE 60230663D1
- Authority
- DE
- Germany
- Prior art keywords
- image forming
- forming apparatus
- image
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP01204567 | 2001-11-27 | ||
PCT/EP2002/013399 WO2003046662A1 (en) | 2001-11-27 | 2002-11-27 | Imaging apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60230663D1 true DE60230663D1 (de) | 2009-02-12 |
Family
ID=8181314
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60230663T Expired - Lifetime DE60230663D1 (de) | 2001-11-27 | 2002-11-27 | Bilderzeugungsapparat |
Country Status (7)
Country | Link |
---|---|
US (1) | US7379579B2 (de) |
EP (1) | EP1449032B1 (de) |
JP (1) | JP4290553B2 (de) |
KR (1) | KR100674245B1 (de) |
CN (1) | CN1294455C (de) |
DE (1) | DE60230663D1 (de) |
WO (1) | WO2003046662A1 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1324138A3 (de) * | 2001-12-28 | 2007-12-19 | ASML Netherlands B.V. | Lithographischer Apparat und Verfahren zur Herstellung eines Artikels |
JP4929444B2 (ja) * | 2004-09-27 | 2012-05-09 | 国立大学法人東北大学 | パターン描画装置および方法 |
US7177012B2 (en) * | 2004-10-18 | 2007-02-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7403865B2 (en) * | 2004-12-28 | 2008-07-22 | Asml Netherlands B.V. | System and method for fault indication on a substrate in maskless applications |
US7233384B2 (en) * | 2005-06-13 | 2007-06-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor |
KR20080103564A (ko) * | 2006-02-16 | 2008-11-27 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법 및 디바이스 제조 방법 |
US9645502B2 (en) | 2011-04-08 | 2017-05-09 | Asml Netherlands B.V. | Lithographic apparatus, programmable patterning device and lithographic method |
DE102011076083A1 (de) | 2011-05-18 | 2012-11-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Projektionsdisplay und Verfahren zum Anzeigen eines Gesamtbildes für Projektionsfreiformflächen oder verkippte Projektionsflächen |
JP6676942B2 (ja) * | 2015-12-01 | 2020-04-08 | 株式会社ニコン | 制御装置及び制御方法、露光装置及び露光方法、デバイス製造方法、データ生成方法、並びに、プログラム |
TWI724642B (zh) * | 2019-11-20 | 2021-04-11 | 墨子光電有限公司 | 微製像設備及其加工方法 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2049964A (en) | 1979-05-01 | 1980-12-31 | Agfa Gevaert Nv | Simultaneously projecting two images of a subject in register |
DE3406677A1 (de) * | 1984-02-24 | 1985-09-05 | Fa. Carl Zeiss, 7920 Heidenheim | Einrichtung zur kompensation der auswanderung eines laserstrahls |
JP2501436B2 (ja) * | 1986-10-31 | 1996-05-29 | 富士通株式会社 | パタ−ンデ−タ検査装置 |
JP2796316B2 (ja) * | 1988-10-24 | 1998-09-10 | 株式会社日立製作所 | 欠陥または異物の検査方法およびその装置 |
JPH03265815A (ja) * | 1990-03-16 | 1991-11-26 | Kobe Steel Ltd | レーザビームによる描画装置 |
US5142132A (en) * | 1990-11-05 | 1992-08-25 | Litel Instruments | Adaptive optic wafer stepper illumination system |
WO1992011567A1 (en) * | 1990-12-21 | 1992-07-09 | Eastman Kodak Company | Method and apparatus for selectively varying the exposure of a photosensitive medium |
US5229889A (en) * | 1991-12-10 | 1993-07-20 | Hughes Aircraft Company | Simple adaptive optical system |
US5229872A (en) * | 1992-01-21 | 1993-07-20 | Hughes Aircraft Company | Exposure device including an electrically aligned electronic mask for micropatterning |
JP2710527B2 (ja) * | 1992-10-21 | 1998-02-10 | 大日本スクリーン製造株式会社 | 周期性パターンの検査装置 |
JPH06250108A (ja) * | 1993-02-22 | 1994-09-09 | Hitachi Ltd | 補償光学装置とこれを用いた天体望遠鏡,光データリンク,レーザ加工機 |
JPH088161A (ja) * | 1994-06-20 | 1996-01-12 | Mitsubishi Electric Corp | 転写シミュレータ装置 |
JP2001500628A (ja) * | 1996-02-28 | 2001-01-16 | ケニス シー ジョンソン | マイクロリトグラフィ用マイクロレンズスキャナ及び広フィールド共焦顕微鏡 |
JPH10177589A (ja) * | 1996-12-18 | 1998-06-30 | Mitsubishi Electric Corp | パターン比較検証装置、パターン比較検証方法およびパターン比較検証プログラムを記録した媒体 |
JP4159139B2 (ja) * | 1998-05-14 | 2008-10-01 | リコーマイクロエレクトロニクス株式会社 | 光像形成装置、光加工装置並びに露光装置 |
SE519397C2 (sv) * | 1998-12-16 | 2003-02-25 | Micronic Laser Systems Ab | System och metod för mikrolitografiskt ritande av högprecisionsmönster |
JP3315658B2 (ja) * | 1998-12-28 | 2002-08-19 | キヤノン株式会社 | 投影装置および露光装置 |
TWI282909B (en) * | 1999-12-23 | 2007-06-21 | Asml Netherlands Bv | Lithographic apparatus and a method for manufacturing a device |
JP2001255664A (ja) * | 2000-03-14 | 2001-09-21 | Fuji Photo Film Co Ltd | 画像露光方法 |
JP4364459B2 (ja) * | 2000-12-07 | 2009-11-18 | 富士通株式会社 | 光信号交換器の制御装置および制御方法 |
JP2002367900A (ja) * | 2001-06-12 | 2002-12-20 | Yaskawa Electric Corp | 露光装置および露光方法 |
DE10297208T5 (de) * | 2001-09-12 | 2005-01-05 | Micronic Laser Systems Ab | Verbessertes Verfahren und verbesserte Vorrichtung unter Verwendung eines SLM |
-
2002
- 2002-11-27 DE DE60230663T patent/DE60230663D1/de not_active Expired - Lifetime
- 2002-11-27 KR KR1020047007941A patent/KR100674245B1/ko not_active IP Right Cessation
- 2002-11-27 EP EP02790447A patent/EP1449032B1/de not_active Expired - Fee Related
- 2002-11-27 JP JP2003548035A patent/JP4290553B2/ja not_active Expired - Fee Related
- 2002-11-27 WO PCT/EP2002/013399 patent/WO2003046662A1/en active Application Filing
- 2002-11-27 CN CNB028235606A patent/CN1294455C/zh not_active Expired - Fee Related
- 2002-11-27 US US10/496,630 patent/US7379579B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1449032B1 (de) | 2008-12-31 |
JP2005510860A (ja) | 2005-04-21 |
EP1449032A1 (de) | 2004-08-25 |
CN1596387A (zh) | 2005-03-16 |
KR100674245B1 (ko) | 2007-01-25 |
WO2003046662A1 (en) | 2003-06-05 |
KR20040054804A (ko) | 2004-06-25 |
CN1294455C (zh) | 2007-01-10 |
JP4290553B2 (ja) | 2009-07-08 |
US7379579B2 (en) | 2008-05-27 |
US20050062948A1 (en) | 2005-03-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |