NO20023642L - Nitrid halvlederlaserinnretning - Google Patents

Nitrid halvlederlaserinnretning

Info

Publication number
NO20023642L
NO20023642L NO20023642A NO20023642A NO20023642L NO 20023642 L NO20023642 L NO 20023642L NO 20023642 A NO20023642 A NO 20023642A NO 20023642 A NO20023642 A NO 20023642A NO 20023642 L NO20023642 L NO 20023642L
Authority
NO
Norway
Prior art keywords
semiconductor laser
nitride semiconductor
laser device
nitride
semiconductor
Prior art date
Application number
NO20023642A
Other languages
English (en)
Other versions
NO20023642D0 (no
NO332908B1 (no
Inventor
Masahiko Sano
Original Assignee
Nichia Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nichia Corp filed Critical Nichia Corp
Publication of NO20023642D0 publication Critical patent/NO20023642D0/no
Publication of NO20023642L publication Critical patent/NO20023642L/no
Publication of NO332908B1 publication Critical patent/NO332908B1/no

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042—Electrical excitation ; Circuits therefor
    • H01S5/0421—Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042—Electrical excitation ; Circuits therefor
    • H01S5/0425—Electrodes, e.g. characterised by the structure
    • H01S5/04252—Electrodes, e.g. characterised by the structure characterised by the material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/32308—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm
    • H01S5/32341—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm blue laser based on GaN or GaP
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/02—Structural details or components not essential to laser action
    • H01S5/0206—Substrates, e.g. growth, shape, material, removal or bonding
    • H01S5/0213—Sapphire, quartz or diamond based substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042—Electrical excitation ; Circuits therefor
    • H01S5/0425—Electrodes, e.g. characterised by the structure
    • H01S5/04256—Electrodes, e.g. characterised by the structure characterised by the configuration
    • H01S5/04257—Electrodes, e.g. characterised by the structure characterised by the configuration having positive and negative electrodes on the same side of the substrate

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
  • Led Devices (AREA)
NO20023642A 2000-02-16 2002-07-31 Nitrid halvlederlaserinnretning NO332908B1 (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000038304 2000-02-16
PCT/JP2001/001063 WO2001061804A1 (en) 2000-02-16 2001-02-15 Nitride semiconductor laser device

Publications (3)

Publication Number Publication Date
NO20023642D0 NO20023642D0 (no) 2002-07-31
NO20023642L true NO20023642L (no) 2002-10-01
NO332908B1 NO332908B1 (no) 2013-01-28

Family

ID=18562064

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20023642A NO332908B1 (no) 2000-02-16 2002-07-31 Nitrid halvlederlaserinnretning

Country Status (13)

Country Link
US (2) US6838701B2 (no)
EP (1) EP1276186B1 (no)
JP (1) JP3864782B2 (no)
KR (2) KR100790964B1 (no)
CN (1) CN1203596C (no)
AU (2) AU3229701A (no)
CA (1) CA2400121C (no)
IL (2) IL151192A0 (no)
NO (1) NO332908B1 (no)
PL (1) PL202938B1 (no)
RU (1) RU2238607C2 (no)
TW (1) TW501288B (no)
WO (1) WO2001061804A1 (no)

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JP3812366B2 (ja) * 2001-06-04 2006-08-23 豊田合成株式会社 Ｉｉｉ族窒化物系化合物半導体素子の製造方法
JP3912044B2 (ja) * 2001-06-06 2007-05-09 豊田合成株式会社 Ｉｉｉ族窒化物系化合物半導体発光素子の製造方法
CN1305187C (zh) * 2002-01-21 2007-03-14 松下电器产业株式会社 氮化物半导体激光元件及其制造方法
US8294172B2 (en) 2002-04-09 2012-10-23 Lg Electronics Inc. Method of fabricating vertical devices using a metal support film
JP2004006498A (ja) * 2002-05-31 2004-01-08 Toyoda Gosei Co Ltd Ｉｉｉ族窒化物系化合物半導体発光素子
US6841802B2 (en) 2002-06-26 2005-01-11 Oriol, Inc. Thin film light emitting diode
JP4480948B2 (ja) * 2002-07-15 2010-06-16 日本オプネクスト株式会社 半導体レーザ素子及びその製造方法
JP4507532B2 (ja) * 2002-08-27 2010-07-21 日亜化学工業株式会社 窒化物半導体素子
JP4337520B2 (ja) * 2002-11-25 2009-09-30 日亜化学工業株式会社 リッジ導波路型半導体レーザ
TWI303909B (en) * 2002-11-25 2008-12-01 Nichia Corp Ridge waveguide semiconductor laser diode
TW577184B (en) * 2002-12-26 2004-02-21 Epistar Corp Light emitting layer having voltage/resistance interdependent layer
JP4635418B2 (ja) * 2003-07-31 2011-02-23 日亜化学工業株式会社 半導体装置の製造方法及び半導体装置
KR100576849B1 (ko) * 2003-09-19 2006-05-10 삼성전기주식회사 발광소자 및 그 제조방법
TWI246783B (en) * 2003-09-24 2006-01-01 Matsushita Electric Works Ltd Light-emitting device and its manufacturing method
JP4326297B2 (ja) * 2003-09-30 2009-09-02 シャープ株式会社 モノリシック多波長レーザ素子およびその製造方法
KR100994567B1 (ko) * 2003-11-11 2010-11-15 삼성전자주식회사 반도체 레이저 다이오드 및 그 제조방법
JP4640752B2 (ja) * 2003-12-05 2011-03-02 シャープ株式会社 窒化ガリウム系半導体レーザ及びその製造方法
JP2005191209A (ja) * 2003-12-25 2005-07-14 Matsushita Electric Ind Co Ltd 半導体レーザ装置およびその製造方法
JP4956928B2 (ja) * 2004-09-28 2012-06-20 日亜化学工業株式会社 半導体装置
JP4601391B2 (ja) * 2004-10-28 2010-12-22 シャープ株式会社 窒化物半導体素子およびその製造方法
KR100631898B1 (ko) * 2005-01-19 2006-10-11 삼성전기주식회사 Ｅｓｄ보호 능력을 갖는 질화갈륨계 발광 소자 및 그 제조방법
US20070131947A1 (en) * 2005-12-13 2007-06-14 Lg Innotek Co., Ltd Light-emitting device
US20090001402A1 (en) * 2006-03-22 2009-01-01 Rohm Co., Ltd. Semiconductor element and method of making the same
JP2007329350A (ja) * 2006-06-08 2007-12-20 Matsushita Electric Ind Co Ltd 半導体装置
JP5008911B2 (ja) * 2006-07-04 2012-08-22 ローム株式会社 半導体発光素子およびその製造方法
JP4353232B2 (ja) * 2006-10-24 2009-10-28 ソニー株式会社 発光素子
JP2008171997A (ja) * 2007-01-11 2008-07-24 Rohm Co Ltd ＧａＮ系半導体発光素子
US9318874B2 (en) * 2009-06-03 2016-04-19 Nichia Corporation Semiconductor device and method of manufacturing semiconductor device
JP2011009610A (ja) 2009-06-29 2011-01-13 Sharp Corp 窒化物半導体レーザ素子及びウェハ
RU2455739C2 (ru) * 2010-03-19 2012-07-10 Владимир Александрович Филоненко Линейка лазерных диодов
US20120037946A1 (en) * 2010-08-12 2012-02-16 Chi Mei Lighting Technology Corporation Light emitting devices
JP5204170B2 (ja) * 2010-08-25 2013-06-05 シャープ株式会社 窒化ガリウム系半導体レーザ及びその製造方法
TWI416765B (zh) * 2011-01-17 2013-11-21 Light emitting diodes
CN108807626B (zh) * 2011-09-15 2020-02-21 晶元光电股份有限公司 发光元件
JP2012023406A (ja) * 2011-10-28 2012-02-02 Sharp Corp 窒化物半導体発光素子とその窒化物半導体発光素子を備える窒化ガリウム系化合物半導体レーザ素子
US8716743B2 (en) * 2012-02-02 2014-05-06 Epistar Corporation Optoelectronic semiconductor device and the manufacturing method thereof
CN106299069A (zh) * 2016-08-31 2017-01-04 厦门三安光电有限公司 一种激光二极管及其制作方法
DE102016120685A1 (de) 2016-10-28 2018-05-03 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung eines Halbleiterlasers und Halbleiterlaser

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JPS60199349A (ja) 1984-03-21 1985-10-08 Fuji Oil Co Ltd 蛋白の製造法
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JPS63124461A (ja) 1986-11-12 1988-05-27 Nec Corp 半導体装置
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JP3322300B2 (ja) 1997-11-14 2002-09-09 日亜化学工業株式会社 窒化ガリウム系半導体発光素子と受光素子
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Also Published As

Publication number Publication date
US6838701B2 (en) 2005-01-04
KR100790964B1 (ko) 2008-01-04
US7167497B2 (en) 2007-01-23
EP1276186A1 (en) 2003-01-15
CN1203596C (zh) 2005-05-25
US20030038294A1 (en) 2003-02-27
IL151192A (en) 2006-10-31
RU2238607C2 (ru) 2004-10-20
TW501288B (en) 2002-09-01
JP3864782B2 (ja) 2007-01-10
EP1276186A4 (en) 2006-09-20
KR20070046208A (ko) 2007-05-02
EP1276186B1 (en) 2016-12-07
WO2001061804A1 (en) 2001-08-23
NO20023642D0 (no) 2002-07-31
CA2400121A1 (en) 2001-08-23
PL202938B1 (pl) 2009-08-31
AU2001232297B2 (en) 2005-10-06
KR100753146B1 (ko) 2007-08-30
PL357338A1 (en) 2004-07-26
RU2002124578A (ru) 2004-03-27
KR20020075917A (ko) 2002-10-07
US20040233956A1 (en) 2004-11-25
CN1404641A (zh) 2003-03-19
AU3229701A (en) 2001-08-27
IL151192A0 (en) 2003-04-10
CA2400121C (en) 2010-09-21
NO332908B1 (no) 2013-01-28

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