NO135614B - - Google Patents
Download PDFInfo
- Publication number
- NO135614B NO135614B NO1796/72A NO179672A NO135614B NO 135614 B NO135614 B NO 135614B NO 1796/72 A NO1796/72 A NO 1796/72A NO 179672 A NO179672 A NO 179672A NO 135614 B NO135614 B NO 135614B
- Authority
- NO
- Norway
- Prior art keywords
- layer
- current
- zone
- transistor
- integrated circuit
- Prior art date
Links
- 239000010410 layer Substances 0.000 claims description 404
- 238000002347 injection Methods 0.000 claims description 93
- 239000007924 injection Substances 0.000 claims description 93
- 230000007704 transition Effects 0.000 claims description 75
- 239000004065 semiconductor Substances 0.000 claims description 71
- 239000002800 charge carrier Substances 0.000 claims description 57
- 239000004020 conductor Substances 0.000 claims description 43
- 238000003860 storage Methods 0.000 claims description 43
- 239000000758 substrate Substances 0.000 claims description 37
- 239000011159 matrix material Substances 0.000 claims description 16
- 239000002344 surface layer Substances 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 9
- 230000000295 complement effect Effects 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 230000037431 insertion Effects 0.000 claims 1
- 238000003780 insertion Methods 0.000 claims 1
- 238000009792 diffusion process Methods 0.000 description 22
- 230000000694 effects Effects 0.000 description 12
- 238000009413 insulation Methods 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 11
- 230000003321 amplification Effects 0.000 description 10
- 238000003199 nucleic acid amplification method Methods 0.000 description 10
- 238000005265 energy consumption Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 7
- 230000000873 masking effect Effects 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 238000010276 construction Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000003071 parasitic effect Effects 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 3
- 230000005669 field effect Effects 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 230000006798 recombination Effects 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 238000004904 shortening Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 102000003712 Complement factor B Human genes 0.000 description 1
- 108090000056 Complement factor B Proteins 0.000 description 1
- 206010048865 Hypoacusis Diseases 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/02—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
- H03K19/08—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices
- H03K19/082—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using bipolar transistors
- H03K19/091—Integrated injection logic or merged transistor logic
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/41—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger
- G11C11/411—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger using bipolar transistors only
- G11C11/4113—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger using bipolar transistors only with at least one cell access to base or collector of at least one of said transistors, e.g. via access diodes, access transistors
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/41—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger
- G11C11/413—Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing, timing or power reduction
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/41—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger
- G11C11/413—Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing, timing or power reduction
- G11C11/414—Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing, timing or power reduction for memory cells of the bipolar type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0214—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
- H01L27/0229—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L of bipolar structures
- H01L27/0233—Integrated injection logic structures [I2L]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/082—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only
- H01L27/0821—Combination of lateral and vertical transistors only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/04—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/02—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
- H03K19/08—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/01—Details
- H03K3/012—Modifications of generator to improve response time or to decrease power consumption
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/26—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback
- H03K3/28—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback
- H03K3/281—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback using at least two transistors so coupled that the input of one is derived from the output of another, e.g. multivibrator
- H03K3/286—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback using at least two transistors so coupled that the input of one is derived from the output of another, e.g. multivibrator bistable
- H03K3/288—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback using at least two transistors so coupled that the input of one is derived from the output of another, e.g. multivibrator bistable using additional transistors in the input circuit
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/26—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback
- H03K3/28—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback
- H03K3/281—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback using at least two transistors so coupled that the input of one is derived from the output of another, e.g. multivibrator
- H03K3/286—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback using at least two transistors so coupled that the input of one is derived from the output of another, e.g. multivibrator bistable
- H03K3/289—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback using at least two transistors so coupled that the input of one is derived from the output of another, e.g. multivibrator bistable of the master-slave type
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B10/00—Static random access memory [SRAM] devices
- H10B10/10—SRAM devices comprising bipolar components
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R25/00—Deaf-aid sets, i.e. electro-acoustic or electro-mechanical hearing aids; Electric tinnitus maskers providing an auditory perception
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/087—I2L integrated injection logic
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computing Systems (AREA)
- Mathematical Physics (AREA)
- General Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Bipolar Integrated Circuits (AREA)
- Bipolar Transistors (AREA)
- Logic Circuits (AREA)
- Static Random-Access Memory (AREA)
- Electrodes Of Semiconductors (AREA)
- Amplifiers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL7107040A NL7107040A (ja) | 1971-05-22 | 1971-05-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
NO135614B true NO135614B (ja) | 1977-01-17 |
NO135614C NO135614C (no) | 1978-06-29 |
Family
ID=19813233
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO1796/72A NO135614C (no) | 1971-05-22 | 1972-05-19 | Integrert krets. |
Country Status (22)
Country | Link |
---|---|
US (4) | US4056810A (ja) |
JP (14) | JPS5215359B1 (ja) |
AR (1) | AR193989A1 (ja) |
AT (1) | AT361042B (ja) |
AU (1) | AU474945B2 (ja) |
BE (1) | BE783738A (ja) |
BR (1) | BR7203222D0 (ja) |
CA (1) | CA970473A (ja) |
CH (1) | CH551694A (ja) |
DE (5) | DE2266041C2 (ja) |
DK (1) | DK138198B (ja) |
ES (1) | ES403026A1 (ja) |
FR (1) | FR2138905B1 (ja) |
GB (1) | GB1398862A (ja) |
HK (7) | HK38978A (ja) |
IE (1) | IE37694B1 (ja) |
IT (1) | IT958927B (ja) |
NL (5) | NL7107040A (ja) |
NO (1) | NO135614C (ja) |
SE (3) | SE382137B (ja) |
YU (1) | YU35934B (ja) |
ZA (1) | ZA723230B (ja) |
Families Citing this family (88)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL160687C (nl) * | 1972-06-10 | 1979-11-15 | Philips Nv | Toongenerator voor het opwekken van gekozen frequenties. |
DE2344244C3 (de) * | 1973-09-01 | 1982-11-25 | Robert Bosch Gmbh, 7000 Stuttgart | Laterale Transistorstruktur |
FR2244262B1 (ja) * | 1973-09-13 | 1978-09-29 | Radiotechnique Compelec | |
US4153909A (en) * | 1973-12-10 | 1979-05-08 | National Semiconductor Corporation | Gated collector lateral transistor structure and circuits using same |
GB1507299A (en) * | 1974-03-26 | 1978-04-12 | Signetics Corp | Integrated semiconductor devices |
DE2442716C3 (de) * | 1974-09-06 | 1984-06-20 | Deutsche Itt Industries Gmbh, 7800 Freiburg | Monolithisch integriertes NOR-Gatter |
DE2442773C3 (de) * | 1974-09-06 | 1978-12-14 | Deutsche Itt Industries Gmbh, 7800 Freiburg | Integrierte Master-Slave-Flipflopschaltung |
JPS5431872B2 (ja) * | 1974-09-06 | 1979-10-09 | ||
NL7413264A (nl) * | 1974-10-09 | 1976-04-13 | Philips Nv | Geintegreerde schakeling. |
DE2560485C2 (de) * | 1974-10-09 | 1987-02-26 | N.V. Philips' Gloeilampenfabrieken, Eindhoven | Integrierte Schaltung mit einem mehreren I↑2↑L-Torschaltungen gemeinsamen Halbleiterkörper |
NL7513827A (nl) * | 1974-11-26 | 1976-05-31 | Sony Corp | Halfgeleiderinrichting, meer in het bijzonder volgens het principe van "integrated injection logic" werkende halfgeleiderinrichting. |
DE2460150C2 (de) * | 1974-12-19 | 1984-07-12 | Ibm Deutschland Gmbh, 7000 Stuttgart | Monolitisch integrierbare Speicheranordnung |
US4119998A (en) * | 1974-12-27 | 1978-10-10 | Tokyo Shibaura Electric Co., Ltd. | Integrated injection logic with both grid and internal double-diffused injectors |
JPS5615587B2 (ja) * | 1974-12-27 | 1981-04-10 | ||
JPS561783B2 (ja) * | 1974-12-27 | 1981-01-16 | ||
US4054900A (en) * | 1974-12-27 | 1977-10-18 | Tokyo Shibaura Electric Co., Ltd. | I.I.L. with region connecting base of double diffused injector to substrate/emitter of switching transistor |
US4107719A (en) * | 1975-02-19 | 1978-08-15 | Siemens Aktiengesellschaft | Inverse planar transistor |
DE2509530C2 (de) * | 1975-03-05 | 1985-05-23 | Ibm Deutschland Gmbh, 7000 Stuttgart | Halbleiteranordnung für die Grundbausteine eines hochintegrierbaren logischen Halbleiterschaltungskonzepts basierend auf Mehrfachkollektor-Umkehrtransistoren |
FR2308206A2 (fr) * | 1975-04-14 | 1976-11-12 | Radiotechnique Compelec | Circuit logique integre a injecteurs de courant |
DE2529951A1 (de) * | 1975-07-04 | 1977-01-27 | Siemens Ag | Lateraler, bipolarer transistor |
US4599635A (en) * | 1975-08-28 | 1986-07-08 | Hitachi, Ltd. | Semiconductor integrated circuit device and method of producing same |
FR2326810A1 (fr) * | 1975-09-30 | 1977-04-29 | Thomson Csf | Nouveaux inverseurs logiques integres |
FR2337431A1 (fr) * | 1975-12-29 | 1977-07-29 | Radiotechnique Compelec | Perfectionnement a la structure des circuits integres a transistors bipolaires et procede d'obtention |
FR2337432A1 (fr) * | 1975-12-29 | 1977-07-29 | Radiotechnique Compelec | Perfectionnement a la structure des circuits integres a transistors bipolaires complementaires et procede d'obtention |
DE2700587A1 (de) * | 1976-01-15 | 1977-07-21 | Itt Ind Gmbh Deutsche | Monolithisch integrierte i hoch 2 l-speicherzelle |
NL7606193A (nl) * | 1976-06-09 | 1977-12-13 | Philips Nv | Geintegreerde schakeling. |
JPS608628B2 (ja) * | 1976-07-05 | 1985-03-04 | ヤマハ株式会社 | 半導体集積回路装置 |
US4150392A (en) * | 1976-07-31 | 1979-04-17 | Nippon Gakki Seizo Kabushiki Kaisha | Semiconductor integrated flip-flop circuit device including merged bipolar and field effect transistors |
JPS5325375A (en) * | 1976-07-31 | 1978-03-09 | Nippon Gakki Seizo Kk | Semiconductor integrated circuit devi ce |
JPS5838938B2 (ja) * | 1976-08-03 | 1983-08-26 | 財団法人半導体研究振興会 | 半導体集積回路 |
DE2652103C2 (de) * | 1976-11-16 | 1982-10-28 | Ibm Deutschland Gmbh, 7000 Stuttgart | Integrierte Halbleiteranordnung für ein logisches Schaltungskonzept und Verfahren zu ihrer Herstellung |
FR2373163A1 (fr) * | 1976-12-03 | 1978-06-30 | Thomson Csf | Structure pour circuits logiques |
JPS588147B2 (ja) * | 1976-12-08 | 1983-02-14 | ヤマハ株式会社 | 半導体集積回路装置 |
JPS5811134B2 (ja) * | 1976-12-14 | 1983-03-01 | 株式会社東芝 | 分周回路 |
US4067038A (en) * | 1976-12-22 | 1978-01-03 | Harris Corporation | Substrate fed logic and method of fabrication |
NL7614610A (nl) * | 1976-12-31 | 1978-07-04 | Philips Nv | Inrichting voor het koppelen van in i2l techniek bedreven transistoren met een op hogere rust- stroom ingestelde transistor. |
NL7700420A (nl) * | 1977-01-17 | 1978-07-19 | Philips Nv | Halfgeleiderinrichting en werkwijze ter ver- vaardiging daarvan. |
JPS53121487A (en) * | 1977-03-30 | 1978-10-23 | Mitsubishi Electric Corp | Semiconductor logic circuit device of electrostatic induction type |
JPS53122381A (en) * | 1977-03-31 | 1978-10-25 | Mitsubishi Electric Corp | Semiconductor logic circuit device of electrostatic induction type |
US4400689A (en) * | 1977-04-07 | 1983-08-23 | Analog Devices, Incorporated | A-to-D Converter of the successive-approximation type |
GB1584724A (en) * | 1977-07-14 | 1981-02-18 | Philips Electronic Associated | Integrated injection logic circuits |
FR2404962A1 (fr) * | 1977-09-28 | 1979-04-27 | Ibm France | Dispositif semi-conducteur du genre cellule bistable en technologie a injection de courant, commandee par l'injecteur |
FR2408914A1 (fr) * | 1977-11-14 | 1979-06-08 | Radiotechnique Compelec | Dispositif semi-conducteur monolithique comprenant deux transistors complementaires et son procede de fabrication |
US4348600A (en) * | 1978-02-14 | 1982-09-07 | Motorola, Inc. | Controlled current source for I2 L to analog interfaces |
GB2014387B (en) * | 1978-02-14 | 1982-05-19 | Motorola Inc | Differential to single-ended converter utilizing inverted transistors |
DE2816949C3 (de) * | 1978-04-19 | 1981-07-16 | Ibm Deutschland Gmbh, 7000 Stuttgart | Monolithisch integrierte Halbleiteranordnung und deren Verwendung zum Aufbau einer Speicheranordnung |
NL7806989A (nl) * | 1978-06-29 | 1980-01-03 | Philips Nv | Geintegreerde schakeling. |
US4199776A (en) * | 1978-08-24 | 1980-04-22 | Rca Corporation | Integrated injection logic with floating reinjectors |
JPS55145363A (en) * | 1979-04-27 | 1980-11-12 | Toshiba Corp | Semiconductor device |
US4274891A (en) * | 1979-06-29 | 1981-06-23 | International Business Machines Corporation | Method of fabricating buried injector memory cell formed from vertical complementary bipolar transistor circuits utilizing mono-poly deposition |
US4458406A (en) * | 1979-12-28 | 1984-07-10 | Ibm Corporation | Making LSI devices with double level polysilicon structures |
US4475280A (en) * | 1980-12-24 | 1984-10-09 | General Electric Company | Method of making an integrated circuit incorporating low voltage and high voltage semiconductor devices |
US4412142A (en) * | 1980-12-24 | 1983-10-25 | General Electric Company | Integrated circuit incorporating low voltage and high voltage semiconductor devices |
JPS57116430A (en) * | 1981-01-13 | 1982-07-20 | Toshiba Corp | Inverted logical circuit |
US4654684A (en) * | 1981-04-13 | 1987-03-31 | International Business Machines Corp. | Magnetically sensitive transistors utilizing Lorentz field potential modultion of carrier injection |
JPS5947467B2 (ja) * | 1981-09-01 | 1984-11-19 | セイコーインスツルメンツ株式会社 | 温度センサ−用半導体素子 |
US4567500A (en) * | 1981-12-01 | 1986-01-28 | Rca Corporation | Semiconductor structure for protecting integrated circuit devices |
US4629912A (en) * | 1982-02-02 | 1986-12-16 | Fairchild Camera And Instrument Corp. | Schottky shunt integrated injection |
JPS58122611U (ja) * | 1982-02-15 | 1983-08-20 | カルソニックカンセイ株式会社 | 自動車用空気調和装置 |
JPS6048090A (ja) * | 1983-08-26 | 1985-03-15 | 伊勢電子工業株式会社 | 螢光表示装置 |
JPS6074455A (ja) * | 1983-09-29 | 1985-04-26 | Fujitsu Ltd | マスタスライス集積回路 |
JPH031424Y2 (ja) * | 1985-02-08 | 1991-01-17 | ||
US4813017A (en) * | 1985-10-28 | 1989-03-14 | International Business Machines Corportion | Semiconductor memory device and array |
US4794277A (en) * | 1986-01-13 | 1988-12-27 | Unitrode Corporation | Integrated circuit under-voltage lockout |
JPS6241030A (ja) * | 1986-05-09 | 1987-02-23 | Sumitomo Rubber Ind Ltd | タイヤの製造方法 |
US5087579A (en) * | 1987-05-28 | 1992-02-11 | Texas Instruments Incorporated | Method for fabricating an integrated bipolar-CMOS circuit isolation for providing different backgate and substrate bias |
US5060044A (en) * | 1987-05-28 | 1991-10-22 | Texas Instruments Incorporated | Integrated bipolar-CMOS circuit isolation for providing different backgate and substrate bias |
JPS6439120U (ja) * | 1987-09-04 | 1989-03-08 | ||
EP0328905B1 (de) * | 1988-02-15 | 1994-06-29 | Siemens Aktiengesellschaft | Schaltungsanordnung zum Schutze einer integrierten Schaltung |
JPH0828423B2 (ja) * | 1988-10-14 | 1996-03-21 | 日本電気株式会社 | 半導体記憶装置 |
JP3237757B2 (ja) * | 1989-12-28 | 2001-12-10 | 呉羽化学工業株式会社 | 電子部品封止用樹脂組成物および封止電子部品 |
US4999687A (en) * | 1990-04-25 | 1991-03-12 | At&T Bell Laboratories | Logic element and article comprising the element |
JPH0721531U (ja) * | 1991-07-22 | 1995-04-18 | 積水化成品工業株式会社 | 折り箱容器 |
JP2955106B2 (ja) * | 1992-01-06 | 1999-10-04 | 三菱電機株式会社 | 半導体装置 |
US5244098A (en) * | 1992-11-02 | 1993-09-14 | The Read Corporation | Material separating apparatus and method |
JP2537308Y2 (ja) * | 1993-08-18 | 1997-05-28 | 善孝 小林 | 自転車用サドルカバー入れ |
US6125139A (en) * | 1995-12-29 | 2000-09-26 | Advanced Micro Devices, Inc. | Narrowband digital cordless telephone |
US5978688A (en) * | 1995-12-29 | 1999-11-02 | Advanced Micro Devices, Inc. | Apparatus and method for protocol interface |
US5943373A (en) * | 1995-12-29 | 1999-08-24 | Advanced Micro Devices, Inc. | External protocol hooks system and method |
US6978009B1 (en) | 1996-08-20 | 2005-12-20 | Legerity, Inc. | Microprocessor-controlled full-duplex speakerphone using automatic gain control |
US6514785B1 (en) * | 2000-06-09 | 2003-02-04 | Taiwan Semiconductor Manufacturing Company | CMOS image sensor n-type pin-diode structure |
US7598521B2 (en) * | 2004-03-29 | 2009-10-06 | Sanyo Electric Co., Ltd. | Semiconductor device in which the emitter resistance is reduced |
US7433192B2 (en) * | 2004-12-29 | 2008-10-07 | Agere Systems Inc. | Packaging for electronic modules |
US7215204B2 (en) * | 2004-12-29 | 2007-05-08 | Agere Systems Inc. | Intelligent high-power amplifier module |
CN105047289A (zh) * | 2015-07-06 | 2015-11-11 | 舒泳军 | 一种带滑槽滑块的隔热屏罩的电缆 |
CN104979045A (zh) * | 2015-07-06 | 2015-10-14 | 余储 | 一种带有防火层的隔热屏罩的电缆 |
US10249607B1 (en) | 2017-12-15 | 2019-04-02 | Texas Instruments Incorporated | Internally stacked NPN with segmented collector |
KR102239463B1 (ko) * | 2020-11-25 | 2021-04-14 | 재단법인대구경북과학기술원 | 칼슘 이온 전지용 나시콘계 전극 조성물 및 이를 포함하는 칼슘 이온 전지 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2838617A (en) * | 1953-01-13 | 1958-06-10 | Philips Corp | Circuit-arrangement comprising a four-zone transistor |
US2936384A (en) * | 1957-04-12 | 1960-05-10 | Hazeltine Research Inc | Six junction transistor signaltranslating system |
US3165710A (en) * | 1961-03-27 | 1965-01-12 | Westinghouse Electric Corp | Solid state oscillator |
US3177414A (en) * | 1961-07-26 | 1965-04-06 | Nippon Electric Co | Device comprising a plurality of transistors |
JPS468254B1 (ja) * | 1967-11-13 | 1971-03-02 | ||
US3517324A (en) * | 1968-01-22 | 1970-06-23 | Eastman Kodak Co | Complementary emitter follower |
US3579059A (en) * | 1968-03-11 | 1971-05-18 | Nat Semiconductor Corp | Multiple collector lateral transistor device |
US3643235A (en) * | 1968-12-30 | 1972-02-15 | Ibm | Monolithic semiconductor memory |
US3817797A (en) * | 1969-05-12 | 1974-06-18 | Ibm | Construction of monolithic chip and method of distributing power there-in for individaul electronic devices constructed thereon |
BE756139A (fr) * | 1969-09-15 | 1971-02-15 | Rca Corp | Circuit intermediaire integre pour le couplage d'un circuit de commandea impedance de sortie faible a une charge a impedance d'entree elevee |
NL6917885A (ja) * | 1969-11-28 | 1971-06-02 | ||
US3657612A (en) * | 1970-04-20 | 1972-04-18 | Ibm | Inverse transistor with high current gain |
DE2021824C3 (de) * | 1970-05-05 | 1980-08-14 | Ibm Deutschland Gmbh, 7000 Stuttgart | Monolithische Halbleiterschaltung |
US3648125A (en) * | 1971-02-02 | 1972-03-07 | Fairchild Camera Instr Co | Method of fabricating integrated circuits with oxidized isolation and the resulting structure |
US3778688A (en) * | 1971-03-15 | 1973-12-11 | Texas Instruments Inc | Mos-bipolar high voltage driver circuit |
DE2165729C3 (de) * | 1971-12-30 | 1975-02-13 | Ibm Deutschland Gmbh, 7000 Stuttgart | Monolithische, als Lese/Schreiboder als Festwertspeicher betreibbare Speicheranordnung |
US3708691A (en) * | 1972-01-21 | 1973-01-02 | Tektronix Inc | Large scale integrated circuit of reduced area including counter |
DE2212168C2 (de) * | 1972-03-14 | 1982-10-21 | Ibm Deutschland Gmbh, 7000 Stuttgart | Monolithisch integrierte Halbleiteranordnung |
JPS4935030A (ja) * | 1972-08-03 | 1974-04-01 |
-
1971
- 1971-05-22 NL NL7107040A patent/NL7107040A/xx unknown
-
1972
- 1972-05-12 ZA ZA723230A patent/ZA723230B/xx unknown
- 1972-05-17 CA CA142,385A patent/CA970473A/en not_active Expired
- 1972-05-19 IE IE676/72A patent/IE37694B1/xx unknown
- 1972-05-19 DE DE2266041A patent/DE2266041C2/de not_active Expired - Lifetime
- 1972-05-19 CH CH753272A patent/CH551694A/xx not_active IP Right Cessation
- 1972-05-19 DK DK252672AA patent/DK138198B/da not_active IP Right Cessation
- 1972-05-19 IT IT68600/72A patent/IT958927B/it active
- 1972-05-19 AT AT439572A patent/AT361042B/de not_active IP Right Cessation
- 1972-05-19 GB GB2369972A patent/GB1398862A/en not_active Expired
- 1972-05-19 DE DE2224574A patent/DE2224574C2/de not_active Expired - Lifetime
- 1972-05-19 DE DE2266040A patent/DE2266040C2/de not_active Expired - Lifetime
- 1972-05-19 SE SE7206613A patent/SE382137B/xx unknown
- 1972-05-19 DE DE2266042A patent/DE2266042C2/de not_active Expired - Lifetime
- 1972-05-19 NO NO1796/72A patent/NO135614C/no unknown
- 1972-05-19 DE DE19722224574D patent/DE2224574A1/de active Granted
- 1972-05-19 BE BE783738A patent/BE783738A/xx not_active IP Right Cessation
- 1972-05-20 ES ES403026A patent/ES403026A1/es not_active Expired
- 1972-05-22 YU YU1355/72A patent/YU35934B/xx unknown
- 1972-05-22 AR AR242128A patent/AR193989A1/es active
- 1972-05-22 BR BR3222/72A patent/BR7203222D0/pt unknown
- 1972-05-22 AU AU42565/72A patent/AU474945B2/en not_active Expired
- 1972-05-22 JP JP47049966A patent/JPS5215359B1/ja active Pending
- 1972-05-23 FR FR7218313A patent/FR2138905B1/fr not_active Expired
-
1975
- 1975-06-26 SE SE7507351A patent/SE404459B/xx not_active IP Right Cessation
- 1975-06-26 SE SE7507352A patent/SE404460B/xx not_active IP Right Cessation
-
1976
- 1976-01-28 US US05/653,131 patent/US4056810A/en not_active Expired - Lifetime
- 1976-01-29 US US05/653,472 patent/US4078208A/en not_active Expired - Lifetime
- 1976-03-11 JP JP51026620A patent/JPS594862B2/ja not_active Expired
-
1978
- 1978-02-09 US US05/876,219 patent/US4286177A/en not_active Expired - Lifetime
- 1978-07-13 HK HK389/78A patent/HK38978A/xx unknown
- 1978-07-13 HK HK386/78A patent/HK38678A/xx unknown
- 1978-07-13 HK HK390/78A patent/HK39078A/xx unknown
- 1978-07-13 HK HK388/78A patent/HK38878A/xx unknown
- 1978-07-13 HK HK391/78A patent/HK39178A/xx unknown
- 1978-07-13 HK HK387/78A patent/HK38778A/xx unknown
- 1978-07-13 HK HK392/78A patent/HK39278A/xx unknown
-
1980
- 1980-06-26 JP JP8602080A patent/JPS5638858A/ja active Granted
- 1980-06-26 JP JP55086017A patent/JPS604594B2/ja not_active Expired
- 1980-06-26 JP JP55086015A patent/JPS6019669B2/ja not_active Expired
- 1980-06-26 JP JP8601680A patent/JPS5638854A/ja active Granted
- 1980-06-26 JP JP8601980A patent/JPS5638857A/ja active Granted
- 1980-06-26 JP JP55086018A patent/JPS5857910B2/ja not_active Expired
- 1980-06-26 JP JP8601080A patent/JPS568866A/ja active Granted
- 1980-06-26 JP JP8602180A patent/JPS5638859A/ja active Granted
- 1980-06-26 JP JP8601180A patent/JPS568867A/ja active Granted
- 1980-06-26 JP JP55086013A patent/JPS604593B2/ja not_active Expired
- 1980-06-26 JP JP8601280A patent/JPS568868A/ja active Granted
- 1980-06-26 JP JP8601480A patent/JPS568869A/ja active Granted
- 1980-12-03 US US06/212,582 patent/US4714842A/en not_active Expired - Lifetime
-
1982
- 1982-09-30 NL NLAANVRAGE8203799,A patent/NL187661C/xx not_active IP Right Cessation
- 1982-12-13 NL NLAANVRAGE8204809,A patent/NL187550C/xx not_active IP Right Cessation
- 1982-12-15 NL NLAANVRAGE8204833,A patent/NL187551C/xx not_active IP Right Cessation
- 1982-12-17 NL NLAANVRAGE8204877,A patent/NL188608C/xx active Search and Examination
Also Published As
Similar Documents
Publication | Publication Date | Title |
---|---|---|
NO135614B (ja) | ||
US4716314A (en) | Integrated circuit | |
EP0090665B1 (en) | Semiconductor memory device | |
CN104995737A (zh) | 半导体装置 | |
US3038085A (en) | Shift-register utilizing unitary multielectrode semiconductor device | |
US3982266A (en) | Integrated injection logic having high inverse current gain | |
US3699406A (en) | Semiconductor gate-controlled pnpn switch | |
EP0014080B1 (en) | A three-terminal semiconductor switch device | |
JP2005244145A (ja) | 半導体記憶装置及びその製造方法 | |
JPS6156627B2 (ja) | ||
US4255671A (en) | IIL Type semiconductor integrated circuit | |
US3890634A (en) | Transistor circuit | |
US3665266A (en) | Low saturation resistance,low offset voltage,monolithic analog switch | |
US3969747A (en) | Complementary bipolar transistors with IIL type common base drivers | |
JPS6337507B2 (ja) | ||
US4857977A (en) | Lateral metal-oxide-semiconductor controlled triacs | |
US4163244A (en) | Symmetrical integrated injection logic circuit | |
JPS6212153A (ja) | バイポ−ラramセル及びその製造方法 | |
US4054900A (en) | I.I.L. with region connecting base of double diffused injector to substrate/emitter of switching transistor | |
US3047733A (en) | Multiple output semiconductor logical device | |
US3621345A (en) | Semiconductor device having a bistable circuit element | |
JP2946546B2 (ja) | 半導体記憶装置 | |
JPS59149045A (ja) | 半導体装置の製造方法 | |
JPS6216028B2 (ja) | ||
JP2959003B2 (ja) | 半導体記憶装置 |