KR900008672A - 불휘발성 반도체 기억소자 - Google Patents

불휘발성 반도체 기억소자

Info

Publication number
KR900008672A
KR900008672A KR1019880015779A KR880015779A KR900008672A KR 900008672 A KR900008672 A KR 900008672A KR 1019880015779 A KR1019880015779 A KR 1019880015779A KR 880015779 A KR880015779 A KR 880015779A KR 900008672 A KR900008672 A KR 900008672A
Authority
KR
South Korea
Prior art keywords
memory device
semiconductor memory
nonvolatile semiconductor
nonvolatile
semiconductor
Prior art date
Application number
KR1019880015779A
Other languages
English (en)
Other versions
KR920001402B1 (ko
Inventor
신윤승
전성오
Original Assignee
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자 주식회사 filed Critical 삼성전자 주식회사
Priority to KR1019880015779A priority Critical patent/KR920001402B1/ko
Priority to NL8902027A priority patent/NL192066C/nl
Priority to DE3926474A priority patent/DE3926474C2/de
Priority to FR8910770A priority patent/FR2639765B1/fr
Priority to GB8918307A priority patent/GB2225485B/en
Priority to JP1205856A priority patent/JP2505286B2/ja
Priority to US07/391,865 priority patent/US5019881A/en
Publication of KR900008672A publication Critical patent/KR900008672A/ko
Application granted granted Critical
Publication of KR920001402B1 publication Critical patent/KR920001402B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/788—Field effect transistors with field effect produced by an insulated gate with floating gate
    • H01L29/7881—Programmable transistors with only two possible levels of programmation
    • H01L29/7884—Programmable transistors with only two possible levels of programmation charging by hot carrier injection
    • H01L29/7885—Hot carrier injection from the channel
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C16/00—Erasable programmable read-only memories
    • G11C16/02—Erasable programmable read-only memories electrically programmable
    • G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
KR1019880015779A 1988-11-29 1988-11-29 불휘발성 반도체 기억소자 KR920001402B1 (ko)

Priority Applications (7)

Application Number Priority Date Filing Date Title
KR1019880015779A KR920001402B1 (ko) 1988-11-29 1988-11-29 불휘발성 반도체 기억소자
NL8902027A NL192066C (nl) 1988-11-29 1989-08-08 Niet-vluchtige halfgeleidergeheugencel.
DE3926474A DE3926474C2 (de) 1988-11-29 1989-08-10 Permanent-Speicherzellen-Anordnung
FR8910770A FR2639765B1 (fr) 1988-11-29 1989-08-10 Composant de memoire semi-conductrice remanente
GB8918307A GB2225485B (en) 1988-11-29 1989-08-10 A semiconductor memory device
JP1205856A JP2505286B2 (ja) 1988-11-29 1989-08-10 不揮発性半導体記憶素子
US07/391,865 US5019881A (en) 1988-11-29 1989-08-10 Nonvolatile semiconductor memory component

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019880015779A KR920001402B1 (ko) 1988-11-29 1988-11-29 불휘발성 반도체 기억소자

Publications (2)

Publication Number Publication Date
KR900008672A true KR900008672A (ko) 1990-06-03
KR920001402B1 KR920001402B1 (ko) 1992-02-13

Family

ID=19279692

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880015779A KR920001402B1 (ko) 1988-11-29 1988-11-29 불휘발성 반도체 기억소자

Country Status (7)

Country Link
US (1) US5019881A (ko)
JP (1) JP2505286B2 (ko)
KR (1) KR920001402B1 (ko)
DE (1) DE3926474C2 (ko)
FR (1) FR2639765B1 (ko)
GB (1) GB2225485B (ko)
NL (1) NL192066C (ko)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100391015B1 (ko) * 2001-01-15 2003-07-12 황만택 지압 및 맛사지 효과 있는 배와 장(腸) 맛사지기
KR100402635B1 (ko) * 2001-03-07 2003-10-22 황만택 지압 및 맛사지 효과 잇는 배와 장(腸) 맛사지기
KR100402634B1 (ko) * 2001-03-07 2003-10-22 황만택 지압 및 맛사지 효과 잇는 배와 장(腸) 맛사지기

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0136995B1 (ko) * 1994-09-08 1998-04-24 김주용 비휘발성메모리셀의제조방법
DE69610062T2 (de) * 1995-11-21 2001-05-03 Programmable Microelectronics Nichtflüchtige PMOS-Speicheranordnung mit einer einzigen Polysiliziumschicht
KR970053902A (ko) * 1995-12-30 1997-07-31 김광호 공정시간 단축형 반도체 제조방법
US6478800B1 (en) * 2000-05-08 2002-11-12 Depuy Acromed, Inc. Medical installation tool
DE10235072A1 (de) * 2002-07-31 2004-02-26 Micronas Gmbh EEPROM-Struktur für Halbleiterspeicher
TWI312319B (en) 2003-08-28 2009-07-21 Toppan Forms Co Ltd Audio message transfer sheet and manufacturing method thereof, audio information output sheet and audio information component

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2743422A1 (de) * 1977-09-27 1979-03-29 Siemens Ag Wortweise loeschbarer, nicht fluechtiger speicher in floating-gate-technik
DE2844878A1 (de) * 1978-10-14 1980-04-30 Itt Ind Gmbh Deutsche Integrierbarer isolierschicht-feldeffekttransistor
US4334292A (en) * 1980-05-27 1982-06-08 International Business Machines Corp. Low voltage electrically erasable programmable read only memory
JPS57141969A (en) * 1981-02-27 1982-09-02 Toshiba Corp Nonvolatile semiconductor memory
US4558344A (en) * 1982-01-29 1985-12-10 Seeq Technology, Inc. Electrically-programmable and electrically-erasable MOS memory device
JPS58130571A (ja) * 1982-01-29 1983-08-04 Hitachi Ltd 半導体装置
JPS59117270A (ja) * 1982-12-24 1984-07-06 Mitsubishi Electric Corp 浮遊ゲ−ト型不揮発性ｍｏｓ半導体メモリ装置
US4590504A (en) * 1982-12-28 1986-05-20 Thomson Components - Mostek Corporation Nonvolatile MOS memory cell with tunneling element
FR2562707A1 (fr) * 1984-04-06 1985-10-11 Efcis Point-memoire electriquement effacable et reprogrammable, comportant une grille flottante au-dessus d'une grille de commande
JPH0671070B2 (ja) * 1984-07-11 1994-09-07 株式会社日立製作所 半導体記憶装置の製造方法
JPS61136274A (ja) * 1984-12-07 1986-06-24 Toshiba Corp 半導体装置
JPS6232638A (ja) * 1985-08-05 1987-02-12 Nec Corp 半導体記憶装置
JPS6273774A (ja) * 1985-09-27 1987-04-04 Toshiba Corp 半導体記憶装置の製造方法
JPS62131582A (ja) * 1985-11-26 1987-06-13 モトロ−ラ・インコ−ポレ−テツド 丸いエツジを有する分離した中間層キヤパシタ
JPS62155568A (ja) * 1985-12-27 1987-07-10 Nec Corp 不揮発性半導体記憶装置
JPS62193283A (ja) * 1986-02-20 1987-08-25 Toshiba Corp 半導体記憶装置
JPS62234375A (ja) * 1986-04-04 1987-10-14 Nec Corp 不揮発性半導体記憶装置
JPS6336576A (ja) * 1986-07-30 1988-02-17 Toshiba Corp 半導体装置及びその製造方法
IT1198109B (it) * 1986-11-18 1988-12-21 Sgs Microelettronica Spa Cella di memoria eeprom a singolo livello di polisilicio con zona di ossido di tunnel
US4894802A (en) * 1988-02-02 1990-01-16 Catalyst Semiconductor, Inc. Nonvolatile memory cell for eeprom including a floating gate to drain tunnel area positioned away from the channel region to prevent trapping of electrons in the gate oxide during cell erase
US4845538A (en) * 1988-02-05 1989-07-04 Emanuel Hazani E2 prom cell including isolated control diffusion

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100391015B1 (ko) * 2001-01-15 2003-07-12 황만택 지압 및 맛사지 효과 있는 배와 장(腸) 맛사지기
KR100402635B1 (ko) * 2001-03-07 2003-10-22 황만택 지압 및 맛사지 효과 잇는 배와 장(腸) 맛사지기
KR100402634B1 (ko) * 2001-03-07 2003-10-22 황만택 지압 및 맛사지 효과 잇는 배와 장(腸) 맛사지기

Also Published As

Publication number Publication date
DE3926474A1 (de) 1990-05-31
JP2505286B2 (ja) 1996-06-05
JPH02159071A (ja) 1990-06-19
GB2225485A (en) 1990-05-30
FR2639765A1 (fr) 1990-06-01
KR920001402B1 (ko) 1992-02-13
GB8918307D0 (en) 1989-09-20
DE3926474C2 (de) 1994-07-14
NL192066B (nl) 1996-09-02
US5019881A (en) 1991-05-28
NL8902027A (nl) 1990-06-18
GB2225485B (en) 1993-04-28
NL192066C (nl) 1997-01-07
FR2639765B1 (fr) 1994-05-06

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