KR20110025768A - 박막 트랜지스터 및 표시 장치 - Google Patents
박막 트랜지스터 및 표시 장치 Download PDFInfo
- Publication number
- KR20110025768A KR20110025768A KR1020107029079A KR20107029079A KR20110025768A KR 20110025768 A KR20110025768 A KR 20110025768A KR 1020107029079 A KR1020107029079 A KR 1020107029079A KR 20107029079 A KR20107029079 A KR 20107029079A KR 20110025768 A KR20110025768 A KR 20110025768A
- Authority
- KR
- South Korea
- Prior art keywords
- film
- oxide semiconductor
- semiconductor film
- protective
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/674—Thin-film transistors [TFT] characterised by the active materials
- H10D30/6755—Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
- H10D30/031—Manufacture or treatment of FETs having insulated gates [IGFET] of thin-film transistors [TFT]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6704—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
Landscapes
- Thin Film Transistor (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2008-174469 | 2008-07-03 | ||
| JP2008174469A JP5584960B2 (ja) | 2008-07-03 | 2008-07-03 | 薄膜トランジスタおよび表示装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20110025768A true KR20110025768A (ko) | 2011-03-11 |
Family
ID=41465881
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020107029079A Ceased KR20110025768A (ko) | 2008-07-03 | 2009-06-24 | 박막 트랜지스터 및 표시 장치 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20110095288A1 (enExample) |
| JP (1) | JP5584960B2 (enExample) |
| KR (1) | KR20110025768A (enExample) |
| CN (1) | CN102084486A (enExample) |
| WO (1) | WO2010001783A1 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20140042572A (ko) * | 2012-09-28 | 2014-04-07 | 엘지디스플레이 주식회사 | 표시장치용 산화물 박막 트랜지스터 및 그 제조방법 |
| US9293589B2 (en) | 2012-01-25 | 2016-03-22 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing semiconductor device |
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| KR101634411B1 (ko) | 2008-10-31 | 2016-06-28 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 구동 회로, 표시 장치 및 전자 장치 |
| JP4752925B2 (ja) * | 2009-02-04 | 2011-08-17 | ソニー株式会社 | 薄膜トランジスタおよび表示装置 |
| KR102096109B1 (ko) | 2009-07-03 | 2020-04-01 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치의 제작 방법 |
| KR101935752B1 (ko) | 2009-07-10 | 2019-01-04 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치의 제작 방법 |
| KR101638978B1 (ko) * | 2009-07-24 | 2016-07-13 | 삼성전자주식회사 | 박막 트랜지스터 및 그 제조방법 |
| CN112242173B (zh) | 2009-10-09 | 2024-08-20 | 株式会社半导体能源研究所 | 半导体器件 |
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| CN102725841B (zh) * | 2010-01-15 | 2016-10-05 | 株式会社半导体能源研究所 | 半导体器件 |
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| JP2011203726A (ja) * | 2010-03-05 | 2011-10-13 | Semiconductor Energy Lab Co Ltd | 表示装置 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100568500B1 (ko) * | 2003-12-26 | 2006-04-07 | 한국전자통신연구원 | 폴리실리콘층 형성 방법 및 이를 이용한 박막 트랜지스터제조 방법 |
| JP4870403B2 (ja) * | 2005-09-02 | 2012-02-08 | 財団法人高知県産業振興センター | 薄膜トランジスタの製法 |
| JP2007115808A (ja) * | 2005-10-19 | 2007-05-10 | Toppan Printing Co Ltd | トランジスタ |
| JP5128792B2 (ja) * | 2006-08-31 | 2013-01-23 | 財団法人高知県産業振興センター | 薄膜トランジスタの製法 |
| KR101146574B1 (ko) * | 2006-12-05 | 2012-05-16 | 캐논 가부시끼가이샤 | 산화물 반도체를 이용한 박막 트랜지스터의 제조방법 및 표시장치 |
-
2008
- 2008-07-03 JP JP2008174469A patent/JP5584960B2/ja active Active
-
2009
- 2009-06-24 WO PCT/JP2009/061507 patent/WO2010001783A1/ja not_active Ceased
- 2009-06-24 US US13/000,446 patent/US20110095288A1/en not_active Abandoned
- 2009-06-24 KR KR1020107029079A patent/KR20110025768A/ko not_active Ceased
- 2009-06-24 CN CN2009801256879A patent/CN102084486A/zh active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9293589B2 (en) | 2012-01-25 | 2016-03-22 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing semiconductor device |
| US10243081B2 (en) | 2012-01-25 | 2019-03-26 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing semiconductor device |
| KR20140042572A (ko) * | 2012-09-28 | 2014-04-07 | 엘지디스플레이 주식회사 | 표시장치용 산화물 박막 트랜지스터 및 그 제조방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010016163A (ja) | 2010-01-21 |
| CN102084486A (zh) | 2011-06-01 |
| JP5584960B2 (ja) | 2014-09-10 |
| US20110095288A1 (en) | 2011-04-28 |
| WO2010001783A1 (ja) | 2010-01-07 |
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