WO2010001783A1 - 薄膜トランジスタおよび表示装置 - Google Patents
薄膜トランジスタおよび表示装置 Download PDFInfo
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- WO2010001783A1 WO2010001783A1 PCT/JP2009/061507 JP2009061507W WO2010001783A1 WO 2010001783 A1 WO2010001783 A1 WO 2010001783A1 JP 2009061507 W JP2009061507 W JP 2009061507W WO 2010001783 A1 WO2010001783 A1 WO 2010001783A1
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- Prior art keywords
- film
- oxide semiconductor
- thin film
- protective
- semiconductor film
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- 239000010409 thin film Substances 0.000 title claims abstract description 95
- 239000010408 film Substances 0.000 claims abstract description 302
- 239000004065 semiconductor Substances 0.000 claims abstract description 111
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 38
- 238000000034 method Methods 0.000 claims abstract description 26
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 230000001681 protective effect Effects 0.000 claims description 121
- 239000001301 oxygen Substances 0.000 claims description 21
- 229910052760 oxygen Inorganic materials 0.000 claims description 21
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 19
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 17
- 238000000231 atomic layer deposition Methods 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 11
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 11
- 238000000137 annealing Methods 0.000 claims description 10
- 239000012298 atmosphere Substances 0.000 claims description 7
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 5
- 238000009832 plasma treatment Methods 0.000 claims description 4
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 claims description 3
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 14
- 239000001257 hydrogen Substances 0.000 abstract description 10
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 10
- 230000015572 biosynthetic process Effects 0.000 abstract description 6
- 238000009413 insulation Methods 0.000 abstract 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 12
- 239000010410 layer Substances 0.000 description 12
- 238000005530 etching Methods 0.000 description 11
- 230000004048 modification Effects 0.000 description 10
- 238000012986 modification Methods 0.000 description 10
- 239000007789 gas Substances 0.000 description 9
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 230000007547 defect Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- 239000011787 zinc oxide Substances 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 4
- 229910052733 gallium Inorganic materials 0.000 description 4
- 229910052738 indium Inorganic materials 0.000 description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000003795 desorption Methods 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- -1 oxygen radicals Chemical class 0.000 description 2
- 230000003071 parasitic effect Effects 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/7869—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
Definitions
- the present invention relates to a thin film transistor using an oxide semiconductor film and a display device using the same.
- an oxide semiconductor film using zinc oxide, indium gallium zinc oxide, or the like for the purpose of application to an electronic device such as a thin film transistor (TFT: Thin Film Transistor), a light emitting device, or a transparent conductive film.
- TFT Thin Film Transistor
- R & D is becoming more active.
- Such an oxide semiconductor film has high electron mobility and excellent electrical characteristics as compared with the case of using amorphous silicon ( ⁇ -Si) generally used for liquid crystal displays and the like. know.
- ⁇ -Si amorphous silicon
- the bottom gate type has a structure in which a gate electrode and a gate insulating film are formed in this order on a substrate, and an oxide semiconductor film is formed so as to cover the upper surface of the gate insulating film.
- Non-Patent Document 1 it has been reported that in the oxide semiconductor film, an electrically shallow impurity level is formed due to the intrusion of hydrogen gas or the like to cause a reduction in resistance (see Non-Patent Document 1). For this reason, for example, when zinc oxide is used for a thin film transistor, a normally-on type operation in which a drain current flows without applying a gate voltage, that is, a depletion type operation, the threshold voltage decreases as the defect level increases. Therefore, there is a problem that the leakage current increases. Thus, the penetration of hydrogen gas into the oxide semiconductor film affects the current transfer characteristics of the thin film transistor.
- the present invention has been made in view of such problems, and an object of the present invention is to provide a thin film transistor capable of suppressing the occurrence of leakage current in an oxide semiconductor film and a display device using the thin film transistor.
- the thin film transistor of the present invention includes a gate electrode, an oxide semiconductor film that forms a channel region corresponding to the gate electrode, a pair of electrodes including a source electrode and a drain electrode formed on the oxide semiconductor film, and an oxide And one or a plurality of protective films provided to face the channel region of the semiconductor film, and at least one of the one or more protective films includes aluminum oxide.
- the method for manufacturing a thin film transistor of the present invention includes a step of forming a gate electrode on a substrate, a step of forming an oxide semiconductor film having a channel region corresponding to the gate electrode, and a source electrode and a drain on the oxide semiconductor film. Including a step of forming a pair of electrodes made of electrodes and a step of forming one or more protective films so as to face the channel region of the oxide semiconductor film, and at least one of the one or more protective films
- the protective film is formed of a film containing aluminum oxide.
- the display device of the present invention includes a display element and the thin film transistor of the present invention.
- the protective film containing aluminum oxide is provided so as to face the channel region of the oxide semiconductor film forming the channel region. Intrusion of elements such as hydrogen into the substrate is suppressed.
- one or a plurality of protective films are provided facing the channel region of the oxide semiconductor film forming the channel region, and at least one of these protective films Since aluminum oxide contains aluminum oxide, entry of hydrogen or the like into the oxide semiconductor film can be suppressed, and generation of leakage current can be suppressed. Accordingly, the display device can improve brightness and display brighter.
- FIG. 1 illustrates a cross-sectional structure of a thin film transistor according to a first embodiment of the present invention. It is a figure for demonstrating the manufacturing method of the thin-film transistor shown in FIG. 3 illustrates a cross-sectional structure of a thin film transistor according to a second embodiment of the present invention. It is a figure for demonstrating the manufacturing method of the thin-film transistor shown in FIG. 3 illustrates a cross-sectional structure of a thin film transistor according to a third embodiment of the present invention. It is a figure for demonstrating the manufacturing method of the thin-film transistor shown in FIG. 5A and 5B show current-voltage characteristics of the thin film transistor shown in FIG. 5, where FIG. 5A shows a case where ozone treatment is performed, and FIG.
- 5B shows a case where ozone treatment is not performed.
- 6 represents the relationship of off-state current to the thickness of the protective film of the thin film transistor of FIG. 6A and 6B show current-voltage characteristics of the thin film transistor of FIG. 5, (A) shows before annealing, and (B) shows after annealing.
- 3 shows current-voltage characteristics of a thin film transistor according to a comparative example.
- 7 illustrates a cross-sectional structure of a thin film transistor according to a modification of the third embodiment. It is a figure for demonstrating the manufacturing method of the thin-film transistor shown in FIG.
- FIG. 1 shows a cross-sectional structure of a thin film transistor 1 according to a first embodiment of the present invention.
- the thin film transistor 1 has a bottom gate structure, for example, and uses an oxide semiconductor for a channel region (active layer).
- the thin film transistor 1 has a gate electrode 12 on a substrate 11 made of glass or plastic, and a gate insulating film 13 is provided so as to cover the gate electrode 12 and the substrate 11.
- An oxide semiconductor film 14 is formed in a region corresponding to the gate electrode 12 on the gate insulating film 13, and a pair of electrodes (a source electrode 15A and a drain electrode) are provided on the oxide semiconductor film 14 at a predetermined interval. 15B) is provided.
- a protective film 16 is formed over the entire surface of the substrate 11 so as to cover the channel region 14A, the source electrode 15A, and the drain electrode 15B of the oxide semiconductor film 14.
- the gate electrode 12 serves to control the electron density in the oxide semiconductor film 14 by the gate voltage applied to the thin film transistor 1.
- the gate electrode 12 is made of, for example, molybdenum (Mo).
- the gate insulating film 13 is composed of a silicon oxide film, a silicon nitride film, a silicon nitride oxide film, an aluminum oxide film, or the like.
- the oxide semiconductor film 14 is made of an oxide semiconductor, and a channel region 14A is formed between the source electrode 15A and the drain electrode 15B by voltage application.
- an oxide semiconductor is an oxide formed from an element such as indium (In), gallium (Ga), zinc (Zn), or tin (Su).
- the oxide semiconductor film 14 has a thickness of 20 nm to 100 nm, for example.
- the source electrode 15A and the drain electrode 15B are composed of, for example, molybdenum or chromium (Cr) alone or a laminated structure of titanium (Ti) / aluminum (Al) / titanium.
- the protective film 16 suppresses intrusion of hydrogen or the like into the thin film transistor 1, particularly into the channel region 14 ⁇ / b> A of the oxide semiconductor film 14.
- the protective film 16 includes an aluminum oxide film (Al 2 O 3 ), and is formed of a single layer film or a laminated film of two or more layers.
- the two-layer film include a laminated film of an aluminum oxide film and a silicon nitride film, or a laminated film of an aluminum oxide film and a silicon oxide film.
- Examples of the three-layer film include a laminated film of an aluminum oxide film, a silicon nitride film, and a silicon oxide film.
- the thickness of the protective film 16 is, for example, 10 nm to 100 nm, preferably 50 nm or less.
- the thin film transistor 1 can be manufactured, for example, as follows.
- the metal thin film is patterned by etching using, for example, a photoresist.
- a gate electrode 12 is formed.
- a gate insulating film 13 is formed by, for example, a plasma CVD (Chemical Vapor Deposition) method so as to cover the substrate 11 and the gate electrode 12.
- a plasma CVD Chemical Vapor Deposition
- a metal thin film is formed on the oxide semiconductor film 14 by, for example, a sputtering method, a region corresponding to the channel region 14A of the oxide semiconductor film 14 in the metal thin film. Further, the opening 150 is formed by etching using, for example, a photoresist. Thereby, the source electrode 15A and the drain electrode 15B are formed, respectively.
- the protective film 16 made of the above-described material or the like is formed so as to cover the formed oxide semiconductor film 14, the source electrode 15A, and the drain electrode 15B.
- ALD Atomic Layer Deposition
- the protective film 16 is formed using, for example, an atomic layer deposition (ALD: Atomic Layer Deposition) method as described below. That is, the substrate 11 on which the oxide semiconductor film 14, the source electrode 15A, and the drain electrode 15B are formed is placed in a vacuum chamber, and a trimethylaluminum gas serving as a source gas is introduced, and an atomic layer aluminum film is formed on the electrode formation side. Form.
- ALD Atomic Layer Deposition
- the aluminum film is oxidized by introducing oxygen radicals obtained by exciting ozone gas or oxygen gas with plasma to the side of the substrate 11 where the aluminum film is formed.
- the aluminum film since the aluminum film has a film thickness at the atomic layer level, it is easily oxidized by ozone or oxygen radicals.
- an aluminum oxide film is formed over the entire surface of the substrate 11. In this manner, an aluminum oxide film having a desired film thickness can be formed by alternately repeating the atomic layer formation process and the oxidation process of the aluminum film.
- the aluminum oxide film as the protective film 16 by using the atomic layer deposition method, oxygen is not deficient in the oxidation process. Therefore, an ideal composition that provides a stoichiometric ratio is obtained. It becomes easy to realize.
- the composition ratio of aluminum and oxygen can be an ideal 2: 3.
- the film can be formed in a state where generation of hydrogen gas is suppressed, the electrical characteristics of the oxide semiconductor film 14 are not deteriorated. Thereby, the protective film 16 having excellent gas barrier properties can be formed. Thus, the thin film transistor 1 shown in FIG. 1 is completed.
- the thin film transistor 1 when a gate voltage Vg equal to or higher than a predetermined threshold voltage is applied between the gate electrode 12 and the source electrode 15A through a wiring layer (not shown), a channel region 14A is formed in the oxide semiconductor film 14, A current (drain current Id) flows between the source electrode 15A and the drain electrode 15B, and functions as a transistor.
- the thin film transistor 1 When an element such as hydrogen enters the thin film transistor 1, an electrically shallow impurity level is formed in the oxide semiconductor film 14 as described above, resulting in a reduction in resistance. Therefore, for example, when zinc oxide is used as the oxide semiconductor film 14, the drain current Id flows without applying the gate voltage Vg, and the leakage current increases.
- the protective film 16 made of an aluminum oxide film is provided so as to cover the channel region 14A, the source electrode 15A, and the drain electrode 15B. Intrusion of hydrogen into the semiconductor film 14 is suppressed. Thereby, generation
- the thin film transistor 1 as described above can be suitably used as a drive element in a display device such as an organic EL display or a liquid crystal display.
- a display device such as an organic EL display or a liquid crystal display.
- the thin film transistor 1 since the thin film transistor 1 is provided, leakage current can be suppressed, so that a bright display with high luminance can be realized.
- the protective film 16 made of an aluminum oxide film prevents intrusion of hydrogen or the like from the outside, the reliability is improved.
- FIG. 3 shows a cross-sectional structure of a thin film transistor 2 according to a second embodiment of the present invention.
- the thin film transistor 2 has a bottom-gate structure and uses an oxide semiconductor for a channel region (active layer).
- oxide semiconductor for a channel region (active layer).
- a gate electrode 12, a gate insulating film 13, and an oxide semiconductor film 14 are provided on a substrate 11.
- a channel protective film 17 (first protective film) is formed on the upper surface of the oxide semiconductor film 14 and covers the upper surface of the channel protective film 17 and the side surface of the oxide semiconductor film 14.
- the protective film 18 (second protective film) is formed. Openings 170A and 170B are provided in the channel protective film 17 and the protective film 18, and a source electrode 19A and a drain electrode 19B are embedded in the openings 170A and 170B, respectively.
- the channel protective film 17 is formed so as to cover the upper surface of the oxide semiconductor 14.
- the channel protective film 17 plays a role of preventing mechanical damage to the oxide semiconductor film 14 and suppressing desorption of oxygen or the like in the oxide semiconductor film 14 by, for example, heat treatment during the manufacturing process. In the manufacturing process, the oxide semiconductor film 14 is also protected from the resist stripping solution.
- Such a channel protective film 17 is made of the same material as the protective film 16 of the first embodiment.
- the protective film 18 is provided for the purpose of protecting the inside of the thin film transistor 2 and is made of the same material as that of the protective film 16 of the first embodiment.
- the thin film transistor 2 can be manufactured, for example, as follows.
- the oxide semiconductor film 14 is formed on the entire surface of the gate insulating film 13 by the above-described method.
- a channel protective film 17 is formed on the entire surface of the formed oxide semiconductor film 14 by, for example, the atomic layer deposition method as described above.
- the channel protective film 17 and the oxide semiconductor film 14 formed over the entire surface are patterned by etching using a photoresist.
- the protective film 18 is formed by the above-described atomic layer deposition method so as to cover the upper surface of the patterned channel protective film and the side surface of the oxide semiconductor film 14.
- openings 170A and 170B penetrating to the surface of the oxide semiconductor film 14 are formed in the formed channel protective film 17 and protective film 18 by etching using, for example, a photoresist. Form.
- a metal thin film is formed by, for example, a sputtering method so as to fill these openings 170A and 170B.
- an opening is formed in the region corresponding to the channel region 14A of the formed metal thin film by, for example, etching using a photoresist.
- the source electrode 19A and the drain electrode 19B are formed.
- the thin film transistor 2 shown in FIG. 3 is completed.
- etching is performed when the oxide semiconductor 14, the source electrode 19 ⁇ / b> A, and the drain electrode 19 ⁇ / b> B are formed by patterning using the channel protective film 17 formed so as to cover the upper surface of the oxide semiconductor film 14. Therefore, the channel region 14A can be prevented from being damaged.
- entry of hydrogen into the oxide semiconductor film 14 can be suppressed by the protective film 18 provided to cover the upper surface of the channel protective film 17 and the side surface of the oxide semiconductor film 14. Therefore, the generation of leakage current can be suppressed more effectively than in the first embodiment.
- FIG. 5 shows a cross-sectional structure of a thin film transistor 3 according to a third embodiment of the present invention.
- the thin film transistor 3 has a bottom-gate structure and uses an oxide semiconductor for a channel region (active layer).
- oxide semiconductor for a channel region (active layer).
- the gate electrode 12, the gate insulating film 13, and the oxide semiconductor film 14 are provided on the substrate 11.
- a channel protective film 20 (first protective film) is formed in a region corresponding to the channel region 14 ⁇ / b> A on the oxide semiconductor film 14.
- the source electrode 21 ⁇ / b> A and the drain electrode 21 ⁇ / b> B are provided over the oxide semiconductor film 14 so as to cover the end portion of the channel protective film 20.
- a protective film 22 (second protective film) is formed so as to cover the channel protective film 20, the source electrode 21A, and the drain electrode 21B.
- the channel protective film 20 plays a role of preventing mechanical damage of the oxide semiconductor film 14 and suppressing the desorption of elements such as oxygen during heat treatment during the manufacturing process, for example. In the manufacturing process, the oxide semiconductor film 14 is also protected from the resist stripping solution.
- the channel protective film 20 is composed of a silicon oxide film.
- the protective film 22 is provided for the purpose of protecting the inside of the thin film transistor 3, and is made of the same material as that of the protective film 16 of the first embodiment.
- the thin film transistor 3 can be manufactured, for example, as follows.
- the channel protective film 20 made of the above-described material is formed by, for example, a plasma CVD method. To form. Note that in this embodiment mode, it is desirable to perform annealing treatment in an oxygen atmosphere in the subsequent steps. In general, it is known that when an oxide semiconductor film is placed in a vacuum atmosphere, oxygen present in the film or on the surface is released. Since the silicon oxide film has oxygen diffusibility, the channel protective film 20 is formed of a silicon oxide film, and the oxide semiconductor film 14 is subjected to annealing treatment in an oxygen atmosphere, whereby oxygen is added to the oxide semiconductor film 14. It becomes possible to supply. Accordingly, generation of lattice defects in the oxide semiconductor film 14 can be suppressed.
- the channel protective film 20 and the oxide semiconductor film 14 formed over the entire surface are sequentially patterned by etching using a photoresist.
- a metal thin film is formed by, for example, a sputtering method so as to cover the formed channel protective film 20 and the oxide semiconductor film 14.
- an opening is formed in the region corresponding to the channel region 14A of the metal thin film, for example, by etching using a photoresist.
- the source electrode 21A and the drain electrode 21B are formed, respectively.
- ozone treatment, oxygen plasma treatment, or nitrogen dioxide plasma treatment is performed on the oxide semiconductor film 14 as a treatment prior to the formation of the protective film 22.
- Such treatment may be performed at any timing after the oxide semiconductor film 14 is formed and before the protective film 22 is formed. However, it is desirable to perform it immediately before forming the protective film 22. Also by performing such pretreatment, generation of lattice defects in the oxide semiconductor film 14 can be suppressed.
- the protective film 22 is formed by, for example, the atomic layer deposition method described above so as to cover the formed channel protective film 20, the source electrode 21A, and the drain electrode 21B.
- the thin film transistor 3 shown in FIG. 5 is completed.
- the channel region 14A is formed by etching, for example, when forming the source electrode 19A and the drain electrode 19B by the channel protective film 20 formed on the channel region 14A of the oxide semiconductor film 14. Can be prevented from being damaged.
- penetration of hydrogen into the oxide semiconductor film 14 can be suppressed by the protective film 22 provided so as to cover the channel protective film 20, the source electrode 21A, and the drain electrode 21B. Therefore, it is possible to more effectively suppress the occurrence of leakage current than in the first embodiment.
- FIG. 7A shows the current (Id) -voltage (Vg) characteristics of the thin film transistor 3 when ozone treatment is performed before the protective film 22 is formed.
- FIG. 7B shows current-voltage characteristics when ozone treatment is not performed.
- FIG. 7A by performing ozone treatment, a low off-leakage current can be obtained, and electrical characteristics having a sufficiently high on-off ratio can be obtained.
- FIG. 7B it can be seen that when the ozone treatment is not performed, the threshold voltage of the transistor shifts in the negative direction and the electrical characteristics are greatly deteriorated. This is considered due to the following reasons.
- oxygen in the film or on the surface is desorbed in a vacuum, thereby generating lattice defects.
- Such a lattice defect like hydrogen gas, forms a shallow impurity level in the oxide semiconductor film and increases leakage current.
- the carrier concentration is reduced by preventing the induction of carriers.
- a thin film transistor 3 having a low and sufficient on / off ratio can be obtained. Note that the same effect as described above can be obtained even when treatment is performed with radicals formed by exciting oxygen gas or nitrogen dioxide gas with plasma instead of ozone treatment.
- FIG. 8 shows the relationship of the off-leakage current of the thin film transistor 3 with respect to the thickness of the aluminum oxide film as the protective film 22.
- the ozone treatment is performed before the protective film 22 is formed.
- the film thickness of the aluminum oxide film used as the protective film 22 is desirably 50 nm or less.
- FIGS. 9A and 9B show current-voltage characteristics of the thin film transistor 3 when the protective film 22 of an aluminum oxide film having a thickness of 10 nm is formed.
- FIG. 9A shows initial characteristics
- FIG. 9B shows characteristics after annealing for 1 hour at a temperature of 300 ° C. in a nitrogen atmosphere.
- FIG. 10A shows the initial characteristics when the protective film 22 is not formed
- FIG. 10B shows the characteristics after annealing for 1 hour at a temperature of 300 ° C. in a nitrogen atmosphere.
- FIGS. 10A and 10B it can be seen that when the protective film 22 is not formed, the current-voltage characteristics change greatly after annealing, and the off-leakage current increases rapidly.
- FIGS. 9A and 9B in the thin film transistor 3 of this embodiment in which an aluminum oxide film having a thickness of 10 nm is formed as the protective film 22, after annealing at 300 ° C. It can be seen that the characteristics are stable with almost no change. As a result, it has been found that stable characteristics can be maintained without degrading transistor characteristics even with respect to a thermal process required for device fabrication.
- FIG. 11 shows a cross-sectional structure of a thin film transistor 4 according to a modification.
- the thin film transistor 4 has a bottom-gate structure and uses an oxide semiconductor for a channel region (active layer).
- oxide semiconductor for a channel region (active layer).
- the configuration is the same as that of the third embodiment except for the configuration of the source electrode 23A and the drain electrode 23B. That is, the source electrode 23 ⁇ / b> A and the drain electrode 23 ⁇ / b> B are provided so as not to overlap with the channel protective film 20 formed on the oxide semiconductor film 14.
- the protective film 24 is formed so as to cover a part of the oxide semiconductor film 14, the channel protective film 20, the source electrode 23A, and the drain electrode 23B.
- the protective film 24 is provided for the purpose of protecting the inside of the thin film transistor 4, and is made of the same material as the protective film 16 of the first embodiment.
- the thin film transistor 4 can be manufactured as follows, for example. First, as shown in FIG. 12A, the channel protective film 20 and the oxide semiconductor film 14 are sequentially patterned by etching using a photoresist in the same manner as the thin film transistor 3 of the third embodiment described above. Form. Subsequently, as illustrated in FIG. 12B, the source electrode 23 ⁇ / b> A and the drain electrode 23 ⁇ / b> B are formed over the oxide semiconductor film 14 so as not to overlap with the formed channel protective film 20. Finally, the protective film 24 is formed by the atomic layer deposition method described above. In this modification as well, it is desirable to perform ozone treatment or the like before forming the protective film 24, as in the third embodiment. Thus, the thin film transistor 4 shown in FIG. 11 is completed.
- the source electrode 23A and the drain electrode 23B may be formed so as not to overlap the channel protective film 20. Even when configured in this way, the same effects as those of the first and third embodiments can be obtained. Note that a region (exposed region) that is not covered with the channel protective film 20 and both the source electrode 23A and the drain electrode 23B exists in the oxide semiconductor film 14, but in a reduced-pressure atmosphere when the protective film 24 is formed. In this case, oxygen in this exposed region is desorbed, so that the resistance is low in the exposed region. Therefore, the parasitic capacitance can be reduced without reducing the current of the thin film transistor 4 due to the parasitic resistance.
- the ozone treatment before the formation of the protective film can be performed also in the manufacturing process of the thin film transistor of the first and second embodiments.
- the channel protective film 17 is formed of an aluminum oxide film
- the present invention is not limited to this, as in the third embodiment and modifications.
- the channel protective film 17 may be formed of a silicon oxide film and annealed in an oxygen atmosphere in a later process.
- the channel protective film 20 is formed of a silicon oxide film has been described as an example.
- the channel protective film 20 may be formed of an aluminum oxide film.
- the present invention has been described with the embodiment and the modification.
- the present invention is not limited to the above-described embodiment and the like, and various modifications are possible.
- the case where the aluminum oxide film is formed by the atomic layer deposition method has been described as an example.
- the present invention is not limited to this, and the oxidation is performed by another deposition method such as a sputtering method.
- An aluminum film may be formed.
- an aluminum oxide film can be uniformly formed with an ideal composition ratio, and thus it is easy to ensure gas barrier properties.
- the bottom gate structure is described as an example of the thin film transistor.
- the present invention is not limited to this, and a top gate structure may be used.
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Abstract
Description
図1は、本発明の第1の実施の形態に係る薄膜トランジスタ1の断面構造を表すものである。薄膜トランジスタ1は、例えばボトムゲート型の構造を有し、チャネル領域(活性層)に酸化物半導体を用いたものである。薄膜トランジスタ1は、ガラスやプラスティックなどよりなる基板11上にゲート電極12を有しており、このゲート電極12と基板11とを覆うように、ゲート絶縁膜13が設けられている。ゲート絶縁膜13上のゲート電極12に対応する領域には、酸化物半導体膜14が形成され、酸化物半導体膜14上には、所定の間隔をおいて一対の電極(ソース電極15Aおよびドレイン電極15B)が設けられている。これらの酸化物半導体膜14のチャネル領域14A、ソース電極15Aおよびドレイン電極15Bを被覆するように、基板11の全面に渡って保護膜16が形成されている。
図3は、本発明の第2の実施の形態に係る薄膜トランジスタ2の断面構造を表すものである。薄膜トランジスタ2は、上記第1の実施の形態と同様、ボトムゲート型の構造を有し、チャネル領域(活性層)に酸化物半導体を用いたものである。以下では、上記第1の実施の形態と同様の構成要素については同一の符号を付し、適宜説明を省略する。
図5は、本発明の第3の実施の形態に係る薄膜トランジスタ3の断面構造を表すものである。薄膜トランジスタ3は、上記第1の実施の形態と同様、ボトムゲート型の構造を有し、チャネル領域(活性層)に酸化物半導体を用いたものである。以下では、上記第1の実施の形態と同様の構成要素については同一の符号を付し、適宜説明を省略する。
次に、上記第3の実施の形態の変形例について説明する。図11は、変形例に係る薄膜トランジスタ4の断面構造を表すものである。薄膜トランジスタ4は、上記第1の実施の形態と同様、ボトムゲート型の構造を有し、チャネル領域(活性層)に酸化物半導体を用いたものである。以下では、上記第1および第3の実施の形態と同様の構成要素については同一の符号を付し、適宜説明を省略する。
Claims (15)
- ゲート電極と、
前記ゲート電極に対応してチャネル領域を形成する酸化物半導体膜と、
前記酸化物半導体膜上に形成されたソース電極およびドレイン電極からなる一対の電極と、
前記酸化物半導体膜のチャネル領域に対向して設けられた一または複数の保護膜とを備え、
前記一または複数の保護膜のうち少なくとも一の保護膜が酸化アルミニウムを含んで構成されている
薄膜トランジスタ。 - 前記保護膜は、酸化アルミニウム膜により構成されている
請求項1に記載の薄膜トランジスタ。 - 前記保護膜は、酸化アルミニウム膜と、シリコン窒化膜およびシリコン酸化膜のうちの少なくとも一方との積層膜により構成されている
請求項1に記載の薄膜トランジスタ。 - 前記酸化アルミニウム膜の膜厚が50nm以下である
請求項2または3に記載の薄膜トランジスタ。 - 前記保護膜は、前記酸化物半導体膜のチャネル領域と前記一対の電極とを覆うように形成されている
請求項1に記載の薄膜トランジスタ。 - 前記保護膜は、
前記酸化物半導体膜の上面を覆うように形成された第1の保護膜と、
前記第1の保護膜の上面および前記酸化物半導体膜の側面を覆うように形成された第2の保護膜とを有し、
前記第1および第2の保護膜は開口を有し、
前記一対の電極は、前記開口を介して前記酸化物半導体膜上に形成され、かつ
前記第1および第2の保護膜のうち少なくともいずれか一方が、酸化アルミニウムを含む
請求項1に記載の薄膜トランジスタ。 - 前記保護膜は、
前記酸化物半導体膜のチャネル領域上に形成された第1の保護膜と、
前記第1の保護膜および前記一対の電極を覆うように形成された第2の保護膜とを有し、
前記第1および第2の保護膜のうち少なくともいずれか一方が、酸化アルミニウムを含む
請求項1に記載の薄膜トランジスタ。 - 前記第2の保護膜が酸化アルミニウムを含む
請求項7に記載の薄膜トランジスタ。 - 前記一対の電極は、前記第1の保護膜の端部を覆うように前記酸化物半導体膜上に形成されている
請求項7に記載の薄膜トランジスタ。 - 前記一対の電極は、前記酸化物半導体膜上の前記第1の保護膜に重ならないように形成されている
請求項7に記載の薄膜トランジスタ。 - 基板上にゲート電極を形成する工程と、
前記ゲート電極に対応してチャネル領域を有する酸化物半導体膜を形成する工程と、
前記酸化物半導体膜上にソース電極およびドレイン電極からなる一対の電極を形成する工程と、
前記酸化物半導体膜のチャネル領域に対向するように、一または複数の保護膜を形成する工程とを含み、
前記一または複数の保護膜のうち少なくとも一の保護膜を、酸化アルミニウムを含む膜により形成する
薄膜トランジスタの製造方法。 - 前記酸化アルミニウムを含む膜を、原子層成膜法により形成する
請求項11に記載の薄膜トランジスタの製造方法。 - 前記酸化アルミニウムを含む膜を形成する前に、前記酸化物半導体膜に対して、オゾン処理、酸素プラズマ処理もしくは二酸化窒素プラズマ処理を施す
請求項11に記載の薄膜トランジスタの製造方法。 - 前記一または複数の保護膜を形成する工程は、
前記酸化物半導体膜のチャネル領域上に、シリコン酸化膜を含む第1の保護膜を形成する工程と、
前記第1の保護膜を形成した後、前記酸化物半導体膜に対して酸素雰囲気中でアニール処理を施す工程と、
前記第1の保護膜および前記一対の電極を覆うように、酸化アルミニウムを含む第2の保護膜を形成する工程と
を含む請求項11に記載の薄膜トランジスタの製造方法。 - 表示素子と、前記表示素子を駆動するための薄膜トランジスタを備え、
前記薄膜トランジスタは、
ゲート電極と、
前記ゲート電極に対応してチャネル領域を形成する酸化物半導体膜と、
前記酸化物半導体膜上に形成されたソース電極およびドレイン電極からなる一対の電極と、
前記酸化物半導体膜のチャネル領域に対向して設けられた一または複数の保護膜とを有し、
前記一または複数の保護膜のうち少なくとも一の保護膜が酸化アルミニウムを含んで構成されている
表示装置。
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Also Published As
Publication number | Publication date |
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US20110095288A1 (en) | 2011-04-28 |
KR20110025768A (ko) | 2011-03-11 |
JP2010016163A (ja) | 2010-01-21 |
CN102084486A (zh) | 2011-06-01 |
JP5584960B2 (ja) | 2014-09-10 |
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