KR20070102933A - 기판 처리 장치 - Google Patents
기판 처리 장치 Download PDFInfo
- Publication number
- KR20070102933A KR20070102933A KR1020070020161A KR20070020161A KR20070102933A KR 20070102933 A KR20070102933 A KR 20070102933A KR 1020070020161 A KR1020070020161 A KR 1020070020161A KR 20070020161 A KR20070020161 A KR 20070020161A KR 20070102933 A KR20070102933 A KR 20070102933A
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- unit
- board
- coating
- processing apparatus
- Prior art date
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/02—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type
- B25J9/04—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical coordinate type or polar coordinate type
- B25J9/041—Cylindrical coordinate type
- B25J9/042—Cylindrical coordinate type comprising an articulated arm
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/10—Programme-controlled manipulators characterised by positioning means for manipulator elements
- B25J9/106—Programme-controlled manipulators characterised by positioning means for manipulator elements with articulated links
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/063—Transporting devices for sheet glass
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
Landscapes
- Engineering & Computer Science (AREA)
- Robotics (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating Apparatus (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims (4)
- 기판 표면에 박막을 형성하는 기판 처리 장치로서,슬릿 노즐로부터 처리액을 토출시키면서, 상기 슬릿 노즐을 도포 방향으로 이동시켜 기판 표면에 처리액을 도포하는 도포 유닛과,상기 기판 처리 장치에 있어서 기판을 반송하는 반송 유닛을 구비하고,상기 도포 유닛 및 상기 반송 유닛은 상기 도포 방향으로 수직인 방향으로 배열하는 것을 특징으로 하는 기판 처리 장치.
- 청구항 1에 있어서,상기 반송 유닛이 기판을 승강시키는 승강 수단을 더 구비하는 것을 특징으로 하는 기판 처리 장치.
- 청구항 2에 있어서,상기 도포 유닛에 있어서의 처리가 종료된 기판에 대해, 후처리를 행하는 후처리 유닛을 더 구비하고,상기 후처리 유닛은 상기 반송 유닛과 다단 구조를 형성하는 것을 특징으로 하는 기판 처리 장치.
- 청구항 1 내지 청구항 3 중 어느 한 항에 있어서,상기 반송 유닛은 기판의 중앙부를 지지하는 지지부재를 구비하는 것을 특징으로 하는 기판 처리 장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006113415A JP4969138B2 (ja) | 2006-04-17 | 2006-04-17 | 基板処理装置 |
JPJP-P-2006-00113415 | 2006-04-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20070102933A true KR20070102933A (ko) | 2007-10-22 |
KR100795657B1 KR100795657B1 (ko) | 2008-01-21 |
Family
ID=38759402
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070020161A KR100795657B1 (ko) | 2006-04-17 | 2007-02-28 | 기판 처리 장치 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4969138B2 (ko) |
KR (1) | KR100795657B1 (ko) |
CN (1) | CN101060066B (ko) |
TW (1) | TWI345284B (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101456471B1 (ko) * | 2013-03-06 | 2014-10-31 | (주) 티에이에스 | 이송 시스템 |
KR101520939B1 (ko) * | 2008-09-12 | 2015-05-18 | 주식회사 디엠에스 | 슬릿코터 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5537380B2 (ja) * | 2009-11-16 | 2014-07-02 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
KR101081883B1 (ko) | 2009-12-21 | 2011-11-09 | 주식회사 케이씨텍 | 노즐 간극의 정밀제어가 가능한 기판 코터 장치 |
JP5417186B2 (ja) * | 2010-01-08 | 2014-02-12 | 大日本スクリーン製造株式会社 | 基板処理装置 |
CN102320753A (zh) * | 2011-08-09 | 2012-01-18 | 深圳市华星光电技术有限公司 | 玻璃基板的涂布设备及其涂布方法 |
KR102126421B1 (ko) * | 2012-04-13 | 2020-06-24 | 가부시키가이샤 니콘 | 롤용 카세트 장치 |
CN102931120B (zh) * | 2012-10-25 | 2017-09-29 | 上海集成电路研发中心有限公司 | 工件传输系统 |
JP5735161B1 (ja) * | 2014-07-08 | 2015-06-17 | 中外炉工業株式会社 | 塗布装置及びその改良方法 |
CN105363627A (zh) * | 2015-10-09 | 2016-03-02 | 昆山希盟自动化科技有限公司 | Ccd对位的loca贴合机 |
CN106585067A (zh) * | 2015-10-19 | 2017-04-26 | 深圳莱宝高科技股份有限公司 | 一种面板处理装置及其处理方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2838345B2 (ja) * | 1992-10-28 | 1998-12-16 | 東京エレクトロン株式会社 | 基板搬送装置 |
JP3094055B2 (ja) * | 1993-05-18 | 2000-10-03 | 東京エレクトロン株式会社 | フィルタ装置及びレジスト処理システム |
JPH07297258A (ja) * | 1994-04-26 | 1995-11-10 | Tokyo Electron Ltd | 板状体の搬送装置 |
JPH1022358A (ja) * | 1996-06-28 | 1998-01-23 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP3571471B2 (ja) * | 1996-09-03 | 2004-09-29 | 東京エレクトロン株式会社 | 処理方法,塗布現像処理システム及び処理システム |
JP3622842B2 (ja) * | 2000-12-11 | 2005-02-23 | 住友精密工業株式会社 | 搬送式基板処理装置 |
JP4003611B2 (ja) * | 2002-10-28 | 2007-11-07 | トヨタ自動車株式会社 | 発電電動装置 |
JP4080349B2 (ja) * | 2003-02-21 | 2008-04-23 | 大日本スクリーン製造株式会社 | 減圧乾燥装置および被膜形成装置 |
JP2005142372A (ja) * | 2003-11-06 | 2005-06-02 | Tokyo Electron Ltd | 基板処理装置及び基板処理方法 |
JP2005270932A (ja) * | 2004-03-26 | 2005-10-06 | Tokyo Electron Ltd | 塗布膜形成装置 |
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2006
- 2006-04-17 JP JP2006113415A patent/JP4969138B2/ja active Active
-
2007
- 2007-02-01 TW TW096103632A patent/TWI345284B/zh active
- 2007-02-27 CN CN2007100843178A patent/CN101060066B/zh active Active
- 2007-02-28 KR KR1020070020161A patent/KR100795657B1/ko active IP Right Grant
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101520939B1 (ko) * | 2008-09-12 | 2015-05-18 | 주식회사 디엠에스 | 슬릿코터 |
KR101456471B1 (ko) * | 2013-03-06 | 2014-10-31 | (주) 티에이에스 | 이송 시스템 |
Also Published As
Publication number | Publication date |
---|---|
TW200810004A (en) | 2008-02-16 |
KR100795657B1 (ko) | 2008-01-21 |
CN101060066A (zh) | 2007-10-24 |
JP2007287914A (ja) | 2007-11-01 |
JP4969138B2 (ja) | 2012-07-04 |
CN101060066B (zh) | 2010-09-15 |
TWI345284B (en) | 2011-07-11 |
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