TWI345284B - Substrate processing apparatus - Google Patents
Substrate processing apparatus Download PDFInfo
- Publication number
- TWI345284B TWI345284B TW096103632A TW96103632A TWI345284B TW I345284 B TWI345284 B TW I345284B TW 096103632 A TW096103632 A TW 096103632A TW 96103632 A TW96103632 A TW 96103632A TW I345284 B TWI345284 B TW I345284B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- unit
- transport
- coating
- processing apparatus
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/02—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type
- B25J9/04—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical coordinate type or polar coordinate type
- B25J9/041—Cylindrical coordinate type
- B25J9/042—Cylindrical coordinate type comprising an articulated arm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/10—Programme-controlled manipulators characterised by positioning means for manipulator elements
- B25J9/106—Programme-controlled manipulators characterised by positioning means for manipulator elements with articulated links
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/063—Transporting devices for sheet glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
Landscapes
- Engineering & Computer Science (AREA)
- Robotics (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating Apparatus (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006113415A JP4969138B2 (ja) | 2006-04-17 | 2006-04-17 | 基板処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200810004A TW200810004A (en) | 2008-02-16 |
TWI345284B true TWI345284B (en) | 2011-07-11 |
Family
ID=38759402
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096103632A TWI345284B (en) | 2006-04-17 | 2007-02-01 | Substrate processing apparatus |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4969138B2 (ko) |
KR (1) | KR100795657B1 (ko) |
CN (1) | CN101060066B (ko) |
TW (1) | TWI345284B (ko) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101520939B1 (ko) * | 2008-09-12 | 2015-05-18 | 주식회사 디엠에스 | 슬릿코터 |
JP5537380B2 (ja) * | 2009-11-16 | 2014-07-02 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
KR101081883B1 (ko) | 2009-12-21 | 2011-11-09 | 주식회사 케이씨텍 | 노즐 간극의 정밀제어가 가능한 기판 코터 장치 |
JP5417186B2 (ja) * | 2010-01-08 | 2014-02-12 | 大日本スクリーン製造株式会社 | 基板処理装置 |
CN102320753A (zh) * | 2011-08-09 | 2012-01-18 | 深圳市华星光电技术有限公司 | 玻璃基板的涂布设备及其涂布方法 |
JP6011615B2 (ja) * | 2012-04-13 | 2016-10-19 | 株式会社ニコン | カセット装置、基板搬送装置、基板処理装置及び基板処理方法 |
CN102931120B (zh) * | 2012-10-25 | 2017-09-29 | 上海集成电路研发中心有限公司 | 工件传输系统 |
KR101456471B1 (ko) * | 2013-03-06 | 2014-10-31 | (주) 티에이에스 | 이송 시스템 |
JP5735161B1 (ja) * | 2014-07-08 | 2015-06-17 | 中外炉工業株式会社 | 塗布装置及びその改良方法 |
CN105363627A (zh) * | 2015-10-09 | 2016-03-02 | 昆山希盟自动化科技有限公司 | Ccd对位的loca贴合机 |
CN106585067A (zh) * | 2015-10-19 | 2017-04-26 | 深圳莱宝高科技股份有限公司 | 一种面板处理装置及其处理方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2838345B2 (ja) * | 1992-10-28 | 1998-12-16 | 東京エレクトロン株式会社 | 基板搬送装置 |
JP3094055B2 (ja) * | 1993-05-18 | 2000-10-03 | 東京エレクトロン株式会社 | フィルタ装置及びレジスト処理システム |
JPH07297258A (ja) * | 1994-04-26 | 1995-11-10 | Tokyo Electron Ltd | 板状体の搬送装置 |
JPH1022358A (ja) * | 1996-06-28 | 1998-01-23 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP3571471B2 (ja) * | 1996-09-03 | 2004-09-29 | 東京エレクトロン株式会社 | 処理方法,塗布現像処理システム及び処理システム |
JP3622842B2 (ja) * | 2000-12-11 | 2005-02-23 | 住友精密工業株式会社 | 搬送式基板処理装置 |
JP4003611B2 (ja) * | 2002-10-28 | 2007-11-07 | トヨタ自動車株式会社 | 発電電動装置 |
JP4080349B2 (ja) * | 2003-02-21 | 2008-04-23 | 大日本スクリーン製造株式会社 | 減圧乾燥装置および被膜形成装置 |
JP2005142372A (ja) * | 2003-11-06 | 2005-06-02 | Tokyo Electron Ltd | 基板処理装置及び基板処理方法 |
JP2005270932A (ja) * | 2004-03-26 | 2005-10-06 | Tokyo Electron Ltd | 塗布膜形成装置 |
-
2006
- 2006-04-17 JP JP2006113415A patent/JP4969138B2/ja active Active
-
2007
- 2007-02-01 TW TW096103632A patent/TWI345284B/zh active
- 2007-02-27 CN CN2007100843178A patent/CN101060066B/zh active Active
- 2007-02-28 KR KR1020070020161A patent/KR100795657B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
TW200810004A (en) | 2008-02-16 |
CN101060066B (zh) | 2010-09-15 |
JP4969138B2 (ja) | 2012-07-04 |
CN101060066A (zh) | 2007-10-24 |
KR20070102933A (ko) | 2007-10-22 |
JP2007287914A (ja) | 2007-11-01 |
KR100795657B1 (ko) | 2008-01-21 |
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