KR20010034389A - 웨이퍼 처리 시스템 - Google Patents
웨이퍼 처리 시스템 Download PDFInfo
- Publication number
- KR20010034389A KR20010034389A KR1020007008144A KR20007008144A KR20010034389A KR 20010034389 A KR20010034389 A KR 20010034389A KR 1020007008144 A KR1020007008144 A KR 1020007008144A KR 20007008144 A KR20007008144 A KR 20007008144A KR 20010034389 A KR20010034389 A KR 20010034389A
- Authority
- KR
- South Korea
- Prior art keywords
- wafer
- container
- storage
- reservoir
- chamber
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67769—Storage means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/14—Wafer cassette transporting
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (7)
- 외부 환경으로부터 차단될 수 있고 또 2개 이상의 리액터(6, 7)를 보관하는 처리 챔버(21)와, 일련의 웨이퍼(13)를 수용하기 위한 컨테이너(12) 및 상기 처리 챔버(21) 내에 배열되어 상기 컨테이너(12)를 직립 상태로 이동시키기 위한 컨베이어 수단(11)과, 웨이퍼(13)용 보조 컨테이너(10)와, 상기 보조 컨테이너(10)를 보관하기 위한 저장 수단(8)과, 상기 웨이퍼를 보조 컨테이너로부터 상기 컨테이너로 이동시키거나 그 역방향으로 이동시키기 위한 제1 이송 수단(24)과, 상기 컨테이너를 상기 컨테이너용 중간 저장부로부터 상기 처리 챔버로 이동시키거나 또는 그 역 방향으로 이동시키기 위한 제2 이송 수단(16)을 포함하며, 상기 처리 챔버(21)와 저장 수단(8) 사이에는 상기 컨테이너(12)를 수용하기 위해 중간 저장부(22)가 배열되고, 상기 컨테이너(12)용 상기 중간 저장부(22)와 상기 보조 컨테이너(10)용 상기 저장 수단(8) 사이에는 상기 보조 컨테이너(10)용 중간 저장부(30)가 배열되며, 보조 컨테이너를 상기 저장 수단으로부터 상기 보조 컨테이너용 중간 저장부로이동시키거나 그 역 방향으로 이동시키기 위해 제3 이송 수단(31)이 제공되는 웨이퍼(13) 처리 시스템(1)에 있어서,상기 중간 저장부(22)는 상기 컨테이너(12)를 직립 상태로 수납하도록 설계되는 것을 특징으로 하는 웨이퍼 처리 시스템.
- 제1항에 있어서, 상기 저장부(8)는 상기 보조 컨테이너(10)를 직립 상태로 수납하도록 설계되고, 또 상기 제1 이송 수단(24)은 본질적으로 수평으로 연장되는 상기 웨이퍼용 지지면을 포함하는 것을 특징으로 하는 웨이퍼 처리 시스템.
- 제1항 또는 제2항에 있어서, 상기 컨베이어 수단(11)은 회전 저장 선반(carousel)을 포함하는 것을 특징으로 하는 웨이퍼 처리 시스템.
- 제1항 내지 제3항 중 어느 한 항에 있어서, 상기 중간 저장부는 처리 챔버(21) 및 저장 수단(8)으로부터 차단될 수 있는 챔버(22)를 포함하는 것을 특징으로 하는 웨이퍼 처리 시스템.
- 제1항 내지 제4항 중 어느 한 항에 있어서, 상기 보조 컨테이너용 중간 저장부는 회전 플랫폼을 포함하는 것을 특징으로 하는 웨이퍼 처리 시스템.
- 제1항 내지 제5항 중 어느 한 항에 있어서, 상기 리액터는 노를 포함하는 것을 특징으로 하는 웨이퍼 처리 시스템.
- 제1항 내지 제6항 중 어느 한 항에 따른 2개 이상의 시스템을 포함하는 조립체로서,하나 이상의 시스템은 2개의 리액터(6, 7)를 포함하는 것을 특징으로 하는 조립체.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL1008143 | 1998-01-27 | ||
NL1008143A NL1008143C2 (nl) | 1998-01-27 | 1998-01-27 | Stelsel voor het behandelen van wafers. |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010034389A true KR20010034389A (ko) | 2001-04-25 |
KR100375977B1 KR100375977B1 (ko) | 2003-03-15 |
Family
ID=19766426
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2000-7008144A KR100375977B1 (ko) | 1998-01-27 | 1999-01-27 | 웨이퍼 처리 장치 |
Country Status (9)
Country | Link |
---|---|
US (1) | US6663332B1 (ko) |
EP (1) | EP1057212B1 (ko) |
JP (1) | JP3399464B2 (ko) |
KR (1) | KR100375977B1 (ko) |
AU (1) | AU2301699A (ko) |
DE (1) | DE69916035T2 (ko) |
NL (1) | NL1008143C2 (ko) |
TW (1) | TW429505B (ko) |
WO (1) | WO1999038199A1 (ko) |
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US5387265A (en) * | 1991-10-29 | 1995-02-07 | Kokusai Electric Co., Ltd. | Semiconductor wafer reaction furnace with wafer transfer means |
NL9200446A (nl) | 1992-03-10 | 1993-10-01 | Tempress B V | Inrichting voor het behandelen van microschakeling-schijven (wafers). |
JP3258748B2 (ja) * | 1993-02-08 | 2002-02-18 | 東京エレクトロン株式会社 | 熱処理装置 |
KR100221983B1 (ko) * | 1993-04-13 | 1999-09-15 | 히가시 데쓰로 | 처리장치 |
FR2719893B1 (fr) * | 1994-05-13 | 1996-08-02 | Europ Propulsion | Dispositif de chargement d'un four spatial automatique. |
JPH08213446A (ja) * | 1994-12-08 | 1996-08-20 | Tokyo Electron Ltd | 処理装置 |
JP3478364B2 (ja) * | 1995-06-15 | 2003-12-15 | 株式会社日立国際電気 | 半導体製造装置 |
KR100310249B1 (ko) * | 1995-08-05 | 2001-12-17 | 엔도 마코토 | 기판처리장치 |
NL1005102C2 (nl) | 1997-01-27 | 1998-07-29 | Advanced Semiconductor Mat | Inrichting voor het behandelen van halfgeleiderschijven. |
NL1009327C2 (nl) * | 1998-06-05 | 1999-12-10 | Asm Int | Werkwijze en inrichting voor het overbrengen van wafers. |
JP2001284276A (ja) * | 2000-03-30 | 2001-10-12 | Hitachi Kokusai Electric Inc | 基板処理装置 |
KR20020019414A (ko) * | 2000-09-05 | 2002-03-12 | 엔도 마코토 | 기판 처리 장치 및 기판 처리 장치를 이용한 반도체디바이스 제조 방법 |
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1998
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- 1999-01-27 DE DE69916035T patent/DE69916035T2/de not_active Expired - Fee Related
- 1999-01-27 KR KR10-2000-7008144A patent/KR100375977B1/ko not_active IP Right Cessation
- 1999-01-27 US US09/600,695 patent/US6663332B1/en not_active Expired - Lifetime
- 1999-01-27 AU AU23016/99A patent/AU2301699A/en not_active Abandoned
- 1999-01-27 WO PCT/NL1999/000047 patent/WO1999038199A1/en active IP Right Grant
- 1999-01-27 EP EP99902928A patent/EP1057212B1/en not_active Expired - Lifetime
- 1999-07-13 TW TW088111839A patent/TW429505B/zh not_active IP Right Cessation
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JP2002502112A (ja) | 2002-01-22 |
AU2301699A (en) | 1999-08-09 |
EP1057212B1 (en) | 2004-03-31 |
TW429505B (en) | 2001-04-11 |
DE69916035T2 (de) | 2004-08-26 |
US6663332B1 (en) | 2003-12-16 |
JP3399464B2 (ja) | 2003-04-21 |
EP1057212A1 (en) | 2000-12-06 |
NL1008143C2 (nl) | 1999-07-28 |
DE69916035D1 (de) | 2004-05-06 |
WO1999038199A1 (en) | 1999-07-29 |
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