KR102282866B1 - 표시 장치, 및 표시 장치를 포함하는 전자 장치 - Google Patents
표시 장치, 및 표시 장치를 포함하는 전자 장치 Download PDFInfo
- Publication number
- KR102282866B1 KR102282866B1 KR1020207007826A KR20207007826A KR102282866B1 KR 102282866 B1 KR102282866 B1 KR 102282866B1 KR 1020207007826 A KR1020207007826 A KR 1020207007826A KR 20207007826 A KR20207007826 A KR 20207007826A KR 102282866 B1 KR102282866 B1 KR 102282866B1
- Authority
- KR
- South Korea
- Prior art keywords
- insulating film
- film
- transistor
- electrode
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1345—Conductors connecting electrodes to cell terminals
- G02F1/13454—Drivers integrated on the active matrix substrate
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133345—Insulating layers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
-
- H01L27/1214—
-
- H01L27/1225—
-
- H01L27/1248—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/421—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer
- H10D86/423—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer comprising semiconductor materials not belonging to the Group IV, e.g. InGaZnO
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/451—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs characterised by the compositions or shapes of the interlayer dielectrics
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Control Of Indicators Other Than Cathode Ray Tubes (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020217022971A KR102368865B1 (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012161344 | 2012-07-20 | ||
| JPJP-P-2012-161344 | 2012-07-20 | ||
| PCT/JP2013/069456 WO2014014039A1 (en) | 2012-07-20 | 2013-07-10 | Display device and electronic device including the display device |
| KR1020187038087A KR102093060B1 (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020187038087A Division KR102093060B1 (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020217022971A Division KR102368865B1 (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20200032261A KR20200032261A (ko) | 2020-03-25 |
| KR102282866B1 true KR102282866B1 (ko) | 2021-07-27 |
Family
ID=49946266
Family Applications (8)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020257034910A Pending KR20250154556A (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
| KR1020227006185A Active KR102505680B1 (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
| KR1020187038087A Active KR102093060B1 (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
| KR1020237006749A Active KR102705677B1 (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
| KR1020247029906A Active KR102878532B1 (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
| KR1020207007826A Active KR102282866B1 (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
| KR1020157001433A Active KR102081468B1 (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
| KR1020217022971A Active KR102368865B1 (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
Family Applications Before (5)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020257034910A Pending KR20250154556A (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
| KR1020227006185A Active KR102505680B1 (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
| KR1020187038087A Active KR102093060B1 (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
| KR1020237006749A Active KR102705677B1 (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
| KR1020247029906A Active KR102878532B1 (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020157001433A Active KR102081468B1 (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
| KR1020217022971A Active KR102368865B1 (ko) | 2012-07-20 | 2013-07-10 | 표시 장치, 및 표시 장치를 포함하는 전자 장치 |
Country Status (7)
| Country | Link |
|---|---|
| US (8) | US9298057B2 (enExample) |
| JP (11) | JP6208485B2 (enExample) |
| KR (8) | KR20250154556A (enExample) |
| CN (2) | CN104488016B (enExample) |
| DE (1) | DE112013003609B4 (enExample) |
| TW (6) | TWI666497B (enExample) |
| WO (1) | WO2014014039A1 (enExample) |
Families Citing this family (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014013958A1 (en) | 2012-07-20 | 2014-01-23 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
| CN104488016B (zh) | 2012-07-20 | 2018-08-10 | 株式会社半导体能源研究所 | 显示装置及具有该显示装置的电子设备 |
| JP6219562B2 (ja) | 2012-10-30 | 2017-10-25 | 株式会社半導体エネルギー研究所 | 表示装置及び電子機器 |
| US9519198B2 (en) * | 2012-11-21 | 2016-12-13 | Sharp Kabushiki Kaisha | Liquid crystal display device |
| WO2014103901A1 (en) | 2012-12-25 | 2014-07-03 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
| JP6198434B2 (ja) | 2013-04-11 | 2017-09-20 | 株式会社半導体エネルギー研究所 | 表示装置及び電子機器 |
| JP2015055767A (ja) * | 2013-09-12 | 2015-03-23 | 株式会社ジャパンディスプレイ | 液晶表示パネル |
| JP6425877B2 (ja) * | 2013-09-26 | 2018-11-21 | 株式会社ジャパンディスプレイ | 表示素子およびその製造方法 |
| TWI666770B (zh) | 2013-12-19 | 2019-07-21 | 日商半導體能源研究所股份有限公司 | 半導體裝置 |
| CN103676330B (zh) * | 2013-12-23 | 2017-02-01 | 合肥京东方光电科技有限公司 | 阵列基板及显示装置 |
| KR102234434B1 (ko) * | 2013-12-27 | 2021-04-02 | 삼성디스플레이 주식회사 | 표시패널 및 그 제조방법 |
| TWI663726B (zh) | 2014-05-30 | 2019-06-21 | Semiconductor Energy Laboratory Co., Ltd. | 半導體裝置、模組及電子裝置 |
| TWI588978B (zh) * | 2014-08-18 | 2017-06-21 | 群創光電股份有限公司 | 薄膜電晶體及顯示面板 |
| KR102225787B1 (ko) * | 2014-10-10 | 2021-03-10 | 삼성전자주식회사 | 이미지 센서 및 그 제조 방법 |
| KR20160114511A (ko) | 2015-03-24 | 2016-10-05 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치의 제작 방법 |
| US9806200B2 (en) | 2015-03-27 | 2017-10-31 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| KR102381082B1 (ko) * | 2015-07-31 | 2022-03-30 | 엘지디스플레이 주식회사 | 액정 표시 장치 |
| KR102457205B1 (ko) * | 2015-08-31 | 2022-10-20 | 엘지디스플레이 주식회사 | 편광 제어 패널, 이의 제조 방법 및 이를 이용한 입체 영상 표시 장치 |
| WO2017087823A1 (en) | 2015-11-18 | 2017-05-26 | Mir Kalim U | Super-resolution sequencing |
| US10714633B2 (en) | 2015-12-15 | 2020-07-14 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and display device |
| KR20180123028A (ko) | 2016-03-11 | 2018-11-14 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장비, 상기 반도체 장치의 제작 방법, 및 상기 반도체 장치를 포함하는 표시 장치 |
| WO2017190271A1 (zh) * | 2016-05-03 | 2017-11-09 | 博立多媒体控股有限公司 | 具有显示和输入功能的电子产品 |
| KR102570314B1 (ko) * | 2016-06-08 | 2023-08-24 | 삼성디스플레이 주식회사 | 표시 장치 및 이의 제조 방법 |
| CN106098697B (zh) * | 2016-06-15 | 2019-04-02 | 深圳市华星光电技术有限公司 | 微发光二极管显示面板及其制作方法 |
| US10586495B2 (en) * | 2016-07-22 | 2020-03-10 | Semiconductor Energy Laboratory Co., Ltd. | Display device and electronic device |
| CN106057828A (zh) * | 2016-08-12 | 2016-10-26 | 京东方科技集团股份有限公司 | 一种基板及其制备方法、显示面板 |
| CN108666342B (zh) * | 2017-03-31 | 2021-02-09 | 京东方科技集团股份有限公司 | 一种显示面板及制作方法、显示装置 |
| WO2018189714A2 (en) * | 2017-04-14 | 2018-10-18 | 3M Innovative Properties Company | Durable low emissivity window film constructions |
| CN107945728A (zh) * | 2017-12-15 | 2018-04-20 | 京东方科技集团股份有限公司 | 一种显示基板、显示基板的制作方法及显示装置 |
| CN107958243B (zh) * | 2018-01-11 | 2020-07-07 | 京东方科技集团股份有限公司 | 主动式指纹识别像素电路、驱动方法及显示面板 |
| KR20230164225A (ko) * | 2018-02-01 | 2023-12-01 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시 장치 및 전자 기기 |
| WO2019186770A1 (ja) * | 2018-03-28 | 2019-10-03 | シャープ株式会社 | 表示デバイスおよび表示デバイスの製造方法 |
| TWI655768B (zh) * | 2018-04-24 | 2019-04-01 | 友達光電股份有限公司 | 陣列基板 |
| CN110596974B (zh) * | 2018-06-12 | 2022-04-15 | 夏普株式会社 | 显示面板和显示装置 |
| US11036321B2 (en) * | 2018-07-27 | 2021-06-15 | Lg Display Co., Ltd. | Light control film and display apparatus including the same |
| KR102630202B1 (ko) * | 2018-08-31 | 2024-01-25 | 엘지디스플레이 주식회사 | 유기 발광 표시 장치 |
| CN109387656B (zh) * | 2018-11-01 | 2021-01-26 | 京东方科技集团股份有限公司 | 一种转速传感器及其制作方法、驱动方法、电子设备 |
| JP7434167B2 (ja) * | 2018-11-02 | 2024-02-20 | 株式会社半導体エネルギー研究所 | 表示装置 |
| CN114678382A (zh) * | 2019-02-22 | 2022-06-28 | 群创光电股份有限公司 | 显示装置 |
| JP7628956B2 (ja) | 2019-11-01 | 2025-02-12 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| JP7679305B2 (ja) | 2019-11-08 | 2025-05-19 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| CN110828486B (zh) * | 2019-11-19 | 2023-05-12 | 云谷(固安)科技有限公司 | 显示面板的制作方法和显示面板 |
| CN111385934B (zh) * | 2019-12-26 | 2022-01-07 | 宁波凯耀电器制造有限公司 | 一种可控硅调光Bleeder电路 |
| CN111341849B (zh) * | 2020-03-05 | 2022-04-12 | 合肥京东方光电科技有限公司 | 显示基板及其制备方法、显示面板 |
| KR20210151304A (ko) | 2020-06-04 | 2021-12-14 | 삼성디스플레이 주식회사 | 표시 장치 |
| CN112542469B (zh) * | 2020-12-02 | 2022-11-08 | 深圳市华星光电半导体显示技术有限公司 | 阵列基板、显示面板及电子设备 |
| CN117012158A (zh) * | 2022-04-28 | 2023-11-07 | 川奇光电科技(扬州)有限公司 | 显示装置与驱动电路结构 |
| US20230351934A1 (en) | 2022-04-28 | 2023-11-02 | E Ink Holdings Inc. | Narrow border reflective display device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120097940A1 (en) * | 2010-10-22 | 2012-04-26 | Min-Sung Kwon | Display device and method for manufacturing the same |
Family Cites Families (184)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60198861A (ja) | 1984-03-23 | 1985-10-08 | Fujitsu Ltd | 薄膜トランジスタ |
| JPH0244256B2 (ja) | 1987-01-28 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn2o5deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
| JPH0244258B2 (ja) | 1987-02-24 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn3o6deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
| JPH0244260B2 (ja) | 1987-02-24 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn5o8deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
| JPS63210023A (ja) | 1987-02-24 | 1988-08-31 | Natl Inst For Res In Inorg Mater | InGaZn↓4O↓7で示される六方晶系の層状構造を有する化合物およびその製造法 |
| JPH0244262B2 (ja) | 1987-02-27 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn6o9deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
| JPH0244263B2 (ja) | 1987-04-22 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn7o10deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
| JPH05251705A (ja) | 1992-03-04 | 1993-09-28 | Fuji Xerox Co Ltd | 薄膜トランジスタ |
| JP3479375B2 (ja) | 1995-03-27 | 2003-12-15 | 科学技術振興事業団 | 亜酸化銅等の金属酸化物半導体による薄膜トランジスタとpn接合を形成した金属酸化物半導体装置およびそれらの製造方法 |
| KR100394896B1 (ko) | 1995-08-03 | 2003-11-28 | 코닌클리케 필립스 일렉트로닉스 엔.브이. | 투명스위칭소자를포함하는반도체장치 |
| JP3963974B2 (ja) * | 1995-12-20 | 2007-08-22 | 株式会社半導体エネルギー研究所 | 液晶電気光学装置 |
| JP3625598B2 (ja) | 1995-12-30 | 2005-03-02 | 三星電子株式会社 | 液晶表示装置の製造方法 |
| KR100229611B1 (ko) | 1996-06-12 | 1999-11-15 | 구자홍 | 액정표시장치의 제조방법 |
| FR2751468A1 (fr) * | 1996-07-15 | 1998-01-23 | Lgelectronics | Procede d'attaque pour un dispositif presentant un materiau organique |
| JP3410296B2 (ja) * | 1996-08-02 | 2003-05-26 | シャープ株式会社 | 液晶表示装置及びその製造方法 |
| JP4170454B2 (ja) | 1998-07-24 | 2008-10-22 | Hoya株式会社 | 透明導電性酸化物薄膜を有する物品及びその製造方法 |
| JP2000150861A (ja) | 1998-11-16 | 2000-05-30 | Tdk Corp | 酸化物薄膜 |
| JP3276930B2 (ja) | 1998-11-17 | 2002-04-22 | 科学技術振興事業団 | トランジスタ及び半導体装置 |
| JP4372939B2 (ja) | 1999-02-12 | 2009-11-25 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| US6576924B1 (en) | 1999-02-12 | 2003-06-10 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having at least a pixel unit and a driver circuit unit over a same substrate |
| JP4372943B2 (ja) | 1999-02-23 | 2009-11-25 | 株式会社半導体エネルギー研究所 | 半導体装置およびその作製方法 |
| TW518637B (en) | 1999-04-15 | 2003-01-21 | Semiconductor Energy Lab | Electro-optical device and electronic equipment |
| JP4531194B2 (ja) | 1999-04-15 | 2010-08-25 | 株式会社半導体エネルギー研究所 | 電気光学装置及び電子機器 |
| EP1049167A3 (en) * | 1999-04-30 | 2007-10-24 | Sel Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| TW460731B (en) | 1999-09-03 | 2001-10-21 | Ind Tech Res Inst | Electrode structure and production method of wide viewing angle LCD |
| KR100684578B1 (ko) | 2000-06-13 | 2007-02-20 | 엘지.필립스 엘시디 주식회사 | 반사투과형 액정표시장치용 어레이기판과 그 제조방법 |
| JP4089858B2 (ja) | 2000-09-01 | 2008-05-28 | 国立大学法人東北大学 | 半導体デバイス |
| KR20020038482A (ko) | 2000-11-15 | 2002-05-23 | 모리시타 요이찌 | 박막 트랜지스터 어레이, 그 제조방법 및 그것을 이용한표시패널 |
| JP3997731B2 (ja) | 2001-03-19 | 2007-10-24 | 富士ゼロックス株式会社 | 基材上に結晶性半導体薄膜を形成する方法 |
| JP2002289859A (ja) | 2001-03-23 | 2002-10-04 | Minolta Co Ltd | 薄膜トランジスタ |
| JP3925839B2 (ja) | 2001-09-10 | 2007-06-06 | シャープ株式会社 | 半導体記憶装置およびその試験方法 |
| JP4090716B2 (ja) | 2001-09-10 | 2008-05-28 | 雅司 川崎 | 薄膜トランジスタおよびマトリクス表示装置 |
| JP4164562B2 (ja) | 2002-09-11 | 2008-10-15 | 独立行政法人科学技術振興機構 | ホモロガス薄膜を活性層として用いる透明薄膜電界効果型トランジスタ |
| EP1443130B1 (en) | 2001-11-05 | 2011-09-28 | Japan Science and Technology Agency | Natural superlattice homologous single crystal thin film, method for preparation thereof, and device using said single crystal thin film |
| JP4101511B2 (ja) * | 2001-12-27 | 2008-06-18 | 株式会社半導体エネルギー研究所 | 発光装置及びその作製方法 |
| JP4083486B2 (ja) | 2002-02-21 | 2008-04-30 | 独立行政法人科学技術振興機構 | LnCuO(S,Se,Te)単結晶薄膜の製造方法 |
| CN1445821A (zh) | 2002-03-15 | 2003-10-01 | 三洋电机株式会社 | ZnO膜和ZnO半导体层的形成方法、半导体元件及其制造方法 |
| JP3933591B2 (ja) | 2002-03-26 | 2007-06-20 | 淳二 城戸 | 有機エレクトロルミネッセント素子 |
| JP3989761B2 (ja) * | 2002-04-09 | 2007-10-10 | 株式会社半導体エネルギー研究所 | 半導体表示装置 |
| TWI272556B (en) | 2002-05-13 | 2007-02-01 | Semiconductor Energy Lab | Display device |
| TWI263339B (en) | 2002-05-15 | 2006-10-01 | Semiconductor Energy Lab | Light emitting device and method for manufacturing the same |
| US7339187B2 (en) | 2002-05-21 | 2008-03-04 | State Of Oregon Acting By And Through The Oregon State Board Of Higher Education On Behalf Of Oregon State University | Transistor structures |
| JP2004022625A (ja) | 2002-06-13 | 2004-01-22 | Murata Mfg Co Ltd | 半導体デバイス及び該半導体デバイスの製造方法 |
| US7105868B2 (en) | 2002-06-24 | 2006-09-12 | Cermet, Inc. | High-electron mobility transistor with zinc oxide |
| US7067843B2 (en) | 2002-10-11 | 2006-06-27 | E. I. Du Pont De Nemours And Company | Transparent oxide semiconductor thin film transistors |
| JP4175877B2 (ja) * | 2002-11-29 | 2008-11-05 | 株式会社半導体エネルギー研究所 | 半導体装置及びその作製方法 |
| JP4166105B2 (ja) | 2003-03-06 | 2008-10-15 | シャープ株式会社 | 半導体装置およびその製造方法 |
| JP2004273732A (ja) | 2003-03-07 | 2004-09-30 | Sharp Corp | アクティブマトリクス基板およびその製造方法 |
| JP4108633B2 (ja) | 2003-06-20 | 2008-06-25 | シャープ株式会社 | 薄膜トランジスタおよびその製造方法ならびに電子デバイス |
| SG142140A1 (en) * | 2003-06-27 | 2008-05-28 | Semiconductor Energy Lab | Display device and method of manufacturing thereof |
| US7262463B2 (en) | 2003-07-25 | 2007-08-28 | Hewlett-Packard Development Company, L.P. | Transistor including a deposited channel region having a doped portion |
| KR101034181B1 (ko) | 2003-08-21 | 2011-05-12 | 엘지디스플레이 주식회사 | 액정표시장치용 어레이기판 제조방법 |
| JP2005173106A (ja) | 2003-12-10 | 2005-06-30 | Seiko Epson Corp | 電気光学装置及びその製造方法 |
| US7282782B2 (en) | 2004-03-12 | 2007-10-16 | Hewlett-Packard Development Company, L.P. | Combined binary oxide semiconductor device |
| US7297977B2 (en) | 2004-03-12 | 2007-11-20 | Hewlett-Packard Development Company, L.P. | Semiconductor device |
| US7145174B2 (en) | 2004-03-12 | 2006-12-05 | Hewlett-Packard Development Company, Lp. | Semiconductor device |
| US20070194379A1 (en) | 2004-03-12 | 2007-08-23 | Japan Science And Technology Agency | Amorphous Oxide And Thin Film Transistor |
| KR101116816B1 (ko) | 2004-06-05 | 2012-02-28 | 엘지디스플레이 주식회사 | 반투과형 박막 트랜지스터 기판 및 그 제조 방법 |
| KR101037085B1 (ko) | 2004-06-05 | 2011-05-26 | 엘지디스플레이 주식회사 | 반투과형 박막 트랜지스터 기판 및 그 제조 방법 |
| KR101076426B1 (ko) | 2004-06-05 | 2011-10-25 | 엘지디스플레이 주식회사 | 반투과형 박막 트랜지스터 기판 및 그 제조 방법 |
| US7211825B2 (en) | 2004-06-14 | 2007-05-01 | Yi-Chi Shih | Indium oxide-based thin film transistors and circuits |
| US8217396B2 (en) | 2004-07-30 | 2012-07-10 | Semiconductor Energy Laboratory Co., Ltd. | Display device comprising electrode layer contacting wiring in the connection region and extending to pixel region |
| JP2006100760A (ja) | 2004-09-02 | 2006-04-13 | Casio Comput Co Ltd | 薄膜トランジスタおよびその製造方法 |
| US7285501B2 (en) | 2004-09-17 | 2007-10-23 | Hewlett-Packard Development Company, L.P. | Method of forming a solution processed device |
| US8350466B2 (en) * | 2004-09-17 | 2013-01-08 | Semiconductor Energy Laboratory Co., Ltd. | Display device and manufacturing method thereof |
| US7298084B2 (en) | 2004-11-02 | 2007-11-20 | 3M Innovative Properties Company | Methods and displays utilizing integrated zinc oxide row and column drivers in conjunction with organic light emitting diodes |
| US7863611B2 (en) | 2004-11-10 | 2011-01-04 | Canon Kabushiki Kaisha | Integrated circuits utilizing amorphous oxides |
| US7829444B2 (en) | 2004-11-10 | 2010-11-09 | Canon Kabushiki Kaisha | Field effect transistor manufacturing method |
| US7791072B2 (en) | 2004-11-10 | 2010-09-07 | Canon Kabushiki Kaisha | Display |
| JP5126729B2 (ja) | 2004-11-10 | 2013-01-23 | キヤノン株式会社 | 画像表示装置 |
| AU2005302963B2 (en) | 2004-11-10 | 2009-07-02 | Cannon Kabushiki Kaisha | Light-emitting device |
| US7453065B2 (en) | 2004-11-10 | 2008-11-18 | Canon Kabushiki Kaisha | Sensor and image pickup device |
| EP2453480A2 (en) | 2004-11-10 | 2012-05-16 | Canon Kabushiki Kaisha | Amorphous oxide and field effect transistor |
| EP1815530B1 (en) | 2004-11-10 | 2021-02-17 | Canon Kabushiki Kaisha | Field effect transistor employing an amorphous oxide |
| US7579224B2 (en) | 2005-01-21 | 2009-08-25 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing a thin film semiconductor device |
| TWI412138B (zh) | 2005-01-28 | 2013-10-11 | 半導體能源研究所股份有限公司 | 半導體裝置,電子裝置,和半導體裝置的製造方法 |
| TWI481024B (zh) | 2005-01-28 | 2015-04-11 | 半導體能源研究所股份有限公司 | 半導體裝置,電子裝置,和半導體裝置的製造方法 |
| US7858451B2 (en) | 2005-02-03 | 2010-12-28 | Semiconductor Energy Laboratory Co., Ltd. | Electronic device, semiconductor device and manufacturing method thereof |
| US7948171B2 (en) | 2005-02-18 | 2011-05-24 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device |
| US20060197092A1 (en) | 2005-03-03 | 2006-09-07 | Randy Hoffman | System and method for forming conductive material on a substrate |
| US8681077B2 (en) | 2005-03-18 | 2014-03-25 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, and display device, driving method and electronic apparatus thereof |
| US7544967B2 (en) | 2005-03-28 | 2009-06-09 | Massachusetts Institute Of Technology | Low voltage flexible organic/transparent transistor for selective gas sensing, photodetecting and CMOS device applications |
| US7645478B2 (en) | 2005-03-31 | 2010-01-12 | 3M Innovative Properties Company | Methods of making displays |
| US8300031B2 (en) | 2005-04-20 | 2012-10-30 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device comprising transistor having gate and drain connected through a current-voltage conversion element |
| JP2006344849A (ja) | 2005-06-10 | 2006-12-21 | Casio Comput Co Ltd | 薄膜トランジスタ |
| US7691666B2 (en) | 2005-06-16 | 2010-04-06 | Eastman Kodak Company | Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby |
| US7402506B2 (en) | 2005-06-16 | 2008-07-22 | Eastman Kodak Company | Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby |
| US7507618B2 (en) | 2005-06-27 | 2009-03-24 | 3M Innovative Properties Company | Method for making electronic devices using metal oxide nanoparticles |
| JP2007053355A (ja) * | 2005-07-22 | 2007-03-01 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
| WO2007011061A1 (en) | 2005-07-22 | 2007-01-25 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| KR100711890B1 (ko) | 2005-07-28 | 2007-04-25 | 삼성에스디아이 주식회사 | 유기 발광표시장치 및 그의 제조방법 |
| JP2007059128A (ja) | 2005-08-23 | 2007-03-08 | Canon Inc | 有機el表示装置およびその製造方法 |
| JP4850457B2 (ja) | 2005-09-06 | 2012-01-11 | キヤノン株式会社 | 薄膜トランジスタ及び薄膜ダイオード |
| JP5116225B2 (ja) | 2005-09-06 | 2013-01-09 | キヤノン株式会社 | 酸化物半導体デバイスの製造方法 |
| JP2007073705A (ja) | 2005-09-06 | 2007-03-22 | Canon Inc | 酸化物半導体チャネル薄膜トランジスタおよびその製造方法 |
| JP4280736B2 (ja) | 2005-09-06 | 2009-06-17 | キヤノン株式会社 | 半導体素子 |
| EP3614442A3 (en) | 2005-09-29 | 2020-03-25 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having oxide semiconductor layer and manufactoring method thereof |
| JP5064747B2 (ja) | 2005-09-29 | 2012-10-31 | 株式会社半導体エネルギー研究所 | 半導体装置、電気泳動表示装置、表示モジュール、電子機器、及び半導体装置の作製方法 |
| JP5037808B2 (ja) | 2005-10-20 | 2012-10-03 | キヤノン株式会社 | アモルファス酸化物を用いた電界効果型トランジスタ、及び該トランジスタを用いた表示装置 |
| CN101667544B (zh) | 2005-11-15 | 2012-09-05 | 株式会社半导体能源研究所 | 半导体器件及其制造方法 |
| KR101226444B1 (ko) | 2005-12-21 | 2013-01-28 | 삼성디스플레이 주식회사 | 표시 기판의 제조 방법 및 표시 기판 |
| TWI292281B (en) | 2005-12-29 | 2008-01-01 | Ind Tech Res Inst | Pixel structure of active organic light emitting diode and method of fabricating the same |
| US7867636B2 (en) | 2006-01-11 | 2011-01-11 | Murata Manufacturing Co., Ltd. | Transparent conductive film and method for manufacturing the same |
| JP4655942B2 (ja) | 2006-01-16 | 2011-03-23 | セイコーエプソン株式会社 | 発光装置、発光装置の製造方法および電子機器 |
| JP4977478B2 (ja) | 2006-01-21 | 2012-07-18 | 三星電子株式会社 | ZnOフィルム及びこれを用いたTFTの製造方法 |
| US7576394B2 (en) | 2006-02-02 | 2009-08-18 | Kochi Industrial Promotion Center | Thin film transistor including low resistance conductive thin films and manufacturing method thereof |
| US7977169B2 (en) | 2006-02-15 | 2011-07-12 | Kochi Industrial Promotion Center | Semiconductor device including active layer made of zinc oxide with controlled orientations and manufacturing method thereof |
| JP4809087B2 (ja) * | 2006-03-14 | 2011-11-02 | セイコーエプソン株式会社 | エレクトロルミネッセンス装置、電子機器、およびエレクトロルミネッセンス装置の製造方法 |
| KR20070101595A (ko) | 2006-04-11 | 2007-10-17 | 삼성전자주식회사 | ZnO TFT |
| US20070252928A1 (en) | 2006-04-28 | 2007-11-01 | Toppan Printing Co., Ltd. | Structure, transmission type liquid crystal display, reflection type display and manufacturing method thereof |
| JP5028033B2 (ja) | 2006-06-13 | 2012-09-19 | キヤノン株式会社 | 酸化物半導体膜のドライエッチング方法 |
| JP4993963B2 (ja) * | 2006-07-24 | 2012-08-08 | 株式会社ブリヂストン | 情報表示用パネル |
| EP1887417A1 (en) | 2006-07-24 | 2008-02-13 | Bridgestone Corporation | Electrophoretic display panel |
| JP4609797B2 (ja) | 2006-08-09 | 2011-01-12 | Nec液晶テクノロジー株式会社 | 薄膜デバイス及びその製造方法 |
| JP4999400B2 (ja) | 2006-08-09 | 2012-08-15 | キヤノン株式会社 | 酸化物半導体膜のドライエッチング方法 |
| EP1895545B1 (en) | 2006-08-31 | 2014-04-23 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device |
| JP4332545B2 (ja) | 2006-09-15 | 2009-09-16 | キヤノン株式会社 | 電界効果型トランジスタ及びその製造方法 |
| JP4274219B2 (ja) | 2006-09-27 | 2009-06-03 | セイコーエプソン株式会社 | 電子デバイス、有機エレクトロルミネッセンス装置、有機薄膜半導体装置 |
| JP5164357B2 (ja) | 2006-09-27 | 2013-03-21 | キヤノン株式会社 | 半導体装置及び半導体装置の製造方法 |
| CN100459100C (zh) * | 2006-09-30 | 2009-02-04 | 中芯国际集成电路制造(上海)有限公司 | 平坦化方法及顶层金属层隔离结构的形成方法 |
| US7622371B2 (en) | 2006-10-10 | 2009-11-24 | Hewlett-Packard Development Company, L.P. | Fused nanocrystal thin film semiconductor and method |
| US7772021B2 (en) | 2006-11-29 | 2010-08-10 | Samsung Electronics Co., Ltd. | Flat panel displays comprising a thin-film transistor having a semiconductive oxide in its channel and methods of fabricating the same for use in flat panel displays |
| JP2008140684A (ja) | 2006-12-04 | 2008-06-19 | Toppan Printing Co Ltd | カラーelディスプレイおよびその製造方法 |
| KR101303578B1 (ko) | 2007-01-05 | 2013-09-09 | 삼성전자주식회사 | 박막 식각 방법 |
| US8207063B2 (en) | 2007-01-26 | 2012-06-26 | Eastman Kodak Company | Process for atomic layer deposition |
| KR20080077538A (ko) * | 2007-02-20 | 2008-08-25 | 삼성전자주식회사 | 박막트랜지스터 기판과 액정표시장치 |
| KR100851215B1 (ko) | 2007-03-14 | 2008-08-07 | 삼성에스디아이 주식회사 | 박막 트랜지스터 및 이를 이용한 유기 전계 발광표시장치 |
| US7795613B2 (en) | 2007-04-17 | 2010-09-14 | Toppan Printing Co., Ltd. | Structure with transistor |
| KR101325053B1 (ko) | 2007-04-18 | 2013-11-05 | 삼성디스플레이 주식회사 | 박막 트랜지스터 기판 및 이의 제조 방법 |
| KR20080094300A (ko) | 2007-04-19 | 2008-10-23 | 삼성전자주식회사 | 박막 트랜지스터 및 그 제조 방법과 박막 트랜지스터를포함하는 평판 디스플레이 |
| KR101334181B1 (ko) | 2007-04-20 | 2013-11-28 | 삼성전자주식회사 | 선택적으로 결정화된 채널층을 갖는 박막 트랜지스터 및 그제조 방법 |
| US8274078B2 (en) | 2007-04-25 | 2012-09-25 | Canon Kabushiki Kaisha | Metal oxynitride semiconductor containing zinc |
| KR101345376B1 (ko) | 2007-05-29 | 2013-12-24 | 삼성전자주식회사 | ZnO 계 박막 트랜지스터 및 그 제조방법 |
| US7903219B2 (en) * | 2007-08-16 | 2011-03-08 | Sony Corporation | Liquid crystal display device |
| US8202365B2 (en) | 2007-12-17 | 2012-06-19 | Fujifilm Corporation | Process for producing oriented inorganic crystalline film, and semiconductor device using the oriented inorganic crystalline film |
| JP2009271103A (ja) | 2008-04-30 | 2009-11-19 | Hitachi Displays Ltd | 液晶表示装置 |
| WO2009142089A1 (ja) * | 2008-05-20 | 2009-11-26 | シャープ株式会社 | 表示パネル用の基板、この基板を備える表示パネル、表示パネル用の基板の製造方法および表示パネルの製造方法 |
| KR101681483B1 (ko) * | 2008-09-12 | 2016-12-02 | 삼성디스플레이 주식회사 | 박막 트랜지스터 기판 및 그 제조 방법 |
| JP4623179B2 (ja) | 2008-09-18 | 2011-02-02 | ソニー株式会社 | 薄膜トランジスタおよびその製造方法 |
| JP5451280B2 (ja) | 2008-10-09 | 2014-03-26 | キヤノン株式会社 | ウルツ鉱型結晶成長用基板およびその製造方法ならびに半導体装置 |
| JP5616012B2 (ja) | 2008-10-24 | 2014-10-29 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| US8941617B2 (en) | 2008-11-07 | 2015-01-27 | Semiconductor Energy Laboratory Co., Ltd. | Image input-output device with color layer between photodetector and display elements to improve the accuracy of reading images in color |
| JP2010117549A (ja) * | 2008-11-13 | 2010-05-27 | Seiko Epson Corp | 表示装置の製造方法 |
| JP2012042490A (ja) * | 2008-12-16 | 2012-03-01 | Sharp Corp | 液晶表示用パネル及び液晶表示装置 |
| TWI501319B (zh) | 2008-12-26 | 2015-09-21 | 半導體能源研究所股份有限公司 | 半導體裝置及其製造方法 |
| JP2010182582A (ja) | 2009-02-06 | 2010-08-19 | Seiko Epson Corp | 有機エレクトロルミネッセンス装置、電子機器 |
| WO2011007675A1 (en) | 2009-07-17 | 2011-01-20 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| CN104992984B (zh) | 2009-07-31 | 2019-08-16 | 株式会社半导体能源研究所 | 半导体装置、显示模块及电子装置 |
| EP2284891B1 (en) | 2009-08-07 | 2019-07-24 | Semiconductor Energy Laboratory Co, Ltd. | Semiconductor device and manufacturing method thereof |
| US8115883B2 (en) | 2009-08-27 | 2012-02-14 | Semiconductor Energy Laboratory Co., Ltd. | Display device and method for manufacturing the same |
| CN105428424A (zh) | 2009-09-16 | 2016-03-23 | 株式会社半导体能源研究所 | 晶体管及显示设备 |
| WO2011043218A1 (en) | 2009-10-09 | 2011-04-14 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
| WO2011052382A1 (en) | 2009-10-30 | 2011-05-05 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
| KR101876473B1 (ko) * | 2009-11-06 | 2018-07-10 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 반도체 장치의 제작 방법 |
| WO2011065210A1 (en) | 2009-11-28 | 2011-06-03 | Semiconductor Energy Laboratory Co., Ltd. | Stacked oxide material, semiconductor device, and method for manufacturing the semiconductor device |
| CN105609509A (zh) | 2009-12-04 | 2016-05-25 | 株式会社半导体能源研究所 | 显示装置 |
| KR20210043743A (ko) | 2009-12-04 | 2021-04-21 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 그 제조 방법 |
| KR101311874B1 (ko) | 2009-12-14 | 2013-09-26 | 엘지디스플레이 주식회사 | 반사투과형 액정표시장치용 어레이 기판의 제조 방법 |
| KR101913111B1 (ko) | 2009-12-18 | 2018-10-31 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
| WO2011081041A1 (en) * | 2009-12-28 | 2011-07-07 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the semiconductor device |
| WO2011081011A1 (en) * | 2009-12-28 | 2011-07-07 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device and manufacturing method thereof |
| EP2526622B1 (en) | 2010-01-20 | 2015-09-23 | Semiconductor Energy Laboratory Co. Ltd. | Semiconductor device |
| KR101805378B1 (ko) | 2010-01-24 | 2017-12-06 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시 장치와 이의 제조 방법 |
| KR20150010776A (ko) | 2010-02-05 | 2015-01-28 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치, 및 반도체 장치의 제조 방법 |
| KR101084191B1 (ko) | 2010-02-16 | 2011-11-17 | 삼성모바일디스플레이주식회사 | 유기 발광 디스플레이 장치 및 그 제조 방법 |
| KR20180110212A (ko) | 2010-02-19 | 2018-10-08 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 트랜지스터 및 이를 이용한 표시 장치 |
| CN102763203B (zh) * | 2010-02-26 | 2016-10-26 | 株式会社半导体能源研究所 | 制造半导体装置的方法 |
| KR101305378B1 (ko) | 2010-03-19 | 2013-09-06 | 엘지디스플레이 주식회사 | 터치인식 횡전계형 액정표시장치 및 이의 제조 방법 |
| JP2011221097A (ja) | 2010-04-05 | 2011-11-04 | Seiko Epson Corp | 電気泳動表示装置用基板、電気泳動表示装置、および電子機器 |
| KR101293130B1 (ko) * | 2010-05-28 | 2013-08-12 | 엘지디스플레이 주식회사 | 어레이 기판 및 이의 제조방법 |
| KR101827340B1 (ko) * | 2010-07-14 | 2018-02-09 | 삼성디스플레이 주식회사 | 액정 표시 장치 |
| US8785241B2 (en) | 2010-07-16 | 2014-07-22 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| US8835917B2 (en) | 2010-09-13 | 2014-09-16 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, power diode, and rectifier |
| WO2012035984A1 (en) | 2010-09-15 | 2012-03-22 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and display device |
| KR20130106398A (ko) | 2010-09-15 | 2013-09-27 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 액정 표시 장치 및 그 제작 방법 |
| JP5437971B2 (ja) * | 2010-10-29 | 2014-03-12 | 株式会社ジャパンディスプレイ | 液晶表示装置 |
| TWI525818B (zh) | 2010-11-30 | 2016-03-11 | 半導體能源研究所股份有限公司 | 半導體裝置及半導體裝置之製造方法 |
| JP5372900B2 (ja) | 2010-12-15 | 2013-12-18 | 株式会社ジャパンディスプレイ | 液晶表示装置 |
| TWI535032B (zh) | 2011-01-12 | 2016-05-21 | 半導體能源研究所股份有限公司 | 半導體裝置的製造方法 |
| JP5906132B2 (ja) * | 2012-05-09 | 2016-04-20 | 株式会社ジャパンディスプレイ | 表示装置 |
| KR102099262B1 (ko) * | 2012-07-11 | 2020-04-09 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 액정 표시 장치, 및 액정 표시 장치의 구동 방법 |
| CN104488016B (zh) | 2012-07-20 | 2018-08-10 | 株式会社半导体能源研究所 | 显示装置及具有该显示装置的电子设备 |
| WO2014013958A1 (en) | 2012-07-20 | 2014-01-23 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
| US9455220B2 (en) | 2014-05-31 | 2016-09-27 | Freescale Semiconductor, Inc. | Apparatus and method for placing stressors on interconnects within an integrated circuit device to manage electromigration failures |
-
2013
- 2013-07-10 CN CN201380038678.2A patent/CN104488016B/zh active Active
- 2013-07-10 WO PCT/JP2013/069456 patent/WO2014014039A1/en not_active Ceased
- 2013-07-10 DE DE112013003609.6T patent/DE112013003609B4/de active Active
- 2013-07-10 CN CN201810760315.4A patent/CN108987416B/zh active Active
- 2013-07-10 KR KR1020257034910A patent/KR20250154556A/ko active Pending
- 2013-07-10 KR KR1020227006185A patent/KR102505680B1/ko active Active
- 2013-07-10 KR KR1020187038087A patent/KR102093060B1/ko active Active
- 2013-07-10 KR KR1020237006749A patent/KR102705677B1/ko active Active
- 2013-07-10 KR KR1020247029906A patent/KR102878532B1/ko active Active
- 2013-07-10 KR KR1020207007826A patent/KR102282866B1/ko active Active
- 2013-07-10 KR KR1020157001433A patent/KR102081468B1/ko active Active
- 2013-07-10 KR KR1020217022971A patent/KR102368865B1/ko active Active
- 2013-07-11 US US13/939,323 patent/US9298057B2/en active Active
- 2013-07-17 TW TW102125561A patent/TWI666497B/zh active
- 2013-07-17 TW TW112120473A patent/TWI883446B/zh active
- 2013-07-17 TW TW107142399A patent/TWI666499B/zh active
- 2013-07-17 TW TW106145546A patent/TWI679480B/zh active
- 2013-07-17 TW TW108123309A patent/TWI718580B/zh active
- 2013-07-17 TW TW110103542A patent/TWI804808B/zh active
- 2013-07-18 JP JP2013149240A patent/JP6208485B2/ja active Active
-
2016
- 2016-01-15 JP JP2016005872A patent/JP6058832B2/ja active Active
- 2016-02-01 US US15/012,092 patent/US10514579B2/en active Active
-
2017
- 2017-09-07 JP JP2017171667A patent/JP6552567B2/ja active Active
-
2018
- 2018-10-30 US US16/175,021 patent/US10514580B2/en active Active
- 2018-11-28 JP JP2018221897A patent/JP6585806B2/ja active Active
-
2019
- 2019-09-05 JP JP2019162060A patent/JP2020079923A/ja not_active Withdrawn
- 2019-12-19 US US16/720,439 patent/US11209710B2/en active Active
-
2021
- 2021-11-24 JP JP2021190060A patent/JP2022036994A/ja not_active Withdrawn
- 2021-12-27 US US17/562,070 patent/US11531243B2/en active Active
-
2022
- 2022-09-29 JP JP2022155871A patent/JP7378560B2/ja active Active
- 2022-11-28 US US17/994,525 patent/US11899328B2/en active Active
-
2023
- 2023-10-31 JP JP2023186649A patent/JP7527457B2/ja active Active
-
2024
- 2024-01-18 US US18/415,901 patent/US12210257B2/en active Active
- 2024-07-23 JP JP2024117852A patent/JP7661589B2/ja active Active
- 2024-11-15 JP JP2024199395A patent/JP7762282B2/ja active Active
-
2025
- 2025-01-09 US US19/014,390 patent/US20250147370A1/en active Pending
- 2025-04-02 JP JP2025061068A patent/JP2025102914A/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120097940A1 (en) * | 2010-10-22 | 2012-04-26 | Min-Sung Kwon | Display device and method for manufacturing the same |
Also Published As
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP7762282B2 (ja) | 半導体装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A107 | Divisional application of patent | ||
| PA0104 | Divisional application for international application |
Comment text: Divisional Application for International Patent Patent event code: PA01041R01D Patent event date: 20200317 Application number text: 1020187038087 Filing date: 20181228 |
|
| PA0201 | Request for examination | ||
| PG1501 | Laying open of application | ||
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20200615 Patent event code: PE09021S01D |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20210427 |
|
| A107 | Divisional application of patent | ||
| PA0104 | Divisional application for international application |
Comment text: Divisional Application for International Patent Patent event code: PA01041R01D Patent event date: 20210720 Application number text: 1020187038087 Filing date: 20181228 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20210722 Patent event code: PR07011E01D |
|
| PR1002 | Payment of registration fee |
Payment date: 20210722 End annual number: 3 Start annual number: 1 |
|
| PG1601 | Publication of registration | ||
| PR1001 | Payment of annual fee |
Payment date: 20240619 Start annual number: 4 End annual number: 4 |
|
| PR1001 | Payment of annual fee |
Payment date: 20250616 Start annual number: 5 End annual number: 5 |