KR101870931B1 - 공정 균일성과 열 방산을 개선하기 위한 더미 티에스브이 - Google Patents
공정 균일성과 열 방산을 개선하기 위한 더미 티에스브이 Download PDFInfo
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- KR101870931B1 KR101870931B1 KR1020127025912A KR20127025912A KR101870931B1 KR 101870931 B1 KR101870931 B1 KR 101870931B1 KR 1020127025912 A KR1020127025912 A KR 1020127025912A KR 20127025912 A KR20127025912 A KR 20127025912A KR 101870931 B1 KR101870931 B1 KR 101870931B1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/367—Cooling facilitated by shape of device
- H01L23/3677—Wire-like or pin-like cooling fins or heat sinks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/481—Internal lead connections, e.g. via connections, feedthrough structures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/03—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/065—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H10D89/00
- H01L25/0657—Stacked arrangements of devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/03—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/07—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group subclass H10D
- H01L25/073—Apertured devices mounted on one or more rods passed through the apertures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/50—Multistep manufacturing processes of assemblies consisting of devices, the devices being individual devices of subclass H10D or integrated devices of class H10
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/2919—Material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32135—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/32145—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
- H01L2224/92—Specific sequence of method steps
- H01L2224/9202—Forming additional connectors after the connecting process
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
- H01L2225/04—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same main group of the same subclass of class H10
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06541—Conductive via connections through the device, e.g. vertical interconnects, through silicon via [TSV]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
- H01L2225/04—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same main group of the same subclass of class H10
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06541—Conductive via connections through the device, e.g. vertical interconnects, through silicon via [TSV]
- H01L2225/06544—Design considerations for via connections, e.g. geometry or layout
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
- H01L2225/04—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same main group of the same subclass of class H10
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06555—Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking
- H01L2225/06565—Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking the devices having the same size and there being no auxiliary carrier between the devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
- H01L2225/04—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same main group of the same subclass of class H10
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06575—Auxiliary carrier between devices, the carrier having no electrical connection structure
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
- H01L2225/04—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same main group of the same subclass of class H10
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06589—Thermal management, e.g. cooling
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Memories (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/716,902 US10181454B2 (en) | 2010-03-03 | 2010-03-03 | Dummy TSV to improve process uniformity and heat dissipation |
| US12/716,902 | 2010-03-03 | ||
| PCT/US2011/026987 WO2011109595A1 (en) | 2010-03-03 | 2011-03-03 | Dummy tsv to improve process uniformity and heat dissipation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20130038215A KR20130038215A (ko) | 2013-04-17 |
| KR101870931B1 true KR101870931B1 (ko) | 2018-06-25 |
Family
ID=44114478
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020127025912A Active KR101870931B1 (ko) | 2010-03-03 | 2011-03-03 | 공정 균일성과 열 방산을 개선하기 위한 더미 티에스브이 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US10181454B2 (enExample) |
| EP (1) | EP2543067B1 (enExample) |
| JP (2) | JP2013521661A (enExample) |
| KR (1) | KR101870931B1 (enExample) |
| CN (1) | CN102782841B (enExample) |
| TW (1) | TWI562277B (enExample) |
| WO (1) | WO2011109595A1 (enExample) |
Families Citing this family (62)
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| US8563365B2 (en) * | 2011-03-09 | 2013-10-22 | Georgia Tech Research Corporation | Air-gap C4 fluidic I/O interconnects and methods of fabricating same |
| US8618647B2 (en) * | 2011-08-01 | 2013-12-31 | Tessera, Inc. | Packaged microelectronic elements having blind vias for heat dissipation |
| US9633149B2 (en) * | 2012-03-14 | 2017-04-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | System and method for modeling through silicon via |
| US9147610B2 (en) | 2012-06-22 | 2015-09-29 | Infineon Technologies Ag | Monitor structures and methods of formation thereof |
| TWI497661B (zh) | 2012-08-15 | 2015-08-21 | 財團法人工業技術研究院 | 半導體基板 |
| US9343393B2 (en) | 2012-08-15 | 2016-05-17 | Industrial Technology Research Institute | Semiconductor substrate assembly with embedded resistance element |
| KR20140023707A (ko) * | 2012-08-17 | 2014-02-27 | 에스케이하이닉스 주식회사 | 얼라인 키 구조물을 포함한 반도체 메모리 장치 |
| CN103633039B (zh) * | 2012-08-29 | 2017-02-08 | 中芯国际集成电路制造(上海)有限公司 | 半导体散热结构及其形成方法、半导体芯片 |
| US9058460B2 (en) | 2013-03-01 | 2015-06-16 | International Business Machines Corporation | Thermally-optimized metal fill for stacked chip systems |
| CN103236420B (zh) * | 2013-04-28 | 2015-12-23 | 华进半导体封装先导技术研发中心有限公司 | 三维封装中散热通道与地线通道共用的封装结构 |
| KR101428754B1 (ko) * | 2013-05-14 | 2014-08-11 | (주)실리콘화일 | 방열 특성이 개선된 반도체 장치 |
| KR102144734B1 (ko) * | 2013-10-25 | 2020-08-14 | 삼성전자 주식회사 | 반도체 장치 제조 방법 |
| US9627341B2 (en) * | 2013-10-28 | 2017-04-18 | Infineon Technologies Dresden Gmbh | Wafer arrangement, a method for testing a wafer, and a method for processing a wafer |
| KR20150094135A (ko) * | 2014-02-10 | 2015-08-19 | 삼성전자주식회사 | 반도체 패키지 및 이의 제조방법 |
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| KR20150118638A (ko) | 2014-04-14 | 2015-10-23 | 에스케이하이닉스 주식회사 | 이미지 센서 및 그 제조 방법 |
| US10177032B2 (en) * | 2014-06-18 | 2019-01-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Devices, packaging devices, and methods of packaging semiconductor devices |
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| CN104966693B (zh) * | 2015-06-03 | 2017-03-15 | 贵州大学 | 一种内嵌式复合散热结构的三维集成功率系统及制备方法 |
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2010
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2011
- 2011-02-21 TW TW100105592A patent/TWI562277B/zh active
- 2011-03-03 KR KR1020127025912A patent/KR101870931B1/ko active Active
- 2011-03-03 JP JP2012556238A patent/JP2013521661A/ja active Pending
- 2011-03-03 CN CN201180012102.XA patent/CN102782841B/zh active Active
- 2011-03-03 EP EP11709535.6A patent/EP2543067B1/en active Active
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| Publication number | Publication date |
|---|---|
| EP2543067B1 (en) | 2022-09-21 |
| US20110215457A1 (en) | 2011-09-08 |
| CN102782841A (zh) | 2012-11-14 |
| TWI562277B (en) | 2016-12-11 |
| KR20130038215A (ko) | 2013-04-17 |
| JP6412091B2 (ja) | 2018-10-24 |
| WO2011109595A1 (en) | 2011-09-09 |
| CN102782841B (zh) | 2016-06-29 |
| JP2017073560A (ja) | 2017-04-13 |
| US11222869B2 (en) | 2022-01-11 |
| US10181454B2 (en) | 2019-01-15 |
| US20190148345A1 (en) | 2019-05-16 |
| EP2543067A1 (en) | 2013-01-09 |
| TW201145454A (en) | 2011-12-16 |
| JP2013521661A (ja) | 2013-06-10 |
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