KR101473107B1 - 기판 처리 장치 - Google Patents
기판 처리 장치 Download PDFInfo
- Publication number
- KR101473107B1 KR101473107B1 KR1020130093094A KR20130093094A KR101473107B1 KR 101473107 B1 KR101473107 B1 KR 101473107B1 KR 1020130093094 A KR1020130093094 A KR 1020130093094A KR 20130093094 A KR20130093094 A KR 20130093094A KR 101473107 B1 KR101473107 B1 KR 101473107B1
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- detection
- swinging
- swinging member
- magnet
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G43/00—Control devices, e.g. for safety, warning or fault-correcting
- B65G43/08—Control devices operated by article or material being fed, conveyed or discharged
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Automation & Control Theory (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2012-182964 | 2012-08-22 | ||
JP2012182964A JP6000019B2 (ja) | 2012-08-22 | 2012-08-22 | 基板処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20140026256A KR20140026256A (ko) | 2014-03-05 |
KR101473107B1 true KR101473107B1 (ko) | 2014-12-16 |
Family
ID=50213886
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020130093094A KR101473107B1 (ko) | 2012-08-22 | 2013-08-06 | 기판 처리 장치 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6000019B2 (zh) |
KR (1) | KR101473107B1 (zh) |
CN (1) | CN103633000B (zh) |
TW (1) | TWI494260B (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD800083S1 (en) | 2015-02-23 | 2017-10-17 | Samsung Electronics Co., Ltd. | Electronic device |
CN105107776B (zh) * | 2015-08-24 | 2017-06-27 | 京东方科技集团股份有限公司 | 检测装置及工件清洗设备 |
CN105865495B (zh) * | 2016-06-20 | 2017-12-01 | 武汉华星光电技术有限公司 | 位置检知装置 |
JP7148289B2 (ja) * | 2018-06-20 | 2022-10-05 | 芝浦メカトロニクス株式会社 | 基板検出装置及び基板処理装置 |
CN109142388B (zh) * | 2018-08-01 | 2021-04-13 | 京东方科技集团股份有限公司 | 基板检测器、驱动装置以及基板清洁设备 |
JP6857682B2 (ja) * | 2019-03-29 | 2021-04-14 | 芝浦メカトロニクス株式会社 | 基板処理装置 |
USD959424S1 (en) | 2020-02-26 | 2022-08-02 | Samsung Electronics Co., Ltd. | Mobile telephone |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101071174B1 (ko) * | 2008-11-26 | 2011-10-10 | 에프엔에스테크 주식회사 | 기판 감지장치 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0737285B2 (ja) * | 1993-02-22 | 1995-04-26 | 吉田車輌機器株式会社 | 荷検出装置 |
JPH10265026A (ja) * | 1997-03-25 | 1998-10-06 | Hitachi Electron Eng Co Ltd | ワーク通過検出装置 |
JPH1111640A (ja) * | 1997-06-30 | 1999-01-19 | Okamura Corp | ローラコンベヤにおける搬送物検出装置 |
JP2001057355A (ja) * | 1999-08-19 | 2001-02-27 | Dainippon Screen Mfg Co Ltd | 基板検出装置および基板処理装置 |
JP2002110004A (ja) * | 2000-09-29 | 2002-04-12 | Nippon Kentetsu Co Ltd | 通過検出スイッチ |
JP2003128244A (ja) * | 2001-10-30 | 2003-05-08 | Sumitomo Precision Prod Co Ltd | 基板検出装置及び基板処理設備 |
TW200420480A (en) * | 2003-04-04 | 2004-10-16 | Mosel Vitelic Inc | Wafer transmission system with sensor |
TWM259245U (en) * | 2004-05-28 | 2005-03-11 | Jing Bo Technology Co Ltd | Magnetically swinging counting controller and resetting structure |
JP2007066985A (ja) * | 2005-08-29 | 2007-03-15 | Shibaura Mechatronics Corp | 基板の検出装置及び処理装置 |
KR20070048483A (ko) * | 2005-11-04 | 2007-05-09 | 세메스 주식회사 | 기판을 처리하는 장치 및 기판을 처리하는 방법 |
JP2010133884A (ja) * | 2008-12-08 | 2010-06-17 | Sharp Corp | 振り子センサ |
CN102253505B (zh) * | 2010-05-20 | 2013-04-03 | 北京京东方光电科技有限公司 | 基板位置检测方法及装置 |
-
2012
- 2012-08-22 JP JP2012182964A patent/JP6000019B2/ja active Active
-
2013
- 2013-08-06 KR KR1020130093094A patent/KR101473107B1/ko active IP Right Grant
- 2013-08-20 CN CN201310364328.7A patent/CN103633000B/zh active Active
- 2013-08-20 TW TW102129802A patent/TWI494260B/zh active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101071174B1 (ko) * | 2008-11-26 | 2011-10-10 | 에프엔에스테크 주식회사 | 기판 감지장치 |
Also Published As
Publication number | Publication date |
---|---|
JP2014041897A (ja) | 2014-03-06 |
CN103633000A (zh) | 2014-03-12 |
TWI494260B (zh) | 2015-08-01 |
CN103633000B (zh) | 2016-05-04 |
KR20140026256A (ko) | 2014-03-05 |
JP6000019B2 (ja) | 2016-09-28 |
TW201414653A (zh) | 2014-04-16 |
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